Organic Si-free Reactant Is A Carboxylic Acid Or Derivative Patents (Class 528/26)
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Patent number: 8367791Abstract: A method and composition for corrosion protection of a structure is provided. In one disclosed embodiment, a polysiloxane ureide which inhibits corrosion formation on a surface of a physical object is provided. The polysiloxane ureide has a backbone including, (i) at least one diamine-terminated polysiloxane as disclosed; (ii) at least one aromatic diamine; and, (iii) at least one diisocyanate. In another disclosed embodiment, there is provided a polyureide which inhibits corrosion formation on a surface of a physical object. The polyureide comprises: (i) at least one aliphatic diamine; (ii) at least one aromatic diamine; and, (iii) at least one diisocyanate.Type: GrantFiled: February 6, 2011Date of Patent: February 5, 2013Assignee: The Boeing CompanyInventors: Norman R. Byrd, Douglas G. Soden
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Patent number: 8361626Abstract: Polydiorganosiloxane polyamide, block copolymers having organic soft segments and methods of making the copolymers are provided.Type: GrantFiled: October 5, 2011Date of Patent: January 29, 2013Assignee: 3M Innovative Properties CompanyInventors: Audrey A. Sherman, Stephen A. Johnson, Richard G. Hansen
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Publication number: 20130017161Abstract: A cosmetic composition containing a silicone resin polymer comprised of M units in combination with Q or T units or both, wherein the number of M units is greater than the number of Q units or T units or combination thereof, and a method for improving the finish of a cosmetic composition.Type: ApplicationFiled: January 10, 2012Publication date: January 17, 2013Applicant: RevlonInventors: Anjali Abhimanyu Patil, Joseph Frank Calello, Robert Walter Sandewicz
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Patent number: 8349537Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.Type: GrantFiled: January 14, 2011Date of Patent: January 8, 2013Assignee: PI R&D Co., Ltd.Inventors: Maw Soe Win, Toshiyuki Goshima, Sigemasa Segawa, Shintaro Nakajima, Eika Kyo, Yoshikazu Nishikawa, Shuzo Waki
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Patent number: 8343474Abstract: The invention relates to new compounds of Formula 1: [(O3/2)Si CH2CH2SX]a [Si(O4/2)]b[Si(O3/2V)]c. The compounds are useful as scavengers for the removal of unwanted organic and inorganic compounds, for solid phase extraction, for solid phase synthesis, for acid and metal mediated heterogeneous catalysis, for metal ion abstraction and for the immobilization of bio-molecules.Type: GrantFiled: February 9, 2007Date of Patent: January 1, 2013Assignee: Phosphonics Ltd.Inventors: John Robert Howe Wilson, Alice Caroline Sullivan, Siud Pui Man
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Patent number: 8334341Abstract: An object of the present invention is to provide a carbodiimide type compound having high dispersibility and dispersion stability of pigments, fine resin particles, and pigment-resin composite fine particles particularly in a silicone dispersion medium; a pigment dispersion composition and a pigment-resin composite fine particles-containing dispersion composition preferably usable in a wide range of fields such as inks for solvent ink jet, liquid developers, and the like by using the compound; and a liquid developer using such a pigment dispersion composition and/or pigment-resin composite fine particles-containing dispersion composition. The present invention provides a carbodiimide type compound obtained by introducing a polysiloxane chain by reaction of a functional group of a polysiloxane chain-containing compound having the functional group reactive with a carbodiimide group with a carbodiimide group of a carbodiimide compound having a carbodiimide equivalent weight of 100 to 50000.Type: GrantFiled: March 23, 2006Date of Patent: December 18, 2012Assignee: Sakata INX Corp.Inventors: Hideo Shibata, Koji Iwase, Hirohito Maeda, Takaaki Yodo
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Publication number: 20120314294Abstract: There is provided an optical member that can retain a high antireflection effect on a substrate for a long time. The optical member includes a laminated body that can reduce the reflection of light formed on a substrate surface, wherein at least one layer of the laminated body is a polyimide layer containing a polyimide film, and the polyimide contains a repeating unit represented by the following general formula (1), and a 1,4-cyclohexylene group in the main chain of R2 in the general formula (1) contains 90% by mole or more of a trans-1,4-cyclohexylene group: wherein R1 denotes a tetravalent organic group, and R2 denotes a divalent organic group having one or two or more 1,4-cyclohexylene groups in the main chain.Type: ApplicationFiled: February 23, 2011Publication date: December 13, 2012Applicant: CANON KABUSHIKI KAISHAInventor: Tomonari Nakayama
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Patent number: 8329376Abstract: A silicon-containing film is formed from a heat curable composition comprising (A) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, and substantially removing the acid catalyst from the reaction mixture, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively. The composition is effective in minimizing the occurrence of pattern defects after lithography and is shelf stable.Type: GrantFiled: April 10, 2007Date of Patent: December 11, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsutomu Ogihara, Takafumi Ueda, Motoaki Iwabuchi
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Patent number: 8329830Abstract: A surface treatment process comprises (a) providing at least one substrate having at least one major surface; (b) combining (1) at least one curable oligomeric or polymeric polysilazane comprising at least one chemically reactive site, and (2) at least one fluorochemical compound comprising (i) at least one organofluorine or heteroorganofluorine moiety that comprises at least about six perfluorinated carbon atoms, and (ii) at least one functional group that is capable of reacting with the polysilazane through at least one of the chemically reactive sites; (c) allowing or inducing the polysilazane and the fluorochemical compound to react to form at least one curable organofluorine-modified polysilazane; (d) applying the curable organofluorine-modified polysilazane or its precursors to at least a portion of at least one major surface of the substrate; and (e) curing the curable organofluorine-modified polysilazane to form a surface treatment.Type: GrantFiled: June 2, 2010Date of Patent: December 11, 2012Assignee: 3M Innovative Properties CompanyInventors: Yu Yang, George G. I. Moore, Thomas P. Klun
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Patent number: 8324324Abstract: A composition for preparing curable organofluorine-modified polysilazanes comprises (a) at least one curable oligomeric or polymeric polysilazane comprising at least one chemically reactive site; and (b) at least one fluorochemical compound comprising (1) at least one organofluorine or heteroorganofluorine moiety, and (2) at least one functional group that is capable of reacting with the curable oligomeric or polymeric polysilazane through at least one of the chemically reactive sites of the polysilazane. The curable organofluorine-modified polysilazanes can be prepared by combining the components of the composition and allowing or inducing the components to react.Type: GrantFiled: June 2, 2010Date of Patent: December 4, 2012Assignee: 3M Innovative Properties CompanyInventors: Yu Yang, George G. I. Moore, Thomas P. Klun
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Publication number: 20120301826Abstract: Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings.Type: ApplicationFiled: August 7, 2012Publication date: November 29, 2012Inventors: Chan Hyo Park, Sang Woo Kim, Kyung Jun Kim, Hye Ran Seong, Se Jin Shin, Dong Hyun Oh
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Publication number: 20120295085Abstract: Provided are a polyimide resin composition containing a polyimide obtained by the condensation of: a diamine component containing an aromatic diamine (A) represented by the general formula (1-1) or the like, a silicone diamine (B) represented by the general formula (2) and an aliphatic diamine (C) represented by the general formula (3); and an acid anhydride component containing a specific aromatic tetracarboxylic dianhydride (D); and a laminate and a device using the polyimide resin composition.Type: ApplicationFiled: January 24, 2011Publication date: November 22, 2012Applicant: Mitsui Chemicals, Inc.Inventors: Kenji Iida, Kiyomi Imagawa, Yusuke Tomita
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Publication number: 20120296051Abstract: Disclosed herein is a process for the production of a polysiloxane-polyorgano block copolymer. The process includes reacting a reaction mixture containing (a) an ester-functional polydiorganosiloxane and (b) a bisphenolic compound or a bisphenolic compound oligomer. This process has the advantage of yielding block copolymers with controlled block structures and avoiding the impurities that may be carried over from the conventional hydroxyaryloxy-terminated-polydiorganosiloxanes. Also disclosed are ester-functional polysiloxanes and polysiloxane-polyorgano block copolymers prepared by the process of the invention. These copolymers exhibit advantageous properties such as improved low temperature properties, improved rheological properties during molding, improved clarity, chemical, scratch resistance, and improved electrical insulation properties.Type: ApplicationFiled: May 16, 2012Publication date: November 22, 2012Applicant: Momentive Performance Materials GmbHInventors: John M. Huggins, Hubertus Eversheim
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Patent number: 8309673Abstract: Novel silicone polyethers by alkoxylating polymerization of epoxide monomers with (poly)organosiloxanes starting from an ?,?-dihydroxysiloxane as starter by means of DMC catalysis and process for preparing them.Type: GrantFiled: June 26, 2009Date of Patent: November 13, 2012Assignee: Evonik Goldschmidt GmbHInventors: Frank Schubert, Wilfried Knott
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Publication number: 20120283381Abstract: The present invention relates to macroinitiators comprising at least one hydrophobic segments in a molecule, wherein a molecular weight of the hydrophobic segment is 300 to 1800. The present invention further relates to block copolymers, wetting agent and polymeric materials having the block copolymers of the present invention associated with, which is suitable for medical devices, particularly for ophthalmic devices, including contact lenses, ophthalmic lenses, punctal plugs and artificial corneas.Type: ApplicationFiled: April 18, 2012Publication date: November 8, 2012Inventors: Ryuta Tamiya, Kazuhiko Fujisawa, Masataka Nakamura
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Patent number: 8299197Abstract: A polymer for gap-filling in a semiconductor device, the polymer being prepared by polycondensation of hydrolysates of the compound represented by Formula 1, the compound represented by Formula 2, and one or more compounds represented by Formulae 3 and 4: [RO]3Si—[CH2]n—Si[OR]3??(1) wherein n is from 0 to 2 and each R is independently a C1-C6 alkyl group; [RO]3Si—[CH2]nX??(2) wherein X is a C6-C12 aryl group, n is from 0 to 2, and R is a C1-C6 alkyl group; [RO]3Si—R???(3) wherein R and R? are independently a C1-C6 alkyl group; and [RO]3Si—H??(4) wherein R is a C1-C6 alkyl group.Type: GrantFiled: March 8, 2010Date of Patent: October 30, 2012Assignee: Cheil Industries, Inc.Inventors: Chang Soo Woo, Hyun Hoo Sung, Jin Hee Bae, Dong Seon Uh, Jong Seob Kim
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Publication number: 20120271025Abstract: A method of preparing polydiorganosiloxane polyoxamide copolymers is described. These copolymers have at least one polydiorganosiloxane segment and at least two aminooxalylamino groups. The method can be used in the presence or absence of a solvent. Intermediates involved in the preparation of the copolymers are also described.Type: ApplicationFiled: December 22, 2010Publication date: October 25, 2012Applicant: 3M Innovative Properties CompanyInventors: David S. Hays, Richard G. Hansen
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Patent number: 8293322Abstract: The invention relates to products and processes employing coupling activator compounds represented by the following formula I: S—X-A??(I) wherein S represents a silane coupling moiety capable of bonding with the surface of an inorganic substrate, A represents a ring-opening polymerization activator moiety, or blocked precursor thereof, and X represents a linking moiety. Substrates containing the coupling activator compounds are useful in preparing reinforced resins.Type: GrantFiled: April 8, 2011Date of Patent: October 23, 2012Assignee: Johns ManvilleInventors: Thomas Burghardt, Jawed Asrar, Klaus Friedrich Gleich
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Patent number: 8293368Abstract: The invention relates to moisture-curable compositions that air provided with increased elasticity while having good mechanical properties and adhesion. Said compositions contain at least on silane-functional polymer A, at least one aminosilane AS2, and at least one ?-functional organodialkoxysilane at an amount of 0.6 to 5.0 parts by weight relative to 100 parts by weight of polymer A. Also disclosed are the production and use of the inventive compositions, especially as a sealant and adhesive.Type: GrantFiled: April 28, 2006Date of Patent: October 23, 2012Assignee: Sika Technology AGInventors: Barbara Jucker, Pierre-Andre Butikofer, Urs Burckhardt, Ueli Pfenninger
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Patent number: 8293454Abstract: A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or 157 nm radiation. In combination, the organic antireflective material and the silicon antireflective material provide an antireflective material suitable for deep ultraviolet lithography. The invention is also directed to a process of making the lithographic structure.Type: GrantFiled: November 18, 2008Date of Patent: October 23, 2012Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Katherina E. Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle, Arpan P. Mahorowala, Dirk Pfeiffer
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Patent number: 8283432Abstract: A polymer that is a polysiloxane polymer has fluoroquinolone antibiotic groups, or pharmaceutically acceptable salts thereof, attached via linkers. The linkers may be hydrolytically labile thereby providing a manner of releasing the fluoroquinolone antibiotic from the polymer.Type: GrantFiled: October 28, 2011Date of Patent: October 9, 2012Assignee: NDSU Research FoundationInventors: Shane Jeremy Stafslien, Bret Ja Chisholm, Alex J. Kugel
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Patent number: 8273841Abstract: The present invention is directed to a series of polymeric citrate esters that have unique liquidity, and outstanding feel when applied to the skin. The polymers of the present invention are made by polymerizing citrate mono and di fatty esters with a hydroxypropyl functional silicone to provide a polymer with a very low surface tension and outstanding skin feel.Type: GrantFiled: August 30, 2010Date of Patent: September 25, 2012Assignee: Surfatech CorporationInventors: Kevin A. O'Lenick, Andrew J. O'Lenick, Anthony J. O'Lenick, Jr.
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Publication number: 20120229744Abstract: Disclosed is a liquid crystal display element which is composed of a pair of substrates (1) at least one of which is transparent. The liquid crystal display element comprises, between the pair of substrates, a transparent electrode (2), an aligning agent (3) that contains at least reactive monomers and/or oligomers (5), and a liquid crystal layer. The liquid crystal display element is characterized in that an alignment layer is obtained by polymerizing the reactive monomers or oligomers contained in the aligning agent, and the liquid crystal layer is composed of a liquid crystal composition that contains a compound (4) having at least one benzene ring in each molecule, said benzene ring containing at least one fluorine atom and being disubstituted by halogen atoms.Type: ApplicationFiled: October 18, 2010Publication date: September 13, 2012Applicants: JNC PETROCHEMICAL CORPORATION, JNC CORPORATIONInventors: Norikatsu Hattori, Atsuko Fujita
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Publication number: 20120225256Abstract: A process for producing a relief printing plate precursor for laser engraving is provided that comprises a layer forming step of forming a relief-forming layer formed from a resin composition for laser engraving containing (Component A) an isocyanate compound having an average number of isocyanato groups, fn, of greater than 2, and (Component B) a compound having a siloxane bond in the molecule and having two or more active hydrogen atoms; and a crosslinking step of thermally crosslinking the relief-forming layer, and thereby obtaining a relief printing plate precursor having a crosslinked relief-forming layer. Furthermore, there are also provided a relief printing plate obtained by the above process, a process for making a relief printing plate, and a relief printing plate.Type: ApplicationFiled: March 2, 2012Publication date: September 6, 2012Applicant: FUJIFILM CorporationInventor: Atsushi SUGASAKI
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Patent number: 8252882Abstract: The present invention relates to a polyimide resin produced by using silphenylene compound represented by the following formula (1) as a monomer: in which R1 to R4 each independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms, and R5 and R6 each independently represents a divalent hydrocarbon group having 2 to 8 carbon atoms. The silphenylene compound of the present invention is useful as a flexible printed wiring board material, a passivation film for IC chips, and a panel material for liquid crystals.Type: GrantFiled: June 24, 2011Date of Patent: August 28, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Michihiro Sugo, Takahiro Goi, Tomoyuki Goto, Shohei Tagami
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Publication number: 20120202953Abstract: A gas separation membrane is provided which has both excellent gas permeability and gas separation characteristics, particularly permeability of carbon dioxide (CO2) and separation characteristics of carbon dioxide and methane (CH4), at such a high level that has not hitherto been achieved. The gas separation membrane was obtained by heat treating a membrane composed of a hyperbranched polyimide-based material in a non-oxidizing atmosphere.Type: ApplicationFiled: February 17, 2012Publication date: August 9, 2012Applicants: NATIONAL UNIVERSITY CORP KYOTO INSTITUTE OF TECH, IBIDEN CO., LTD.Inventors: Tomoyuki Suzuki, Yasuharu Yamada
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Patent number: 8236429Abstract: Polydiorganosiloxane polyoxamide, linear, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting a diamine with a polydiorganosiloxane precursor having oxalylamino groups. The polydioroganosiloxane polyoxamide block copolymers are of the (AB)n type.Type: GrantFiled: April 14, 2011Date of Patent: August 7, 2012Assignee: 3M Innovative Properties CompanyInventors: Audrey A. Sherman, Richard G. Hansen, Wendi J. Winkler, Charles M. Leir, Mieczyslaw H. Mazurek, Karl E. Benson, Mark D. Purgett, Albert I. Everaerts
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Publication number: 20120192737Abstract: Disclosed are a resin composition for laser engraving including a resin having two groups having specific structures and having a number average molecular weight of 5,000 or more and 500,000 or less, a relief printing plate precursor for laser engraving comprising a relief-forming layer formed from the resin composition on a support, a process for making the relief printing plate precursor, a process of making a relief printing plate using the relief printing plate precursor, and a relief printing plate having a relief layer which is manufactured by the process.Type: ApplicationFiled: January 26, 2012Publication date: August 2, 2012Applicant: FUJIFILM CORPORATIONInventor: Shigefumi KANCHIKU
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Publication number: 20120184702Abstract: The present invention relates to a process for producing composite materials which consist essentially of a) at least one oxidic phase; and b) at least one organic polymer phase; by copolymerizing at least one compound A selected from aryloxy metalates, aryloxy semimetalates and aryloxy esters of nonmetals which form oxo acids and are different than carbon and nitrogen with at least one compound B selected from formaldehyde and formaldehyde equivalents, in a reaction medium which is essentially anhydrous, wherein the compound B is used in such an amount that the molar ratio of formaldehyde to the aryloxy groups in compound A is at least 0.9:1.Type: ApplicationFiled: January 19, 2012Publication date: July 19, 2012Applicant: BASF SEInventors: Arno Lange, Gerhard Cox, Rainer Dyllick-Brenzinger, Oliver Gronwald, Theo Smit
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Publication number: 20120184688Abstract: A polymer including a structural unit represented by the following Chemical Formula 1, and a composition and a film including the same are provided. In the above Chemical Formula 1, each substituent is defined as described in the specification.Type: ApplicationFiled: August 4, 2011Publication date: July 19, 2012Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Young Suk JUNG, Yoo Seong YANG, Tai Gyoo PARK, Sang Mo KIM, Eun Seog CHO
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Publication number: 20120153229Abstract: The present invention provides a fluorescent dye-silane hybrid resin manufactured by polycondensing an alkoxysilane bonded with a fluorescent dye with an organo-silane. More particularly, the present invention provides a fluorescent dye-siloxane hybrid resin that is manufactured by reacting a fluorescent dye having one or more functional groups with an alkoxysilane having an organic functional group to form an alkoxysilane bonded with the fluorescent dye and then polycondensing the alkoxysilane bonded with a fluorescent dye with an organo-silanediol and an organo-alkoxysilane having a thermocurable or ultraviolet-curable functional group without water. The fluorescent dye-silane hybrid resin has excellent thermostability, photostability, fluorescence characteristics, and processibility.Type: ApplicationFiled: December 20, 2011Publication date: June 21, 2012Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Byeong-Soo Bae, Seung-Yeon Kwak
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Patent number: 8193295Abstract: A novel amide group-containing siloxane amine compound, which is useful as a diamine component of a polybenzimidazole resin, a polybenzoxazole resin, and particularly a polyimide resin, which is derived from an amine monomer, has a chemical structure represented by the formula (1). In the formula (1), R1 and R2 each independently represent an optionally substituted alkylene group; p denotes an integer of 0 to 3; q denotes an integer of 0 to 3; m denotes an integer of 1 to 30; and n denotes an integer of 0 to 20; provided that p and q are not 0 at the same time.Type: GrantFiled: July 28, 2008Date of Patent: June 5, 2012Assignees: Sony Chemical & Information Device Corporation, Ihara Chemical Industry Co., Ltd.Inventors: Tomoyasu Sunaga, Junichi Ishii, Etsuchi Nishikawa
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Publication number: 20120133078Abstract: A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such that the polymerizable fluid composition fills the relief structure in the mold. The polymerizable fluid composition is subjected to conditions to polymerize polymerizable fluid composition and form a solidified polymeric material therefrom on the transfer layer. The mold is then separated from the solid polymeric material such that a replica of the relief structure in the mold is formed in the solidified polymeric material; and the transfer layer and the solidified polymeric material are subjected to an environment to selectively etch the transfer layer relative to the solidified polymeric material such that a relief image is formed in the transfer layer.Type: ApplicationFiled: February 1, 2012Publication date: May 31, 2012Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEMInventors: Carlton Grant Willson, Matthew E. Colburn
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Publication number: 20120128916Abstract: There are provided a molded object, a method of producing the same, a sealed molded object, a polymer, and an optical information recording medium, in each of which curing may be achieved at around room temperature in a short time without addition of an accelerator, and volumetric shrinkage accompanying the curing may be suppressed. The molded object is obtained by curing a curable composition containing a silicon analogue having one or more epoxy groups and an ?-hydroxy acid.Type: ApplicationFiled: November 3, 2011Publication date: May 24, 2012Applicant: Sony CorporationInventor: Noriyuki Saito
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Publication number: 20120129048Abstract: Provided is a binder capable of realizing a lithium secondary battery that includes a negative electrode including a negative-electrode active material layer containing at least one of silicon and a silicon alloy as a negative-electrode active material and also containing a binder and has an excellent charge-discharge cycle characteristic. The binder for the lithium secondary battery contains a polyimide resin that is formed by imidizing either a tetracarboxylic acid or a tetracarboxylic anhydride and a diamine, the polyimide resin having a hydrolyzable silyl group.Type: ApplicationFiled: November 18, 2011Publication date: May 24, 2012Applicants: SHIN-ETSU CHEMICAL CO., LTD., SANYO ELECTRIC CO., LTD.Inventors: Atsushi Fukui, Taizo Sunano, Maruo Kamino, Yoshinori Yoneda
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Patent number: 8178613Abstract: An acryloxy-functional silicone composition curable by high-energy radiation, which is characterized by excellent storage stability of the composition and by improved resistance to scratching, transparency, water repellency, and adhesiveness in a hard cured coating film produced from the aforementioned composition. This composition comprises (A) a polyfunctional acrylate of at least one type; an amino-modified organopolysiloxane (B) or a product (F) of a Michael addition reaction between at least one type of a polyfunctional acrylate and amino-modified organopolysiloxane; (C) an organoalkoxysilane having an aliphatic unsaturated bond, (D) a colloidal silica; and (E) an alcohol-containing organic solvent.Type: GrantFiled: March 5, 2004Date of Patent: May 15, 2012Assignee: Dow Corning Toray Company, Ltd.Inventors: Hisataka Nakashima, Mari Wakita, Hideki Kobayashi
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Patent number: 8178645Abstract: A polyester polyol, referred to hereinafter as a MHMS polyol comprises fatty acid based mer units wherein at least about 80 weight percent of the fatty acid based mer units are from methyl 9 (10) hydroxymethylstearate, or is prepared from an oil having fatty acids or fatty acid esters which are at least about 80 weight percent oleic acid or esters thereof and which has an average hydroxyl functionality of from 1.5 to 4. A reaction product, referred to herein after as MHMS alkoxysilane prepolymer, is produced from at least one such MHMS polyol and at least one isocyanate functional silane. This prepolymer is moisture cured to form a silylated MHMS polymer.Type: GrantFiled: July 10, 2008Date of Patent: May 15, 2012Assignee: Dow Global Technologies LLCInventors: Paul J. Popa, Zenon Lysenko, David A. Babb, William A. Koonce, Gary E. Spilman
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Publication number: 20120116028Abstract: According to the present invention, a contact lens material being excellent in oxygen permeability and transparency, being capable of undergoing injection molding, having no water content and having flexibility, as well as a contact lens gel material having excellent oxygen permeability and transparency can be provided. The present invention relates to a contact lens material comprising a polycarbonate resin derived from at least two compounds among compounds represented by a general formula (A), a general formula (B) and a general formula (C), a highly polar molecular weight control modifier (chain terminator) and a compound forming a carbonic acid ester, wherein the compound of the general formula (A) is essentially comprised, and to a production method thereof.Type: ApplicationFiled: July 15, 2009Publication date: May 10, 2012Inventors: Yasuhiko Suzuki, Kazuhiko Nakada, Tsuyoshi Watanabe, Takahiro Adachi, Mamoru Hagiwara, Masahiko Minemura
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Publication number: 20120108749Abstract: Silicone pressure sensitive adhesive compositions including amphiphilic copolymers. The amphiphilic copolymers are based on a polydimethylhydrogensiloxane or polydimethylsiloxane based macroinitiator. A medical device including said pressure sensitive adhesive compositions for securing the device to human skin or tissue.Type: ApplicationFiled: July 7, 2010Publication date: May 3, 2012Applicant: ConvaTec Technologies Inc.Inventors: Mahesh Sambasivam, James Crivello
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Patent number: 8168735Abstract: The present invention provides a hydrophilic silicone which has a predetermined number of silicon atoms and a high purity and is suitable for producing an ophthalmic device and a process for preparing the same. The silicone compound is represented by formula (1) with a purity of 95% by weight or higher, wherein m is one value out of the integers of from 3 to 10, n is one value out of the integers of from 1 to 10, R1 is one out of alkyl groups having 1 to 4 carbon atoms, and R2 is one out of a hydrogen atom and a methyl group.Type: GrantFiled: May 26, 2009Date of Patent: May 1, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Shoji Ichinohe
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Patent number: 8168738Abstract: Disclosed are low temperature, moisture curable coating compositions, related coated substrates, and methods for coating a substrate. The coating compositions include an ungelled, secondary amine-containing Michael addition reaction product of reactants including a compound comprising more than one site of ethylenic unsaturation, and an aminofunctional silane.Type: GrantFiled: May 28, 2009Date of Patent: May 1, 2012Assignee: PPG Industries Ohio, Inc.Inventors: Ronald R. Ambrose, Anthony M. Chasser, Susan F. Donaldson, Ellen C. LaLumere, Kaliappa G. Ragunathan
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Publication number: 20120093746Abstract: An amino acid-modified organopolysiloxane can be prepared under mild reaction conditions by reacting an amino-modified organopolysiloxane with an amino acid or amino acid derivative ester in the presence of an organometallic catalyst. The amino acid-modified organopolysiloxane having a hydrophilic group is useful in cosmetics, powder surface treatment, fiber or fabric treatment, coating, and resin modification.Type: ApplicationFiled: October 6, 2011Publication date: April 19, 2012Applicant: Shin-Etsu Chemical Co., Ltd.Inventor: Hiroyuki MORIYA
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Patent number: 8158739Abstract: Branched polydiorganosiloxane polyamide, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting one or more amine compounds including at least one polyamine with a precursor having at least one polydiorganosiloxane segment and at least two ester groups.Type: GrantFiled: June 29, 2011Date of Patent: April 17, 2012Assignee: 3M Innovative Properties CompanyInventors: Audrey A. Sherman, David B. Olson, Stephen A. Johnson, Craig E. Hamer, David S. Hays, Richard G. Hansen
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Patent number: 8147854Abstract: This invention relates to a cosmetics characterized in that it contains a gelling agent comprising an organopolysiloxane having a silicon-bonded organic group represented by general formula: R1—X—CO—NH—[X—N(—CO—X—R1)]p—X— (1) (wherein R1 designates a group containing metal salt of a carboxylic acid represented by formula —COO? (Mn+)1/n (where M is a metal that has a valence of 1 or higher); X's designate the same or different C2 to C14 bivalent hydrocarbon groups; and p designates an integer from 0 to 10.). Preferably, the organosiloxane has an optionally substituted C9 or more univalent hydrocarbon group. Adding the gelling agent makes it possible to provide a cosmetic possessing superior temporal stability, water retention properties, sensory feel, gloss, curl retention, and cleansing power.Type: GrantFiled: June 21, 2006Date of Patent: April 3, 2012Assignee: Dow Corning Toray Company, Ltd.Inventors: Tadashi Okawa, Tomohiro Iimura
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Publication number: 20120077912Abstract: The present disclosure is directed to a polyester having renewable 1,3-propanediol. This invention is further directed to a coating composition comprising the polyester having components derived from renewable resources.Type: ApplicationFiled: September 28, 2010Publication date: March 29, 2012Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: Hari Babu Sunkara, Rajesh Gopalan Saliya, Ayumu Yokoyama
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Patent number: 8138297Abstract: A moisture-curable silylated resin possessing improved storage stability and short cure time is obtained by reacting a prepolymer with a silylating reactant comprising silane (i) possessing three methoxy groups, silane (ii) possessing three alkoxy groups independently containing from 2 to 4 carbon atoms, and, optionally, silane (iii) possessing two methoxy groups and one alkoxy group of from 2 to 4 carbon atoms and/or silane (iv) possessing one methoxy group and two alkoxy groups independently containing from 2 to 4 carbon atoms.Type: GrantFiled: February 9, 2009Date of Patent: March 20, 2012Assignee: Momentive Performance Materials Inc.Inventors: Misty Weiyu Huang, Christine Lacroix
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Patent number: 8138274Abstract: Fluorosilicon polymers are disclosed that are prepared by a process comprising reacting a) iodinated oligomers having copolymerized units of perfluoro(methyl vinyl ether) and vinylidene fluoride or tetrafluoroethylene that contain 40-90 mole percent copolymerized units of vinylidene fluoride or tetrafluoroethylene and 10-60 mole percent copolymerized units of perfluoro(methyl vinyl ether), said oligomers having two functional endgroups and having a number average molecular weight between 1000 and 25,000 with b) a methoxyvinyl silane or an ethoxyvinyl silane to form a silicon-containing polymeric adduct that is further reacted with an acid to form a crosslinked fluorinated polymer.Type: GrantFiled: December 8, 2009Date of Patent: March 20, 2012Assignees: Dupont Performance Elastomers LLCInventors: Ming-Hong Hung, Bruno Ameduri
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Publication number: 20120065341Abstract: The invention relates to stable silicon dioxide dispersions and also their use for producing polyurethanes. The silicon dioxide dispersions are largely or preferably completely free of water and comprise silicon dioxide particles having an average diameter of 1-150 nm and at least one chain extender. The silicon dioxide particles can be modified by means of a silane (S) which comprises groups which are reactive toward isocyanates. Furthermore, a polyol, in particular a polyesterol and/or an isocyanate-comprising compound can be comprised in the silicon dioxide dispersions.Type: ApplicationFiled: September 9, 2011Publication date: March 15, 2012Applicant: BASF SEInventors: Berend Eling, Marine Boudou, Stefan Auffarth, Oliver Reese
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Patent number: 8133957Abstract: A resin composition for encapsulating an optical semiconductor element that comprises components (A), (B) and (C) described below: (A) a branched silicone resin containing 2 to 6 epoxy groups, one or more (R1SiO3/2) units, two or more (R2R3SiO)n structures and 3 or more (R43-xR5xSiO1/2) units per molecule, in an amount of 100 parts by weight, wherein R1, R2, R3, R4 and R5 each represents a hydrogen atom, a hydroxyl group or a monovalent organic group of 1 to 20 carbon atoms which monovalent organic group may or may not contain an oxygen atom, provided that at least two of the R5 groups within each molecule represent an epoxy group and/or an epoxy group-containing non-aromatic group, n represents an integer of 3 to 20, and x represents an integer of 1 to 3, (B) a curing agent, in such an amount that a content of epoxy reactive groups in the component (B) ranges from 0.4 to 1.5 moles per 1 mol of epoxy groups within component (A), and (C) a curing catalyst, in an amount within a range from 0.Type: GrantFiled: July 28, 2009Date of Patent: March 13, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoshihira Hamamoto, Toshio Shiobara, Miyuki Wakao, Tsutomu Kashiwagi
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Patent number: RE43604Abstract: Provided are a polycarbonate resin which can solve problems present in an electrophotographic photoreceptor and an electrophotographic photoreceptor in which the above polycarbonate resin is used and which is improved in a cleaning property, a lubricity and an abrasion resistance. The polycarbonate resin comprises a repetitive unit represented by the following Formula (1), and the electrophotographic photoreceptor in which a photosensitive layer is provided on a conductive substrate contains the above polycarbonate resin in the above photosensitive layer. In the following Formula (1), R represents an alkyl group having 1 to 3 carbon atoms; n1 is an integer of 2 to 4; and n2 is an integer of 1 to 200.Type: GrantFiled: May 19, 2005Date of Patent: August 28, 2012Assignee: Idemitsu Kosan Co. Ltd.Inventor: Takaaki Hikosaka