Reactant Contains A Silicon Atom As A Ring Member Of A Cyclic Compound Patents (Class 528/37)
  • Patent number: 11834555
    Abstract: A cured product of a silanol composition comprising a cyclic silanol containing a silanol group and having a cyclic structure formed by a siloxane bond, and a dehydration condensation product thereof, wherein an area ratio of a peak derived from SiO—H stretching observed at 2600 to 3800 cm?1 to an area of a peak derived from Si—O—Si stretching observed at 960 to 1220 cm?1 (SiO—H stretching/Si—O—Si stretching area ratio) is 0.01 or more in an IR spectrum.
    Type: Grant
    Filed: February 19, 2020
    Date of Patent: December 5, 2023
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Kazuhiro Yamauchi, Tomohiro Sugahara, Tatsuro Toda
  • Patent number: 11820666
    Abstract: Organosilicon chemistry, polymer derived ceramic materials, and methods. Such materials and methods for making polysilocarb (SiOC) and Silicon Carbide (SiC) materials having 3-nines, 4-nines, 6-nines and greater purity. Processes and articles utilizing such high purity SiOC and SiC.
    Type: Grant
    Filed: August 7, 2021
    Date of Patent: November 21, 2023
    Assignee: Pallidus, Inc.
    Inventors: Douglas M. Dukes, Andrew R. Hopkins, Walter J. Sherwood, Ashish P. Diwanji, Glenn Sandgren, Mark S. Land, Brian L. Benac
  • Patent number: 11746194
    Abstract: A fabrication method and application of topological elastomers with highly branched structures, low modulus and high elasticity. The topological elastomers comprise dendritic macromolecules. The fabrication method includes direct crosslinking, post-crosslinking, grafting, and copolymerization. The performance of the elastomer can be easily tuned via changing the topology of the polymer network. The breakthrough of this invention lies in that these topological elastomers with highly branched structures are having low modulus and high elasticity, which would expand its application in the field of elastomer. Notably, the variety of topological elastomers, the versatility of curing chemistries, the availability of a wide variety of monomers, and the various polymerization methods are enabling the fabrication of topological elastomers with feasibility and efficiency.
    Type: Grant
    Filed: June 1, 2020
    Date of Patent: September 5, 2023
    Assignee: ZHEJIANG UNIVERSITY
    Inventors: Tao Xie, Ning Zheng, Xiaona Xu
  • Patent number: 11464083
    Abstract: A heating element is used, a periphery of the heating element is covered with a net-shaped conductor, the conductor and a carbon fiber bundle are electrically connected with a connecting tool at one end of the heating element, a periphery of the conductor is covered with an outer skin having flexibility, thermal conductivity and an insulating property, and the other end of the heating element is provided with a power supply terminal configured to supply power.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: October 4, 2022
    Assignees: JIKAN TECHNO, INC., S.K.G. CO., LTD.
    Inventors: Kazuya Okamoto, Takahiro Kinoshita
  • Patent number: 11299638
    Abstract: A method of forming a hydrophobic and oleophobic surface. The method including spin coating an F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface. The F-POSS has a structure: Each Rf represents a nonreactive, fluorinated organic group, R1 represents a first monovalent organic group comprising at least two carbon atoms, and R2 represents hydrogen or a second monovalent organic group comprising at least two carbon atoms. The F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane are then dried on the inert surface.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: April 12, 2022
    Assignee: United States of America as represented by the Secretary of the Air Force
    Inventors: Timothy S. Haddad, Joseph M. Mabry, Sean Ramirez
  • Patent number: 10550271
    Abstract: A method of forming a hydrophobic and oleophobic surface. The method including spin coating an F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface. The F-POSS has a structure: Each Rf represents a nonreactive, fluorinated organic group, R1 represents a first monovalent organic group comprising at least two carbon atoms, and R2 represents hydrogen or a second monovalent organic group comprising at least two carbon atoms. The F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane are then dried on the inert surface.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: February 4, 2020
    Assignee: United States of America as represented by the Secretary of the Air Force
    Inventors: Timothy S. Haddad, Joseph M. Mabry, Sean Ramirez
  • Patent number: 9178166
    Abstract: The invention relates to novel conjugated polymers containing repeating units comprising a halogenated benzene ring, a silolobithiophene moiety, and a benzofused heteroaromatic moiety, to methods for their preparation and educts or intermediates used therein, to polymer blends, mixtures and formulations containing them, to the use of the polymers, polymer blends, mixtures and formulations as organic semiconductors in organic electronic (OE) devices, especially in organic photovoltaic (OPV) devices and organic photodetectors (OPD), and to OE, OPV and OPD devices comprising these polymers, polymer blends, mixtures or formulations.
    Type: Grant
    Filed: August 6, 2014
    Date of Patent: November 3, 2015
    Assignee: MERCK PATENT GMBH
    Inventors: David P. Waller, Kap-Soo Cheon
  • Patent number: 9035015
    Abstract: Novel photoactive polymers, as well as related photovoltaic cells, articles, systems, and methods, are disclosed.
    Type: Grant
    Filed: January 21, 2015
    Date of Patent: May 19, 2015
    Assignee: MERCK PATENT GmbH
    Inventors: Li Wen, David P. Waller, Paul Byrne, Nicolas Drolet, Gilles Herve Regis Dennler, Kap-Soo Cheon
  • Patent number: 9024037
    Abstract: Diphenylamine-benzobisthiazole-diphenylamine monomers having two-photon absorption cross-sections and high solubility in organic solvents are provided. Also provided are the corresponding organo-soluble, wholly conjugated and two-photon absorbing benzobisthiazole-triarylamine polymers.
    Type: Grant
    Filed: May 18, 2012
    Date of Patent: May 5, 2015
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Loon-Seng Tan, Ramamurthi Kannan, Matthew Dalton
  • Publication number: 20150099848
    Abstract: Provided herein are silicon-based compositions, which after curing is a coating composition having strong substrate adhesion and scratch resistance. The compositions are formed from a mixture of constituents comprising: from about 20% to about 90% (w/w) of a first siloxane selected from the group consisting of silsesquioxane, methylmethoxysiloxane, and combinations thereof; and from about 10% to about 80% (w/w) of one or more silicon compounds selected from the group consisting of a second siloxane, silane, and silazane. Optionally, the compositions may comprise from about 0.1% to about 5% (w/w) alkyltitanate.
    Type: Application
    Filed: May 12, 2014
    Publication date: April 9, 2015
    Applicant: BURNING BUSH TECHNOLOGIES, LLC
    Inventor: Chris Fish
  • Patent number: 8974775
    Abstract: There is provided herein a functionalized ionic silicone composition comprising a silicone of the formula (I): M1aM2bM3cD1dD2eD3fT1gT2hT3iQj??(I) which contains a monovalent radical bearing ion-pairs and having the formula (II): -A-Ix?Mny+; where A is a spacing group having at least 2 spacing atoms selected from a divalent hydrocarbon or hydrocarbonoxy group, where I is an ionic group such as sulfonate —SO3?, carboxylate —COO?, phosphonate —PO32? group and phosphate —OPO32?, where M is hydrogen or a cation independently selected from alkali metals, alkali earth metals, transition metals, metals, quaternary ammonium and phosphonium groups; or, zwitterions having the formula (III): —R?—NR?2+—R??—I??(III) where I is defined as above, and where the subscript a, b, c, d, e, f, g, h, i, j are zero or positive subject to the following limitations: 2?a+b+c+d+e+f+g+h+i+j?6000, b+e+h>0 and c+f+i>0.
    Type: Grant
    Filed: January 4, 2012
    Date of Patent: March 10, 2015
    Assignee: Momentive Performance Materials Inc.
    Inventors: Anubhav Saxena, Alok Sarkar, Sandip Tiwari
  • Patent number: 8969508
    Abstract: Photoactive polymers are provided, as well as related photovoltaic cells, articles, systems, and methods comprising these photoactive polymers.
    Type: Grant
    Filed: February 26, 2013
    Date of Patent: March 3, 2015
    Assignee: Merck Patent GmbH
    Inventors: Li Wen, David P. Waller, Paul Byrne, Nicolas Drolet, Gilles Herve Regis Dennler, Kap-Soo Cheon
  • Patent number: 8962783
    Abstract: Photovoltaic cells with silole-containing polymers, as well as related systems, methods and components are disclosed.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: February 24, 2015
    Assignee: Merck Patent GmbH
    Inventors: Russell Gaudiana, Richard Kingsborough, Xiaobo Shi, David Waller, Zhengguo Zhu
  • Patent number: 8933186
    Abstract: Disclosed are novel polyorganosiloxane, a polycarbonate resin composition comprising the same and a modified polycarbonate resin. Disclosed is also a novel polyorganosiloxane derivative which may be utilized in various applications and is used in particular as an impact modifier, a modifier or a comonomer of polycarbonate resin.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: January 13, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Hyong Min Bahn, Moo Ho Hong, Young Young Hwang, Min Jeong Kim, Jung Jun Park
  • Patent number: 8916645
    Abstract: The HBP Free-POSS compounds of Formula I are superior to prior HB polymers and linear polymers in space and electronic applications because they have better resistance to electrons, protons and atomic oxygen, have superior out-gassing performance, and are transparent. They are used as coatings, films, adhesives, sealants and elastomers.
    Type: Grant
    Filed: January 19, 2011
    Date of Patent: December 23, 2014
    Assignee: Michigan Molecular Institute
    Inventors: Jin Hu, Claire Hartmann-Thompson, Dale J. Meier, Petar R. Dvornic
  • Patent number: 8907039
    Abstract: Lateral hydroxymethyl-substituted organopolysiloxanol are prepared by reacting a silanol-stopped organosiloxane with a hydrolyzable methyleneoxy-group-containing organosilicon compound.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: December 9, 2014
    Assignee: Wacker Chemie AG
    Inventors: Florian Hoffmann, Juergen Stohrer
  • Patent number: 8883951
    Abstract: A monomer composition for polymerizing a branch-type silsesquioxane polymer is disclosed. The monomer composition includes hydroxy-substituted cyclic siloxane in a solvent, and the hydroxy-substituted cyclic siloxane includes stereoisomers of cyclic siloxane of cis, trans, random and twist structures at controlled ratios. Also disclosed are a branch-type silsesquioxane polymer synthesized by polymerizing the monomer composition for polymerizing a branch-type silsesquioxane polymer, and a method for synthesizing the same. In accordance with the disclosure, the isomers can be isolated stably at desired ratios. The isolated isomers may be polymerized into polymers of various types. Since the polymers exhibit low dielectric property, they may be utilized as low dielectric materials.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: November 11, 2014
    Assignee: Korea Institute of Science and Technology
    Inventors: Seung Sang Hwang, Kyung Youl Baek, He Seung Lee, Soon Man Hong, Soon Jong Kwak, Chong Min Koo
  • Patent number: 8865852
    Abstract: A low-dielectric constant thin film prepared from a silsesquioxane polymer matrix as a precursor and a method for preparing the same which comprises preparing silsesquioxane sol by adding a stereoisomer of a multi reactive cyclosiloxane to an alkoxysilane are provided. The low-dielectric-constant thin film retains a stable film state even at a curing temperature of ?500° C. without being decomposed, a very uniform surface property with a low surface modulus, and a superior coatability as to be coatable smoothly with no crack even with a thickness of 500 nm or larger.
    Type: Grant
    Filed: October 21, 2010
    Date of Patent: October 21, 2014
    Assignee: Korea Institute of Science and Technology
    Inventors: Kyung Youl Baek, Seung Sang Hwang, Seung-Sock Choi, Sungyoun Oh, He Seung Lee, Eun Kyeong Kim
  • Publication number: 20140275463
    Abstract: The present invention provides a novel organosilicon compound and polysiloxane which are useful as electronic materials, optical materials, coating materials, sealing materials and catalyst carriers and which can be used as additives for improving various physical properties such as flame retardancy, heat resistance, weatherability, light resistance, electric insulating property, a surface characteristic, hardness, a mechanical strength and a chemical resistance of a polymer material.
    Type: Application
    Filed: May 30, 2014
    Publication date: September 18, 2014
    Applicants: Chisso Petrochemical Corporation, JNC CORPORATION
    Inventors: Nobumasa OOTAKE, Kazuhiro YOSHIDA
  • Patent number: 8822808
    Abstract: Provided are a photoelectric conversion device capable of controlling an absorbance of the red region at a wavelength of 600 nm or more, and an imaging device having an improved color reproduction by using the photoelectric device. Provided are a photoelectric conversion device that includes a pair of electrodes, and a photoelectric conversion layer disposed between the pair of electrodes, in which the photoelectric conversion layer contains a p-type semiconductor compound and two or more different kinds of unsubstituted fullerenes, and an imaging device that includes the photoelectric conversion device.
    Type: Grant
    Filed: March 24, 2011
    Date of Patent: September 2, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Mitsumasa Hamano
  • Publication number: 20140120243
    Abstract: A method of forming a silsesquioxane/Q/siloxane polymer or oligomer system used to form coatings or monoliths, includes the step of mixing silsesquioxane, siloxane and alkoxysilane components having structures as presented below in ratios as presented below with a soluble F? catalyst and water in a suitable solvent so that on stirring at temperatures of ?20° to approximately 100° C. all of the components dissolve producing a solution. A soluble oligomer is formed in equilibribum with single molecules with specific structures including [RSiO1.5]x[R?MeSiO]y[R?Me2SiOSiO1.5]z (where R?R? or R? or R1 or R2 as denoted below) and where x, y and z are mole fractions whose sum is equal to one.
    Type: Application
    Filed: October 31, 2012
    Publication date: May 1, 2014
    Applicant: MAYATERIALS, INC.
    Inventors: Richard M. LAINE, Michael Z. ASUNCION, David J. KRUG
  • Patent number: 8668991
    Abstract: The present invention relates to a curable organopolysiloxane composition, which comprises: (A) an organocyclosiloxane having alkenyl groups, represented by the following formula (I) wherein n=3 or 4; (B) a hydrosilicone resin of formula (II) (R1R2R3SiO1/2)M.(R4R5SiO2/2)D.(R6SiO3/2)T.
    Type: Grant
    Filed: March 12, 2013
    Date of Patent: March 11, 2014
    Assignee: Henkel (China) Company Limited
    Inventors: Wenjuan Tan, Zhiming Pasing Li, Wentao Thomas Xing, Liwei Zhang, Yong Zhang
  • Patent number: 8658755
    Abstract: Provided is a silicon-containing curable composition which includes a prepolymer (A) containing two or more Si—H groups in one molecule, which is obtained by subjecting one or more kinds of a cyclic siloxane compound (?) represented the following formula (1) and one or more kinds of a compound (?) represented by the following formula (2), to a hydrosilylation reaction; a cyclic siloxane compound (B) containing, in one molecule, two or more carbon-carbon double bonds that are reactive with Si—H groups; a polysiloxane compound (C) which is different from the prepolymer (A) and the cyclic siloxane compound (B); and a hydrosilylation catalyst (D). In formula (1), R1 to R3 each represent an alkyl group having 1 to 6 carbon atoms, or a phenyl group; a represents a number from 2 to 10; and b represents a number from 0 to 8. In formula (2), n represents the number 1 or 2.
    Type: Grant
    Filed: September 15, 2010
    Date of Patent: February 25, 2014
    Assignee: Adeka Corporation
    Inventor: Masako Saito
  • Publication number: 20140023970
    Abstract: A coatable resin solution capable of forming a coating when applied to the surface of a substrate that is photo-patternable and developable as a dielectric material upon exposure to ultraviolet radiation is provided. The resin solution comprises a silsequioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ-based resin includes both a hydride component and at least one photo-curable component. The resulting coating exhibits a dielectric constant that is less than or equal to about 3.5.
    Type: Application
    Filed: March 28, 2012
    Publication date: January 23, 2014
    Applicant: DOW CORNING CORPORATION
    Inventors: Peng-Fei Fu, Eric S. Moyer, Jason Suhr
  • Publication number: 20140011009
    Abstract: A silicon-based coating composition for a wide range of mold surfaces, which composition is formed from a mixture of constituents comprising appropriate portions of silazane, siloxane, and silane, and optionally organic solvent. The composition, after curing, results in an extreme release product that is non-transferable to the finished part, allowing for proper adhesion of coatings or adhesives to the finished surface without additional surface preparation. The cured coatings are ultrathin, having a thickness between 0.1 ?m and 3 ?m, and having a hardness between about 4H and about 9H.
    Type: Application
    Filed: July 3, 2013
    Publication date: January 9, 2014
    Applicant: BURNING BUSH GROUP, LLC
    Inventor: Chris Fish
  • Patent number: 8609799
    Abstract: Heteroatom doped silane compounds, e.g., phosphorus-containing silane compounds, are provided. The application also provides methods of producing the heteroatom doped silane compounds from halogen substituted silanes via reaction with a heteroatom-containing nucleophile.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: December 17, 2013
    Assignee: NDSU Research Foundation
    Inventors: Douglas L. Schulz, Xuliang Dai, Kendric J. Nelson, Philip Boudjouk
  • Patent number: 8586689
    Abstract: A polymer including a structural unit represented by the following Chemical Formula 1, and a composition and a film including the same are provided. In the above formula at least one of Ra and Rb is either Chemical Formula 3 or Chemical Formula 4, as shown below. The polymer also includes units selected from polyamic acid, polyimide, polyaramid, polyamide, polyurethane, polycarbonate and polyacetal units and mixtures of such units.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: November 19, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young Suk Jung, Yoo Seong Yang, Tai Gyoo Park, Sang Mo Kim, Eun Seog Cho
  • Patent number: 8586691
    Abstract: Carbanionic polymer chains that contain polyene mer can be provided with a block derived from one or more ethylenically unsaturated functional monomers after being reacted to include, at their respective termini, one or more, although preferably one, unit that is the radical of a cyclic compound, the ring structure of the cyclic compound comprising silicon atoms alternating with O, S or N atoms.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: November 19, 2013
    Assignee: Bridgestone Corporation
    Inventor: Yuan-Yong Yan
  • Patent number: 8586690
    Abstract: The present invention relates to a process for the production of an intermediate siloxane monomer and use of said monomer to produce high molecular weight linear polysilalkylenesiloxanes. The siloxane monomer is prepared by ring opening polymerization of a cyclic monomer of the structure in the presence of an acidic or basic ring opening polymerization catalyst; to form a mixture of siloxane monomers and linear oligomers. The linear oligomers are then extracted and discarded before a further step of ring opening polymerization using the aforementioned intermediate siloxane monomer mixture as the starting material. The second polymerization step is undertaken at a temperature within the melting point range of said siloxane monomer mixture. The intermediate, final product and methods of their manufacture are described.
    Type: Grant
    Filed: November 2, 2010
    Date of Patent: November 19, 2013
    Assignee: Dow Corning Corporation
    Inventors: Frederic Gubbels, Stephanie Lobry, Francois Ganachaud, Amedee Ratsimihety
  • Patent number: 8524850
    Abstract: PROBLEM TO BE SOLVED To provide an ophthalmic lens, which can be more safely worn, that is, to provide a material, which is transparent and has high oxygen permeability and a high hydrophilic property, and to provide a novel monomer to be a raw material thereof. SOLUTION A hydrophilic polysiloxane macromonomer contains polyoxyethylene as a hydrophilic side chains in a polysiloxane main chain, wherein transparency, oxygen permeability, and hydrophilic properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.
    Type: Grant
    Filed: March 5, 2012
    Date of Patent: September 3, 2013
    Assignee: CooperVision International Holding Company, LP
    Inventors: Hiroyuki Ueyama, Seiichiro Ikawa, Junichi Iwata
  • Patent number: 8501893
    Abstract: A synthetic method for preparing dual curable (e.g., thermal and light curable) silicone compositions is provided. The first step being a chemical modification of silanichydride bonds in cyclic siloxane monomer by the hydrosilylation reaction with acrylate-/methacrylate-containing allylic monomer. The second step being a ring-opening polymerization of the acrylate-/methacrylate-functionalized cyclic siloxane monomer with siloxane monomers using an oligosiloxane as a chain terminator.
    Type: Grant
    Filed: January 23, 2009
    Date of Patent: August 6, 2013
    Assignee: National Science and Technology Development Agency
    Inventors: Wanida Janvikul, Boonlom Thavornyutikarn, Paradorn Ngamdee
  • Patent number: 8455606
    Abstract: Novel photoactive polymers, as well as related components, articles, systems, and methods are disclosed.
    Type: Grant
    Filed: July 1, 2009
    Date of Patent: June 4, 2013
    Assignee: Merck Patent GmbH
    Inventors: Zhengguo Zhu, David Waller
  • Patent number: 8455604
    Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane may have the formula H-[(AHR)n(c-AmHpm-2)q]—H, where A is independently Si or Ge; R is H, -AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. The method may include combining a silane compound of the formula AHaR14-a, AkHgR1?h and/or c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. Alternatively, the method may include halogenating a polyarylsilane and reducing the halopolysilane with a metal hydride to form the polysilane.
    Type: Grant
    Filed: July 6, 2012
    Date of Patent: June 4, 2013
    Assignee: Kovio, Inc.
    Inventors: Wenzhuo Guo, Vladimir K. Dioumaev, Joerg Rockenberger, Brent Ridley
  • Patent number: 8455599
    Abstract: Low molecular weight siloxane materials having one functional group are provided which have reduced tendency to form phase separated domains after polymerization. Two classes of siloxane materials are included: (1) symmetric siloxane macromonomers containing at least two monomer termini and one polymerizable functional group which is equidistant from the termini, and (2) assymetric siloxane macromonomers having at least one polymerizable functional group terminus and at least one oxygen-containing polar hydrophilic terminus selected from the group consisting of hydroxyl, ether, and polyether. Symmetric siloxane macromonomers having hydroxyl termini are useful for forming biocompatible materials, such as for contact lenses, tissue regeneration scaffold polymers, and coatings to reduce non-specific binding of proteins.
    Type: Grant
    Filed: August 4, 2010
    Date of Patent: June 4, 2013
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Edward Kimble
  • Patent number: 8409684
    Abstract: A release sheet, on which a stamper receiving layer for producing an optical recording medium is laminated, comprising a release agent layer on a side to which the stamper receiving layer is laminated, wherein the release agent layer is formed using a release agent that contains an organopolysiloxane (other than an MQ resin below) containing an alkenyl group in the molecule, an MQ resin containing an alkenyl group and having, as constituent components, M units represented by formula (1) R12R2—Si—O—??(1) (where, R1 denotes an organic group and R2 denotes an alkenyl group), and Q units represented by formula (2) and a cross-linking agent, and that does not substantially contain particles consisting of inorganic matter, and the alkenyl group content in said MQ resin ranges from 0.5 to 5 wt %. The release sheet can reduce concave defects on a convex-concave pattern transfer surface of the stamper receiving layer.
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: April 2, 2013
    Assignee: Lintec Corporation
    Inventors: Takuya Okuda, Shin Kubota
  • Publication number: 20130040135
    Abstract: There are provided a silicone resin sheet having high heat resistance and strength and being excellent in flexibility, and a pressure-sensitive adhesive sheet having excellent anchoring, force and excellent moisture resistance. The inorganic oxide particle-containing silicone resin sheet according to the present invention includes a silicone resin composition containing a crosslinked structure in which an inorganic oxide particle dispersed in a polysiloxane resin and the polysiloxane resin are crosslinked through a chemical bond, and has a tensile elongation of 5 to 15%.
    Type: Application
    Filed: August 8, 2012
    Publication date: February 14, 2013
    Applicant: NITTO DENKO CORPORATION
    Inventor: Keisuke HIRANO
  • Publication number: 20130030139
    Abstract: A dendritic polymer and a magnetic resonance imaging contrast agent employing the same. The magnetic resonance contrast agent includes the dendritic polymer according to the structure of S?P-D?Z-L)i)j or S?P-D?X—Z-L)i)j, wherein, S is cyclosilane moiety with j silicon oxygen residual groups, and j is not less than 2; P is ?CH2CH2O?l, and l is not less than 1; D is a C3-30 dendritic moiety having n oxygen residue, and n is not less than 3; X is C3-30 moiety having bi-functional groups; Z is a C3-20 moiety having a plurality of functional group; and L is a metal cation.
    Type: Application
    Filed: October 2, 2012
    Publication date: January 31, 2013
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventor: INDUSTRIAL TECHNOLOGY RESEARCH INSITUTE
  • Publication number: 20120322966
    Abstract: A method of regioselectively preparing a pyridine-containing compound is provided. In particular embodiments, the method includes reacting halogen-functionalized pyridal[2,1,3]thiadiazole with organotin-functionalized cyclopenta[2,1-b:3,4-b?]dithiophene or organotin-functionalized indaceno[1,2-b:5,6-b?]dithiophene. Also provided is a method of preparing a polymer. The method includes regioselectively preparing a monomer that includes a pyridal[2,1,3]thiadiazole unit; and reacting the monomer to produce a polymer that includes a regioregular conjugated backbone section, wherein the section includes a repeat unit containing the pyridal[2,1,3]thiadiazole unit. A polymer that includes a regioregular conjugated backbone section, and electronic devices that include the polymer, are also provided.
    Type: Application
    Filed: June 18, 2012
    Publication date: December 20, 2012
    Inventors: Guillermo C. BAZAN, Lei YING, Ben B.Y. HSU, Wen WEN, Hsin-Rong TSENG, Gregory C. WELCH
  • Publication number: 20120277372
    Abstract: The HBP Free-POSS compounds of Formula I are superior to prior HB polymers and linear polymers in space and electronic applications because they have better resistance to electrons, protons and atomic oxygen, have superior out-gassing performance, and are transparent. They are used as coatings, films, adhesives, sealants and elastomers.
    Type: Application
    Filed: January 19, 2011
    Publication date: November 1, 2012
    Applicant: MICHIGAN MOLECULAR INSTITUTE
    Inventors: Jin Hu, Claire Hartmann-Thompson, Dale J. Meier, Petar R. Dvornic
  • Patent number: 8263725
    Abstract: Cured products constituted with conventional epoxy compounds have been disadvantageous in heat-resistant and light-resistant transparency, and crack resistance. An object of the present invention is to provide: a modified polyorganosiloxane compound having an epoxy group and/or an oxetanyl group which provides a cured product that is excellent in heat-resistant and light-resistant transparency, and crack resistance; a curable composition thereof; and a cured product obtained by curing the same.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: September 11, 2012
    Assignee: Kaneka Corporation
    Inventors: Yoshikatsu Ichiryu, Katsuya Ouchi
  • Publication number: 20120226010
    Abstract: The present invention relates to a process for the production of an intermediate siloxane monomer and use of said monomer to produce high molecular weight linear polysilalkylenesiloxanes. The siloxane monomer is prepared by ring opening polymerization of a cyclic monomer of the structure in the presence of an acidic or basic ring opening polymerisation catalyst; to form a mixture of siloxane monomers and linear oligomers. The linear oligomers are then extracted and discarded before a further step of ring opening polymerization using the aforementioned intermediate siloxane monomer mixture as the starting material. The second polymerisation step is undertaken at a temperature within the melting point range of said siloxane monomer mixture. The intermediate, final product and methods of their manufacture are described.
    Type: Application
    Filed: November 2, 2010
    Publication date: September 6, 2012
    Inventors: Francois Ganachaud, Frederic Gubbels, Stephanie Lobry, Amedee Ratsimihety
  • Patent number: 8258332
    Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer, and reacting the reactive polymer with a halosilane compound containing an amino group.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: September 4, 2012
    Assignee: Bridgestone Corporation
    Inventors: Terrence E. Hogan, Steven Luo, Yoichi Ozawa, Junko Matsushita, Ryuji Nakagawa, Eiju Suzuki, Ken Tanaka
  • Publication number: 20120219793
    Abstract: Embodiments of the present disclosure include functionalized polyhedral oligomeric silsesquioxane compositions or mixtures, methods of using functionalized polyhedral oligomeric silsesquioxane compositions, structures including functionalized polyhedral oligomeric silsesquioxane, and the like.
    Type: Application
    Filed: November 9, 2010
    Publication date: August 30, 2012
    Inventors: Nathan Fritz, Paul Kohl, Rajarshi Saha
  • Publication number: 20120208973
    Abstract: A polysiloxane represented by the formula (1) or (2): where R, R1, R2, m and n are defined in the specification.
    Type: Application
    Filed: April 25, 2012
    Publication date: August 16, 2012
    Inventors: Nobumasa OOTAKE, Kazuhiro Yoshida, Kenichi Watanabe, Yasuhito Yamaryo
  • Patent number: 8236916
    Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H-[(AHR)n(c-AmHpm-2)q]—H, where each instance of A is independently Si or Ge; R is H, -AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14-a, the formula AkHgR1?h and/or the formula c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane.
    Type: Grant
    Filed: December 23, 2008
    Date of Patent: August 7, 2012
    Assignee: Kovio, Inc.
    Inventors: Wenzhuo Guo, Vladimir K. Dioumaev, Joerg Rockenberger, Brent Ridley
  • Publication number: 20120178894
    Abstract: The present invention relates to a compound represented by Formula (1) and a polymer obtained using the compound: wherein R1 is phenyl which may have substituents, Q1 is hydrogen, halogen, alkyl having 1 to 10 carbon atoms, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexenyl or phenyl in which optional hydrogen may be replaced by halogen or alkyl having 1 to 5 carbon atoms, <—Z0?A1-Z1?l?A2-Z2?m?A3-Z3?n?A4?p-Z4—??(2) and Q2 is a group represented by Formula (2): wherein the code < represents a bonding point with silicon, l, m, n and p are independently 0, 1, 2 or 3, A1 to A4 are independently a single bond, 1,4-cyclohexylene, 1,4-cyclohexenylene, a condensed ring group having 6 to 10 carbon atoms which is a divalent group, or 1,4-phenylene, Z0 to Z3 are independently a single bond, CH?CH—, —C?C—, —COO—, —OCO—, or alkylene having 1 to 20 carbon atoms, and Z4 is a single bond, —CH?CH—, —C?C—, —COO—, —OCO—, or alkylene having 1 to 20 carbon atoms.
    Type: Application
    Filed: March 19, 2012
    Publication date: July 12, 2012
    Inventors: Jyun-ichi INAGAKI, Yasuyuki SASADA, Takashi KATO
  • Patent number: 8198380
    Abstract: The present invention relates to a composition for a thermosetting silicone resin, the composition including: (A) an organohydrogenpolysiloxane; (B) an alkenyl group-containing epoxy compound; (C) an alkenyl group-containing cyclic siloxane; and (D) a hydrosilylation catalyst, a thermosetting silicone resin composition obtained by reacting the composition and a production method thereof, a photosemiconductor element-encapsulating material including the thermosetting silicone resin composition, and a photosemiconductor device including a photosemiconductor element encapsulated with the resin composition or the photosemiconductor element-encapsulating material.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: June 12, 2012
    Assignee: Nitto Denko Corporation
    Inventor: Hiroyuki Katayama
  • Patent number: 8173758
    Abstract: A polysiloxane represented by the formula (1) or (2): where R, R1, R2, m and n are defined in the specification.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: May 8, 2012
    Assignee: JNC Corporation
    Inventors: Nobumasa Ootake, Kazuhiro Yoshida, Kenichi Watanabe, Yasuhito Yamaryo
  • Patent number: 8153713
    Abstract: A core-shell particle is formed by a method that includes forming a crosslinked polyorganosiloxane core, reacting a graftlinking agent with the crosslinked polyorganosiloxane core, and polymerizing a poly(alkenyl aromatic) shell around the graftlinking agent-functionalized polyorganosiloxane core. The method produces a core-shell particle with improved adhesion between shell and core. The core-shell particle is useful as an impact modifier in thermoplastic compositions.
    Type: Grant
    Filed: November 7, 2008
    Date of Patent: April 10, 2012
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: Amol Adhikrao Mohite, Jaykisor Pal, Sathya Narayanan, Satishkumar H. Mahanth, Albin Peter Berzinis, Shripathy Vilasagar
  • Publication number: 20120052300
    Abstract: The present invention relates to a process for producing a particulate nanocomposite material, in which the particles of the nanocomposite material comprise a) at least one inorganic or organo(semi)metallic phase which comprises at least one (semi)metal M; and b) at least one organic polymer phase. The invention also relates to the nanocomposite materials obtainable by this process. The process comprises the polymerization of at least one monomer MM which has at least one first cationically polymerizable monomer unit A which has a metal or semimetal M, and at least one second cationically polymerizable organic monomer unit B which is joined to the polymerizable unit A via at least one, e.g.
    Type: Application
    Filed: May 7, 2010
    Publication date: March 1, 2012
    Applicant: BASF SE
    Inventors: Samira Nozari, Rainer Dyllick-Brenzinger, Arno Lange, Stefan Spange