Abstract: The present invention relates to a curing accelerating compound-silica composite material capable of giving excellent storage stability to a curable resin composition, which is obtained by subjecting one or more compounds selected from compounds represented by the general formula (I-1) below and partial condensates thereof to a sol-gel reaction in the presence of a curing accelerating compound and water; a curable resin composition comprising the same; and an electronic component device comprising a device sealed with the curable resin composition.

Abstract: A method of making a diluted polysiloxane containing polymer comprising the steps of: i) Preparing a polysiloxane containing polymer by the polycondensation of siloxane containing monomers and/or oligomers which comprise condensable groups in the presence of an organopolysiloxane and/or an organic based diluent material, a suitable catalyst and optionally an end-blocking agent; and ii) Where required quenching the polymerization process; wherein the diluent material is substantially retained within the resulting diluted organopolysiloxane.

Abstract: A sealing material for optical elements with excellent transparency, crack resistance, and heat resistance which can produce a cured product of the sealing material and a sealed optical element are provided.

Abstract: To provide a highly efficient and stable method for the preparation of a silicon-containing polysulfide-type polymer, in particular, a polysulfide-type polymer with organosilyl groups, the method being carried out without generation of by-products that could have high impact on the environment. A method for the preparation of a silicon-containing polysulfide-type polymer characterized by mixing (A) a silicon-containing compound having a silicon atom-bonded monovalent organic group having an aliphatic unsaturated bond; (B) a polysulfide polymer with at least two mercapto groups in one molecule; and (C) an organic base or ammonia; the mixing being carried out in the presence of (D) sulfur.

Abstract: A curable resin which exhibits excellent heat resistance while including an extremely smaller amount of volatile component is disclosed, and an electronic component device having excellent reliability in heat resistance and the like which contains the above curable resin is provided. A curable resin obtained in reaction of at least one compound (a) selected from the group consisting of the silane compounds represented by the following Formula (I-1) and the partial condensates thereof with a phenol compound (b), comprising a remaining volatile component in an amount of 10 wt % or less with respect to the total weight of the curable resin is used as a curing agent.

Abstract: Photovoltaic cells with silole-containing polymers, as well as related systems, methods and components are disclosed.

Abstract: Polysiloxane phosphoramide fire retardants are provided having the basic structural unit: wherein, Y is O or S; R? is selected from a saturated or unsaturated alkyl, an aryl, a heterocyclic, and a cycloaliphatic; R is selected from H, a saturated or unsaturated alkyl, an aryl, a heterocyclic, and a cycloaliphatic; X is selected from H, a saturated or unsaturated alkyl, an aryl, a heterocyclic, and a cycloaliphatic; n is selected from 0 to 500; and ? is selected from 1-500.

Abstract: The invention provides a radiation-curable alkoxy silanized hyperbranched polyester acrylate, characterized in that the radiation-curable alkoxy silanized hyperbranched polyester acrylate is produced by using a hyperbranched molecule with at least 16 functionalities as a core; acrylating or methacrylating a portion of the terminal groups of the hyperbranched molecule; and terminating a portion of the end groups of the hyperbranched molecule with an isocyanated silane coupling agent. The acrylate of the invention can be formed into a coating on polar substrates, such as glass or metal, or used as an adhesive.

Abstract: The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.

Abstract: Novel silicone polyether copolymers of inverse structure of the formula 1, characterized in that no unsaturated functional groups caused by side reactions or conversion products thereof are present in the copolymer, and a process for preparation thereof, in which a polyether modified terminally and/or laterally with alkoxysilyl groups is reacted with silanes and/or siloxanes which bear one or more hydrolysis-labile groups, in a hydrolysis and condensation reaction.

Abstract: Provided herein, according to some embodiments of the invention, are organosilane polymers prepared by reacting organosilane compounds including (a) at least one compound of Formula I Si(OR1)(OR2)(OR3)R4??(I) wherein R1, R2 and R3 may each independently be an alkyl group, and R4 may be —(CH2)nR5, wherein R5 may be an aryl or a substituted aryl, and n may be 0 or a positive integer; and (b) at least one compound of Formula II Si(OR6)(OR7)(OR8)R9??(II) wherein R6, R7 and R8 may each independently an alkyl group or an aryl group; and R9 may be an alkyl group. Also provided are hardmask compositions including an organosilane compound according to an embodiment of the invention, or a hydrolysis product thereof. Methods of producing semiconductor devices using a hardmask compostion according to an embodiment of the invention, and semiconductor devices produced therefrom, are also provided.

Abstract: The present invention relates to a composition for cross-linking and stabilization of a polymer containing hydrolysable silane groups comprising a sulphonic acid as a silanol condensation catalyst characterized in that it comprises a stabilizer which is neutral or acidic, does not contain ester groups and is a compound according to formula (I): wherein R is an unsubstituted or substituted aliphatic or aromatic hydrocarbyl radical which may comprise heteroatoms, R? is a hydrocarbyl radical, R? is a hydrocarbyl radical and R? and/or R? being a bulky radical, X1, X2 or X3 is the same or different H or OH, whereby at least X1, X2 or X3 is OH, and n is 1 to 4; or a compound according to formula (II): R??—(S)p—R????(II) wherein R?? is an aliphatic hydrocarbyl radical and p is 1 to 6; or a mixture of any of such compounds, to a stabilized polymer comprising the above stabilizers and to a process for cross-linking and stabilization of silane group containing polymers in the presence of the above mentio

Abstract: A siloxane resin having the formula: (HSiO3/2)a(RSiO3/2)b(SiO4/2)c where R is Z, Z(CH2)n or ZO(CH2)n where Z is a phenyl or substituted phenyl group; n has a value of 1 to 6, a has value of 0.01 to 0.7, b has a value of 0.05 to 0.7, c has a value of 0.1 to 0.9 and a+b+c?1. The siloxane resins are useful in anti-reflective coating compositions.

Abstract: A nanostructured hybrid liquid oligomer composition including at least one epoxy-functional component (A), at least one cyclic carbonate component (B), at least one amine-functional component (C), and, optionally, at least one acrylate (methacrylate) functional component (D), wherein at least one epoxy, amine, or acrylate (methacrylate) component contains alkoxysilane units. The composition is highly curable at low temperatures (approximately 10 to 30° C.) with forming of nanostructure under the influence of atmospheric moisture and the forming of active, specific hydroxyl groups by reaction of cyclic carbonates with amine functionalities. According to the present invention, the cured composition has excellent strength-stress properties, adhesion to a variety of substrates, appearance, and resistance to weathering, abrasion, and solvents.

Abstract: A method for producing an amino group-containing conjugated diene polymer includes polymerizing a conjugated diene compound in the presence of a reaction product of 1,3-bis(diphenylethenyl)benzene or a derivative thereof and an organolithium compound to obtain a conjugated diene polymer, and reacting the conjugated diene polymer with a modifier.

Abstract: The invention provides a process for preparing branched SiH-functional siloxanes by converting a mixture of one or more low molecular weight SiH-functional siloxanes, one or more low molecular weight SiH-free siloxanes and one or more trialkoxysilanes with addition of water and in the presence of at least one Brønsted-acidic catalyst, which is characterized in that the reaction is performed in one process step.

Abstract: The present invention relates to a composition for cross-linking and stabilization of a polymer containing hydrolysable silane groups comprising a sulfonic acid as a silanol condensation catalyst characterized in that it comprises a stabilizer which is neutral or acidic, does not contain ester groups and is a compound according to formula (I): wherein R is an unsubstituted or substituted aliphatic or aromatic hydrocarbyl radical which may comprise heteroatoms, R? is a hydrocarbyl radical, R? is a hydrocarbyl radical and R? and/or R? being a bulky radical, X1, X2 or X3 is the same or different H or OH, whereby at least X1, X2 or X3 is OH, and n is 1 to 4; or a compound according to formula (II): R??—(S)p—R????(II) wherein R?? is an aliphatic hydrocarbyl radical and p is 1 to 6; or a mixture of any of such compounds, to a stabilized polymer comprising the above stabilizers and to a process for cross-linking and stabilization of silane group containing polymers in the presence of the above mentioned sta

Abstract: The invention relates to silicon oils, more particularly, to a novel method for the preparation of a silicon oil by polymerization and rearrangement of cyclic siloxanes in the presence of an alkaline catalyst and a co-catalyst which is a cryptand (macroheterobicyclic diamine) acting as a polymerization accelerator.

Abstract: A method for preparing polyorganosiloxanes (POS) by a ring-opening polymerization and/or linear, non-linear or cyclic POS redistribution in the presence of a nucleophilic carbene. The initial efficiency of the POS conversion is substantially increased at low temperature, resulting in less residual content of initial POS.

Abstract: A process for producing a low VOC epoxy silane oligomer which includes the reaction of an epoxy silane with water in a water to silane molar ratio of from 0.1 to 1.5, in which the epoxy silane is the reaction product of an epoxy alkoxy-substituted silane and a diol or a dicarboxylic acid.

Abstract: Provided are polymers comprising the condensation product of silicon-containing reactants. Also provided are compositions suitable for use in forming optical waveguides which include such polymers, as well as optical waveguides formed from such polymers. The polymers, compositions and optical waveguides have particular use in the formation of printed wiring boards having electrical and optical functionality.

Abstract: The present invention relates to an improved method of polymerizing silicon fluids, more particularly, this method is particularly convenient for producing low viscosity silicone oils.

Abstract: The invention relates to a process for the preparation of equilibration products of organosiloxanes by rearrangement of the siloxane bond to a cation exchange resin, the organopolysiloxanes thus obtainable and the use thereof.

Abstract: The invention relates to a process for preparing equilibration products of organosiloxanes by rearrangement of the siloxane bond over a cation exchange resin, to the organopolysiloxanes thus obtainable, and to their use.

Abstract: A release coating composition according to the present invention comprises an alkenyl functional polysiloxane (1), a silicon hydride functional polysiloxane (11) and a catalyst (111) comprising a platinum group metal. The alkenyl functional polysiloxane (1) is an alkenylterminated polysiloxane prepared by siloxane polycondensation and/or equilibration using a phosphazene base catalyst followed by neutralisation with an acidic neutralising agent. The level of catalyst (III) in the composition can be as low as 2-40 parts per million platinum group metal by weight.

Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.

Abstract: A synthesis process for polyhedral oligomeric silsesquioxanes that produces in high yield a low resin content, solvent free, and trace metal free monomer suitable for use in microelectronic applications. POSS silanols are reacted with a silane coupling agent in the presence of a solvent and a superbase.

Abstract: A synthesis process for polyhedral oligomeric silsesquioxanes using phosphazene superbases to produce in high yield a low resin content, solvent free, and trace metal free monomer suitable for use in microelectronic, biological, and medical applications involving polymerization, grafting, and alloying.

Abstract: A curable resin which exhibits excellent heat resistance while including an extremely smaller amount of volatile component is disclosed, and an electronic component device having excellent reliability in heat resistance and the like which contains the above curable resin is provided. A curable resin obtained in reaction of at least one compound (a) selected from the group consisting of the silane compounds represented by the following Formula (I-1) and the partial condensates thereof with a phenol compound (b), comprising a remaining volatile component in an amount of 10 wt % or less with respect to the total weight of the curable resin is used as a curing agent.

Abstract: Disclosed are hydroxyl organic oligosiloxane resins prepared by hydrolysis-condensation of organic alkoxysilane and preparation method thereof. More particularly, the present invention provides a method for preparation of novel resins with excellent coating properties, mechanical properties and thermal stability, comprising use of a hydroxyl organic oligosiloxane resin which has a center of inorganic network structure with high condensation degree formed by complete hydrolysis-condensation, and at least one hydroxyl group and organic group or organic functional group around the center.

Abstract: A method of making a diluted organopolysiloxane polymer comprising the steps of:— (i) preparing an organopolysiloxane polymer by polymerising cyclic organopolysiloxane monomer(s) in the presence of an organic diluent material, a suitable catalyst and an end-blocking agent; and (ii) Where required quenching the polymerisation process; wherein the diluent material is substantially retained within the resulting diluted organopolysiloxane.

Abstract: In a one part organopolysiloxane gel composition comprising an alkenyl-containing branched organopolysiloxane, an SiH-termined organohydrogenpolysiloxane, and an addition reaction catalyst, the catalyst is obtained by heat aging a mixing of a platinum complex having an alkenyl-containing silane or organosiloxane as a ligand, a phosphite, and an organohydrogenpolysiloxane at 30-120° C. and an organic peroxide is concomitantly used. The composition inhibits addition reaction at room temperature, maintains storage stability over a long period, yet can cure rapidly at moderate temperature.

Abstract: Organopolysiloxanes having aminoalkyl groups are prepared by (i) reacting (A) linear, cyclic or branched organopolysiloxanes with (B) aminoalkylsilanes which have an SiC-bonded, basic nitrogen-containing hydrocarbon radical and 2 or 3 hydrolyzable groups, ?or the partial or complete hydrolysis products thereof, optionally in the presence of (C) basic catalysts and/or (D) chain-terminating reagents, and (ii) optionally, after the reaction (i) neutralizing the optionally used basic catalysts (c), with the proviso that compounds (A), (B) and, when used, (D) are reacted continuously in a reaction space whose ratio of length to diameter is equal to or greater than four.

Abstract: An improved process for preparing hydrolyzable polymers, the process includes, inter alia, reacting certain silylorganohalide compounds with a salt of a cyanate in the presence of active hydrogen containing polymers.

Abstract: The invention provides a method for preparing functionalized polyorganosiloxane resins (POS) comprising units M: (R3SiO1/2), Q: (SiO4/2) and M?: (YaR3-aSiO1/2) and optionally D: (R2SiO2/2) and/or D?: (RYSiO2/2) and T: (RSiO3/2) and/or T?: (YSiO3/2), wherein in said units R is C1-C10, alkyl or C8-C12, aryl and Y is a functional group (such as Si—H), by redistributing POS resins, using POSf bearing functional groups M? and/or D? and/or in the presence of an acid catalyst such as triflic acid or one of its derivatives and a non-basic inert filler: carbon black, diatomaceous earth, zeolite or acid or neutral oxide (Al2O3, Na2O, TiO2, MgO, silica). The invention also provides said catalyst system.

Abstract: The present invention relates to a process for preparing functionalized polyorganosiloxane (POS) resins comprising units M: (R3SiO1/2), Q: (SiO4/2) and M?: (YaR3-aSiO1/2) and optionally D: (R2SiO2/2) and/or D?: (RYSiO2/2) and T: (RSiO3/2) and/or T?: (YSiO3/2), with, in these units: R=C1-C10 alkyl or a C8-C12 aryl and Y a functional group (e.g.: Si—H), by redistribution of POS resins using POSf bearing functional units M? and/or D? and/or in the presence of an acid catalyst of the trifluoromethane-sulfonimide (TFSI) type. The present invention also relates to the aforementioned catalyst system.

Abstract: An epoxy resin composition can be used for forming a film having excellent water-repellency on a substrate surface. The epoxy resin composition contains (a) an epoxy resin having at least two alicyclic epoxy groups, at least one perfluoroalkyl group having 6 to 12 carbon atoms, and at least one alkylsiloxane group and (b) a cationic polymerization catalyst. The alicyclic epoxy groups and the perfluoroalkyl group are present in branched chains of the epoxy resin, and the alkylsiloxane group is present in the main chain of the epoxy resin.

Abstract: Coating compositions for producing sol-gel coatings that include: a) one or more alkoxysilyl-containing oxalamides of the general formula (II), where R? is hydrogen or an organic C1-C10 radical, R? radicals are organic, optionally oxygen-attached C1-C10 radicals, R is an oxygen-attached radical optionally containing one or more ether groups and having 1 to 30 carbon atoms and n is an integer between 0 and 2, b) optionally further crosslinkers, c) one or more catalysts and d) water. The sol-gel coatings are produced by a method that includes combining a silica sol and one or more alkoxysilyl-containing oxalamides. The sol-gel coatings obtained from the above-described coating compositions can be used to coat substrates.

Abstract: The invention is an adhesive composition comprising a) one or more silane functional prepolymers comprising a polyether or a polyolefin backbone and silane moieties capable of silanol condensation; b) one or more isocyanate functional prepolymers comprising a polyether backbone and isocyanate moieties; c) one or more organotin compounds or titanate or zirconate compounds having one or more ligands comprising a hydrocarbyl phosphate ester or a hydrocarbyl sulfonate ester, or a mixture thereof; d) a tertiary amine or an anhydrous strong organic acid which is miscible with the polymer and enhances the bonding of the adhesive to a coated unprimed substrate. In one embodiment, the invention is a method of bonding two or more substrates together using the adhesive compositions of this invention. The process comprises applying an adhesive as described herein to one or more of the substrates; contacting the one or more substrates with the adhesive disposed between the substrates; and allowing the adhesive to cure.

Abstract: The in vitro polymerization of silica, silicone, non-silicon metalloid-oxane and metallo-oxane polymer networks, by combining a catalyst and a substrate to polymerize the substrate to form silica, polysiloxanes, polymetalloid-oxanes polymetallo-oxanes (metal oxides), polyorganometalloid oxanes, polyorganometallo oxanes, and the polyhydrido derivatives thereof, at about neutral pH.

Abstract: A process for forming a siloxane oligomer from a mixture comprising at least one alkoxysilane, at least one phase transfer catalyst having a specified structure, and water is described.

Abstract: The invention relates to a process for the preparation of equilibration products of organosiloxanes by rearrangement of the siloxane bond to a cation exchange resin, the organopolysiloxanes thus obtainable and the use thereof.

Abstract: A curing composition comprising (A) a silane compound having formula: R12Si(OR2)2 wherein R1 is C1–C3 alkyl, C2–C3 alkenyl or phenyl, and R2 is C1–C3 alkyl, C2–C3 acyl or C3–C5 alkoxyalkyl and (B) phosphoric acid is added to an organosilicon compound to formulate a silicone-base coating composition which remains shelf stable and quickly cures at room temperature after being applied to a substrate, to form a cured coating having transparency, surface hardness, adhesion and the like. A silicone-base coating composition having the curing composition formulated therein is effective as a solventless, RTV silicone coating composition of one part type.

Abstract: This invention describes novel chemical compounds whose structures are hybrids between sulfur-containing and non-sulfur-containing silanes wherein the two types of silanes are linked by siloxane bonds. The invention includes methods of preparation for the hybrid silanes as well as their use in filled rubbers as coupling agents. The hybrid silanes described are unique in that a certain amount of water in their preparation leads to superior performance in their intended application, and that they can thus be produced more efficiently and safely than coupling agents currently used in the art, from readily available hydrated raw materials.

Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.

Abstract: The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.

Abstract: A molecular complex for application to fuser members in toner fusing systems. The complex is formed from molecules with complementary acid and base functional groups. These groups interact to provide a noncovalent bond having a bond energy of about 20 kJ/mol or more.

Abstract: Crosslinkable compositions employing organosilicon compounds having at least two hydrolyzable groups, optionally a crosslinker, and optionally a compound containing basic nitrogen, include a crosslinking catalyst which is a reaction product of a phosphorus compound, a sulfur compound, and a tin compound. The compositions exhibit improved shelf life.

Abstract: A process for the preparation of organopolysiloxane resins, wherein a silane R3SiOR1 ??(I) or a hydrolyzate thereof, and a silane Si(OR2)4 ??(II) or a partial hydrolyzate thereof, are reacted with acidified water and a portion of alcohol distilled off; the mixture is then reacted in the presence of base and a water-insoluble organic solvent and water, alcohol and optionally a portion of water-insoluble organic solvent are removed; the mixture is then neutralized with acid, and any water, alcohol, and a portion of organic solvent are distilled off; the mixture obtained is then treated with organopolysiloxanes and precipitated salts formed are then removed, and optionally, the mixture is separated from water-insoluble organic solvent.

Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]??, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ?=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.