Abstract: Disclosed are: a microetching agent which can form roughened shapes less affected by differences in the crystallinity of the copper and with which roughened shape excellent in terms of adhesiveness to resins, etc. can be formed on either electrolytic copper or rolled copper; and a method for producing a wiring board which includes a step of roughening a copper surface using the microetching agent. In the present invention, the microetching agent for copper is an acidic aqueous solution containing an inorganic acid, a cupric ion source, a halide ion source, and a polymer. The polymer has a functional group containing a nitrogen atom. It is preferable that the microetching agent contain a sulfate ion source.

Abstract: Provided is a process for producing a copolymer of a diallylamine and sulfur dioxide which copolymer has a higher molecular weight and water-solubility than that obtained by a conventional production process by copolymerizing the diallylamine and sulfur dioxide in the presence of an acid and a radical polymerization initiator in a polar solvent.

Abstract: Provided is a process for producing a copolymer of a diallylamine and sulfur dioxide which copolymer has a higher molecular weight and water-solubility than that obtained by a conventional production process by copolymerizing the diallylamine and sulfur dioxide in the presence of an acid and a radical polymerization initiator in a polar solvent.

Abstract: There is provided a photosensitive resin having at least three moieties in the backbone chain, two moieties of which moieties are an alicyclic group moiety and a sulfonyl moiety. The photosensitive resin has a superior solubility in solvents and a superior dry-etching resistance, and enables easy fabrication of highly integrated semiconductor devices.

Abstract: Provided is a photosensitive resin with high sensitivity to exposure light. The photosensitive resin comprises a vinyl monomer moiety having an alicyclic group in a side chain thereof, and a sulfonyl moiety.

Abstract: The present invention discloses, inter alia, a composition useful for producing a homogeneous, semipermeable membrane, the composition comprising (1) a polysulfone compound, (2) a solvent, such as sulfolane, antypyrine, &dgr;-valerolactam, diethyl phthalate, and mixtures thereof, and (3) a non-solvent, such as poly(ethylene glycol), di(ethylene glycol), tri(ethylene glycol), glycerol, and mixtures thereof. Another aspect of this invention discloses methods for fabricating semipermeable membranes by homogeneously mixing the composition of the polysulfone compound, solvent, and non-solvent, melting the composition, and melt-spinning the molten composition. Another aspect of the present invention includes homogeneous, melt-spun, semipermeable membranes useful for liquid separation processes, such as, but not limited to, microfiltration, ultrafiltration, dialysis, and reverse osmosis.

Abstract: Poly (diene sulfones) have superior properties as X-ray resists. Many poly (diene sulfones) have an X-ray sensitivity below about 50 mJ/cm.sup.2, and a glass transition temperature above about 70.degree. C. A preferred X-ray resist is poly (1,3-hexadiene sulfone). A method of synthesizing poly (diene sulfones) is disclosed, in which a diene monomer is dissolved in a molar excess of a nitroalkane at low temperature, for example in a molar excess of dried 2-nitropropane in a -78.degree. C. dry ice/acetone bath, and reacted with a molar excess of sulfur dioxide in the presence of a free radical initiator such as tert-butyl-hydroperoxide.

Abstract: The invention relates to polyarylene sulfoxides which are soluble in polar organic solvents, a process for their preparation and their use. Soluble polyarylene sulfoxides can be prepared by homogeneous partial oxidation of polyarylene sulfides. The homogeneous partial oxidation is achieved by dispersing the polyarylene sulfide in finely divided form in a solvent stable to oxidation, slowly adding a mild oxidizing agent and terminating the oxidation as soon as the polymer chains have reached a uniform degree of oxidation. The partially oxidized polyarylene sulfoxides are suitable for the production of coatings and shaped articles, such as fibers, membranes, films and nonwovens.

Abstract: Copolymers comprising 1-50 mole % of sulfur dioxide and 50-99 mole % of trialkylgermylstyrene, having a weight average molecular weight of 500-10,000,000 and exhibiting a high sensitivity to light, electron beam, and X-ray, as well as having an excellent anti-dry etching resistance, and their application as a positive resisting material.

Abstract: Novel nonlinearly optically active polymers, well suited for electrooptical applications, are prepared by copolymerizing a first difunctional monomer with a second difunctional comonomer, with at least one of such difunctional monomers including a polar charge transfer moiety containing at least one electron acceptor group and at least one electron donor group (D), and further wherein the polymerizable functional groups are borne by the one or more electron donor groups (D).

Abstract: An improved process for the production of linear alternating polymers of carbon monoxide and at least one ethylenically unsaturated hydrocarbon employs a novel catalyst composition formed from a compound of palladium, the anion of a strong non-hydrohalogenic acid and a novel hexakis phosphine ligand. The process is characterized by a lessened degree of reactor fouling.

Abstract: A polymer solution contains a sulphonated polyarylethersulphone in a solvent mixture containing at least three components, where the solvent mixture has a delta-H in the range from 3 to 8.5; a delta-P in the range from 4 to 8 and a delta-D in the range 7.2 to 9.5 and each component of the solvent mixture is a liquid or low melting solid which is a non-solvent or poor solvent for the sulphonated polyarylethersulphone, and at least one of the components satisfies at least one of the conditions:a) said component has a delta-D of less than 8 when the value of delta-P is not more than 3; andb) said component has a delta-H of greater than 3 when the value of delta-P is at least 8.5; andc) said component has a delta-H of less than 8 when it contains at least one hydroxylic group; andd) said component is free of hydroxylic groups and has a delta-P which is greater than 3 and less than 8.5.The solution can be used for the production of membranes suitable for use in reverse osmosis applications.

Abstract: Novel thermosetting resins are produced from low molecular weight linear alternating polymers of carbon monoxide and a suitable curing agent. The resin compositions are particularly useful as coatings.

Abstract: An asymmetric membrane formed from a sulphonated polyarylethersulphone has a salt rejection of at least 99%. Alternatively, a membrane has a good salt rejection and an acceptable water flux such that the ratio ##EQU1## has the value of at least 0.7. The membranes can be obtained using barium salts of the sulphonated polyarylethersulphone, with the proportion of barium being controlled to be at least 85%, preferably at least 86%, and not more than 91%, preferably not more than 90% of the barium required to react with the sulphonic acid groups on the sulphonated polymer.

Abstract: A novel copolymer useful as an active ingredient for a positive type resist material to be decomposed by electron beam or X-rays with a high sensitivity and having a superior resistance to dry etching, a process for producing the copolymer and a resist material containing the copolymer are provided, which copolymer consists of 1 to 50% by mol of structural units of ##STR1## and 50 to 99% by mol of structural units of one or more vinyl compounds at least one of which is an aromatic ring-containing vinyl compound and having a number average molecular weight of 500 to 500,000.

Abstract: An asymmetric membrane formed from a sulphonated polyarylethersulphone has a salt rejection of at least 99%. Alternatively, a membrane has a good salt rejection and an acceptable water flux such that the ratio ##EQU1## has the value of at least 0.7. The membranes can be obtained using barium salts of the sulphonated polyarylethersulphone, with the proportion of barium being controlled to be at least 85%, preferably at least 86%, and not more than 91%, preferably not more than 90% of the barium required to react with the sulphonic acid groups on the sulphonated polymer.

Abstract: The invention is a process for preparing linear alternating polymers of sulfur dioxide, ethylene, optionally at least one ethylenically unsaturated hydrocarbon other than ethylene and optionally carbon monoxide having the general formula ##STR1## wherein Z is at least one moiety selected from SO.sub.2 and CO, G is the moiety of at least one ethylenically unsaturated hydrocarbon of at least 2 carbon atoms polymerized through the ethylenic unsaturation, n is an integer of at least 1, and m is an integer of zero or greater, which process comprises contacting sulfur dioxide, ethylene, optionally carbon monoxide, and optionally at least one ethylenically unsaturated hydrocarbon of at least 2 carbon atoms, in the presence of a catalyst obtained from (1) a compound of a Group VIII metal selected from palladium, cobalt and nickel, (2) a bidentate ligand of phosphorus, arsenic, or antimony, and (3) an anion of a non-hydrohalogenic acid having a pKa of less than 6.

Abstract: Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula ##STR1## in which R.sub.1, R.sub.2 and R.sub.3 independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R.sub.4 represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.

Abstract: In accordance with this invention, there is provided a positive resist medium for microlithography which is comprised of a film of a copolymer of sulfur dioxide and certain vinyl esters. A method of manufacturing microelectronic circuits and recording information utilizing the resist medium of this invention is also provided.

Abstract: Copolymers of an aziridine and sulfur dioxide are disclosed which are useful as positive radiation resists for use in electron beam and x-ray lithography.

Abstract: The invention relates to a homopolymer or copolymer of acrylonitrile which comprises from 0 to 30% by weight, incorporated by polymerization, of comonomer units which are free from ionic groups, said polymers having a K-value of from 50 to 100, a dye absorption capacity for cationic dyes of at least 0.5% by weight, a conductivity, measured in dimethylformamide solution, of at least 10.mu. Siemens, and from 0.2 to 1.5% by weight of sulphur fixed to said polymer as well as to a process for the production thereof.

Abstract: Poly(aldehyde aminosilicon acid) resinous products are produced by reacting an aminosilicon acid compound with an aldehyde compound.

Abstract: Copolymers of an aziridine and sulfur dioxide are disclosed which are useful as positive radiation resists for use in electron beam and x-ray lithography.

Abstract: This invention relates to a high molecular weight terpolymer of ethylene, sulfur dioxide and carbon monoxide stable to 280.degree. C. and containing as little as 36 mol % ethylene and about 41-51 mol % sulfur dioxide; and to the method of producing said terpolymer by irradiation of a liquid and gaseous mixture of ethylene, sulfur dioxide and carbon monoxide by means of Co-60 gamma rays or an electron beam, at a temperature of about 10.degree.-50.degree. C., and at a pressure of about 140 to 680 atmospheres, to initiate polymerization.