Abstract: A method for production of a uniform polymer of high molar mass is provides, the method comprising: (a) polymerizing cyclic imino ether monomer in a first reaction mixture by cationic ring opening polymerization to produce a polymerized first reaction mixture containing (i) polymerized material and (ii) solvent and/or unreacted cyclic imino ether monomer; (b) separating solvent and/or unreacted cyclic imino ether monomer from polymerized material contained in the polymerized first reaction mixture; (c) copolymerizing by cationic ring opening polymerization a second liquid reaction mixture containing cyclic imino ether monomer and solvent by combining the separated unreacted cyclic imino ether monomer and/or the separated solvent with other components. Also disclosed are polyoxazoline polymers comprising at least 50 wt.

Abstract: A flame retardant polymer is prepared from renewable content. In an exemplary synthetic method, a bio-derived flame retardant polymer is prepared by a polycondensation reaction of a biobased diol (e.g., isosorbide) and a phosphorus-containing monomer (e.g., phenylphosphonic dichloride). The biobased diol may be obtained either directly from, or through modification of, a biological product. Preferably, at least 50% of the mass of the biobased diol is obtained directly from a biological product. The phosphorus-containing monomer may be a phosphonic dichloride, dichlorophosphate, alkyl/aryl phosphonate, or other phosphorus-containing monomer known for flame retardancy.

Abstract: A hard coating composition including at least the following components (A) to (E): Component (A): A poly(methyl)glycidyl ether compound derived from a chain aliphatic polyol or a chain aliphatic polyether polyol, which may or may not contain a hydroxyl group, Component (B): A silsesquioxane compound containing a cationic polymerizable group, Component (C): A silicate compound, Component (D): A silane compound containing a cationic polymerizable group, or a partial condensed compound thereof, or a mixture thereof, and Component (E): A cationic photopolymerization initiator, wherein the composition includes 5 to 40 parts by weight of the component (A), 60 to 95 parts by weight of the total of the components (B), (C) and (D), and 0.1 to 10 parts by weight of the component (E), each based on 100 parts by weight of the total of the components (A) to (D).

Abstract: Prepolymers having more than one alkoxysilyl function per chain end reactive towards epoxide groups as a constituent of curable compositions, and their use for producing adhesive-bonding and coating compositions, which may also be foamable, and also polymeric materials produced therefrom.

Abstract: A light-emitting device including: a substrate; a light-emitting diode; and an optical resonance layer to resonate light emitted from the light-emitting diode. The optical resonance layer includes a first layer, including a polysilsesquioxane-based copolymer. A linking group connecting two different silicon (Si) atoms of the polysilsesquioxane-based copolymer can be —O—, or a substituted or unsubstituted C1-C30 alkylene group.

Abstract: A method for producing (hydroxymethyl)polysiloxanes of the general formula I (SiO4/2)k(R1SiO3/2)m(R12SiO2/2)p(R13SiO1/2)q[O1/2—(SiR22—X—Y—)aSiR22—CH2—OH]s[O1/2H]t??formula I, includes reacting silanol-containing organosiloxanes of the general formula II (SiO4/2)k(R1SiO3/2)m(R12SiO2/2)p(R13SiO1/2)q[O1/2H]r??formula II with cyclic or acyclic compounds that include at least one unit of the general formula III Z—[O—CH2—SiR22]n—Y??formula III

Abstract: Disclosed is a photosensitive resin composition which exhibits positive or negative photosensitivity and is used as a mask in an ion implantation step, the photosensitive resin composition including, as a resin, (A) a polysiloxane. The photosensitive resin composition of the present invention has high heat resistance and is capable of controlling a pattern shape, and also has excellent ion implantation mask performance, thus enabling application to a low-cost high-temperature ion implantation process.

Abstract: Disclosed are an epoxy compound having an alkoxysilyl group, a composite of which exhibits good heat resistant properties and/or a cured product of which exhibits good flame retardant properties, a method of preparing the same, a composition comprising the same, and a cured product and a use of the composition. An alkoxysilylated epoxy compound comprising at least one of Chemical Formula S1 substituent and at least two epoxy groups in a core, a method of preparing the epoxy compound by an allylation, a claisen rearrangement, an epoxidation and an alkoxysilylation, an epoxy composition comprising the epoxy compound, and a cured product and a use of the composition are provided. The composite of the disclosed exhibits improved chemical bonding, good heat resistant properties, a low CTE, a high glass transition temperature or Tg-less The cured product of the composition exhibits good flame retardant properties.

Abstract: The present invention provides a non-aromatic saturated hydrocarbon group-containing organopolysiloxane containing the following units (I) to (III): (I) a siloxane unit (T unit) represented by R1SiO3/2: 40 to 99 mol %; (II) a siloxane unit (D unit) represented by R2R3SiO2/2: 59 mol % or less; and (III) a siloxane unit (M unit) represented by R4R5R6SiO1/2: 1 to 30 mol %. There can be an organopolysiloxane, which is soluble in a nonpolar organic solvent so that the organopolysiloxane can be peeled in a short time, and which is hardly soluble in a polar organic solvent to be exemplarily used upon coating a photoresist onto a semiconductor side of a joined substrate and removing the photoresist therefrom so that the organopolysiloxane is not peeled from the supporting substrate upon coating a photoresist onto a semiconductor side of a joined substrate and removing the photoresist therefrom.

Abstract: The present invention relates to novel amine terminated cycloaliphatic polysiloxanes, and preparations thereof. More particularly, the invention provides several reaction schemes for the synthesis of amino-functionalized cyclo-aliphatic silicones and the products produced by the reaction schemes. In one embodiment of the invention, an amine functionalized silicone is prepared through a base-catalyzed ring-opening reaction. In another embodiment of the invention, an amine functionalized silicone is prepared through the hydrosilation of a silicone oligomer through the blocking and deblocking of an amine terminated in a vinyl group.

Abstract: An aromatic ring-containing polymer for a resist underlayer, the polymer including a unit represented by the following Chemical Formula 1: wherein, R1 and R2 are independently hydrogen, a C1 to C10 alkyl group, or an aromatic group, A is a functional group derived from an aromatic compound with a heteroatom or without a heteroatom, and n is an integer of one or more.

Abstract: The present invention relates to a novel porous film material which comprises at least one carbonaceous semimetal oxide phase, and to a process for production thereof. The invention also relates to the use of these porous film materials as a separator layer or for production of such separator layers in electrochemical cells, particularly in lithium cells and especially in lithium secondary cells.

Abstract: A polyimide resin including repeating units represented by formula (1): wherein R is a diamine residue or a diisocyanate residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of imide rings bonded to the norbornane rings is in exo configuration with respect to the norbornane rings, and a polyamic acid resin including repeating units represented by formula (2): wherein R is a diamine residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of amide groups and carboxyl groups bonded to the norbornane rings is in exo configuration with respect to the norbornane rings. The polyimide resin is soluble in general-purpose solvents, has a good transparency and a high molecular weight, and is excellent in mechanical properties, such as tensile strength and elongation.

Abstract: Reclaiming cured elastomer material by mixing the cured elastomer as crumbs or chips with a devulcanization-aiding chemical composition, and devulcanizing the cured material by applying a shear-stress deformation to the mixture of the crumbs or chips with a devulcanization-aiding chemical while performing a mechanical disintegration of the cured elastomer into fine-ground crumbs under controllable temperature not exceeding about 90 degrees C.

Abstract: The invention relates to spiro compounds of the formula (I) and to monolithic materials prepared therefrom by twin ring-opening polymerization which consist of a porous metal oxide or semimetal oxide framework and are suitable for use as catalyst supports or as supports for active compounds.

Abstract: The present invention provides a silicone resin lens obtained by molding and curing a silicon resin composition into a lens, wherein the lens has a refractive index at 400 nm of 1.5 or more, a ratio of a refractive index at 400 nm to a refractive index at 596 nm of 1.01 or more, an Abbe's number of 45 or more, and an absolute value of a differential of refractive indexes against temperatures, dn/dT, of 250×10?6/degrees C. or less. Further, the present invention provides a method for preparing the silicone resin lens according to any one of claims 1 to 3, wherein the silicone resin lens is prepared in conditions where a ratio of a molding shrinkage ratio found after subjecting the silicone resin composition to post-cure to a molding shrinkage ratio found after subjecting the silicone resin composition to molding is 0.8 to 1.2.

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

Abstract: The present invention provides a crosslinkable polysiloxane-containing composition and a process for treating a textile with the composition whereby desirable properties, such as water repellency and durability, are enhanced.

Abstract: The present invention provides a non-aromatic saturated hydrocarbon group-containing organopolysiloxane containing the following units (I) to (III): (I) a siloxane unit (T unit) represented by R1SiO3/2: 40 to 99 mol %; (II) a siloxane unit (D unit) represented by R2R3SiO2/2: 59 mol % or less; and (III) a siloxane unit (M unit) represented by R4R5R6SiO1/2: 1 to 30 mol %. There can be an organopolysiloxane, which is soluble in a nonpolar organic solvent so that the organopolysiloxane can be peeled in a short time, and which is hardly soluble in a polar organic solvent to be exemplarily used upon coating a photoresist onto a semiconductor side of a joined substrate and removing the photoresist therefrom so that the organopolysiloxane is not peeled from the supporting substrate upon coating a photoresist onto a semiconductor side of a joined substrate and removing the photoresist therefrom.

Abstract: The invention relates to compositions comprising or consisting of a reaction product obtained from a reaction mixture of aminosilane of formula (I), a mecaptosilane of formula (II) and an epoxysilane of formula (III). Said compositions are suitable as bonding agents, especially in the form of primers. The compositions are highly adhesive and especially suitable for low-temperature applications and especially for sticking glass together.

Abstract: A composition includes a siloxane of the formula: (RMe2SiO1/2)a(MeRSiO2/2)b(RSiO3/2)c(SiO4/2)d wherein a is at least 2, b is from 3 to 20, c is from 0 to 10, d is from 0 to 10, and each R is independently of the formula —CR?2—CR?2—Y—Z or CR?2—CR?2—Z, wherein each R? is independently a hydrogen atom or a C1 to C10 hydrocarbyl free of aliphatic unsaturation so long as at least one R? is a hydrogen atom, Y is a divalent organic group, and Z is a polycyclic group containing at least one aromatic ring. A method of making the siloxane includes charging (HMe2SiO1/2)a(MeHSiO2/2)b(HSiO3/2)c(SiO4/2)d, a platinum catalyst, and an alkene of the formula CR?2?CR?—Y—Z or CR?2?CR?—Z into a reactor to form the siloxane. The siloxane is useful as a component in holographic storage media for photopolymer-based holographic data storage applications. The siloxane exhibits excellent compatibility when mixed with a polymerizable component before the polymerizable component is cured.

Abstract: Fluorosilicon polymers are disclosed that are prepared by a process comprising reacting a) iodinated oligomers having copolymerized units of perfluoro(methyl vinyl ether) and vinylidene fluoride or tetrafluoroethylene that contain 40-90 mole percent copolymerized units of vinylidene fluoride or tetrafluoroethylene and 10-60 mole percent copolymerized units of perfluoro(methyl vinyl ether), said oligomers having two functional endgroups and having a number average molecular weight between 1000 and 25,000 with b) a methoxyvinyl silane or an ethoxyvinyl silane to form a silicon-containing polymeric adduct that is further reacted with an acid to form a crosslinked fluorinated polymer.

Abstract: The present invention relates to silyl- and heteroatom-substituted compounds selected from carbazoles, dibenzofurans, dibenzothiophenes and disilylbenzophospholes of the formula (I) or (I*), to the use of the compounds of the formula (I) or (I*) in organic electronics applications, preferably in organic light-emitting diodes, to an organic light-emitting diode comprising at least one compound of the formula (I) or (I*), to a light-emitting layer comprising at least one compound of the formula (I) or (I*), to a blocking layer for holes/excitons comprising at least one compound of the formula (I) or (I*), and to an apparatus selected from the group consisting of stationary visual display units, mobile visual display units, illumination units, keyboards, items of clothing, furniture and wallpaper, comprising at least one inventive organic light-emitting diode.

Abstract: A thermoset and method of making such by crosslinking a mixture of a polyhedral oligomeric silsesquioxane having pendent siloxane groups or unsaturated carbon bonds and a siloxylcarborane compound having unsaturated carbon bonds.

Abstract: A composition includes a copolymer including a mixture of monomeric units having structures (A), (B), and (C), and one or more of structures (D) or (E): HSiO(3-a)/2(OH)a??(A) Si(3-b)/2(OH)b—CH2)n—SiO(3-c)/2(OH)c??(B) R1SiO(3-d)/2(OH)d??(C) MeSi(3-e)/2(OH)e??(D) R2SiO(3-f)/2(OH)f??(E) wherein a, b, c, d, e, and f are independently from 0 to 2, n is from 0 to about 10, R1 is a chromophore, and R2 is a hydrophilic group.

Abstract: Photovoltaic cells with silole-containing polymers, as well as related systems, methods and components are disclosed.

Abstract: Provided is a novel silicone copolymer which exhibits high absorption even in a far-ultraviolet region of 200 nm or more, and also is soluble in an alkaline reagent since it has a phenolic hydroxyl group. The silicone copolymer comprises a silsesquioxane having a phenol unit and comprises a silsesquioxane having a condensed polycyclic hydrocarbon.

Abstract: A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.

Abstract: An aromatic ring-containing polymer for a resist underlayer, the polymer including a unit represented by the following Chemical Formula 1: wherein, R1 and R2 are independently hydrogen, a C1 to C10 alkyl group, or an aromatic group, A is a functional group derived from an aromatic compound with a heteroatom or without a heteroatom, and n is an integer of one or more.

Abstract: A curable composition for sealing a light emitting device, comprising a modified polysiloxane containing, in a molecule, not less than one alicyclic hydrocarbon group and not less than two epoxy groups.

Abstract: The invention relates to spiro compounds of the formula (I) and to monolithic materials prepared therefrom by twin ring-opening polymerisation which consist of a porous metal oxide or semimetal oxide framework and are suitable for use as catalyst supports or as supports for active compounds.

Abstract: The present invention generally relates to compositions including linear cycloaliphatic siloxane polymers, and the cyclic cycloaliphatic siloxane oligomers from which they are made. The present invention also generally relates to methods for making cycloaliphatic siloxane polymers, and the cyclic cycloaliphatic siloxane oligomers from which they are made. Some embodiments relate to cationic polymerization of methyl, cyclopentyl, and/or cyclohexyl substituted polysiloxanes. In some embodiments the cationic polymerization is a cationic ring-opening polymerization.

Abstract: A silicon-containing curable composition, comprising: a prepolymer (A) containing two or more Si—H groups per molecule obtained by hydrosilylation reaction of one kind or more selected from each of components (?) and components (?) described below; a cyclic siloxane compound (B) containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups; and a hydrosilylation catalyst (C); wherein the component (?) is a cyclic siloxane compound represented by formula (1) and contains two or more Si—H groups per molecule, wherein R1, R2 and R3 each are an alkyl group having 1 to 6 carbon atoms or a phenyl group, may be the same or different, a is any number of 2 to 10, b is any number of 0 to 8, and a+b?2, and wherein the component (?) is a compound containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups.

Abstract: The invention relates to a novel family of oligomeric and polymeric s-triazine and s-heptazine derivatives and to their use as an intermediate, e.g. as precursors for producing Si/(M)/C/N/(O) ceramics, as mesoporous materials such as, e.g., catalyst carriers for storing gas or as a stationary phase for chromatography, as flameproofing agents, plastic additives or for other organic/inorganic functional materials.

Abstract: The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, where, R1 is selected from C1-C4 alkyl. The invention also relates to a process for imaging this composition.

Abstract: Provided is a positive resist material, particularly a chemically amplified positive resist material having higher sensitivity, higher resolution, a higher exposure latitude and better process adaptability than conventional positive resist materials, and providing a good pattern profile after exposure, particularly having lessened line edge roughness and exhibiting excellent etching resistance. These materials may contain, preferably an organic solvent and acid generator, more preferably a dissolution inhibitor or a basic compound and/or a surfactant. Provided is a positive resist material comprising a polymer comprising at least one monomer unit selected from a group consisting of a monomer unit (A), a monomer unit (B) and a monomer unit (C) represented by the following formula (1); and having a glass transition temperature (Tg) of 100° C. or greater.

Abstract: Provided is a novel silicone copolymer which exhibits high absorption even in a far-ultraviolet region of 200 nm or more, and also is soluble in an alkaline reagent since it has a phenolic hydroxyl group. The silicone copolymer comprises a silsesquioxane having a phenol unit and comprises a silsesquioxane having a condensed polycyclic hydrocarbon.

Abstract: The present invention provides a novel photocurable composition containing an organic polymer having an epoxy group and/or oxetane group-containing silicon group at an end and a cationic photoinitiator. For example, the photocurable composition contains an organic polymer (A) having an epoxy group and/or oxetane group-containing silicon group at an end, and a cationic photoinitiator (B), the organic polymer (A) being produced by addition reaction between an organic polymer terminated with an unsaturated group and a hydrosilane compound having an epoxy group and/or an oxetane group.

Abstract: Fluorine-containing silicon compounds having the general formula (1): wherein X1, X2, and X3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R1 and R2 are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.

Abstract: An organic material having a 6-member ring structure represented by the following formulae (I), wherein: ring A, ring B, and ring C each include substituted or un-substituted aromatic rings comprising 6 to 60 carbon atoms, or substituted or un-substituted heteroaromatic rings comprising 4 to 60 carbon atoms, and ring A and ring C form a fused aromatic or heteroaromatic structure; X is a carbon atom, a nitrogen atom, a sulfur atom, a silicon atom, an oxygen atom, a phosphorus atom, a selenium atom, or a germanium atom.

Abstract: The invention relates to polysiloxanes of the general formula (I) [M?Dn]3T, ??(I) in which: M? is XSiY2O1/2 D is SiY2O2/2 T is SiZO3/2 and a process for the preparation thereof and their use as additives in aqueous surfactant-containing formulations.

Abstract: It is an object of the invention to provide a novel ?-conjugated polymer compound capable of expecting an application as a functional material having a solubility, a heat resistance, an electrochemical activity and a fluorescence, and a method for producing the same. A dihalide is represented by the following formula: (wherein R1 represents a halogen, R2 represents an alkyl group or a silyl group having a substituent, and R3 represents a hydrogen or an alkyl group).

Abstract: Methods of sealing a semiconductor element are provided. The methods includes the steps of coating a semiconductor element mounted on a gold-plated printed circuit board with a curable silicone resin, and then curing the curable silicone resin. In a method, the gold-plated printed circuit board is subjected to preliminary treatment with a treatment agent including an acid anhydride group-containing alkoxysilane and/or a partial hydrolysis-condensation product thereof In another method, the curable silicone resin includes the treatment agent. The methods yield favorable adhesion upon sealing.

Abstract: A composition comprising (A) polycycloolefin-functional polysiloxane represented by the following average compositional formula (1) wherein R1 is a monovalent organic group which does not have an unsaturated bond and may be different from each other, k is the number of 0 or larger, n is the number of from 0.01 to less than 4, m is the number of from 0 to less than 4, provided that the sum of m and n is larger than 0 and less than 4, (B) a siloxane having an SiH bond represented by the following average compositional formula (2) in such an amount that a molar ratio of the SiH bond to the unsaturated bond in the component (A) ranges from 0.1 to 10, HSiR2aO(4-a)/2 ??(2) wherein R2 is a monovalent organic group and a is the number larger than 0 and less than 4, and (C) an addition reaction catalyst in a catalytic amount.

Abstract: A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.

Abstract: The present invention relates to an epoxy group-containing silicon compound which is obtained by condensing at least one epoxy group-containing alkoxy silicon compound per se represented by the general formula (1a): R1aSi(OR2)3, wherein R1a denotes a substituent having an epoxy group and R2 denotes an alkyl group having at most 4 carbons, or said compound and at least one substituted alkoxy silicon compound represented by the general formula (1b): R1bSi(OR3)3, wherein R1b denotes an alkyl group having at most 10 carbons, an aryl group or an unsaturated aliphatic residue and R3 denotes an alkyl group having at most 4 carbons, in the presence of a basic catalyst.

Abstract: The invention provides an ink-jet ink including a fluorine-containing compound (C) in the form of fluorosilsesquioxane having an organic group having 1 to 100 carbon atoms.

Abstract: [Problems] To provide a novel alkoxysilane having a diol protected, an organosilicon resin which has a diol and the composition of which can be easily regulated, and to processes for producing these. [Means for solving problems] The alkoxysilane is an organosilicon compound represented by the following formula (1). The organosilicon resin having a diol is one obtained by hydrolyzing-condensing this compound with a multifunctional alkoxysilane. (In the formula, each of R1, R2 and R3 is an alkyl group or an alkoxy group each having carbon number from 1 to 6. R4 is an alkylene group having carbon number from 2 to 6. Z is an alkylene group having carbon number from 1 to 3.) The alkoxysilane of the present invention can be produced by a hydrosilylation reaction of a compound represented by the following formula (4) and a silane compound R1R2R3SiH. (In the formula, Z is an alkylene group having carbon number from 1 to 3 and R5 has a carbon-carbon double bond at the terminal.

Abstract: A spiro-based compound containing cyclopentaphenanthrene and fluorene, which is used for an organoelectroluminescent device and an organoelectroluminescent device having the spiro-based compound. The spiro-based compound containing cyclopentaphenanthrene and fluorene can be easily manufactured to have high solubility, high color purity, and good thermal stability. The spiro-based compound containing cyclopentaphenanthrene and fluorene is suitable as a substance for an organic film, in particular, an emission layer of an organoelectroluminescent device. Further, the spiro-based compound containing cyclopentaphenanthrene and fluorene can be used as an organic dye, or an electron material such as a non-linear optical material.

Abstract: The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.