By Substitution Of Silicon Bonded Hydrogen Patents (Class 556/481)
  • Patent number: 11097953
    Abstract: Synthesis of silanes with more than three silicon atoms are disclosed (i.e., (SinH(2n+2) with n=4-100). More particularly, the disclosed synthesis methods tune and optimize the isomer ratio by selection of process parameters such as temperature, residence time, and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of silanes containing more than three silicon atoms and particularly, the silanes containing preferably one major isomer. The pure isomers and isomer enriched mixtures are prepared by catalytic transformation of silane (SiH4), disilane (Si2H6), trisilane (Si3H8), and mixtures thereof.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: August 24, 2021
    Assignees: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, American Air Liquide, Inc.
    Inventors: Grigory Nikiforov, Guillaume Husson, Gennadiy Itov, Yang Wang
  • Patent number: 10081643
    Abstract: A method for preparing a reaction product including an aryl-functional silane includes sequential steps (1) and (2). Step (1) is contacting, under silicon deposition conditions, (A) an ingredient including (I) a halosilane such as silicon tetrahalide and optionally (II) hydrogen (H2); and (B) a metal combination comprising copper (Cu) and at least one other metal, where the at least one other metal is selected from the group consisting of gold (Au), cobalt (Co), chromium (Cr), iron (Fe), magnesium (Mg), manganese (Mn), nickel (Ni), palladium (Pd), and silver (Ag); thereby forming a silicon alloy catalyst comprising Si, Cu and the at least one other metal. Step (2) is contacting the silicon alloy catalyst and (C) a reactant including an aryl halide under silicon etching conditions.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: September 25, 2018
    Assignee: Dow Silicones Corporation
    Inventors: Dimitris Katsoulis, Matthew J. McLaughlin, Robert Morgan, Wendy Sparschu
  • Patent number: 9518070
    Abstract: A method of making hydrosilanes having a formula R1R2R3SiH by reacting a compound having formula I: in solution using a strong Lewis acid. This way, e.g., alkenes or carbonyl compounds can be hydrosilylated in good yields using the cyclohexa-2,5-dien-1-yl-silanes of general formula I as transfer hydrosilylating agents in the presence of a strong Lewis acid as catalyst with concomitant formation of an arene solvent.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: December 13, 2016
    Assignee: TECHNISCHE UNIVERSITAET BERLIN
    Inventors: Martin Oestreich, Antoine Simonneau
  • Patent number: 9272258
    Abstract: A process for preparing alkenylhalosilanes by reacting alkenyl halide in the gas phase in a reactor comprising a reaction tube (1) equipped with an inlet (2) at one end of the tube and with an outlet (3) at the other end of the tube, and having a gas inlet device (4) having a plurality of gas feed points (5) that are spaced apart in the direction of the longitudinal axis of the reaction tube (1) and open into the reaction tube (1). The process permits the preparation of alkenylhalosilanes in high yield and with high selectivity. The formation of soot is distinctly lower compared to conventional reactors.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: March 1, 2016
    Assignee: EVONIK DEGUSSA GmbH
    Inventors: Stefan Bade, Norbert Schladerbeck
  • Publication number: 20150141647
    Abstract: Disclosed herein are cobalt complexes containing terpyridine ligands and chelating alkene-modified silyl ligands, and their use as hydrosilylation and/or dehydrogenative silylation and crosslinking catalysts. The cobalt complexes also exhibit adequate air stability for handling and manipulation.
    Type: Application
    Filed: November 19, 2014
    Publication date: May 21, 2015
    Inventors: Tianning Diao, Paul J. Chirik, Aroop Kumar Roy, Kenrick Lewis, Susan Nye, Johannes G.P. Delis, Keith J. Weller
  • Patent number: 9023479
    Abstract: Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: May 5, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Sung Ho Son, Yun Bong Kim, Won Seok Jang, Yong Gyun Cho
  • Publication number: 20150080536
    Abstract: Disclosed herein are cobalt complexes containing terdentate pyridine di-imine ligands and their use as efficient and selective dehydrogenative silylation, hydrosilylation, and crosslinking catalysts.
    Type: Application
    Filed: November 19, 2014
    Publication date: March 19, 2015
    Inventors: Tianning Diao, Paul J. Chirik, Aroop Kumar Roy, Kenrick Lewis, Susan Nye, Keith J. Weller, Johannes G. P. Delis, Renyuan Yu
  • Publication number: 20140330036
    Abstract: The present invention relates to processes for the synthesis of saturated and unsaturated silahydrocarbons using iron-containing or cobalt-containing catalysts. The processes of the invention can produce tetraalkylsilanes, phenyltrialkylsilanes, substituted phenyltrialkylsilanes and their mixtures, which are useful as lubricants and hydraulic fluids, as well as alkyl alkenylsilanes, phenyl alkenylsilanes and substituted phenyl alkenylsilanes and their mixtures, which are useful in the synthesis of saturated silahydrocarbons and other organofunctional silanes.
    Type: Application
    Filed: April 2, 2014
    Publication date: November 6, 2014
    Applicants: PRINCETON UNIVERSITY, MOMENTIVE PERFORMANCE MATERIALS INC.
    Inventors: Kenrick Martin Lewis, Crisita Carmen Hojilla Atienza, Julie L. Boyer, Paul J. Chirik, Johannes G.P. Delis, Aroop Kumar Roy
  • Patent number: 8809568
    Abstract: The present disclosure provides a method of preparing silylethynyl compounds in which two of the hydrocarbyl groups bonded to the silicon exclusive of the ethynyl group, are the same and one is different, that may be used in preparing novel silylethynyl functionalized acene semiconductor chromophores.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: August 19, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Robert S. Clough, John E. Anthony, Marcia M. Payne
  • Publication number: 20140221678
    Abstract: The invention provides a conjugated diene structure-containing organosilicon compound having formula (1): R1nX3-nSi-A-CR2?CR2—CR2?CH2 ??(1) wherein R1 is a monovalent hydrocarbon group, X is halogen or organoxy, n is 0, 1 or 2, R2 is hydrogen or a monovalent hydrocarbon group, and A is a divalent hydrocarbon group. The organosilicon compound is prepared by reacting a conjugated diene structure-bearing olefin compound with a hydrogensilyl-containing compound in the presence of a platinum catalyst and an acid amide compound, organic amine salt compound, nitrile compound, aromatic hydroxy compound, or carboxylic acid compound.
    Type: Application
    Filed: January 24, 2014
    Publication date: August 7, 2014
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kazuhiro TSUCHIDA
  • Publication number: 20140200349
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: July 17, 2014
    Applicant: Dow Corning Corporation
    Inventors: Kurt Brandstadt, Simon Cook, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Patent number: 8779179
    Abstract: The present disclosure provides a method of preparing silylethynyl compounds in which two of the hydrocarbyl groups bonded to the silicon exclusive of the ethynyl group, are the same and one is different, that may be used in preparing novel silylethynyl functionalized acene semiconductor chromophores.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: July 15, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Robert S. Clough, John E. Anthony, Marcia M. Payne
  • Patent number: 8765987
    Abstract: Disclosed herein is a process for the hydrosilylation of a composition containing a silyl hydride and a compound containing at least one unsaturated group, the process comprising contacting a non-previous metal based complex as a catalyst precursor with an activator being a reducing agent shortly before, simultaneously or after contacting the complex with the composition, to cause the silyl hydride to react with the compound containing at least one unsaturated group to produce a hydrosilylation product.
    Type: Grant
    Filed: November 22, 2011
    Date of Patent: July 1, 2014
    Assignees: Cornell University, Momentive Performance Materials Inc.
    Inventors: Paul J. Chirik, Aaron M. Tondreau, Johannes G. P. Delis, Kenrick M. Lewis, Keith J. Weller, Susan A. Nye
  • Publication number: 20140179946
    Abstract: Phosphoranimide-metal catalysts and their role in hydrogenation and hydrosilylation are disclosed. The catalysts comprise first row transition metals such as nickel, cobalt or iron. The catalysts have a metal to anionic phosphoranimide ratio of 1:1. This disclosure presents a process for catalytic hydrogenation and hydrosilylation of a range of unsaturated organic compounds under lower temperature and pressure conditions than conditions associated with industrial hydrogenation and hydrosilylation.
    Type: Application
    Filed: December 21, 2012
    Publication date: June 26, 2014
    Applicant: GOVERNORS OF THE UNIVERSITY OF ALBERTA
    Inventors: Jeffrey Camacho BUNQUIN, Jeffrey Mark STRYKER
  • Patent number: 8716511
    Abstract: Process for preparing organoalkoxyhydrosilanes with a boron content less than 100 ppb and of the formula R1xHySi(OR2)z where x+y+z=4 and x, y, z are greater than or equal to 1, wherein, in a first step, a boron-contaminated organohalohydrosilane of the formula R1xHySiHalz where x+y+z=4, x, y, z are greater than or equal to 1, and R1 are linear or branched alkyl, cycloalkyl, aryl, alkenyl or arylalkyl radicals having 1 to 12 carbon atoms and Hal is F, Cl, Br or I, is subjected to a treatment with silica or aluminosilicate and the silica or the aluminosilicate is subsequently removed from the organohalohydrosilane in a second step and then the purified organohalohydrosilane is reacted with alcohol R2—OH where R2 is a methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, isopentyl, neopentyl or tert-pentyl radical.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: May 6, 2014
    Assignee: Wacker Chemie AG
    Inventors: Wolfgang Knies, Karin Bögershausen
  • Publication number: 20140121398
    Abstract: A [3-(2-norbornyl)-2-norbornyl]silane compound having formula (1) is novel, wherein R1 is a monovalent hydrocarbon radical, X is halogen or an organoxy OR2, R2 is a monovalent hydrocarbon radical, n is 1 or 2 when X is halogen, and n is 0, 1 or 2 when X is organoxy. It is a useful reactant for forming surface coatings on electronic parts.
    Type: Application
    Filed: October 24, 2013
    Publication date: May 1, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yasufumi KUBOTA, Tohru KUBOTA
  • Patent number: 8513450
    Abstract: The invention provides a process for preparing polysilanes of the general formula (1) SinR2n+2 (1), in which silane of the general formula (2) R1mSiH4-m (1a) is converted in the presence of boron compounds of the general formula (3) R23B (3), where R1 is a hydrocarbyl radical having 1 to 18 carbon atoms, R is hydrogen or an R1 radical, R2 is fluorine, chlorine, bromine or a hydrocarbyl radical which has 1 to 18 carbon atoms and may bear substituents selected from fluorine, chlorine, bromine, iodine and NO2, n has integer values from 2 to 100,000, and m is 0, 1 or 2.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: August 20, 2013
    Assignee: Wacker Chemie AG
    Inventors: Andreas Bockholt, Andreas Feigl, Bernhard Rieger
  • Patent number: 8436166
    Abstract: Vinylsilane compounds having a specific amino group, typically diethylaminopropyldimethylvinylsilane, N-methylpiperazinylpropyldimethylvinylsilane, and bistrimethylsilylaminopropyldimethylvinylsilane are novel and useful as a modifier for polymers.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: May 7, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota
  • Publication number: 20120296106
    Abstract: The invention relates to a process for preparing diorganyldihalosilanes of the general formula (1) R2SiX2 (1), in which dihalodihydrosilanes of the general formula (2) X2SiH2 (2), in a mixture with silanes of the general formula (3) R?3SiH (3), are reacted with halogenated hydrocarbons of the general formula (4) R-X (4), in the presence of a free-radical initiator, which is selected from alkanes, diazenes and organodisilanes, where R is a monovalent C1-C18 hydrocarbon radical, R? is a monovalent C1-C18 hydrocarbon radical, hydrogen or halogen, and X is halogen.
    Type: Application
    Filed: October 19, 2010
    Publication date: November 22, 2012
    Applicant: WACKER CHEMIE AG
    Inventors: Michael Stepp, Tobias Weiss
  • Patent number: 8278472
    Abstract: Provided is a method of preparing allylchlorosilane, and more particularly, a method of preparing allylchlorosilane with high yield by Si—C coupling reaction of an allyl chloride derivativce with a hydrosilane derivative under specific reaction conditions without using a catalyst.
    Type: Grant
    Filed: January 27, 2010
    Date of Patent: October 2, 2012
    Assignee: Korea Institute of Science and Technology
    Inventors: Bok Ryul Yoo, Joon Soo Han, Dong Won Lee
  • Publication number: 20120101291
    Abstract: The invention provides a process for preparing polysilanes of the general formula (1) SinR2n+2 (1), in which silane of the general formula (2) R1mSiH4-m (1a) is converted in the presence of boron compounds of the general formula (3) R23B (3), where R1 is a hydrocarbyl radical having 1 to 18 carbon atoms, R is hydrogen or an R1 radical, R2 is fluorine, chlorine, bromine or a hydrocarbyl radical which has 1 to 18 carbon atoms and may bear substituents selected from fluorine, chlorine, bromine, iodine and NO2, n has integer values from 2 to 100,000, and m is 0, 1 or 2.
    Type: Application
    Filed: June 10, 2010
    Publication date: April 26, 2012
    Applicant: WACKER CHEMIE AG
    Inventors: Andreas Bockholt, Andreas Feigl, Bernhard Rieger
  • Patent number: 8097745
    Abstract: A simple method of producing an organosilicon compound of a formula R2n(OR4)mSi—R1—Si(OR4)mR2n is disclosed. The method comprises the following two steps, Y—R1—Y+SiXm+1R2n->R2nXmSi—R1—SiXmR2n R2nXmSi—R1—SiXmR2n+M(OR4)r,->R2n(OR4)mSi—R1—Si(OR4)mR2n In the formulas, R1 is methylene, alkylene, or arylene, R2 is alkyl, alkenyl, alkynyl, or aryl, m and n is 0 to 3, provided m+n=3, at least one m being 1 or more, Y is halogen, X is hydrogen or halogen, R4 is alkyl, alkenyl, alkynyl, or aryl, M is metal, and r is the valence of the metal). The organosilicon compound is used to form a film having excellent heat resistance, chemical resistance, conductivity, and modulus of elasticity.
    Type: Grant
    Filed: March 30, 2010
    Date of Patent: January 17, 2012
    Assignee: JSR Corporation
    Inventors: Yohei Nobe, Kang-go Chung, Ryuichi Saito
  • Publication number: 20110224308
    Abstract: Organosilicone fine particles which are capable of responding to the highly advanced requirements of recent years imposed on them for purposes of actual use, including further improvement in optical characteristics such as total light transmittance and haze as well as heat-resistant colorability related to resin compositions, further improvement in usability (extensions and expansions at the time of use) and feeling (stickiness, roughness and durability) related to cosmetic materials and further improvement in matte effect and factual sense related to paint compositions, as well as methods of their production and cosmetic materials, resin compositions and paint compositions containing such particles are provided. Organosilicone fine particles have tetrahedral general shapes with surfaces each having a concave part with an approximately circular opening. The maximum external diameters L of the organosilicone fine particles have an average value in the range of 0.
    Type: Application
    Filed: May 25, 2011
    Publication date: September 15, 2011
    Inventors: Chiaki Saito, Motoki Maeda, Eriko Hatta
  • Publication number: 20110130585
    Abstract: Provided is a method of preparing allylchlorosilane, and more particularly, a method of preparing allylchlorosilane with high yield by Si—C coupling reaction of an allyl chloride derivativce with a hydrosilane derivative under specific reaction conditions without using a catalyst.
    Type: Application
    Filed: January 27, 2010
    Publication date: June 2, 2011
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Bok Ryul YOO, Joon Soo HAN, Dong Won LEE
  • Patent number: 7884225
    Abstract: The present invention relates to a process for the preparation of 3-chloropropyldimethylchlorosilane by hydrosilylation reaction in a reaction medium comprising dimethylhydrochlorosilane and allyl chloride, in the presence of a catalytically effective amount of di-?-chlorobis(?-1,5-cyclooctadiene)diiridium, the said process being characterized in that at least one auxiliary in the free or supported state selected from the group of compounds consisting of: (i) ketones, (ii) ethers, (iii) quinones, (iv) anhydrides, (v) unsaturated hydrocarbon compounds (UHC) having an aromatic nature and/or comprising at least one C?C double bond and/or at least one C?C triple bond, it being possible for these unsaturated bonds to be conjugated or nonconjugated, the said UHCs being linear or cyclic (mono- or polycyclic), having from 4 to 30 carbon atoms, having from 1 to 8 ethylenic and/or acetylenic unsaturations and optionally comprising one or more heteroatoms, (vi) and their mixtures, is added to the reaction medium, wi
    Type: Grant
    Filed: July 16, 2008
    Date of Patent: February 8, 2011
    Assignee: Rhodia Chimie
    Inventors: Nathalie Guennouni, Jean-Christophe Galland
  • Publication number: 20100317852
    Abstract: Vinylsilane compounds having a specific amino group, typically diethylaminopropyldimethylvinylsilane, N-methylpiperazinylpropyldimethylvinylsilane, and bistrimethylsilylaminopropyldimethylvinylsilane are novel and useful as a modifier for polymers.
    Type: Application
    Filed: June 10, 2010
    Publication date: December 16, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoichi Tonomura, Tohru Kubota
  • Patent number: 7741393
    Abstract: Provided are an organic silicon compound of the following formula (I): (wherein, R1 to R20 represent each independently alkyl, alkoxy, aryloxy, cycloalkyl, alkylcycloalkyl, aryl, dialkylamino or the like, and the aryloxy and aryl may be substituted with a substituent selected from the group consisting of alkyl, alkoxy and alkoxyalkyl.) which can be used for suppression of coloration and thermal deterioration of an organic material in molding, and an organic material composition containing the organic silicon compound and a method of producing the organic silicon compound.
    Type: Grant
    Filed: March 10, 2005
    Date of Patent: June 22, 2010
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Taketoshi Kikuchi, Atsushi Higo, Hideaki Awa, Kunihito Miyake
  • Patent number: 7544827
    Abstract: Chemical vapor deposition processes result in films having low dielectric constants when suitable chemical precursors are utilized. Preferred chemical precursors include siloxanes, (fluoroalkyl)fluorosiloxanes, (fluoroalkyl)silanes, (alkyl)fluorosilanes, (fluoroalkyl)fluorosilanes, alkylsiloxysilanes, alkoxysilanes, alkylalkoxysilanes, silylmethanes, alkoxysilylmethanes, alkylalkoxysilylmethanes, alkoxymethanes, alkylalkoxymethanes, and mixtures thereof. The precursors are particularly suited to thermal CVD for producing low dielectric constant films at relatively low temperatures, particularly without the use of additional oxidizing agents. Such films are useful in the microelectronics industry.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: June 9, 2009
    Assignee: ASM Japan K.K.
    Inventor: Michael A. Todd
  • Publication number: 20080287700
    Abstract: The present invention relates to a method for preparing an omega-haloalkyl dialkylhalosilane by means of a hydrosilylation reaction in the presence of a catalytically effective amount of a hydrosilylation catalyst containing a platinum group metal. The catalytic metal is recovered by (i) subjecting the distillation residue to controlled hydrolysis to release the gaseous H-Hal haloacid, and providing an aqueous medium containing the catalytic metal with a low hydrolysable halide content Si-Hal=2%, expressed by weight of Hal, then (2i) recovering the platinum group catalytic metal from said aqueous medium by means of one of the conventional techniques specific to catalyst manufacturers that do not use a solid adsorbent and operate in ordinary facilities that do not have to be acid-resistant.
    Type: Application
    Filed: June 14, 2005
    Publication date: November 20, 2008
    Inventor: Kamel Ramdani
  • Publication number: 20080275264
    Abstract: The present invention relates to a process for the preparation of 3-chloropropyldimethylchlorosilane by hydrosilylation reaction in a reaction medium comprising dimethylhydrochlorosilane and allyl chloride, in the presence of a catalytically effective amount of di-?-chlorobis(?-1,5-cyclooctadiene)diiridium, the said process being characterized in that at least one auxiliary in the free or supported state selected from the group of compounds consisting of: (i) ketones, (ii) ethers, (iii) quinones, (iv) anhydrides, (v) unsaturated hydrocarbon compounds (UHC) having an aromatic nature and/or comprising at least one C?C double bond and/or at least one C?C triple bond, it being possible for these unsaturated bonds to be conjugated or nonconjugated, the said UHCs being linear or cyclic (mono- or polycyclic), having from 4 to 30 carbon atoms, having from 1 to 8 ethylenic and/or acetylenic unsaturations and optionally comprising one or more heteroatoms, (vi) and their mixtures, is added to the reaction medium, wi
    Type: Application
    Filed: July 16, 2008
    Publication date: November 6, 2008
    Applicant: RHODIA CHIMIE
    Inventors: Nathalie GUENNOUNI, Jean-Christopher GALLAND
  • Patent number: 7314946
    Abstract: The present invention relates to (2-cyclopentenyl)chlorosilane derivatives and the preparation method thereof. In particular, it relates to a very economical process which reacts cyclopentadiene, which is formed by a cracking of industrially produced low-priced dicyclopentadiene, with a silane compound containing silicon-hydrogen bonds at elevated temperature in a hydrocarbon compound with a boiling point of a predetermined range, thus also enabling to prevent problematic production of dicyclopentadiene polymer by using the hydrocarbon compound. Further, in the presence of a group 10 metal compound catalyst, the process herein is capable of lowering the reaction temperature and increasing the yield in the reaction of sterically hindered alkyl-dichlorosilane. The (2-cyclopentenyl)chlorosilane may be useful in preparing an organic silicon compound containing an unsaturated group or a functional silicone polymer using the same, or in modifying the surface or manufacturing a thin layer.
    Type: Grant
    Filed: December 6, 2006
    Date of Patent: January 1, 2008
    Assignee: Korea Institute of Science and Technology
    Inventors: Bok Ryul Yoo, Joon Soo Han, Weon Cheol Lim
  • Patent number: 7005532
    Abstract: An object of the present invention is to provide a process of producing alkoxysilanes, which does not use a chlorosilane as the intermediate raw material, is improved in view of the environment, and is satisfactory with respect to the yield of a desired material. The present invention is concerned with a process of producing an alkoxysilane including hydrosilylating (A) an organosilicon compound having at least one hydrogen-silicon bond and at least one alkoxy group and (B) an organic compound having a carbon—carbon unsaturated bond in vapor phase in the presence of a mixture containing a hydrosilylation catalyst and a polyalkylene glycol and supported on a carrier, thereby adding hydrogen and silicon of the compound (A) to the carbon—carbon unsaturated bond in the compound (B).
    Type: Grant
    Filed: September 11, 2002
    Date of Patent: February 28, 2006
    Assignee: Toagosei Co., Ltd.
    Inventors: Eiichi Suzuki, Masaki Okamoto, Seitaro Tajima, Hiroshi Suzuki, Katsuyoshi Harada
  • Patent number: 6858746
    Abstract: A compound having at least one H—Si group is reacted with an unsaturated aliphatic compound in the presence of a platinum catalyst and at least one organic additive component. The combination of platinum catalyst and additive component is one of: (i) a solution of a Pt(0) complex catalyst in a solvent, with at least one organic amide, or (ii) a solution of a Pt(0) complex catalyst in a solvent, with at least one organic amine, or (iii) a solution of a Pt(0) complex catalyst, in a solvent, with at least one organic nitrite.
    Type: Grant
    Filed: October 10, 2002
    Date of Patent: February 22, 2005
    Assignee: Degussa AG
    Inventors: Sabine Giessler, Helmut Mack, Dieter Barfurth
  • Patent number: 6809213
    Abstract: A highly efficient method is provided for preparing secondary aminoisobutylalkoxysilanes by reacting hydridoalkoxysilanes with secondary methallylamines in the presence of a hydrosilation catalyst.
    Type: Grant
    Filed: May 1, 2001
    Date of Patent: October 26, 2004
    Assignee: General Electric Company
    Inventors: R. Shawn Childress, Michelle A. Filipkowski, Curtis L. Schilling, Jr.
  • Patent number: 6713644
    Abstract: Chloropropylsilanes are prepared via hydrosilation of olefinic halides with organosilicon hydrides, in the presence of neat platinum free copper containing catalysts. Organosilicon hydrides such as triethylsilane, olefinic halides such as allyl chloride, and catalysts such as copper acetate, copper chloride, copper sulphate, copper hydroxide, copper nitrate, and copper cyanide, can be used in the process.
    Type: Grant
    Filed: October 3, 2002
    Date of Patent: March 30, 2004
    Assignee: Dow Corning Corporation
    Inventor: Binh Thanh Nguyen
  • Patent number: 6489501
    Abstract: A method for forming at least one product silane, comprising reacting a transition metal hydride with a starting silane in a presence of a catalyst and at a temperature that exceeds a threshold temperature associated with said reacting.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: December 3, 2002
    Assignee: General Electric Company
    Inventor: Florian Johannes Schattenmann
  • Patent number: 6392077
    Abstract: The present invention relates to a process for preparing organochlorosilanes and more particularly, to the process for preparing organochlorosilanes of R4R3CHSiR1Cl2 (I) by a dehydrohalogenative coupling of hydrochlorosilanes of HSiR1Cl2 (II) with organic halides of R2R3 CHX (III) in the presence of quaternary phosphonium salt as a catalyst to provide better economical matter and yield compared with conventional methods, because only a catalytic amount of phosphonium chloride is required and the catalyst can be separated from the reaction mixture and recycled easily.
    Type: Grant
    Filed: August 1, 2001
    Date of Patent: May 21, 2002
    Assignee: Korea Institute of Science and Technology
    Inventors: Il-Nam Jung, Bok-Ryul Yoo, Joon-Soo Han, Seung-Hyun Kang
  • Patent number: 6384258
    Abstract: A method for the preparation of organylorganooxysilanes containing at least one silicon-carbon bond is provided comprising reacting at least one triorganooxysilane with at least one base.
    Type: Grant
    Filed: May 9, 2001
    Date of Patent: May 7, 2002
    Assignee: General Electric Company
    Inventor: Florian Johannes Schattenmann
  • Patent number: 6291698
    Abstract: The invention relates to a process for preparing vinyl chlorosilanes, that includes thermally and non-catalytically reacting chlorosilane with vinyl chloride at a temperature of 550 to 700° C. by flowing the chlorosilane and vinyl chloride through a ring-gap space in a ring-gap reactor to produce a reaction gas; the ring-gap space having a cross-sectional area and a volume; and, after the flowing, further reacting, adiabatically, the reaction gas in a second zone to produce a hot reaction gas that contains vinylchiorosilane; wherein the second zone has a cross-sectional area that is greater than the cross-sectional area of the ring-gap space; and wherein the second zone has a volume that is in a ratio to the volume of the ring-gap space of 0.15:1 to 1.5:1. The invention also provides an apparatus for carrying out the above process.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: September 18, 2001
    Assignee: Degussa Huels AG
    Inventors: Stefan Bade, Bernt Kesper, Robert Koell, Hartwig Rauleder, Uwe Schoen
  • Patent number: 6222056
    Abstract: The invention relates to a process for preparing vinylchlorosilanes by thermal non-catalyzed reaction of chlorosilanes with vinyl chloride at from 550 to 700° C., using a ring-gap reactor which includes rapidly cooling the hot reaction gases after they have flowed through the ring-gap space, by quenching them with a liquid.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: April 24, 2001
    Assignee: Degussa Huels AG
    Inventors: Stefan Bade, Hartwig Rauleder, Uwe Schoen, Franz-Michael Bollenrath
  • Patent number: 5808128
    Abstract: The invention relates to a method of manufacturing vinyltrichlorosilane by reacting vinyl chloride with trichlorosilane, at elevated temperature. The reaction is carried out at 400.degree.-850.degree. C., preferably 550.degree.-800.degree. C., in a fluidized bed.
    Type: Grant
    Filed: October 15, 1997
    Date of Patent: September 15, 1998
    Assignee: Huels Aktiengesellschaft
    Inventor: Emmanuel Fiolitakis
  • Patent number: 5508460
    Abstract: An improved method for synthesizing arylsilanes is disclosed. Novel catalysts for use in the method are provided. A method for synthesizing the novel catalysts is also disclosed.
    Type: Grant
    Filed: August 15, 1994
    Date of Patent: April 16, 1996
    Assignee: Trustees of the University of Pennsylvania
    Inventors: Donald H. Berry, Peter I. Djurovich
  • Patent number: 5344950
    Abstract: A process for the continuous production of vinylchlorosilanes by reacting vinyl chloride with chlorosilanes at elevated temperature consists of a heatable reaction tube having an internal diameter d.sub.1 and a tubular displacement body having an external diameter d.sub.2 mounted within the reaction tube in an axially symmetrical arrangement and extending over the entire length of the reaction tube, the diameter d.sub.2 being smaller than the diameter d.sub.1.
    Type: Grant
    Filed: January 25, 1993
    Date of Patent: September 6, 1994
    Assignee: Huls Aktiengesellschaft
    Inventors: Willy Hange, Helmut Dietsche, Claus-Dietrich Seiler
  • Patent number: 5182246
    Abstract: A catalyst for hydrogenation, dehydrosilylation of ketones, or hydrosililation of dienes or acetylenes, comprising a complex represented the the formula:A.sup.+ [M.sub.2 H(C)).sub.10 ].sup.-wherein A.sup.+ represents an alkali metal cation, an ammonium cation, an iminium cation, or a phosphonium cation; and M represents a chromium atom, a molybdenum atom, or a tungsten atom; anda process for producing dehydrosilylation products of ketones or hydrosilylation products of dienes or acetylenes, which is characterized by using the complex as a catalyst.
    Type: Grant
    Filed: August 23, 1991
    Date of Patent: January 26, 1993
    Assignee: Sagami Chemical Research Center
    Inventors: Takamasa Fuchikami, Yumiko Ubukata, Yasutaka Tanaka
  • Patent number: 5118829
    Abstract: The present invention is a process for substituting cycloalkyl substituents for a silicon bound hydrogen of a silane. The process employs a preformed organoborane compound as a catalyst to increase the apparent rate of the reaction and to increase the yield of desired cycloalkylsilanes.
    Type: Grant
    Filed: September 27, 1991
    Date of Patent: June 2, 1992
    Assignee: Dow Corning Corporation
    Inventor: John M. Gohndrone
  • Patent number: 5075480
    Abstract: The manufacture of vinyltrichlorosilane by reacting vinylchloride with trichlorosilane at a temperature of 400.degree. to 750.degree. C. in a tubular reactor with a rotating displacement body axial-symmetrically disposed therein is improved by heating the reactants to a temperature of 120.degree. to 400.degree. C. prior to their introduction into the reactor.
    Type: Grant
    Filed: April 30, 1991
    Date of Patent: December 24, 1991
    Assignee: Huels Aktiengesellschaft
    Inventors: Willy Hange, Claus-Dietrich Seiler, Emanuel Fiolitakis, Uwe Schon, Helmut Dietsche
  • Patent number: 5041587
    Abstract: A process for preparing an organic silicon compound is here disclosed which comprises the step of reacting a halogenated hydrocarbon selected from the group consisting ##STR1## wherein each of X.sup.1 to X.sup.16 is selected from the group consisting of hydrogen, an alkyl group, alkenyl group, phenyl group, naphthyl group, alkoxy group, acyl group, alkylamino group and dialkylamino group having 1 to 20 carbon atoms which are unsubstituted or substituted and a halogen atom; and each of at least one of X.sup.1 to X.sup.4, at least one of X.sup.8 to X.sup.10 and at least one of X.sup.11 to X.sup.16 is a halogen atom,with a silane selected from the group consisting of SiH.sub.4, Si.sub.2 H.sub.6 and Si.sub.3 H.sub.8.
    Type: Grant
    Filed: February 12, 1990
    Date of Patent: August 20, 1991
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Masayoshi Itoh, Kenji Iwata, Noriyuki Yanagawa, Tetsura Utsumi, Mineo Kobayashi, Ryo Takeuchi, Tomohiro Abe
  • Patent number: 4985580
    Abstract: The instant invention is a process for the addition of alkyl groups to non-halogen containing silanes. Non-halogen containing silanes are reacted with an alkyl halide in presence of a halogen-accepting metal. The process is run with or without a catalyst, which is effective in improving exchange of alkyl groups from the alkyl halide with hydrogen atoms of the silane.
    Type: Grant
    Filed: March 12, 1990
    Date of Patent: January 15, 1991
    Assignee: Dow Corning Corporation
    Inventors: Kirk M. Chadwick, Roland L. Halm
  • Patent number: 4670574
    Abstract: Silane and monoalkylsilanes can be alkylated using an alkali metal aluminate, MAlR.sub.4, wherein M is Li, Na, or K and each R is a straight chain, alkyl radical solely composed of carbon and hydrogen containing from about 4 to about 18 carbon atoms. The aluminate can be used as a reactant, optionally in the presence of a straight chain alpha-olefin corresponding to the alkyl group in the aluminate. Alternatively, the aluminate can be used as a catalyst for the reaction of the olefin and the silane reactant, in which case from about 5 to about 10 mole percent of the aluminate (based on the silane reactant) is employed. The catalytic reaction is promoted by a smaller amount of a lithium salt such as lithium chloride. Both embodiments are conducted at somewhat elevated temperatures, approximately 160.degree.-210.degree. C., and at autogenous pressures, using reaction times of 8-20 hours.The products are useful as functional fluids or as intermediates.
    Type: Grant
    Filed: September 18, 1986
    Date of Patent: June 2, 1987
    Assignee: Ethyl Corporation
    Inventors: Arcelio J. Malcolm, Charles R. Everly, Gunner E. Nelson
  • Patent number: 4474976
    Abstract: A method of producing phenyl silanes is provided by reacting a silane having at least one hydrogen-silicon bond and an aromatic compound having at least one halogen radical, aryl halide radical or aldehyde radical in the presence of a transition metal catalyst at a temperature in the range of about 150.degree. C. to 200.degree. C. Suitable transition metals include rhodium, ruthenium, palladium, osmium, iridium and platinum.
    Type: Grant
    Filed: August 29, 1983
    Date of Patent: October 2, 1984
    Assignee: General Electric Company
    Inventor: Robert A. Faltynek