Plural Bicyclo Ring Systems Each Having A Hetero Ring As One Of The Cyclos Patents (Class 549/547)
  • Patent number: 10287389
    Abstract: A room temperature or low temperature curable epoxy formulation including a) an epoxy component including at least one epoxy resin and b) a hardener component including at least one compound of formula (I) wherein X is a divalent hydrocarbon group, which optionally contains one or more heteroatoms, and n is 0, 1, 2 or 3, preferably 0 or 1, and/or at least one epoxy-amine adduct, which is a reaction product of the compound of formula (I) and an epoxy compound selected from at least one of a monoepoxide and a polyepoxide, as a curing agent. The compounds of formula (I) and the epoxy-amine adduct are suitable as curing agents for epoxy formulations which provide good surface properties and good cure speed, even at low temperature curing. In particular, amine blushing can be avoided or reduced to a large extent, when these curing agents are used.
    Type: Grant
    Filed: February 24, 2015
    Date of Patent: May 14, 2019
    Assignee: SIKA TECHNOLOGY AG
    Inventors: Claus Urban, Nina Schäffeler
  • Patent number: 10077332
    Abstract: Curable composition comprising at least one epoxy resin and at least one curing agent selected from derivatives of 5-hydroxymethylfurfural. Curable dispersion, curable prepolymer composition and process for manufacturing it. Process for the manufacture of an epoxy thermoset, epoxy thermoset and method for adhering at least two substrates.
    Type: Grant
    Filed: July 3, 2014
    Date of Patent: September 18, 2018
    Assignee: Rhodia Operations
    Inventor: Stephane Jeol
  • Publication number: 20150133629
    Abstract: There is provided a diepoxy compound that can be polymerized to form a cured product having thermal stability that has excellent heat resistance, and can maintain excellent mechanical properties even if exposed to a high temperature environment. The saturated diepoxy compound of the present invention is represented by the following formula (1) and can be produced by hydrogenating the unsaturated bond of an unsaturated diepoxy compound represented by the following formula (2). In the following formulas, R1 to R20 are each an independent group and identically or differently represent a hydrogen atom, a methyl group, or an ethyl group.
    Type: Application
    Filed: April 2, 2013
    Publication date: May 14, 2015
    Applicant: DAICEL CORPORATION
    Inventors: Kyuhei Kitao, Hideyuki Takai, Michihiro Sugahara
  • Publication number: 20140357836
    Abstract: Provided are: a novel triepoxy compound capable of forming, through polymerization, a cured article having excellent heat resistance; a production method thereof; a curable composition including the triepoxy compound; and a cured article obtained by curing the curable composition. The triepoxy compound according to the present invention is represented by Formula (1). The triepoxy compound represented by Formula (1) may be obtained typically by oxidizing a compound represented by Formula (2) with an oxidizing agent. In Formulae (1) and (2), R1 to R2° are the same as or different from one another and each represent hydrogen atom, methyl group, or ethyl group.
    Type: Application
    Filed: September 4, 2012
    Publication date: December 4, 2014
    Applicant: DAICEL CORPORATION
    Inventors: Kyuhei Kitao, Hideyuki Takai, Michihiro Sugahara
  • Patent number: 8455061
    Abstract: An optically active compound having a polymerizable group which is represented by formula (1) or (2). P1-Q1-(A1-Z1)m—X1—(Z1-A1)m-Q1-P2??(1) P1-Q1-(A1-Z1)m—X2??(2) For example, A1 is independently divalent group having ring; Z1 is independently bonding group; m is independently an integer from 1 to 5; Q1 is independently alkylene having 1 to 20 carbons; X1 is a divalent group having chirality; X2 is a monovalent group having chirality, and P1 and P2 are polymerizable groups; and concerns a polymerizable liquid crystal composition, a polymer, an optical device and an article.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: June 4, 2013
    Assignees: JNC Corporation, JNC Petrochemical Corporation
    Inventors: Daisuke Ootsuki, Junichi Inagaki
  • Patent number: 8445174
    Abstract: Disclosed are photo sensitizers that include a polyol moiety covalently bonded to a fused aromatic moiety. Also disclosed is a method for improving UV laser ablation performance of a coating, such as a cationic UV curable coating, by incorporating an oxalyl-containing additive into the cationic UV curable or other coating. Oxalyl-containing sensitizers having the formula Q-O—C(O)—C(O)—O—R1 wherein Q represents a fused aromatic moiety and R1 is an alkyl or aryl group, are also disclosed, as are oxalyl-containing oxetane resins, oxalyl-containing polyester polyols, and cationic UV curable coating formulations that include oxalyl-containing additives.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: May 21, 2013
    Assignee: NDSU Research Foundation
    Inventors: Dean C. Webster, Zhigang Chen
  • Patent number: 8425988
    Abstract: The main aim of the invention is to provide a polymerizable compound that is excellent in the stability of a liquid crystal phase, a polymerizable liquid crystal composition, and an anisotropic polymer in which the optical anisotropy can be adjusted and a uniform orientation is excellent. An anisotropic polymer having a uniform orientation formed by polymerization of a paint film that was prepared by application of a polymerizable liquid crystal composition including a compound represented by formula (1) having a benzyl ester moiety in the minor axis direction of the molecule to a supporting substrate; wherein at least one of Ra is a polymerizable group, A is a divalent cyclic-structure group, B is phenyl that may have a substituent, Y and Z are a single bond or alkylene, and m and n are an integer from 0 to 5.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: April 23, 2013
    Assignees: JNC Corporation, JNC Petrochemical Corporation
    Inventors: Yoshiharu Hirai, Takashi Kato
  • Patent number: 8404316
    Abstract: A polymerizable liquid crystal compound represented by formula (1): wherein Al and A2 are each a cyclic-structure group; Z1 is a bonding group; m is an integer from 0 to 5; P1 is a polymerizable group represented by formula (2-1); Q1 is alkylene having 1 to 20 carbons; P2 is a polymerizable group represented by any one of formula (2-1) to formula (2-4), hydrogen, fluorine, chlorine, —CN, —CF3, —OCF3, alkyl having 1 to 20 carbons or alkoxy having 1 to 20 carbons; Q2 is a group defined in Q1 when P2 is a polymerizable group and, and Q2 is a single bond when P2 is not a polymerizable group; and in formula (2-2) to formula (2-4), Ra is hydrogen, halogen or alkyl having 1 to 5 carbons.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: March 26, 2013
    Assignees: JNC Corporation, JNC Petrochemical Corporation
    Inventors: Daisuke Ootsuki, Junichi Inagaki
  • Patent number: 8389752
    Abstract: Embodiments in accordance with the present invention provide alicyclic diepoxide compounds and methods for forming such compounds. Such methods encompass charging a reaction vessel with an appropriate diene and an appropriate dienophile and causing such to react to form and recover a desired alicyclic diepoxide precursor where such precursor is subsequently epoxidized. Such compounds encompass alicyclic diepoxides having purities of at least 95 percent or at least 98 percent with respect non-isomeric residues and are essentially free of any isomeric alicyclic diepoxide residues.
    Type: Grant
    Filed: October 13, 2009
    Date of Patent: March 5, 2013
    Assignee: Peomerus LLC
    Inventors: Andrew Bell, Dane Jablonski, Elaine Koronich, Yumiko Yamanoi, Yoshiaki Fukunishi, Kazunobu Senoo
  • Patent number: 8247615
    Abstract: The present invention is concerned with a process to convert xanthophyll esters derived from Capsicum sources to their free (non-esterified) forms. The present invention is concerned with a process for obtaining Capsicum derived xanthophylls that meet the finished product needs for purity, yield, ease of use, industrial compatibility and cost that are required to make product suitable for the nutritional supplement, food and beverage industries. The present invention is concerned with a process which yields from 60 to 80%, of xanthophyll materials and nearly quantitative recovery of all input xanthophylls, which xanthophylls are of high purity. The present invention concerns a method to obtain xanthophyll esters present almost exclusively in the trans form when isolated from the natural plant sources. The present invention concerns a process to re-convert cis product back to the more desired trans form.
    Type: Grant
    Filed: May 14, 2010
    Date of Patent: August 21, 2012
    Assignee: Kalamazoo Holdings, Inc.
    Inventors: Mark Reilly, Josh James Tuinstra, Lucas Chadwick, Mark Porter, James Barren, Gregory S. Reynhout
  • Patent number: 8114567
    Abstract: Disclosed are photosensitizers that include a polyol moiety covalently bonded to a fused aromatic moiety. Also disclosed is a method for improving UV laser ablation performance of a coating, such as a cationic UV curable coating, by incorporating an oxalyl-containing additive into the cationic UV curable or other coating. Oxalyl-containing sensitizers having the formula Q-O—C(O)—C(O)—O—R1, wherein Q represents a fused aromatic moiety and R1 is an alkyl or aryl group, are also disclosed, as are oxalyl-containing oxetane resins, oxalyl-containing polyester polyols, and cationic UV curable coating formulations that include oxalyl-containing additives.
    Type: Grant
    Filed: April 21, 2007
    Date of Patent: February 14, 2012
    Assignee: NDSU Research Foundation
    Inventors: Dean C. Webster, Zhigang Chen
  • Publication number: 20110282083
    Abstract: The present invention is concerned with a process to convert xanthophyll esters derived from Capsicum sources to their free (non-esterified) forms. The present invention is concerned with a process for obtaining Capsicum derived xanthophylls that meet the finished product needs for purity, yield, ease of use, industrial compatibility and cost that are required to make product suitable for the nutritional supplement, food and beverage industries. The present invention is concerned with a process which yields from 60 to 80%, of xanthophyll materials and nearly quantitative recovery of all input xanthophylls, which xanthophylls are of high purity. The present invention concerns a method to obtain xanthophyll esters present almost exclusively in the trans form when isolated from the natural plant sources. The present invention concerns a process to re-convert cis product back to the more desired trans form.
    Type: Application
    Filed: May 14, 2010
    Publication date: November 17, 2011
    Applicant: KALAMAZOO HOLDINGS, INC.
    Inventors: Mark Reilly, Josh James Tuinstra, Lucas Chadwick, Mark Porter, James Barren, Gregory S. Reynhout
  • Patent number: 8017795
    Abstract: Disclosed are coating formulations that include a copolyester and a vinyl ether in which the copolyester is produced by copolymerizing a monomer composition that includes a fused aromatic diacid monomer, an unsaturated diacid monomer, and a polyol. Also disclosed are methods for producing a laser-ablatable film on a surface of a substrate. The method includes coating the substrate with a coating formulation that includes a copolyester and a vinyl ether and polymerizing the coating formulation. The copolyester includes a fused aromatic moiety covalently bonded therein. Novel radiation curable sensitizers that can be used in the preparation of radiation curable polymer films having improved laser ablation properties are also described.
    Type: Grant
    Filed: April 21, 2006
    Date of Patent: September 13, 2011
    Assignee: NDSU Research Foundation
    Inventors: Dean C. Webster, Zhigang Chen, Neena Ravindran
  • Publication number: 20110147657
    Abstract: The main aim of the invention is to provide a polymerizable compound that is excellent in the stability of a liquid crystal phase, a polymerizable liquid crystal composition, and an anisotropic polymer in which the optical anisotropy can be adjusted and a uniform orientation is excellent. An anisotropic polymer having a uniform orientation formed by polymerization of a paint film that was prepared by application of a polymerizable liquid crystal composition including a compound represented by formula (1) having a benzyl ester moiety in the minor axis direction of the molecule to a supporting substrate; wherein at least one of Ra is a polymerizable group, A is a divalent cyclic-structure group, B is phenyl that may have a substituent, Y and Z are a single bond or alkylene, and m and n are an integer from 0 to 5.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 23, 2011
    Applicants: CHISSO CORPORATION, CHISSO PETROCHEMICAL CORPORATION
    Inventors: Yoshiharu HIRAI, Takashi KATO
  • Publication number: 20100249341
    Abstract: Disclosed is an alicyclic diepoxy compound which gives a cured article suffering from no deterioration in properties even when used in hot and humid surroundings or used under such conditions as to give a strong acid, which is highly reactive upon curing, and which gives a cured article superior typically in thermal stability. Specifically, the alicyclic diepoxy compound includes a 3,4,3?,4?-diepoxybicyclohexyl compound represented by following Formula (1): wherein R1 to R18 each represent a hydrogen atom, a halogen atom, a hydrocarbon group which may have an oxygen atom or a halogen atom, or a substituted or unsubstituted alkoxy group, in which the alicyclic diepoxy compound contains isomers of the 3,4,3?,4?-diepoxybicyclohexyl compound in a content of less than 20% based on the total of the 3,4,3?,4?-diepoxybicyclohexyl compound and the isomers thereof in terms of peak area ratio as determined by gas chromatography.
    Type: Application
    Filed: June 29, 2007
    Publication date: September 30, 2010
    Inventors: Atsushi Sato, Hideyuki Takai, Hisashi Maeshima, Kyuhei Kitao
  • Patent number: 7732627
    Abstract: A high-purity cycloaliphatic diepoxy compound of General Formula (II) is an epoxidized product of a cycloaliphatic diolefinic compound of General Formula (I) having an isomer content as detected in gas chromatography (GC) of 15% or less: wherein X represents a bivalent group selected from the group consisting of, for example, O, S, —SO—, —SO2—, —CH2—, and —C(CH3)2—; and R1 to R18 may be the same as or different from each other and each represent hydrogen atom, a halogen atom, a hydrocarbon group which may contain oxygen atom or a halogen atom, or an alkoxy group which may be substituted. Such a high-purity cycloaliphatic diepoxy compound is prepared by producing the cycloaliphatic diolefinic compound through distillation, epoxidizing the compound with an aliphatic percarboxylic acid containing substantially no water, carrying out desolvation, and further purifying the epoxidized compound through distillation.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: June 8, 2010
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Hideyuki Takai, Hiroto Tanigawa, Katsuya Maruo
  • Publication number: 20100094030
    Abstract: Embodiments in accordance with the present invention provide alicyclic diepoxide compounds and methods for forming such compounds. Such methods encompass charging a reaction vessel with an appropriate diene and an appropriate dienophile and causing such to react to form and recover a desired alicyclic diepoxide precursor where such precursor is subsequently epoxidized. Such compounds encompass alicyclic diepoxides having purities of at least 95 percent or at least 98 percent with respect non-isomeric residues and are essentially free of any isomeric alicyclic diepoxide residues.
    Type: Application
    Filed: October 13, 2009
    Publication date: April 15, 2010
    Applicant: Promerus LLC
    Inventors: Andrew Bell, Dane Jablonski, Elaine Koronich, Yumiko Yamanoi, Yoshiaki Fukunishi, Kazunobu Senoo
  • Patent number: 7615656
    Abstract: Is disclosed a cycloaliphatic polyepoxy compound represented by following Formula (1): wherein Y represents a linkage group or a single bond; and HAs each represent hydrogen atom at the junction between cyclohexane ring and oxirane ring, and the cyclohexane rings may each further have one or more substituents in addition to the groups shown in the formula. The cycloaliphatic polyepoxy compound contains stereoisomers in such proportions as to have a ratio A/B of 1.8 or more, wherein “A” and “B” are integrated intensities of signals of protons at the junction between cyclohexane ring and oxirane ring as determined by 1H-NMR spectroscopy of the compound, in which “A” represents the integrated intensity of a signal observed at a lower magnetic field, and “B” represents the integrated intensity of a signal observed at a higher magnetic field.
    Type: Grant
    Filed: June 28, 2007
    Date of Patent: November 10, 2009
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Takashi Kubo, Tatsuya Nakano, Takahiro Iwahama
  • Patent number: 7569699
    Abstract: This invention provides a process for producing an epoxytriazole derivative represented by formula (2): (wherein R and Ar are defined below), which comprises a step including a reaction of an epoxy derivative represented by formula (1?): (wherein R represents a hydrogen atom or C1-12 alkyl group and Ar represents an aromatic group optionally substituted by a halogen atom(s) or trifluoromethyl group(s), and X? represents a hydroxy group or leaving group), with 1,2,4-triazole in the presence of a base and water.
    Type: Grant
    Filed: November 29, 2005
    Date of Patent: August 4, 2009
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Taro Ishibahsi, Hideo Muraoka, Tadashi Mizuno
  • Publication number: 20090041945
    Abstract: An active ray curable composition comprising a compound represented by Formula (X):
    Type: Application
    Filed: March 15, 2006
    Publication date: February 12, 2009
    Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
    Inventors: Kimihiko Ookubo, Norio Miura, Takeshi Kurata
  • Publication number: 20080241742
    Abstract: A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
    Type: Application
    Filed: March 24, 2008
    Publication date: October 2, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Wataru HOSHINO, Hideaki TSUBAKI, Masahiro YOSHIDOME
  • Publication number: 20080180501
    Abstract: This invention provides an actinic ray curable composition, which exhibits excellent storage stability, low viscosity, high sensitivity and can form cured film having high hardness and superior weather-proofing under various environments particularly even under a high humidity atmosphere, and actinic ray curable ink utilizing the same, an image forming method utilizing said actinic ray curable ink as ink-jet ink, an ink-jet recording apparatus and a new epoxy compound. An actinic ray curable composition of this invention is characterized by containing at least one type of an epoxy compound represented by following Formula (X) and at least one type of an oxetane compound as a photo polymerizable compound and having a viscosity at 25° C. of 1-500 mPa·s.
    Type: Application
    Filed: November 21, 2005
    Publication date: July 31, 2008
    Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
    Inventors: Kimihiko Ookubo, Norio Miura, Takeshi Kurata
  • Patent number: 6784300
    Abstract: Disclosed is a holographic recording medium. The novel holographic recording mediums disclosed herein comprises: a) at least one polyfunctional epoxide monomer or oligomer which undergoes acid initiated cationic polymerization. Each epoxide in the monomer or oligomer is linked by group comprising a siloxane to a silicon atom and each monomer or oligomer has an epoxy equivalent weight of greater than about 300 grams/mole epoxide; b) a binder which is capable of supporting cationic polymerization; c) an acid generator capable of producing an acid upon exposure to actinic radiation; and optionally d) a sensitizer.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: August 31, 2004
    Assignee: Aprilis, Inc.
    Inventors: Erdem A. Cetin, Richard A. Minns, David A. Waldman
  • Patent number: 6774250
    Abstract: The invention relates to the process for the preparation of liquid reaction products of cycloaliphatic epoxides with mono- or multifunctional hydroxy compounds. The process comprises reacting a polyfunctional cycloaliphatic epoxy resin with a mono- or multifunctional hydroxy compound in the presence of a heterogeneous surface-active catalyst. The invention also relates to curable compositions containing the product obtained by the process.
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: August 10, 2004
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: Kevin B. Hatton, Pauline G. Barker, Claus W. Rabener, Christiane Rabener
  • Patent number: 6740193
    Abstract: In accordance with the present invention, there are provided gem-diesters and epoxidized derivatives thereof. When cured, thermosets comprising invention gem-diesters and epoxidized derivatives thereof have thermally and/or chemically labile gem-diester groups interspersed throughout the crosslinked network. Thus, thermosets based on invention gem-diesters and epoxidized derivatives thereof can be easily reworked thermally or chemically by treatment with dilute acidic or basic solutions. Further provided by the present invention are adhesive compositions comprising invention gem-diesters and epoxidized derivatives thereof.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: May 25, 2004
    Assignee: Henkel Corporation
    Inventors: John G. Woods, Jianzhao Wang, Jean M. J. Fréchet
  • Patent number: 6570029
    Abstract: A no-flow reworkable epoxy underfill is provided for use in an electronic packaged system which incorporates an integrated circuit, an organic printed wire board, and at least one eutectic solder joint formed therebetween. An exemplary embodiment of the encapsulant includes: a cycloaliphatic epoxide; an organic hardener; a curing accelerator; and a fluxing agent wherein said cycloaliphatic epoxide includes a carbonate or carbamate group. The encapsulant can also include a filler, such as a silica filler. A method is also provided for forming the aforementioned reworkable epoxy underfills.
    Type: Grant
    Filed: May 17, 2001
    Date of Patent: May 27, 2003
    Assignee: Georgia Tech Research Corp.
    Inventors: Lejun Wang, Haiying Li, Ching-Ping Wong
  • Patent number: 6498260
    Abstract: A reworkable epoxy underfill is provided for use in an electronic packaged system which incorporates an integrated circuit, an organic printed wire board, and at least one eutectic solder joint formed therebetween. An exemplary embodiment of the encapsulant includes: a cycloaliphatic epoxide; an organic hardener; and a curing accelerator; wherein said cycloaliphatic epoxide includes a carbonate or carbamate group. The encapsulant can also include a filler, such as a silica filler. A method is also provided for forming the aforementioned reworkable epoxy underfills.
    Type: Grant
    Filed: March 29, 2001
    Date of Patent: December 24, 2002
    Assignee: Georgia Tech Research Corp.
    Inventors: Lejun Wang, Haiying Li, Ching-Ping Wong
  • Patent number: 6429281
    Abstract: In accordance with the present invention there are provided cycloaliphatic epoxy compounds and thermosetting resin compositions prepared therefrom. Inventive compounds are based on polycyclic hydrocarbon backbones, as illustrated by the following exemplary structure: wherein: each R is independently lower alkyl or halogen, n′″ is 1 up to about 8, and each x is independently 0, 1, or 2. Inventive compounds provide resins with desirable characteristics such as, for example, hydrophobicity, high Tg values, ionic purity, hydrolytic stability, and the like.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: August 6, 2002
    Assignee: Loctite
    Inventors: Stephen M. Dershem, Frank G. Mizori
  • Patent number: 6423853
    Abstract: Continuous processes for converting cycloalkenes into ozonides in which ozone is reacted with a cycloalkene to form an ozonide solution. A portion of the solution is recycled back to the reaction, and additional cycloalkene is provided.
    Type: Grant
    Filed: September 24, 2001
    Date of Patent: July 23, 2002
    Assignee: E. I. du Pont de Nemours & Comp.
    Inventors: Edward F. Moran, Jr., Chester Arthur Thayer, II
  • Patent number: 6245828
    Abstract: The present invention is directed to polymerizable dental compositions containing a) 3 to 80 wt. % of cycloaliphatic epoxides; b) 0 to 80 wt. % of an epoxide or a mixture of epoxides which are different from a); c) 3 to 85 wt. % of a filer material; d) 0.01 to 25 wt. % of initiators, inhibitors and/or accelerators; e) 0 to 25 wt. % of auxiliary agents, the individual percentages of which are in relation to the total weight. The new polymerizable agents are particularly suited as dental material.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: June 12, 2001
    Assignee: ESPE Dental AG
    Inventors: Wolfgang Weinmann, Oswald Gasser, Rainer Guggenberger, Gunther Lechner, Wolfgang Soglowek, Joachim Zech
  • Patent number: 6160077
    Abstract: Halogen-free epoxy resins that arise from the addition of an epoxy component to a phenol component with base catalysis are disclosed, whereby the molar mass can be adjusted by means of the molar ratios of the initial materials. The resulting resins can be used in the field of electronics, both as molding compounds and as circuit board materials and adhesives.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: December 12, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Heiner Bayer, Walter Fischer, Wilhelm Hekele, Ernst Wipfelder
  • Patent number: 6084111
    Abstract: Compounds having the formula ##STR1## wherein X is selected from O, (CH.sub.2).sub.m O, S, (CH.sub.2).sub.m S, NH, (CH.sub.2).sub.m NH, COO.sup.-, (CH.sub.2).sub.m COO.sup.-, .sup.- OOC and .sup.- OOC (CH.sub.2).sub.m ;m is 1 to 6;n is 1 to 100;R.sub.1 is selected from H, (C.sub.1 -C.sub.20) alkyl, (C.sub.1 -C.sub.20) alkoxy and (C.sub.1 -C.sub.20) ester; andA is a saturated organic linking group selected from residues of polyol, polythiol, polyamine, and polyacid, are prepared by reacting compounds according to formula II ##STR2## with hydrogen peroxide in the presence of (a) tungstic acid or its metal salts, (b) phosphoric acid or its metal salts, and (c) at least one phase transfer catalyst.
    Type: Grant
    Filed: April 17, 1998
    Date of Patent: July 4, 2000
    Assignee: Sartomer Technologies Inc.
    Inventors: Mingxin Fan, Gary W. Ceska, James Horgan, Henri Strub
  • Patent number: 6075155
    Abstract: Disclosed are compounds of the formulas ##STR1## which are useful as monomers in photopolymerizable compositions. Also disclosed are methods of polymerizing these monomers, and polymers produced thereby.
    Type: Grant
    Filed: June 22, 1998
    Date of Patent: June 13, 2000
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James V. Crivello
  • Patent number: 5948922
    Abstract: Compounds containing two cyclic hydrocarbon moieties which are substituted to provide crosslinking functionality and which are linked to each other by secondary or tertiary oxycarbonyl containing moiety are basis for compositions which are cured to provide cured thermosets for encapsulation and underfill for electronic components that are thermally decomposable to allow repair, replacement, recovery or recycling of operative electronic components from assemblies that are inoperative.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: September 7, 1999
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Christopher K. Ober, Hilmar Koerner
  • Patent number: 5767150
    Abstract: Compounds having the formula ##STR1## wherein X is selected from O, (CH.sub.2).sub.m O, S, (CH.sub.2).sub.m S, NH, (CH.sub.2).sub.m NH, COO.sup.-, (CH.sub.2).sub.m COO.sup.-, .sup.- OOC and .sup.- OOC (CH.sub.2).sub.m ;m is 1 to 6;n is 1 to 100;R.sub.1 is (C.sub.1 -C.sub.20) ester; andA is a saturated organic linking group selected from residues of polyol, polythiol, polyamine, and polyacid, are prepared by reacting compounds according to formula II ##STR2## with hydrogen peroxide in the presence of (a) tungstic acid or its metal salts, (b) phosphoric acid or its metal salts, and (c) at least one phase transfer catalyst.
    Type: Grant
    Filed: April 10, 1997
    Date of Patent: June 16, 1998
    Assignee: Sartomer Company
    Inventors: Mingxin Fan, Gary W. Ceska, James Horgan, Henri Strub
  • Patent number: 5736620
    Abstract: Epoxy resins containing rodlike mesogenic moieties are prepared from phenolic hydroxyl containing compounds which contain such moieties.
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: April 7, 1998
    Assignee: The Dow Chemical Company
    Inventors: Jimmy D. Earls, Robert E. Hefner, Jr., Paul M. Puckett
  • Patent number: 5674965
    Abstract: A compound of Formula (1): ##STR1## wherein: X is E--(L.sup.4 O).sub.m --CO--(T).sub.p ;Y is --Si(R.sup.1).sub.3 or X as defined above;T is O, CH.sub.2 or NR.sup.2 ;P is 0 or 1;q is 0, 1, 2, 3 or 4;E comprises an alicyclic or aliphatic epoxy group;each L.sup.1, L.sup.2, L.sup.3 and L.sup.4 independently is an unsubstituted or substituted alkylene group of 1 to 6 carbon atoms wherein any substitution is selected from methyl, amino, ester, hydroxy and ester groups;m is 0 or 1;each R.sup.1 when Y is --Si(R.sup.1).sub.3 is independently unsubstituted alkyl or substituted alkoxy provided that at least one R.sup.1 is unsubstituted alkoxy; andeach R.sup.2 independently is H, --L.sup.1 X unsubstituted or substituted alkyl wherein any substitution is selected from poly(oxyalkylene), epoxy and hydrolyzable silyl groups, or --CONH(C.sub.1-20 -alkyl). The compounds are useful in coating compositions and films and coatings formed therefrom.
    Type: Grant
    Filed: May 12, 1995
    Date of Patent: October 7, 1997
    Assignee: Zeneca Limited
    Inventors: John Gerard Carey, John Christopher Padget, David Alan Pears
  • Patent number: 5306748
    Abstract: Fluorine-modified thermosetting reins are available as phenolic or epoxy resins having trifluoromethyl groups and a naphthalene skeleton in a molecule. They are useful as components of resin compositions or resin modifiers and cure to products having low water pickup, low coefficient of thermal expansion, and adhesion as well as heat resistance and mechanical strength. Thermosetting resin compositions having such a thermosetting resin blended therein are useful in semiconductor element packaging.
    Type: Grant
    Filed: July 29, 1992
    Date of Patent: April 26, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Hisashi Shimizu, Manabu Narumi
  • Patent number: 5169965
    Abstract: A composition comprising a lactone-modified alicyclic compound (I), or an epoxidized lactone-modified alicyclic compound (II) of the following formulae: ##STR1## wherein R is an alkyl group, an aromatic group or an alkenyl group having carbon number of from 1 to 30, Y.sup.1 is at least one of the structural groups; ##STR2## Y.sup.2 is at least one of the structural group; ##STR3## X is the structural group; ##STR4## R.sup.4 and R.sup.b each independently is hydrogen or a methyl group, c and c' represent a number of from 4 to 8, from n1 to nL represents 0 or a number of more than 0, respectively, and n1+n2+n3+. . . +nL corresponds to the total mole numbers of a lactone introduced into one molecule.These compositions can be made into a heat-curable composition, a photo-curable composition, a polymerizable composition and another photo-curable composition.
    Type: Grant
    Filed: July 10, 1991
    Date of Patent: December 8, 1992
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Takaaki Fujiwa, Shin Takemoto, Tomohisa Isobe, Yoshiyuki Harano
  • Patent number: 5068293
    Abstract: The invention relates to naphthol-based epoxy resins of the general formula (I) ##STR1## in which A is a naphthalene nucleus, R is hydrogen or methyl, and n is an integer from 0 to 15, naphthol aralkyl resins which are intermediates for said epoxy resins, a process for the preparation of said naphthol aralkyl resins, and epoxy resin compositions containing said naphthol-based epoxy resins which are highly heat- and moisture-resistant, possess excellent impact strength and other mechanical properties, and are useful for such applications as lamination, molding, casting, and adhesion.
    Type: Grant
    Filed: August 30, 1990
    Date of Patent: November 26, 1991
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Masashi Kaji, Takanori Aramaki, Norito Nakahara, Yasuharu Yamada
  • Patent number: 4533713
    Abstract: Compounds containing (a) a fluoroaliphaticsulfonamido moiety, and (b) a moiety containing (1) at least two oxirane groups, (2) at least two non-terminal N-.beta.-hydroxyalkylene groups, or (3) at least one oxirane group and at least one non-terminal N-.beta.-hydroxyalkylene group. The compound is capable of being cured with a curing agent to give a cured product having excellent water resistance and oil resistance.
    Type: Grant
    Filed: May 6, 1983
    Date of Patent: August 6, 1985
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Richard D. Howells
  • Patent number: 4336201
    Abstract: A process for the preparation of an electrically conductive polyene, wherein a polyene which contains one or more chain members of the formula where R is hydrogen or methyl, and which contains a total of not less than seven aliphatic double bonds, is treated, in the absence of moisture and of oxygen, with a strong Lewis acid having a pk.sub.a of from -10 to +4, or with an alkali metal.
    Type: Grant
    Filed: November 3, 1980
    Date of Patent: June 22, 1982
    Assignee: BASF Aktiengesellschaft
    Inventors: Franz Feichtmayr, Herbert Naarmann, Joachim Paust, Klaus Penzien