A Silicon Halide Reacted With A Hydroxy Or Oxirane-containing Compound (h Of Hydroxy May Be Replaced By A Substituted Or Unsubstituted Ammonium Ion Or A Group Ia Or Iia Light Metal) Patents (Class 556/471)
  • Patent number: 9340560
    Abstract: What is described is a process for continuously esterifying halosilanes of the formula I with alcohols of the formula II to give silane esters of the formula III in a single column (1) R1aSiHalb??(I) R2—(OH)??(II) R1aS—(OR2)b??(III) in which R1 is hydrogen or a monovalent organic radical, where any two R1 radicals within a molecule may be different within the scope of the given definitions, Hal is a halogen atom, a plurality of Hal atoms within a molecule may be different within the scope of the given definitions, R2 is a monovalent organic radical, a and b are integers from 0 to 4 and the sum total of a and b is 4, comprising the measures of: i) feeding the total amount of the halosilane of the formula I required for the reaction in liquid form through line (6) into the upper third of the column (1), ii) feeding at least 60% by weight of the alcohol of the formula II required for the reaction in liquid form through line (7) into the upper third of the column (1), iii) feeding the remainder of the a
    Type: Grant
    Filed: January 16, 2014
    Date of Patent: May 17, 2016
    Assignee: Evonik Degussa GmbH
    Inventors: Stefan Bade, Norbert Schladerbeck, Andre Nehls
  • Patent number: 9200014
    Abstract: The invention relates to a process for dechlorinating alkylsilanes and siloxanes, and also to the use of basic anion exchanger resins for dechlorinating alkyl silanes and alkylsiloxanes.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: December 1, 2015
    Assignee: Evonik Degussa GmbH
    Inventors: Burkhard Standke, Mustafa Guezelsahin, Manuel Friedel, Joerg Arndt, Klaus Koellisch
  • Patent number: 8933259
    Abstract: Organosilicon compounds bearing SiOC groups and having low residual silicon-bonded chlorine are prepared continuously by reacting a chlorosilane with alcohol and optionally water by contacting a gaseous phase containing alcohol with a liquid phase containing silane, organosilicon intermediates, organosilicon compounds containing SiOC groups and optional inert solvent in a reaction column in which the gas phase passes through the liquid phase in bubble form, or is provided with a vaporizer operating by a crossflow principle.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: January 13, 2015
    Assignee: Wacker Chemie AG
    Inventors: Volker Stanjek, Nicolas Imlinger, Heribert Westermayer, Wolfgang Wewers
  • Patent number: 8759563
    Abstract: The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.
    Type: Grant
    Filed: November 5, 2012
    Date of Patent: June 24, 2014
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steven Gerard Mayorga, Mark Leonard O'Neill, Kelly A. Chandler
  • Patent number: 8686176
    Abstract: The present invention discloses a method for synthesizing a reversibly protected organometallic compound which comprises (1) reacting an organometallic compound with a hydroxyl group containing compound to produce a solution containing the reversibly protected organometallic compound and hydrogen chloride; (2) reacting the solution containing the reversibly protected organometallic compound and the hydrogen chloride with a trialkyl amine to precipitate the hydrogen chloride from the solution; and (3) recovering the reversibly protected organometallic compound from the solution of the reversibly protected organometallic compound.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: April 1, 2014
    Assignee: University of Akron Research Foundation
    Inventor: Michael F. Deemer
  • Publication number: 20140081038
    Abstract: The present invention relates to an apparatus comprising a) an unbaffled reactor or microreactor having a channel defined by a pathway, and b) an oscillating flow device, wherein the channel pathway comprises a plurality of directional changes. The reactor channel has a hydrolic diameter from 0.1 mm to 10 mm A method of making said apparatus and the use of said apparatus to carry out a process on a suspension is also disclosed.
    Type: Application
    Filed: January 13, 2011
    Publication date: March 20, 2014
    Applicant: DSM IP ASSETS B.V.
    Inventors: Rafael Wilhelmus Elisabeth Ghislain Reintjens, Mehul Thathagar
  • Publication number: 20140005433
    Abstract: Organosilicon compounds bearing SiOC groups and having low residual silicon-bonded chlorine are prepared continuously by reacting a chlorosilane with alcohol and optionally water by contacting a gaseous phase containing alcohol with a liquid phase containing silane, organosilicon intermediates, organosilicon compounds containing SiOC groups and optional inert solvent in a reaction column in which the gas phase passes through the liquid phase in bubble form, or is provided with a vaporizer operating by a crossflow principle.
    Type: Application
    Filed: March 9, 2012
    Publication date: January 2, 2014
    Applicant: WACKER CHEMIE AG
    Inventors: Volker Stanjek, Nicolas Imlinger, Heribert Westermayer, Wolfgang Wewers
  • Patent number: 8569439
    Abstract: A hardener for silicone rubber materials comprising a silane compound which comprises a 2-hydroxy-propionic acid alkyl ester radical.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: October 29, 2013
    Assignee: Nitro-Chemie Aschau GmbH
    Inventors: Theodor Ederer, Thomas Knott, Ulrich Pichl, Gerhard Schmidt, Ludwig Waldmann
  • Patent number: 8507709
    Abstract: The invention relates to a method for producing silicon compounds (A) having hydrocarbon oxy-groups that have at least one unit of the general formula (1) HmSi(OR)n(OR?)oR?pX4-m-n-o-p (1) by conversion of silicon compounds (B) having at least one unit of the general formula (2) Hm+nSi(OR?)oR?pX4-m-n-o-p (2), having an alcohol of the general formula (3) ROH (3) in the presence of a catalyst (K) that is on a carrier material bonded metal selected from Ni, Pd, Pt, wherein per mol formed group OR, at maximum 1 liter of solvent is used and wherein R, R?, R?, X, m, n, o and p have the meanings listed in claim 1.
    Type: Grant
    Filed: March 19, 2010
    Date of Patent: August 13, 2013
    Assignee: Wacker Chemie AG
    Inventors: Michael Stepp, Markus Merget
  • Patent number: 8329933
    Abstract: The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.
    Type: Grant
    Filed: August 8, 2011
    Date of Patent: December 11, 2012
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steven Gerard Mayorga, Mark Leonard O'Neill, Kelly Ann Chandler
  • Patent number: 8247592
    Abstract: Disclosed is a method of storing a fluorine-containing disilanol compound represented by the following formula (3) in the presence of a tertiary amine in such an amount that a molar ratio of the tertiary amine to a silanol group of the fluorine-containing disilanol compound ranges from 0.001 to 20, HO—Z—R1—Rf—R1—Z—OH??(3) wherein Rf is a divalent fluorinated hydrocarbon group or a divalent fluorinated polyether group, R1 may be the same with or different from each other and is a substituted or unsubstituted divalent hydrocarbon group which may have at least one atom selected from the group consisting of oxygen, nitrogen, silicon, and sulfur atoms, and Z is a group represented by the following formula (2) —SiR2R3—??(2) wherein R2 and R3 may be the same with or different from each other and are monovalent organic groups.
    Type: Grant
    Filed: May 19, 2011
    Date of Patent: August 21, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasunori Sakano, Takashi Matsuda, Noriyuki Koike
  • Publication number: 20120116098
    Abstract: The present invention discloses a method for synthesizing a reversibly protected organometallic compound which comprises (1) reacting an organometallic compound with a hydroxyl group containing compound to produce a solution containing the reversibly protected organometallic compound and hydrogen chloride; (2) reacting the solution containing the reversibly protected organometallic compound and the hydrogen chloride with a trialkyl amine to precipitate the hydrogen chloride from the solution; and (3) recovering the reversibly protected organometallic compound from the solution of the reversibly protected organometallic compound.
    Type: Application
    Filed: October 24, 2011
    Publication date: May 10, 2012
    Applicant: UNIVERSITY OF AKRON RESEARCH FOUNDATION
    Inventor: Michael F. Deemer
  • Patent number: 7968741
    Abstract: A method of preparing a disilanol compound by hydrolyzing a dichlorosilane compound having Si—Cl bonds at both ends, characterized in that the method comprises the step of hydrolyzing the dichlorosilane compound in the presence of a tertiary amine compound.
    Type: Grant
    Filed: July 19, 2007
    Date of Patent: June 28, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasunori Sakano, Takashi Matsuda, Noriyuki Koike
  • Publication number: 20090078633
    Abstract: A chromatographic stationary phase for use in reversed-phase chromatography. A process for producing a chromatographic stationary phase for use in reversed-phase chromatography, chromatographic stationary phases prepared according to the methods of the current invention, and liquid chromatography columns, which include the stationary phases, are also provided.
    Type: Application
    Filed: September 21, 2007
    Publication date: March 26, 2009
    Applicant: AGILENT TECHNOLOGIES, INC.
    Inventors: Wu Chen, Alan D. Broske
  • Patent number: 7507850
    Abstract: The present invention relates to a specific process for preparing organosilane esters of the formula (I) and a composition comprising more than 98% by weight of organosilane esters of the formula (I) and less than 2.0% by weight of at least one hydrocarbon and to the use of such a composition as precursor for producing a layer or film having a dielectric constant of 1<??4.
    Type: Grant
    Filed: April 4, 2005
    Date of Patent: March 24, 2009
    Assignee: Degussa AG
    Inventors: Ekkehard Müh, Hartwig Rauleder, Harald Klein
  • Publication number: 20080103324
    Abstract: The invention relates to producing an organo alcoxydialkylsilane by a method which consists in introducing by pouring an alcanol in a dialkylhalogenosilane omega-halogenalkyl+an organic solvent (s) phase mixture and in removing a halogen acid formed by entrainment with the aid of said organic solvent(s) phase and is characterised, in particular (i) by selecting a particular phase of solvent(s), for example based on cyclohexane, (2i) by carrying out an alcanol introduction mode which makes it possible to control the drawing off the halogen acid formed during reaction and by (3i) controlling the halogen acid quantity in a reaction medium. The thus obtained dialkylhalogenosilane omega-halogenalkyl is usable, in particular as an initial product for preparing organosilisic sulphur-containing compounds of general formula (IV) by a sulfidising reaction carried out on a alkali metal polysulfur.
    Type: Application
    Filed: December 10, 2004
    Publication date: May 1, 2008
    Inventors: Virginie Pevere, Kamel Ramdani
  • Patent number: 7339069
    Abstract: A process for continuously preparing compounds containing SiOC groups, in which chlorosilane(s) are partially reacted with alcohol and optionally also with water in a prereactor, and the partial reaction product therefrom is fed to a first reaction unit comprising a column, reacted with alcohol and optionally water to give a crude product which still comprises volatile constituents, and the crude product is transferred to a second reaction unit comprising a column in which alcohol is additionally introduced, and freed there of volatile constituents, optionally in the presence of an unreactive organic solvent, the desired end product being removed at the lower end of the second reaction unit.
    Type: Grant
    Filed: January 17, 2006
    Date of Patent: March 4, 2008
    Assignee: Wacker Chemie AG
    Inventors: Wolfgang Schattenmann, Georg Loher
  • Patent number: 7067688
    Abstract: An acetylene alcohol represented by the following formula, wherein R1 represents a monovalent hydrocarbon radical having 4 to 10 carbon atoms with the carbon atom bonded to the silicon atom being a tertiary carbon, R2 and R3 each represents a monovalent group selected from the group consisting of alkyl groups having 1 to 4 carbon atoms and a fluorinated group represented by the formula, Rf—Q—, wherein Rf is a linear or branched perfluoroalkyl group having 3 to 100 carbon atoms which may be interrupted by one or more ether bonds, and Q is a divalent group having 2 to 10 carbon atoms which may be interrupted by one or more nitrogen, oxygen, or sulfur atoms, and n is zero or 1.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: June 27, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Norivuki Koike, Yasunori Sakano
  • Patent number: 6878839
    Abstract: Alkenylalkoxysilanes such as allyltrimethoxysilane can be made by reacting the corresponding monoalkenyldichlorosilane, i.e., allyldichlorosilane, with a monohydroxy alcohols, i.e., methyl alcohol. No catalyst is required and the reactions can be carried out at room temperature.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: April 12, 2005
    Assignee: Dow Corning Corporation
    Inventors: Binh Thanh Nguyen, John Patrick Cannady
  • Patent number: 6767982
    Abstract: A mixture of organoalkoxysiloxanes of formula I: wherein R and R″ are identical or different and are methyl, ethyl, vinyl, n-propyl, i-propyl, &ggr;-chloropropyl, n-butyl, i-butyl, n-pentyl, i-pentyl, n-hexyl, i-hexyl, n-heptyl, i-heptyl, n-octyl, i-octyl, hexadecyl, octadecyl or alkoxy, R′ represents methyl or ethyl, n and m are identical or different and each is 0 or an integer ranging from 1 to 20, on the condition that (n+m)≧2, is prepared by: reacting in a first stage the constituents of (i) an organotrichlorosilane or a mixture of organotrichlorosilanes or a mixture of at least one organotrichlorosilane and tetrachlorosilane, (ii) water and (iii) alcohol, combined in a molar ratio (i):(ii):(iii) of 1:(0.59 to 0.95):(0.5 to 100), at a temperature of 0 to 150° C.
    Type: Grant
    Filed: November 14, 2001
    Date of Patent: July 27, 2004
    Assignee: Degussa AG
    Inventors: Burkhard Standke, Michael Horn
  • Publication number: 20040143129
    Abstract: A process for producing an alkoxysilane-based compound having the general formula: 1
    Type: Application
    Filed: January 9, 2004
    Publication date: July 22, 2004
    Inventors: Yasunori Sakano, Noriyuki Koike
  • Publication number: 20030104145
    Abstract: The present invention provides a new chemical adsorbent which can form an extremely thin and transparent film in nanometer order which is fixed uniformly and firmly on a substrate, and give an alignment characteristic of high thermal stability to the thin film; as well as a liquid crystal alignment layer and a liquid crystal display device having a desirable alignment characteristic, a superior alignment control force over a liquid crystal molecule, and a superior thermal stability by using the above-mentioned chemical adsorbent. This purpose can be actualized by developing a new compound which is transparent and stable in a range of a visible ray (a wavelength from 400 nm to 700 nm), and has a photosensitivity in a range of an ultraviolet ray and a far-ultraviolet ray (a wavelength from 200 nm to 400 nm), and can form a thin film in a monolayer through a chemisorption on a substrate.
    Type: Application
    Filed: October 21, 2002
    Publication date: June 5, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Tadashi Ohtake, Takaiki Nomura
  • Patent number: 6524715
    Abstract: A thin film forming chemical absorption material including at least a functional group of the formula CF3—CF2—CH2—O—(benzene)—CH=CH—C(O)—(benzene)— and a —SiX group (X represents halogen) as an end group bonded by siloxane bond. The chemical absorption material can form a monomolecular thin-film having photosensitive groups that are transparent and stable in a visible light region and cause photochemical reaction in an ultraviolet region. A liquid crystal alignment film includes an aggregation of adsorption molecules chemically absorbed directly on a surface with electrodes or chemically adsorbed indirectly thereon through another material layer having a characteristic group the formula above and a —O—Si bond group at a molecular end group.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: February 25, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ootake, Kazufumi Ogawa, Takaiki Nomura, Takako Takebe
  • Patent number: 6495221
    Abstract: The present invention provides a new chemical adsorbent which can form an extremely thin and transparent film in nanometer order which is fixed uniformly and firmly on a substrate, and give an alignment characteristic of high thermal stability to the thin film; as well as a liquid crystal alignment layer and a liquid crystal display device having a desirable alignment characteristic, a superior alignment control force over a liquid crystal molecule, and a superior thermal stability by using the above-mentioned chemical adsorbent. This purpose can be actualized by developing a new compound which is transparent and stable in a range of a visible ray (a wavelength from 400 nm to 700 nm), and has a photosensitivity in a range of an ultraviolet ray and a far-ultraviolet ray (a wavelength from 200 nm to 400 nm), and can form a thin film in a monolayer through a chemisorption on a substrate.
    Type: Grant
    Filed: May 18, 1999
    Date of Patent: December 17, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Tadashi Ohtake, Takaiki Nomura
  • Patent number: 6337416
    Abstract: A (polycyclic secondary-amino)dialkoxysilane favorably employable as a catalyst for polymerization of &agr;-olefin can be prepared by reacting tetrachlorosilane, or a mono(C1-C8)alkyltrichlorosilane with a polycyclic secondary-amine in a non-hydrous, non-alcoholic organic solvent in the presence of a hydrogen chloride-trapping reagent, to produce a (polycyclic secondary-amino)chlorosilane and reacting the (polycyclic secondary-amino)chlorosilane with an alkali metal alkoxide or an alkaline earth metal alkoxide in the presence of a lower alcohol.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: January 8, 2002
    Assignee: Ube Industries, Ltd.
    Inventors: Hiroyuki Ikeuchi, Yasuhisa Sakakibara, Masayoshi Oue
  • Patent number: 6323356
    Abstract: The present invention relates to a process for the preparation of alkoxysilanes in which at least one halogenosilane is reacted with at least one alcohol in the presence of metallic magnesium and the alkoxysilane is isolated from the crude product.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: November 27, 2001
    Assignee: Degussa-Huels Aktiengesellschaft
    Inventors: Peter Löwenberg, Thomas Schlosser, Michael Horn, Ralf Laven, Jaroslaw Monkiewicz
  • Patent number: 6242628
    Abstract: Alkoxysilanes are prepared by a process, comprising: (i) reacting a chlorosilane with an alcohol in a water-free and solvent free phase with removal of the liberated hydrogen chloride; (ii) transferring the resultant product mixture into a liquid phase to be distilled and adding a metal alcoholate to the product mixture in the liquid at a temperature in the range from 10-60° C., and thoroughly mixing the neutralized product mixture, said alcoholate being employed in an equimolar amount or in a stoichiometric excess based on the amount of acidic chloride, and (iii) purifying the treated product mixture by distillation under reduced pressure, thereby preparing alkoxysilanes which are low in acidic chloride or essentially free of acidic chloride.
    Type: Grant
    Filed: November 8, 1999
    Date of Patent: June 5, 2001
    Assignee: Degussa-Huels Aktiengesellschaft
    Inventors: Frank Kropfgans, Hartwig Rauleder, Reinhold Schork
  • Patent number: 6150551
    Abstract: A process for preparing an alkoxysilane with an acidic chloride content of less than 10 ppm by weight, comprising:reacting a chlorosilane with an alcohol in a water-free and solvent-free phase to form a product mixture containing alkoxysilane and residual acidic chloride, with removal of resultant hydrogen chloride from the product mixture,then adding liquid or gaseous ammonia, in an amount corresponding to a stoichiometric excess, based on the content of acidic chloride, to form an ammonia-containing product mixture,treating the ammonia-containing product mixture at a temperature between 10 and 50.degree. C., wherein the ammonia and acidic chloride undergo neutralization, to form a crude product, and optionally, then separating off a salt formed in the course of neutralization, from the crude product, andrecovering the alkoxysilane by distilling the crude product.
    Type: Grant
    Filed: November 3, 1999
    Date of Patent: November 21, 2000
    Assignee: Degussa Huels Aktiengesellschaft
    Inventors: Frank Kropfgans, Hartwig Rauleder
  • Patent number: 6150550
    Abstract: A process for preparing alkoxysilanes by reacting alcohols with halosilanes which are dissolved in a nonpolar solvent that is immiscible with the alcohol.
    Type: Grant
    Filed: December 15, 1998
    Date of Patent: November 21, 2000
    Assignee: Huels Aktiengesellschaft
    Inventors: Stefan Bade, Udo Robers
  • Patent number: 6011167
    Abstract: Polyorganosiloxazane is provided which is capable of being converted into a ceramic material having low dielectric constant. The polymer according to the present invention is characterized by comprising the main repeating units of --(RSiN.sub.3)--, --(RSiN.sub.2 O)--, --(RSiNO.sub.2)-- and --(RSiO.sub.3)--, wherein, R represents an alkyl, alkenyl, cycloalkyl, aryl, alkylamino or alkylsilyl group, and by having a number-average molecular weight ranging from 300 to 100,000. The polyorganosiloxazane of the present invention has superior thermal resistance, and a ceramic material obtainable by firing the same at a predetermined temperature shows very low specific dielectric constant of 2.7 or less, making it useful particularly as a material in electronics.
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: January 4, 2000
    Assignee: Tonen Corporation
    Inventors: Yuuji Tashiro, Osamu Funayama
  • Patent number: 5856549
    Abstract: There is provided a novel silane compound, di-sec-butoxy-n-propyl methoxysilane. The aforesaid silane compound is prepared by reacting n-propyl trihalosilane with sec-butanol and then reacting a resultant reaction product with methanol.
    Type: Grant
    Filed: May 1, 1998
    Date of Patent: January 5, 1999
    Assignee: Tonen Corporation
    Inventors: Takayuki Taki, Masashi Nakajima, Kunihiko Imanishi, Masahide Murata
  • Patent number: 5847179
    Abstract: The invention provides high purity alkoxytrimethylsilane fluids of the general formula ROSiMe.sub.3 wherein Me is methyl and R is a monovalent aliphatic hydrocarbon substituent which ranges from 14 to about 20 carbons, the fluid being substantially free of organic and inorganic contaminants, wherein the alkoxytrimethylsilanes are produced by a novel process, and can be readily incorporated into cosmetic formulations containing organic components without heating and provide improved sensory characteristics compared to those provided by the corresponding alcohols.
    Type: Grant
    Filed: October 2, 1997
    Date of Patent: December 8, 1998
    Assignee: PCR, Inc.
    Inventors: Gary E. LeGrow, William I. Latham, III
  • Patent number: 5705590
    Abstract: A water soluble water absorption preventing agent mainly comprising an organic silicon compound and/or its partial hydrolytic condensate, represented by the following general formula: ##STR1## wherein R.sup.1 denotes an alkyl group with 1-20 carbon atoms and with a linear chain or branched chain for which a halogen can substitute for part or all of the hydrogen atoms, R.sup.2 denotes a hydrogen atom or an alkyl group with 1-10 carbon atoms and with a linear chain or branched chain, R.sup.3 denotes a hydrogen atom or an alkyl group with 1-8 carbon atoms and with a linear chain or branched chain, m denotes an integer 1-2 and n denotes an integer 1-3 where m+n=3 or 4, p denotes an integer 1-50, and q denotes an integer 0-25.
    Type: Grant
    Filed: March 26, 1996
    Date of Patent: January 6, 1998
    Assignee: Shin-Etsu Chem. Co., Ltd.
    Inventors: Tomohisa Suzuki, Kenichi Isobe, Mitsuo Asai, Shoji Ichinohe, Akira Yamamoto
  • Patent number: 5596118
    Abstract: The production of organoxy-functional silanes is carried out by the reaction of (A) halosilanes and (B) hydroxy compounds in the presence of (C) a polymer that includes carbon-bonded fluorine. The presence of (C), the polymer that includes carbon-bonded fluorine, acts to decrease foaming during the reaction and minimizes the production of siloxane oligomer by-products.
    Type: Grant
    Filed: November 29, 1995
    Date of Patent: January 21, 1997
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventors: Taku Koyama, Yasushi Sugiura
  • Patent number: 5545255
    Abstract: An ultra thin, water and oil repelling and durable overcoat is easily formed on a substrate surface via covalent bonding by applying a finishing agent of the invention, comprising a chemically adsorptive compound with a chlorosilyl group and a nonaqueous viscous liquid or solid medium, on the substrate surface. A finishing agent, comprising a chemically adsorptive compound with a chlorosilyl group and a nonaqueous viscous liquid or solid medium, is applied on a substrate surface comprising hydrophilic groups. The substrate surface is then reacted with the chemically adsorptive compound at room temperature, and the agent containing unreacted chemically adsorptive compound is removed. The generation of hydrochloric acid gas can be prevented by adding tertiary amine or amide in the molar amount of one to three times more than the chemically adsorptive compound contained in the finishing agent.
    Type: Grant
    Filed: April 21, 1995
    Date of Patent: August 13, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Patent number: 5493044
    Abstract: A process for preparing alkylsilyl and arylsilyl ethers of the formula(R--O--SiR.sup.1 R.sup.2 R.sup.3)wherein R, R1, R2 and R3 are independently selected from the group consisting of hydrogen, alkyl groups containing one to twenty carbon atoms, substituted alkyl groups containing one to twenty carbon atoms, aryl groups containing six to eighteen carbon atoms, substituted aryl groups containing six to eighteen carbon atoms, hetero aryl groups containing four to eighteen carbon atoms, and substituted hetero aryl groups containing four to eighteen carbon atoms, with the proviso that R is never hydrogen, by reacting, in a hydrocarbon solvent, a chlorosilane of the formula R.sup.1 R.sup.2 R.sup.3 Si--Cl wherein R.sup.1, R.sup.2, and R.sup.
    Type: Grant
    Filed: October 20, 1994
    Date of Patent: February 20, 1996
    Assignee: FMC Corporation
    Inventor: James A. Schwindeman
  • Patent number: 5475078
    Abstract: A novel fluorinated organosilicon compound, exhibiting excellent solvent resistance, chemical resistance and mold release, which is represented by general formula (1): ##STR1## wherein Rf is a divalent group represented by general formula (2): ##STR2## wherein Y is a fluorine atom or CF.sub.3 group; l is an integer of 0-8; k and m are integers of 0-4; j and n are integers of 0 or 1; except when j=k=l=m=n=0.
    Type: Grant
    Filed: May 20, 1993
    Date of Patent: December 12, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shinichi Sato, Takashi Matsuda, Kouji Takano, Toshio Takago
  • Patent number: 5374761
    Abstract: A process for the organooxylation of chlorosilanes. The process comprises contacting in a film a chlorosilane and an alcohol capable of forming an ester with the silicon of the chlorosilane and thereby forming an equilibrium mixture comprising an organooxysilane and hydrogen chloride. The film is heated at a temperature sufficient to cause vaporization of the hydrogen chloride from the equilibrium mixture thereby increasing the yield of organooxysilane in the equilibrium mixture. In a preferred process, the process is run in a falling-film type reactor or a wiped-film type reactor.
    Type: Grant
    Filed: April 29, 1994
    Date of Patent: December 20, 1994
    Assignee: Corning Corporation
    Inventor: Howard M. Bank
  • Patent number: 5359114
    Abstract: Novel silane compound, alkoxy cyclopentyl diethoxysilane, is prepared by reacting cyclopentyl trihalosilane with ROH and then with ethanol, or by reacting cyclopentyl triethoxysilane with ROH, wherein alkyl in the alkoxy or R in ROH stands for an organic group selected from tile group consisting of isopropyl, sec-butyl, tert-buryl and tert-amyl groups. The silane compounds are useful as a catalytic component for olefin polymerization and as a silane coupling agent.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: October 25, 1994
    Assignee: Tonen Corporation
    Inventors: Tomoko Aoki, Satoshi Ueki, Tadanao Kohara
  • Patent number: 5326895
    Abstract: 3-(Vinylbenzyloxy)propylsilane compounds represented by the general formula, CH.sub.2 CH.PHI. CH.sub.2 OCH.sub. CH.sub.2 CH.sub.2 SiR.sup.1.sub.n (OR.sup.2).sub.3-n (wherein R.sup.1 and R.sup.2 each represent a hydrocarbon residue containing 1 to 4 carbon atoms, and n represents an integer from 0 to 2) are provided as novel styrene skeleton-containing alkoxysilane compounds which are highly useful as silane coupling agent or polymerizing monomer.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: July 5, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tohru Kubota, Toshinobu Ishihara, Mikio Endo, Katsuhiro Uehara
  • Patent number: 5189194
    Abstract: The present invention is a process for the preparation of hydrido organooxysilanes. The process comprises contacting a chlorosilane having at least one hydrogen atom bonded to the silicon atom with a anhydrous sodium organooxide. In a preferred embodiment, the process comprises adding the anhydrous sodium organooxide to the chlorosilane at a controlled rate. The process is conducted at a temperature within a range of about 0.degree. C. to 70.degree. C.
    Type: Grant
    Filed: July 6, 1992
    Date of Patent: February 23, 1993
    Assignee: Dow Corning Corporation
    Inventor: Binh T. Nguyen
  • Patent number: 5175330
    Abstract: Disclosed herein is a process of recovering hydrogen chloride and monomeric alkoxysilanes from mixtures of chlorine-containing silicon compounds wherein waste chlorine-containing silicon compounds, for example, are converted to useful, valuable silicon intermediates.
    Type: Grant
    Filed: July 16, 1992
    Date of Patent: December 29, 1992
    Assignee: Dow Corning Corporation
    Inventor: John L. Speier
  • Patent number: 5171476
    Abstract: The invention relates to new cleavable surface-active silane derivatives of the formula ##STR1## in which R.sub.1, n, R.sub.2, R.sub.3, X, m and R.sub.4 have the meaning given in the description, and furthermore processes for the preparation of these silane derivatives and the use of these compounds as surfactants.
    Type: Grant
    Filed: August 20, 1990
    Date of Patent: December 15, 1992
    Assignee: Bayer Aktiengesellschaft
    Inventors: Robert Bloodworth, Gunther Penners, Wolfgang Podszun, Jurgen Reiners, Hans Schulze
  • Patent number: 5142081
    Abstract: This present invention relates to a process for the preparation of O-silylated aliphatic hydroxyl, compounds by the reaction of aliphatic hydroxyl compounds with triorganochlorosilanes and removal of the resulting gaseous hydrogen chloride from the reaction mixture, characterized in that the reaction is carried out in the presence of phase transfer catalysts in the absence of solvent.The invention also relates to the use of the O-silylated hydroxyl compounds obtained by this process as starting materials for the preparation of isocyanates containing ester groups by a reaction with isocyanato carboxylic acid chlorides.
    Type: Grant
    Filed: October 10, 1990
    Date of Patent: August 25, 1992
    Assignee: Bayer Aktiengesellschaft
    Inventors: Lutz Schmalstieg, Josef Pedain, Klaus Nachtkamp
  • Patent number: 5142082
    Abstract: Novel silane compounds, tert.-butoxy cyclopentyl dimethoxysilane and isopropoxy cyclopentyl dimethoxysilane, are prepared by reacting cyclopentyl trihalosilane with ROH (where R stands for tert.-butyl or isopropyl group) and then with methanol, or by reacting cyclopentyl trimethoxysilane with ROH. The silane compounds are useful as a catlaytic component for olefin polymerization and as a silane coupling agent.
    Type: Grant
    Filed: November 4, 1991
    Date of Patent: August 25, 1992
    Assignee: Tonen Corporation
    Inventors: Ryuji Sato, Satoshi Ueki, Tomoko Aoki, Yoshiharu Okumura
  • Patent number: 4924022
    Abstract: Disclosed is a one reactor, continuous system for the manufacture of organoalkoxysilanes. The reactor consists of a fractionating means that allows for completion of the reaction and separation of the HCl formed as a by-product. Also disclosed is a means for removing or reducing any residual hydrolyzable chloride or other acids in the organoalkoxysilanes using ion exchange resins.
    Type: Grant
    Filed: October 4, 1989
    Date of Patent: May 8, 1990
    Assignee: Dow Corning Corporation
    Inventors: Howard M. Bank, Robert A. Petrisko
  • Patent number: 4923687
    Abstract: A method for removing silane compounds from exhaust gases containing silanes comprises treating the silane containing gas with a metal alcholate in alcoholic solution to form a tetraalkoxysilane.
    Type: Grant
    Filed: August 17, 1989
    Date of Patent: May 8, 1990
    Assignee: Huels Aktiengesellschaft
    Inventors: Reinhold Schork, Reinhard Matthes, Hans-Joachim Vahlensieck
  • Patent number: 4906721
    Abstract: Novel organopolysiloxanes are disclosed which comprise ##STR1## wherein R.sup.1 is methyl or phenyl, with the proviso that at least 90% of R.sup.1 is methyl; andR.sup.2 is(a) R.sup.1,(b) linear or branched alkinoxy with 3 to 25 carbon atoms, or(c) a polyalcohol with 2 to 6 hydroxyl groups from which the H-atom of the OH-groups is eliminated, with all but one of the OH-groups being etherified with allyl alcohol.The siloxanes must meet the conditions that at least one--C.tbd.C-- group is contained in the average molecule and that the numerical ratio of the --C.tbd.C-- group to the allyl ether groups is 5:1 to 1:250.The novel organopolysiloxanes, mixed with hydrogenpolysiloxanes and a catalyst, are stable at room temperatures and cure rapidly at elevated temperatures. The cured mixtures have adhesive properties and exhibit no malfunctions due to migration of portions not linked chemically. A process for preparing the organopolysiloxanes is also disclosed.
    Type: Grant
    Filed: April 20, 1988
    Date of Patent: March 6, 1990
    Assignee: Th. Goldschmidt AG
    Inventors: Christian Weitemeyer, Goetz Koerner
  • Patent number: 4855473
    Abstract: The present invention relates to the preparation of organooxychlorosilanes. They are produced by reacting the corresponding chlorosilane with an alcohol in the presence of a catalyst system consisting of hydrogen chloride and a cocatalyst.
    Type: Grant
    Filed: May 8, 1987
    Date of Patent: August 8, 1989
    Assignee: Bayer Aktiengesellschaft
    Inventors: Thomas Wurminghausen, Karl Schneider, Franz Saykowski, Hans G. Frohlen
  • Patent number: 4851558
    Abstract: In a process for producing an alkoxysilane represented by general formula (III):(CH.sub.3).sub.a H.sub.b Si(OR).sub.c Cl.sub.4-(a+b+c) (III)wherein a represents a number of 0 to 2, b represents a number of 1 to 3, c represents a number of 0 to 2, the sum of a+b+c represents a number of not greater than 4 which comprises reacting a chlorosilane represented by general formula (I):(CH.sub.3).sub.a H.sub.b SiCl.sub.4-(a+b) (I)wherein a and b have the same meanings as described above and a+b represents a number of less than 4, with an alcohol represented by general formula (II);ROH (II)wherein R represents an alkyl group, a process for producing said alkoxysilanes characterized in that the reaction of the chlorosilane and the alcohol is performed in the co-presence of (a) an inert low boiling solvent having a boiling point lower than the boiling point of the objective alkoxysilane represented by general formula (III) and a difference in boiling point is not smaller than 4.degree. C.
    Type: Grant
    Filed: May 27, 1988
    Date of Patent: July 25, 1989
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Makoto Nishida, Hiroaki Hanaoka