Silicon Containing Carboxylic Acid Or Derivative Or From A Silicon Derivative Of A Nonsilicon Containing Carboxylic Acid Patents (Class 528/41)
  • Patent number: 9085662
    Abstract: The present invention is directed to a series of citrate ester emulsifiers that are effective in making water in oil (regular emulsions) and oil in water (invert emulsions) and contain a silicone portion that provides better spreadability and skin aesthetics. In addition to being outstanding emulsifiers, these emulsifiers provide unique solubility, liquidity and outstanding feel when applied to the skin, making them highly desirable in cosmetic emulsions.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: July 21, 2015
    Assignee: SurfaTech Corporation
    Inventor: Thomas George O'Lenick
  • Patent number: 9018332
    Abstract: A methacryloxy group- or acryloxy group-containing polyorganosiloxane in which a methacryloxy group or acryloxy group is bonded to a silicon atom in the polyorganosiloxane across a long-chain alkylene group or poly(alkyleneoxy)-long chain-alkylene group having 11 to 20 carbon atoms. A method of producing this methacryloxy group- or acryloxy group-containing polyorganosiloxane, in which a silicon-bonded hydrogen atom-containing polyorganosiloxane is addition reacted in the presence of a hydrosilylation reaction catalyst with a 1-alkenyl methacrylate or a 1-alkenyl acrylate or a 1-alkenyloxypolyalkylene glycol methacrylate or a 1-alkenyloxypolyalkylene glycol acrylate.
    Type: Grant
    Filed: January 14, 2009
    Date of Patent: April 28, 2015
    Assignee: Dow Corning Toray Company, Ltd.
    Inventors: Tadashi Okawa, Eiji Ando
  • Publication number: 20150112011
    Abstract: Curable compositions of “resin-linear” organosiloxane block copolymers comprising a metal ligand complex are disclosed. The addition of a metal ligand complex to compositions of certain resin-linear organosiloxane block copolymers results in curable compositions having faster cure rates, and improved mechanical strength and/or thermal stability over similar compositions without the metal ligand complex.
    Type: Application
    Filed: March 14, 2013
    Publication date: April 23, 2015
    Inventor: Steven Swier
  • Patent number: 9006373
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: April 14, 2015
    Assignee: International Business Machines Corporation
    Inventors: Phillip J. Brock, Qinghuang Lin, Robert D. Miller, Alshakim Nelson, Jitendra S. Rathore, Ratnam Sooriyakumaran
  • Patent number: 8981031
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: March 17, 2015
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Miller, Alshakim Nelson, Jitendra S. Rathore, Ratnam Sooriyakumaran
  • Patent number: 8957136
    Abstract: There is provided an epoxy group-containing silicone condensate that yields cured products with excellent transparency, thermal resistance and gas barrier properties. An epoxysilicone condensate which is the product of hydrolytic condensation of an epoxy group-containing alkoxysilane compound represented by formula (1): and an alkoxysilane compound represented by formula (2): Si(OR12)mR134-m??(2) wherein when the number of moles of the epoxy group-containing alkoxysilane compound (1) is x and the number of moles of the alkoxysilane compound (2) is y, 0.2?my/nx?0.7, a curable composition comprising the condensate, and a cured product of the composition.
    Type: Grant
    Filed: August 8, 2011
    Date of Patent: February 17, 2015
    Assignee: Showa Denko K.K.
    Inventors: Masanao Hara, Hiroshi Uchida
  • Patent number: 8946371
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: February 3, 2015
    Assignee: International Business Machines Corporation
    Inventors: Phillip J. Brock, Blake W. Davis, Qinghuang Lin, Robert D. Miller, Alshakim Nelson, Jitendra S. Rathore, Ratnam Sooriyakumaran
  • Publication number: 20150011723
    Abstract: Organosilicon compounds used for production of hydrophilic surfaces are prepared via an addition reaction of epoxy-functional silanes onto polyethylene glycols, cross-linked via a condensation reaction, and used for modification of substrate surfaces such as hardened silicone elastomers, glass surfaces, surfaces of silicatic construction materials, metals, and plastics.
    Type: Application
    Filed: February 26, 2013
    Publication date: January 8, 2015
    Inventors: Marko Prasse, Uwe Scheim
  • Patent number: 8921505
    Abstract: The present invention relates to a method for preparing poly(organic oxidized silicon) particles having UV-absorbing groups, including reacting an organoalkoxysilane precursor having a UV-absorbing group selected from a group consisting of organotrialkoxysilane, diorganoalkoxysilane and a mixture thereof, in the presence of a base, with a silane compound selected from a group consisting of tetraalkoxysilane, alkyltrialkoxysilane, tetraalkoxysilane, aryltrialkoxysilane, dialkyldialkoxysilane, diaryldialkoxysilane, arylalkyldialkoxysilane and a mixture thereof, serving as a crosslinking regulator and UV stability enhancer, so as to prepare poly(organic oxidized silicon) particles selected from a group consisting of polysilsesquioxane, silsesquioxane-siloxane copolymer, silsesquioxane-silica copolymer, silsesquioxane-siloxane-silica copolymer and silsesquioxane-siloxane copolymer, having UV-absorbing groups.
    Type: Grant
    Filed: July 15, 2011
    Date of Patent: December 30, 2014
    Assignee: Nano and Micro Technologies Co., Ltd.
    Inventors: Young Baek Kim, Goo Jin Jeong, In Whan Kim
  • Patent number: 8906990
    Abstract: Disclosed is a surface treatment agent for galvanized steel sheets, which comprises epoxy-containing silane derivates, alkyl-containing silane derivates, alkoxy silane derivates and one or more selected from the group consisting of a cationic polymer aqueous dispersion, a non-ionic polymer aqueous dispersion and a water-soluble polymer. Also disclosed is a method for producing it, which comprises mixing each component uniformly for 0.5 to 8 hours at 5 to 70° C. Further provided are galvanized steel sheets coated with the surface treatment agent on the surface and a production method thereof. The surface treatment agent for galvanized steel sheets has excellent corrosion resistance, alkali resistance, solvent resistance, recoating property, high temperature resistance and electrical conductivity.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: December 9, 2014
    Inventors: Frank Wan, Jimmy Zhang, Kevin Meagher
  • Patent number: 8829140
    Abstract: Disclosed herein is a process for the production of a polysiloxane-polyorgano block copolymer. The process includes reacting a reaction mixture containing (a) an ester-functional polydiorganosiloxane and (b) a bisphenolic compound or a bisphenolic compound oligomer. This process has the advantage of yielding block copolymers with controlled block structures and avoiding the impurities that may be carried over from the conventional hydroxyaryloxy-terminated-polydiorganosiloxanes.
    Type: Grant
    Filed: May 16, 2012
    Date of Patent: September 9, 2014
    Assignee: Momentive Performance Materials Inc.
    Inventors: John M. Huggins, Hubertus Eversheim
  • Patent number: 8828640
    Abstract: This invention relates to a photo-curing polysiloxane composition including a polysiloxane, a quinonediazidesulfonic acid ester, a methylene alkoxyaryl-containing compound as a curing agent, and a solvent for dispersing the polysiloxane, the quinonediazidesulfonic acid ester, and the methylene alkoxyaryl-containing compound. This invention also provides a protecting film made from the photo-curing polysiloxane composition, and an element containing the protecting film.
    Type: Grant
    Filed: November 7, 2012
    Date of Patent: September 9, 2014
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Publication number: 20140242787
    Abstract: Disclosed is a photosensitive resin composition which exhibits positive or negative photosensitivity and is used as a mask in an ion implantation step, the photosensitive resin composition including, as a resin, (A) a polysiloxane. The photosensitive resin composition of the present invention has high heat resistance and is capable of controlling a pattern shape, and also has excellent ion implantation mask performance, thus enabling application to a low-cost high-temperature ion implantation process.
    Type: Application
    Filed: December 21, 2012
    Publication date: August 28, 2014
    Applicant: TORAY Industries, Inc.
    Inventors: Takenori Fujiwara, Yugo Tanigaki, Mitsuhito Suwa
  • Patent number: 8816000
    Abstract: The invention relates to coatings having a contact angle hysteresis with water measured by the sessile drop method of at most 20°.
    Type: Grant
    Filed: February 22, 2010
    Date of Patent: August 26, 2014
    Assignee: Henkel AG & Co. KGaA
    Inventors: Haitao Rong, Peter Greiwe, Jürgen Groll, Christine Mohr, Marina Glesius, Martin Möller
  • Publication number: 20140206812
    Abstract: A reactive, non-hydrolyzable silane. The silane comprises a quaternary silicon atom and first and second terminal groups. Each of the first and second terminal groups is chemically bonded to the quaternary silicon atom and is selected from a group consisting of cyanate ester, epoxide, episulfide, acrylate, alkene, styrenic, maleimide, phthalonitrile, acetylene, aryl ethynylene, benzoxazine, anthracene, aniline, trifluorovinyl ether, and perfluorocyclobutyl.
    Type: Application
    Filed: January 24, 2013
    Publication date: July 24, 2014
    Applicant: Government of the United States as Represented by the Secretary of the Air Force
    Inventor: Government of the United States as Represented by the Secretary of the Air Force
  • Patent number: 8772407
    Abstract: Disclosed are one-component low temperature, moisture curable, storage stable coating compositions that include a silanol-functional silicone; an alkoxy-functional silicone; a flexibilizer comprising a reaction product of two or more reactants; and a curing agent selected from amines, aminosilanes, ketimines, aldimines, and combinations thereof. Also disclosed are substrates at least partially coated with a coating deposited from such a composition and methods for coating substrates with such compositions.
    Type: Grant
    Filed: September 16, 2008
    Date of Patent: July 8, 2014
    Assignee: PPG Industries Ohio, Inc.
    Inventor: Norman R. Mowrer
  • Patent number: 8759467
    Abstract: A process for producing a polyurethane, which comprises using a polyester polyol (a-1), a polyether polyol (b), an isocyanate compound (c) and a chain extender (d) as a raw material to produce a polyurethane, wherein the polyester polyol (a-1) is a polyester polyol (a-1) obtained by forming an ester bond between either a carboxyl group of a polycarboxylic acid (i-1) having a polysiloxane framework and a plurality of carboxyl groups or an ester group of a polycarboxylic acid ester (i-2) having a polysiloxane framework and a plurality of ester groups, and a hydroxyl group of a polyether polyol (ii).
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: June 24, 2014
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Takanori Taniguchi, Haruhiko Kusaka, Youko Nakagawa, Daisuke Hirooka, Hisashi Nagahama
  • Patent number: 8728624
    Abstract: A fixing material includes a silane compound polymer as the main component, the silane compound polymer being produced by condensing a silane compound mixture that includes at least one silane compound (1) shown by the following formula (1): R1Si(OR2)p(X1)3-p (wherein R1 represents a group including an ester structure or a cyanoalkyl group, R2 represents an alkyl group having 1 to 6 carbon atoms or the like, X1 represents a halogen atom, and p is an integer from 0 to 3), and at least one silane compound (2) shown by the following formula (2): Si(OR3)q(X2)4-q (wherein R3 represents an alkyl group having 1 to 6 carbon atoms, X2 represents a halogen atom, and q is an integer from 0 to 4). A sealed optical device includes an optical device that is sealed with a cured product of the fixing material. The fixing material produces a cured product that exhibits high hardness, excellent transparency and heat resistance, and rarely undergoes coloration even when subjected to high-energy light or heat for a long time.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: May 20, 2014
    Assignee: Lintec Corporation
    Inventors: Takashi Tamada, Mikihiro Kashio
  • Patent number: 8703881
    Abstract: A curable composition of ionic silicones includes a silicone having the formula M1aM2bM3cD1dD2eD3fT1gT2hT3iQj having ionic groups and crosslinking functional groups. The composition can further include polyorganosiloxane having the average compositional formula R26nR27o(OH)pSiO(4-n-o-p)/2, organohydrogenoligosiloxane or organohydrogenpolysiloxane that has the average compositional formula HqR28rSiO(4-q-r)/2 a transition metal catalyst and other components such as UV stabilizer, cure accelerator, pigment, dye, antimicrobial agent, biocide, surfactant, functional or non-functional filler, conductive filler, finely divided surface treated/untreated metal oxides, clay, plasticizers, tackifiers, mold release agents, adhesion promoters, compatibilizers, pharmaceutical excipients, surfactants or antistatic agents.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: April 22, 2014
    Assignee: Momentive Performance Materials Inc.
    Inventors: Anubhav Saxena, Srividhya Marimuthu, Pranav Ramchandra Joshi, Alok Sarkar
  • Patent number: 8658738
    Abstract: A curable resin composition, comprising 100 parts by mass of a (meth)acrylic polymer (A) having, at a terminal thereof, at least one crosslinkable silyl group; 0.1 to 100 parts by mass of a diamine compound (B) having a monovalent or bivalent aliphatic or alicyclic hydrocarbon group that has 8 or more carbon atoms and may be branched and having at least one primary amino group; and 0.1 to 100 parts by mass of a diamine compound (C) having a monovalent aliphatic or alicyclic hydrocarbon group that has 8 or more carbon atoms and may be branched, and having a crosslinkable silyl group and/or a (meth)acryloyl group.
    Type: Grant
    Filed: June 24, 2009
    Date of Patent: February 25, 2014
    Assignee: Kaneka Corporation
    Inventors: Jun Kotani, Nobuyuki Kobayashi, Hiroyuki Hosoda, Kazunori Ishikawa
  • Patent number: 8586689
    Abstract: A polymer including a structural unit represented by the following Chemical Formula 1, and a composition and a film including the same are provided. In the above formula at least one of Ra and Rb is either Chemical Formula 3 or Chemical Formula 4, as shown below. The polymer also includes units selected from polyamic acid, polyimide, polyaramid, polyamide, polyurethane, polycarbonate and polyacetal units and mixtures of such units.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: November 19, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young Suk Jung, Yoo Seong Yang, Tai Gyoo Park, Sang Mo Kim, Eun Seog Cho
  • Publication number: 20130266338
    Abstract: The present invention provides an electrophotographic member capable of more definitely suppressing occurrence of a C set image. The electrophotographic member has a surface layer including a modified polysiloxane having a structure represented by the following formula (1). In the formula (1), G represents a bivalent group having an ethylene oxide chain represented by (—O—C2H4—) and L represents polysiloxane having at least a SiO4/2(Q) unit or a SiO3/2(T) unit.
    Type: Application
    Filed: June 4, 2013
    Publication date: October 10, 2013
    Inventors: Tomohito Taniguchi, Hiroshi Mayuzumi, Yusuke Yagisawa
  • Publication number: 20130210236
    Abstract: The present invention provides a silicon-containing surface modifier wherein the modifier contains one or more of a repeating unit shown by the following general formula (A) and a partial structure shown by the following general formula (C).The present invention has an object to provide a resist underlayer film applicable not only to a negatively developed resist pattern formed by a hydrophilic organic compound but also to a conventional positively developed resist pattern formed by a hydrophobic compound.
    Type: Application
    Filed: January 22, 2013
    Publication date: August 15, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Shin-Etsu Chemical Co., Ltd.
  • Patent number: 8487062
    Abstract: The present invention provides a polyimidesilicone having a primary alcoholic hydroxyl group, which is represented by the following general formula (1): in which k and m are each a positive integer where k and m satisfy a relation of 0.01?k/(k+m)<1; and X, Y and W are as those defined in the specification.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: July 16, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Shohei Tagami, Hideto Kato
  • Patent number: 8481669
    Abstract: A molding material which can produce cured products with long-lasting excellent transparency and heat resistance, a sealing material in which the molding material is used, and a sealed optical element are provided. The molding material comprises a polysilsesquioxane compound with a ladder structure having a repeating unit of the following formula (I) in the molecule as a major component. wherein R1 represents a group shown by the formula AO—(CH2)r— (wherein A indicates a protective group for a hydroxyl group and r is an integer of 1 to 10), R2 represents a substituted or unsubstituted phenyl group, a substituted or unsubstituted (excluding substitution with OA in the above formula) alkyl group having 1 to 20 carbon atoms, or an alkenyl group having 2 to 20 carbon atoms, and l, m, and n individually represent 0 or an arbitrary integer, provided that l and n are not 0 at the same time.
    Type: Grant
    Filed: June 17, 2008
    Date of Patent: July 9, 2013
    Assignee: Lintec Corporation
    Inventor: Mikihiro Kashio
  • Publication number: 20130137795
    Abstract: There is provided an epoxy group-containing silicone condensate that yields cured products with excellent transparency, thermal resistance and gas barrier properties. An epoxysilicone condensate which is the product of hydrolytic condensation of an epoxy group-containing alkoxysilane compound represented by formula (1): and an alkoxysilane compound represented by formula (2): Si(OR12)mR134-m??(2) wherein when the number of moles of the epoxy group-containing alkoxysilane compound (1) is x and the number of moles of the alkoxysilane compound (2) is y, 0.2?my/nx?0.7, a curable composition comprising the condensate, and a cured product of the composition.
    Type: Application
    Filed: August 8, 2011
    Publication date: May 30, 2013
    Applicant: SHOWA DENKO K.K.
    Inventors: Masanao Hara, Hiroshi Uchida
  • Patent number: 8398964
    Abstract: Provided are an organopolysiloxane that exhibits good dispersion stability within not only organic oil agents but also cosmetic materials that contain a powder, and is able to produce a cosmetic material that exhibits excellent skin affinity, an organopolysiloxane that does not impart a sticky feeling, and exhibits excellent skin affinity and skin adhesion, and a cosmetic material including such an organopolysiloxane. The organopolysiloxane is represented by formula (1) below: in which R1 represents a hydrocarbon group such as an alkyl group, R2 represents a group represented by formula (3) or formula (4) below: in which either R4 represents a specific hydrocarbon group and R5 represents a hydrogen atom or a specific hydrocarbon group, or alternatively, at least one of R4 and R5 represents a hydroxyalkyl group, and A represents a group containing an organosilyl group or organosiloxane residue.
    Type: Grant
    Filed: July 27, 2010
    Date of Patent: March 19, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masanao Kamei, Toshiki Tanaka
  • Patent number: 8389663
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Grant
    Filed: October 8, 2009
    Date of Patent: March 5, 2013
    Assignee: International Business Machines Corporation
    Inventors: Phillip Joe Brock, Qinghuang Lin, Robert Dennis Miller, Alshakim Nelson, Jitendra Singh Rathore, Ratnam Sooriyakumaran
  • Publication number: 20130053512
    Abstract: The present invention relates to a contamination inhibitor containing at least one polyorganosiloxane that has silicon-bonded functional groups and that has a number average molecular weight of 3,000 to 500,000 in terms of standard polystyrene as determined by gel permeation chromatography and a silicon-bonded functional group equivalent (a number average molecular weight per mol of the silicon-bonded functional groups) of 3,000 to 500,000 on average. The contamination inhibitor of the present invention can effectively prevent or reduce adhesion of adhering substances on the surface of a substrate even under high temperature conditions, and exhibits superior stability, since the modified silicone having functional groups is used.
    Type: Application
    Filed: February 15, 2011
    Publication date: February 28, 2013
    Inventors: Kazuhiko Kojima, Masaru Ozaki, Tsunehito Sugiura, Seiji Hori
  • Patent number: 8377634
    Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: February 19, 2013
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Gregory Scott Becker, Sina Maghsoodi, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
  • Patent number: 8344088
    Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: January 1, 2013
    Assignee: Honeywell International Inc.
    Inventors: Joseph T. Kennedy, Teresa Baldwin-Hendricks
  • Publication number: 20120298299
    Abstract: A silane-functional polyester of formula (I): wherein Y is an n-valent residue of a polyester P which is solid at room temperature and terminated by hydroxy groups, after removal of n hydroxy groups; R1 is a linear or branched, monovalent carbon residue having 1 to 12 carbon atoms, optionally having one or more C—C multiple bonds and/or having optionally cycloaliphatic and/or aromatic portions; R2 is an acyl residue or a linear or branched, monovalent hydrocarbon residue having 1 to 12 carbon atoms, optionally having one or more C—C multiple bonds and/or having optionally cycloaliphatic and/or aromatic portions; R3 is a linear or branched, divalent hydrocarbon residue having 1 to 12 carbon atoms, optionally having cyclic and/or aromatic portions, and optionally having one or more heteroatoms; the index a has a value of 0, 1 or 2; and the index n has a value of 1 to 3.
    Type: Application
    Filed: November 28, 2011
    Publication date: November 29, 2012
    Applicant: SIKA TECHNOLOGY AG
    Inventors: Daniele Rutz, Marcel Oertli, Barbara Jucker
  • Patent number: 8304161
    Abstract: A silsesquioxane resin comprised of the units (Ph(CH2)rSiO(3-x)/2(OR?)x)m, (HSiO(3-x)/2(OR?)x)n?(MeSiO(3-x)/2(OR?)x)o?(RSiO(3-x)/2(OR?)x)p, (R1SiO(3-x)/2(OR?)x)q where Ph is a phenyl group, Me is a methyl group; R? is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from an aryl sulfonate ester group; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.95; n has a value of 0.05 to 0.95; o has a value of 0.05 to 0.95; p has a value of 0.05 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q=1.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: November 6, 2012
    Assignee: Dow Corning Corporation
    Inventors: Michael L. Bradford, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
  • Publication number: 20120245242
    Abstract: The invention relates to polyurethane prepolymers, to a method for the production thereof, and the use thereof as binding agents for adhesives, coatings, or foams.
    Type: Application
    Filed: December 6, 2010
    Publication date: September 27, 2012
    Applicant: Bayer Intellectual Property GmbH
    Inventors: Evelyn Peiffer, Mathias Matner
  • Patent number: 8198390
    Abstract: A water soluble functional polyethylene glycol-grafted polysiloxane polymer comprising a polysiloxane backbone and polyethylene glycol side chains is provided having the general formula: wherein A is selected from the group consisting of hydrogen, methyl, methoxy and functional polyethylene glycol based chains, B is a functional group for binding biologically-sensitive materials, D is a functional group for binding to a substrate, m is from 3 to 5, v is from 0 to 5, w is from 4 to 11, x is from 0 to 35 and z is from 1 to 33. In order to be water soluble, the polysiloxane polymer h the following properties: x+y+z is from 8 to 40, n is from 8 to 30, and y is from 7 to 35.
    Type: Grant
    Filed: April 19, 2010
    Date of Patent: June 12, 2012
    Assignee: IMEC
    Inventors: Cheng Zhou, Gustaaf Borghs, Wim Laureyn
  • Patent number: 8168741
    Abstract: The present invention relates to novel silicon-based polymers, particularly silicon-based polymers having citrate groups, and their use as chelating agents, for forming nanostructures, as surfactants, as reducing agents and as stabilizers.
    Type: Grant
    Filed: August 2, 2006
    Date of Patent: May 1, 2012
    Assignees: Joint Intellectual Property Policy of McMaster University, Alcon Research, Ltd.
    Inventors: Michael Brook, Ferdinand Gonzaga, Hongjian Tian, Howard Ketelson
  • Patent number: 8142896
    Abstract: The invention relates to an optical article, for example, an ophthalmic lens, comprising at least one multilayer anti-reflective coating on a transparent substrate made from organic or mineral glass. Said coating comprises successively and starting at the substrate, a layer of material with high refractive index (HI), made from a hybrid organic/inorganic matrix within which are dispersed particles of mineral oxide or chalcogenide with a diameter of 2 to 50 nm and a layer of material with low refractive index (BI), obtained by hardening of a composition comprising at least one silane precursor (I) with 4 hydrolysable groups and at least one fluorosilane precursor (II), said second composition comprising at least 10% in mass of fluorine in a theoretical dry extract and with a molar ratio I/I+II greater than 80%.
    Type: Grant
    Filed: June 23, 2009
    Date of Patent: March 27, 2012
    Assignee: Essilor International (Compagnie Generale d'Optique)
    Inventors: John Biteau, Myriam Fanayar, Nathalie Massart, Dominique Rychel
  • Patent number: 8026035
    Abstract: A composition includes a copolymer including a mixture of monomeric units having structures (A), (B), and (C), and one or more of structures (D) or (E): HSiO(3-a)/2(OH)a??(A) Si(3-b)/2(OH)b—CH2)n—SiO(3-c)/2(OH)c??(B) R1SiO(3-d)/2(OH)d??(C) MeSi(3-e)/2(OH)e??(D) R2SiO(3-f)/2(OH)f??(E) wherein a, b, c, d, e, and f are independently from 0 to 2, n is from 0 to about 10, R1 is a chromophore, and R2 is a hydrophilic group.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: September 27, 2011
    Assignee: Cheil Industries, Inc.
    Inventors: Shahrokh Motallebi, SangHak Lim
  • Patent number: 8013094
    Abstract: A gelling agent comprising an organopolysiloxane having a silicon-bonded organic group represented by general formula: R1—X—CO—NH—[X—N(—CO—X—R1)]p—X— (1) (wherein R1 designates a group containing metal salt of a carboxylic acid represented by formula —COO? (Mn+)1/n (where M is a metal that has a valence of 1 or higher); X's designate the same or different C2 to C14 bivalent hydrocarbon groups; and p designates an integer from 0 to 10.). Preferably, the organosiloxane has an optionally substituted C9 or more univalent hydrocarbon group. And a gelatinous composition comprising: (A) 1 to 99 wt. % of aforementioned gelling agent; and (B) 99 to 1 wt. % of a compound selected from the group consisting of a silicone oil, a no-polar organic compound, or a low-polar organic compound, or mixtures thereof. The gelatinous composition has excellent thermal stability, temporal stability, and properties of thixotropic rheology.
    Type: Grant
    Filed: June 21, 2006
    Date of Patent: September 6, 2011
    Assignee: Dow Corning Toray Company, Ltd.
    Inventors: Tadashi Okawa, Tomohiro Iimura
  • Patent number: 7973120
    Abstract: Organosilicon compounds containing at least one silicon-bonded radical of the formula (E1)xZ—Y—C(O)—CR4?C(CH2R4)—NR2—R1— are prepared by reacting the analogous ketoester or tautomer thereof with an amino functional organosilicon compound.
    Type: Grant
    Filed: November 23, 2006
    Date of Patent: July 5, 2011
    Assignee: Wacker Chemie AG
    Inventor: Christian Herzig
  • Patent number: 7960459
    Abstract: The present invention has its object to provide a curable composition which comprises a reactive silyl group-containing organic polymer, does not contain, as a silanol condensation catalyst, any organotin type curing catalyst currently of concern because of the toxic feature thereof, is excellent in surface curability and depth curability and, further, can provide cured products excellent in adhesiveness; the above object can be achieved by a curable composition which comprises: an organic polymer (A) containing a silicon-containing group capable of crosslinking under siloxane bond formation; and a guanidine compound (B-1), as a silanol condensation catalyst (B), represented by the general formula (1): R1N?C(NR12)2??(1) (wherein one of the five R1s is an aryl group and the other four R1s each independently is a hydrogen atom or a hydrocarbon group in which the carbon atom at position 1 is saturated).
    Type: Grant
    Filed: February 9, 2007
    Date of Patent: June 14, 2011
    Assignee: Kaneka Corporation
    Inventors: Noriko Noro, Toshihiko Okamoto, Ayako Yano, Yoshikazu Morii
  • Publication number: 20110124532
    Abstract: Fluorinated compounds represented by formula Rf-Q-X—[Si(R)f(R1)3-f]g. Each Rf is independently a partially fluorinated or fully fluorinated group selected from Rfa-(O)r-CHF—(CF2)n-; [Rfb-(O)t-C(L)H—CF2—O]m-W—; CF3CFH—O—(CF2)p-; CF3—(O—CF2)z-; and CF3—O—(CF2)3—O—CF2—. Methods of treating a surface or a hydrocarbon-bearing formation using the fluorinated compounds and treated articles and treated hydrocarbon-bearing formations are also disclosed.
    Type: Application
    Filed: July 16, 2009
    Publication date: May 26, 2011
    Inventors: Andreas R. Maurer, Harald Kaspar, Kai H. Lochhaas, Michael Juergens, Michael S. Terrazas, Miguel A. Guerra, Rudolf J. Dams, Tilman C. Zipplies, Zai-Ming Qiu, Klaus Hintzer, Werner Schwertfeger
  • Publication number: 20110083887
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Application
    Filed: October 8, 2009
    Publication date: April 14, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phillip Joe Brock, Blake W. Davis, Qinghuang Lin, Robert Dennis Miller, Alshakim Nelson, Jitendra Singh Rathore, Ratnam Sooriyakumaran
  • Patent number: 7914897
    Abstract: A composition for coating comprising at least one compound of formula (I): R<a>Si(R<1>)n(X<1>)3-n, and optionally at least one compound of formula (II): R<b>Si(R<2>)m(X<2>)3-m, wherein R<a> is a straight-chain or branched C(1-24) alkyl group, R<b> is an aromatic group, such as an optionally substituted carbocyclic and heterocyclic group comprising five-, six- or ten-membered ring systems, which is linked by a single covalent bond or a spacer unit, such as a straight-chain or branched alkyl residue having 1 to 8 carbon atoms, to the Si- atom, R<1> and R<2> are, independently of each other a lower alkyl group, such as a straight chain and branched hydrocarbon radical having 1 to 6 carbon atoms, X<1> and X<2> are independently of each other a hydrolysable group, such as a halogen or an alkoxy group and n, m are independently of each other 0 or 1, with the proviso that if n and m are independently of each other 0 or 1, X may represent the sam
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: March 29, 2011
    Assignee: University of Zurich
    Inventors: Jan Zimmermann, Stefan Seeger, Georg Artus, Stefan Jung
  • Patent number: 7915330
    Abstract: A silicone fluid comprising a chromophore-substituted polyorganosiloxane having a formula (2): wherein x is an integer in the range of 60 to 2000; y is an integer in the range of 5 to 100; a ratio x:y is in a range of about 10:1 to about 20:1; and X is a photostabilizing chromophore.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: March 29, 2011
    Assignee: Hallstar Innovations Corp.
    Inventors: Craig A. Bonda, Anna Pavlovic, Anthony J. O'Lenick, Jr.
  • Patent number: 7897671
    Abstract: A method of making a golf ball comprising a core and a cover layer, wherein at least one of the core or cover layer comprises homo and copolymers of poly(dimethyl siloxane) ionomers, and their blends for improved resiliency and abrasion resistant golf balls.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: March 1, 2011
    Assignee: Acushnet Company
    Inventors: Murali Rajagopalan, Michael J. Sullivan, Kevin M. Harris
  • Patent number: 7897670
    Abstract: A golf ball comprising a core and a cover layer, wherein at least one of the core or cover layer comprises homo and copolymers of poly(dimethyl siloxane) ionomers, and their blends for improved resiliency and abrasion resistant golf balls.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: March 1, 2011
    Assignee: Acushnet Company
    Inventors: Murali Rajagopalan, Michael J. Sullivan, Kevin M. Harris
  • Publication number: 20110046337
    Abstract: A coating includes the reaction product of (a) a hybrid copolymer incorporating (i) a first monomer including a hydroxy-functional organoacrylate and (ii) a second monomer including an organoalkoxysilane and (b) a second material including an organofunctional alkoxysilane. The first monomer can be a hydroxy functional acrylate and/or a hydroxyalkylacrylate. The second monomer can be a trialkoxysilane. The second material can be a trialkoxysilane.
    Type: Application
    Filed: August 19, 2009
    Publication date: February 24, 2011
    Applicant: PPG INDUSTRIES OHIO, INC.
    Inventors: John D. Basil, Robert M. Hunia, Laura B. McGrady
  • Publication number: 20110027213
    Abstract: Provided are an organopolysiloxane that exhibits good dispersion stability within not only organic oil agents but also cosmetic materials that contain a powder, and is able to produce a cosmetic material that exhibits excellent skin affinity, an organopolysiloxane that does not impart a sticky feeling, and exhibits excellent skin affinity and skin adhesion, and a cosmetic material including such an organopolysiloxane. The organopolysiloxane is represented by formula (1) below: in which R1 represents a hydrocarbon group such as an alkyl group, R2 represents a group represented by formula (3) or formula (4) below: in which either R4 represents a specific hydrocarbon group and R5 represents a hydrogen atom or a specific hydrocarbon group, or alternatively, at least one of R4 and R5 represents a hydroxyalkyl group, and A represents a group containing an organosilyl group or organosiloxane residue.
    Type: Application
    Filed: July 27, 2010
    Publication date: February 3, 2011
    Inventors: Masanao KAMEI, Toshiki Tanaka
  • Patent number: 7834083
    Abstract: Disclosed is a nanocomposite composition, comprising transparent nanoparticles, a matrix polymer including a polydimethylsiloxane resin and an epoxy group-containing polydimethylsiloxane resin, and a siloxane dispersant including a head part having an affinity for the transparent nanoparticles and a tail part having an affinity for the polydimethylsiloxane resin. The nanocomposite composition of this invention can be effectively used in the encapsulation layer of a light emitting diode or in an optical film.
    Type: Grant
    Filed: May 14, 2007
    Date of Patent: November 16, 2010
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Hyeon Jin Shin, Jae Young Choi, Seong Jae Choi, Seon Mi Yoon