By Substitution Of Silicon Bonded Hydrogen Patents (Class 556/481)
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Patent number: 12202847Abstract: A process for dehydrogenating and methylating silanes. The process includes providing methyl chloride that is reacted with a silane selected from the group consisting of SiH4, H2SiMe2, H2SiMeCl, H3SiMe, H3SiCl and HSiMe2Cl, in the presence of at least one ammonium and/or phosphonium salt at a temperature in the range of 70-350° C.Type: GrantFiled: April 23, 2020Date of Patent: January 21, 2025Assignee: Wacker Chemie AGInventors: Jan Tillmann, Richard Weidner
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Patent number: 12060375Abstract: Dichlorosilane and trichlorosilane are dehydrogenated at elevated temperature in the presence of an ammonium or phosphonium salt as a catalyst, and a halogenated hydrocarbon or hydrogen halide. The method may be used to synthesize organochlorosilane.Type: GrantFiled: September 6, 2018Date of Patent: August 13, 2024Assignee: WACKER CHEMIE AGInventors: Jan Tillmann, Richard Weidner
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Patent number: 11097953Abstract: Synthesis of silanes with more than three silicon atoms are disclosed (i.e., (SinH(2n+2) with n=4-100). More particularly, the disclosed synthesis methods tune and optimize the isomer ratio by selection of process parameters such as temperature, residence time, and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of silanes containing more than three silicon atoms and particularly, the silanes containing preferably one major isomer. The pure isomers and isomer enriched mixtures are prepared by catalytic transformation of silane (SiH4), disilane (Si2H6), trisilane (Si3H8), and mixtures thereof.Type: GrantFiled: October 11, 2018Date of Patent: August 24, 2021Assignees: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, American Air Liquide, Inc.Inventors: Grigory Nikiforov, Guillaume Husson, Gennadiy Itov, Yang Wang
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Patent number: 10081643Abstract: A method for preparing a reaction product including an aryl-functional silane includes sequential steps (1) and (2). Step (1) is contacting, under silicon deposition conditions, (A) an ingredient including (I) a halosilane such as silicon tetrahalide and optionally (II) hydrogen (H2); and (B) a metal combination comprising copper (Cu) and at least one other metal, where the at least one other metal is selected from the group consisting of gold (Au), cobalt (Co), chromium (Cr), iron (Fe), magnesium (Mg), manganese (Mn), nickel (Ni), palladium (Pd), and silver (Ag); thereby forming a silicon alloy catalyst comprising Si, Cu and the at least one other metal. Step (2) is contacting the silicon alloy catalyst and (C) a reactant including an aryl halide under silicon etching conditions.Type: GrantFiled: November 6, 2015Date of Patent: September 25, 2018Assignee: Dow Silicones CorporationInventors: Dimitris Katsoulis, Matthew J. McLaughlin, Robert Morgan, Wendy Sparschu
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Patent number: 9518070Abstract: A method of making hydrosilanes having a formula R1R2R3SiH by reacting a compound having formula I: in solution using a strong Lewis acid. This way, e.g., alkenes or carbonyl compounds can be hydrosilylated in good yields using the cyclohexa-2,5-dien-1-yl-silanes of general formula I as transfer hydrosilylating agents in the presence of a strong Lewis acid as catalyst with concomitant formation of an arene solvent.Type: GrantFiled: September 4, 2014Date of Patent: December 13, 2016Assignee: TECHNISCHE UNIVERSITAET BERLINInventors: Martin Oestreich, Antoine Simonneau
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Patent number: 9272258Abstract: A process for preparing alkenylhalosilanes by reacting alkenyl halide in the gas phase in a reactor comprising a reaction tube (1) equipped with an inlet (2) at one end of the tube and with an outlet (3) at the other end of the tube, and having a gas inlet device (4) having a plurality of gas feed points (5) that are spaced apart in the direction of the longitudinal axis of the reaction tube (1) and open into the reaction tube (1). The process permits the preparation of alkenylhalosilanes in high yield and with high selectivity. The formation of soot is distinctly lower compared to conventional reactors.Type: GrantFiled: May 28, 2013Date of Patent: March 1, 2016Assignee: EVONIK DEGUSSA GmbHInventors: Stefan Bade, Norbert Schladerbeck
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Publication number: 20150141647Abstract: Disclosed herein are cobalt complexes containing terpyridine ligands and chelating alkene-modified silyl ligands, and their use as hydrosilylation and/or dehydrogenative silylation and crosslinking catalysts. The cobalt complexes also exhibit adequate air stability for handling and manipulation.Type: ApplicationFiled: November 19, 2014Publication date: May 21, 2015Inventors: Tianning Diao, Paul J. Chirik, Aroop Kumar Roy, Kenrick Lewis, Susan Nye, Johannes G.P. Delis, Keith J. Weller
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Patent number: 9023479Abstract: Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.Type: GrantFiled: November 1, 2012Date of Patent: May 5, 2015Assignee: SK Innovation Co., Ltd.Inventors: Sung Ho Son, Yun Bong Kim, Won Seok Jang, Yong Gyun Cho
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Publication number: 20150080536Abstract: Disclosed herein are cobalt complexes containing terdentate pyridine di-imine ligands and their use as efficient and selective dehydrogenative silylation, hydrosilylation, and crosslinking catalysts.Type: ApplicationFiled: November 19, 2014Publication date: March 19, 2015Inventors: Tianning Diao, Paul J. Chirik, Aroop Kumar Roy, Kenrick Lewis, Susan Nye, Keith J. Weller, Johannes G. P. Delis, Renyuan Yu
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Publication number: 20140330036Abstract: The present invention relates to processes for the synthesis of saturated and unsaturated silahydrocarbons using iron-containing or cobalt-containing catalysts. The processes of the invention can produce tetraalkylsilanes, phenyltrialkylsilanes, substituted phenyltrialkylsilanes and their mixtures, which are useful as lubricants and hydraulic fluids, as well as alkyl alkenylsilanes, phenyl alkenylsilanes and substituted phenyl alkenylsilanes and their mixtures, which are useful in the synthesis of saturated silahydrocarbons and other organofunctional silanes.Type: ApplicationFiled: April 2, 2014Publication date: November 6, 2014Applicants: PRINCETON UNIVERSITY, MOMENTIVE PERFORMANCE MATERIALS INC.Inventors: Kenrick Martin Lewis, Crisita Carmen Hojilla Atienza, Julie L. Boyer, Paul J. Chirik, Johannes G.P. Delis, Aroop Kumar Roy
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Patent number: 8809568Abstract: The present disclosure provides a method of preparing silylethynyl compounds in which two of the hydrocarbyl groups bonded to the silicon exclusive of the ethynyl group, are the same and one is different, that may be used in preparing novel silylethynyl functionalized acene semiconductor chromophores.Type: GrantFiled: May 25, 2011Date of Patent: August 19, 2014Assignee: 3M Innovative Properties CompanyInventors: Robert S. Clough, John E. Anthony, Marcia M. Payne
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Publication number: 20140221678Abstract: The invention provides a conjugated diene structure-containing organosilicon compound having formula (1): R1nX3-nSi-A-CR2?CR2—CR2?CH2 ??(1) wherein R1 is a monovalent hydrocarbon group, X is halogen or organoxy, n is 0, 1 or 2, R2 is hydrogen or a monovalent hydrocarbon group, and A is a divalent hydrocarbon group. The organosilicon compound is prepared by reacting a conjugated diene structure-bearing olefin compound with a hydrogensilyl-containing compound in the presence of a platinum catalyst and an acid amide compound, organic amine salt compound, nitrile compound, aromatic hydroxy compound, or carboxylic acid compound.Type: ApplicationFiled: January 24, 2014Publication date: August 7, 2014Applicant: Shin-Etsu Chemical Co., Ltd.Inventor: Kazuhiro TSUCHIDA
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Publication number: 20140200349Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.Type: ApplicationFiled: September 20, 2012Publication date: July 17, 2014Applicant: Dow Corning CorporationInventors: Kurt Brandstadt, Simon Cook, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
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Patent number: 8779179Abstract: The present disclosure provides a method of preparing silylethynyl compounds in which two of the hydrocarbyl groups bonded to the silicon exclusive of the ethynyl group, are the same and one is different, that may be used in preparing novel silylethynyl functionalized acene semiconductor chromophores.Type: GrantFiled: May 18, 2011Date of Patent: July 15, 2014Assignee: 3M Innovative Properties CompanyInventors: Robert S. Clough, John E. Anthony, Marcia M. Payne
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Patent number: 8765987Abstract: Disclosed herein is a process for the hydrosilylation of a composition containing a silyl hydride and a compound containing at least one unsaturated group, the process comprising contacting a non-previous metal based complex as a catalyst precursor with an activator being a reducing agent shortly before, simultaneously or after contacting the complex with the composition, to cause the silyl hydride to react with the compound containing at least one unsaturated group to produce a hydrosilylation product.Type: GrantFiled: November 22, 2011Date of Patent: July 1, 2014Assignees: Cornell University, Momentive Performance Materials Inc.Inventors: Paul J. Chirik, Aaron M. Tondreau, Johannes G. P. Delis, Kenrick M. Lewis, Keith J. Weller, Susan A. Nye
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Publication number: 20140179946Abstract: Phosphoranimide-metal catalysts and their role in hydrogenation and hydrosilylation are disclosed. The catalysts comprise first row transition metals such as nickel, cobalt or iron. The catalysts have a metal to anionic phosphoranimide ratio of 1:1. This disclosure presents a process for catalytic hydrogenation and hydrosilylation of a range of unsaturated organic compounds under lower temperature and pressure conditions than conditions associated with industrial hydrogenation and hydrosilylation.Type: ApplicationFiled: December 21, 2012Publication date: June 26, 2014Applicant: GOVERNORS OF THE UNIVERSITY OF ALBERTAInventors: Jeffrey Camacho BUNQUIN, Jeffrey Mark STRYKER
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Patent number: 8716511Abstract: Process for preparing organoalkoxyhydrosilanes with a boron content less than 100 ppb and of the formula R1xHySi(OR2)z where x+y+z=4 and x, y, z are greater than or equal to 1, wherein, in a first step, a boron-contaminated organohalohydrosilane of the formula R1xHySiHalz where x+y+z=4, x, y, z are greater than or equal to 1, and R1 are linear or branched alkyl, cycloalkyl, aryl, alkenyl or arylalkyl radicals having 1 to 12 carbon atoms and Hal is F, Cl, Br or I, is subjected to a treatment with silica or aluminosilicate and the silica or the aluminosilicate is subsequently removed from the organohalohydrosilane in a second step and then the purified organohalohydrosilane is reacted with alcohol R2—OH where R2 is a methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, isopentyl, neopentyl or tert-pentyl radical.Type: GrantFiled: June 21, 2010Date of Patent: May 6, 2014Assignee: Wacker Chemie AGInventors: Wolfgang Knies, Karin Bögershausen
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Publication number: 20140121398Abstract: A [3-(2-norbornyl)-2-norbornyl]silane compound having formula (1) is novel, wherein R1 is a monovalent hydrocarbon radical, X is halogen or an organoxy OR2, R2 is a monovalent hydrocarbon radical, n is 1 or 2 when X is halogen, and n is 0, 1 or 2 when X is organoxy. It is a useful reactant for forming surface coatings on electronic parts.Type: ApplicationFiled: October 24, 2013Publication date: May 1, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Yasufumi KUBOTA, Tohru KUBOTA
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Patent number: 8513450Abstract: The invention provides a process for preparing polysilanes of the general formula (1) SinR2n+2 (1), in which silane of the general formula (2) R1mSiH4-m (1a) is converted in the presence of boron compounds of the general formula (3) R23B (3), where R1 is a hydrocarbyl radical having 1 to 18 carbon atoms, R is hydrogen or an R1 radical, R2 is fluorine, chlorine, bromine or a hydrocarbyl radical which has 1 to 18 carbon atoms and may bear substituents selected from fluorine, chlorine, bromine, iodine and NO2, n has integer values from 2 to 100,000, and m is 0, 1 or 2.Type: GrantFiled: June 10, 2010Date of Patent: August 20, 2013Assignee: Wacker Chemie AGInventors: Andreas Bockholt, Andreas Feigl, Bernhard Rieger
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Patent number: 8436166Abstract: Vinylsilane compounds having a specific amino group, typically diethylaminopropyldimethylvinylsilane, N-methylpiperazinylpropyldimethylvinylsilane, and bistrimethylsilylaminopropyldimethylvinylsilane are novel and useful as a modifier for polymers.Type: GrantFiled: June 10, 2010Date of Patent: May 7, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoichi Tonomura, Tohru Kubota
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Publication number: 20120296106Abstract: The invention relates to a process for preparing diorganyldihalosilanes of the general formula (1) R2SiX2 (1), in which dihalodihydrosilanes of the general formula (2) X2SiH2 (2), in a mixture with silanes of the general formula (3) R?3SiH (3), are reacted with halogenated hydrocarbons of the general formula (4) R-X (4), in the presence of a free-radical initiator, which is selected from alkanes, diazenes and organodisilanes, where R is a monovalent C1-C18 hydrocarbon radical, R? is a monovalent C1-C18 hydrocarbon radical, hydrogen or halogen, and X is halogen.Type: ApplicationFiled: October 19, 2010Publication date: November 22, 2012Applicant: WACKER CHEMIE AGInventors: Michael Stepp, Tobias Weiss
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Patent number: 8278472Abstract: Provided is a method of preparing allylchlorosilane, and more particularly, a method of preparing allylchlorosilane with high yield by Si—C coupling reaction of an allyl chloride derivativce with a hydrosilane derivative under specific reaction conditions without using a catalyst.Type: GrantFiled: January 27, 2010Date of Patent: October 2, 2012Assignee: Korea Institute of Science and TechnologyInventors: Bok Ryul Yoo, Joon Soo Han, Dong Won Lee
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Publication number: 20120101291Abstract: The invention provides a process for preparing polysilanes of the general formula (1) SinR2n+2 (1), in which silane of the general formula (2) R1mSiH4-m (1a) is converted in the presence of boron compounds of the general formula (3) R23B (3), where R1 is a hydrocarbyl radical having 1 to 18 carbon atoms, R is hydrogen or an R1 radical, R2 is fluorine, chlorine, bromine or a hydrocarbyl radical which has 1 to 18 carbon atoms and may bear substituents selected from fluorine, chlorine, bromine, iodine and NO2, n has integer values from 2 to 100,000, and m is 0, 1 or 2.Type: ApplicationFiled: June 10, 2010Publication date: April 26, 2012Applicant: WACKER CHEMIE AGInventors: Andreas Bockholt, Andreas Feigl, Bernhard Rieger
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Patent number: 8097745Abstract: A simple method of producing an organosilicon compound of a formula R2n(OR4)mSi—R1—Si(OR4)mR2n is disclosed. The method comprises the following two steps, Y—R1—Y+SiXm+1R2n->R2nXmSi—R1—SiXmR2n R2nXmSi—R1—SiXmR2n+M(OR4)r,->R2n(OR4)mSi—R1—Si(OR4)mR2n In the formulas, R1 is methylene, alkylene, or arylene, R2 is alkyl, alkenyl, alkynyl, or aryl, m and n is 0 to 3, provided m+n=3, at least one m being 1 or more, Y is halogen, X is hydrogen or halogen, R4 is alkyl, alkenyl, alkynyl, or aryl, M is metal, and r is the valence of the metal). The organosilicon compound is used to form a film having excellent heat resistance, chemical resistance, conductivity, and modulus of elasticity.Type: GrantFiled: March 30, 2010Date of Patent: January 17, 2012Assignee: JSR CorporationInventors: Yohei Nobe, Kang-go Chung, Ryuichi Saito
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Publication number: 20110224308Abstract: Organosilicone fine particles which are capable of responding to the highly advanced requirements of recent years imposed on them for purposes of actual use, including further improvement in optical characteristics such as total light transmittance and haze as well as heat-resistant colorability related to resin compositions, further improvement in usability (extensions and expansions at the time of use) and feeling (stickiness, roughness and durability) related to cosmetic materials and further improvement in matte effect and factual sense related to paint compositions, as well as methods of their production and cosmetic materials, resin compositions and paint compositions containing such particles are provided. Organosilicone fine particles have tetrahedral general shapes with surfaces each having a concave part with an approximately circular opening. The maximum external diameters L of the organosilicone fine particles have an average value in the range of 0.Type: ApplicationFiled: May 25, 2011Publication date: September 15, 2011Inventors: Chiaki Saito, Motoki Maeda, Eriko Hatta
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Publication number: 20110130585Abstract: Provided is a method of preparing allylchlorosilane, and more particularly, a method of preparing allylchlorosilane with high yield by Si—C coupling reaction of an allyl chloride derivativce with a hydrosilane derivative under specific reaction conditions without using a catalyst.Type: ApplicationFiled: January 27, 2010Publication date: June 2, 2011Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Bok Ryul YOO, Joon Soo HAN, Dong Won LEE
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Patent number: 7884225Abstract: The present invention relates to a process for the preparation of 3-chloropropyldimethylchlorosilane by hydrosilylation reaction in a reaction medium comprising dimethylhydrochlorosilane and allyl chloride, in the presence of a catalytically effective amount of di-?-chlorobis(?-1,5-cyclooctadiene)diiridium, the said process being characterized in that at least one auxiliary in the free or supported state selected from the group of compounds consisting of: (i) ketones, (ii) ethers, (iii) quinones, (iv) anhydrides, (v) unsaturated hydrocarbon compounds (UHC) having an aromatic nature and/or comprising at least one C?C double bond and/or at least one C?C triple bond, it being possible for these unsaturated bonds to be conjugated or nonconjugated, the said UHCs being linear or cyclic (mono- or polycyclic), having from 4 to 30 carbon atoms, having from 1 to 8 ethylenic and/or acetylenic unsaturations and optionally comprising one or more heteroatoms, (vi) and their mixtures, is added to the reaction medium, wiType: GrantFiled: July 16, 2008Date of Patent: February 8, 2011Assignee: Rhodia ChimieInventors: Nathalie Guennouni, Jean-Christophe Galland
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Publication number: 20100317852Abstract: Vinylsilane compounds having a specific amino group, typically diethylaminopropyldimethylvinylsilane, N-methylpiperazinylpropyldimethylvinylsilane, and bistrimethylsilylaminopropyldimethylvinylsilane are novel and useful as a modifier for polymers.Type: ApplicationFiled: June 10, 2010Publication date: December 16, 2010Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Yoichi Tonomura, Tohru Kubota
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Patent number: 7741393Abstract: Provided are an organic silicon compound of the following formula (I): (wherein, R1 to R20 represent each independently alkyl, alkoxy, aryloxy, cycloalkyl, alkylcycloalkyl, aryl, dialkylamino or the like, and the aryloxy and aryl may be substituted with a substituent selected from the group consisting of alkyl, alkoxy and alkoxyalkyl.) which can be used for suppression of coloration and thermal deterioration of an organic material in molding, and an organic material composition containing the organic silicon compound and a method of producing the organic silicon compound.Type: GrantFiled: March 10, 2005Date of Patent: June 22, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Taketoshi Kikuchi, Atsushi Higo, Hideaki Awa, Kunihito Miyake
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Patent number: 7544827Abstract: Chemical vapor deposition processes result in films having low dielectric constants when suitable chemical precursors are utilized. Preferred chemical precursors include siloxanes, (fluoroalkyl)fluorosiloxanes, (fluoroalkyl)silanes, (alkyl)fluorosilanes, (fluoroalkyl)fluorosilanes, alkylsiloxysilanes, alkoxysilanes, alkylalkoxysilanes, silylmethanes, alkoxysilylmethanes, alkylalkoxysilylmethanes, alkoxymethanes, alkylalkoxymethanes, and mixtures thereof. The precursors are particularly suited to thermal CVD for producing low dielectric constant films at relatively low temperatures, particularly without the use of additional oxidizing agents. Such films are useful in the microelectronics industry.Type: GrantFiled: October 16, 2006Date of Patent: June 9, 2009Assignee: ASM Japan K.K.Inventor: Michael A. Todd
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Publication number: 20080287700Abstract: The present invention relates to a method for preparing an omega-haloalkyl dialkylhalosilane by means of a hydrosilylation reaction in the presence of a catalytically effective amount of a hydrosilylation catalyst containing a platinum group metal. The catalytic metal is recovered by (i) subjecting the distillation residue to controlled hydrolysis to release the gaseous H-Hal haloacid, and providing an aqueous medium containing the catalytic metal with a low hydrolysable halide content Si-Hal=2%, expressed by weight of Hal, then (2i) recovering the platinum group catalytic metal from said aqueous medium by means of one of the conventional techniques specific to catalyst manufacturers that do not use a solid adsorbent and operate in ordinary facilities that do not have to be acid-resistant.Type: ApplicationFiled: June 14, 2005Publication date: November 20, 2008Inventor: Kamel Ramdani
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Publication number: 20080275264Abstract: The present invention relates to a process for the preparation of 3-chloropropyldimethylchlorosilane by hydrosilylation reaction in a reaction medium comprising dimethylhydrochlorosilane and allyl chloride, in the presence of a catalytically effective amount of di-?-chlorobis(?-1,5-cyclooctadiene)diiridium, the said process being characterized in that at least one auxiliary in the free or supported state selected from the group of compounds consisting of: (i) ketones, (ii) ethers, (iii) quinones, (iv) anhydrides, (v) unsaturated hydrocarbon compounds (UHC) having an aromatic nature and/or comprising at least one C?C double bond and/or at least one C?C triple bond, it being possible for these unsaturated bonds to be conjugated or nonconjugated, the said UHCs being linear or cyclic (mono- or polycyclic), having from 4 to 30 carbon atoms, having from 1 to 8 ethylenic and/or acetylenic unsaturations and optionally comprising one or more heteroatoms, (vi) and their mixtures, is added to the reaction medium, wiType: ApplicationFiled: July 16, 2008Publication date: November 6, 2008Applicant: RHODIA CHIMIEInventors: Nathalie GUENNOUNI, Jean-Christopher GALLAND
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Patent number: 7314946Abstract: The present invention relates to (2-cyclopentenyl)chlorosilane derivatives and the preparation method thereof. In particular, it relates to a very economical process which reacts cyclopentadiene, which is formed by a cracking of industrially produced low-priced dicyclopentadiene, with a silane compound containing silicon-hydrogen bonds at elevated temperature in a hydrocarbon compound with a boiling point of a predetermined range, thus also enabling to prevent problematic production of dicyclopentadiene polymer by using the hydrocarbon compound. Further, in the presence of a group 10 metal compound catalyst, the process herein is capable of lowering the reaction temperature and increasing the yield in the reaction of sterically hindered alkyl-dichlorosilane. The (2-cyclopentenyl)chlorosilane may be useful in preparing an organic silicon compound containing an unsaturated group or a functional silicone polymer using the same, or in modifying the surface or manufacturing a thin layer.Type: GrantFiled: December 6, 2006Date of Patent: January 1, 2008Assignee: Korea Institute of Science and TechnologyInventors: Bok Ryul Yoo, Joon Soo Han, Weon Cheol Lim
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Patent number: 7005532Abstract: An object of the present invention is to provide a process of producing alkoxysilanes, which does not use a chlorosilane as the intermediate raw material, is improved in view of the environment, and is satisfactory with respect to the yield of a desired material. The present invention is concerned with a process of producing an alkoxysilane including hydrosilylating (A) an organosilicon compound having at least one hydrogen-silicon bond and at least one alkoxy group and (B) an organic compound having a carbon—carbon unsaturated bond in vapor phase in the presence of a mixture containing a hydrosilylation catalyst and a polyalkylene glycol and supported on a carrier, thereby adding hydrogen and silicon of the compound (A) to the carbon—carbon unsaturated bond in the compound (B).Type: GrantFiled: September 11, 2002Date of Patent: February 28, 2006Assignee: Toagosei Co., Ltd.Inventors: Eiichi Suzuki, Masaki Okamoto, Seitaro Tajima, Hiroshi Suzuki, Katsuyoshi Harada
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Patent number: 6858746Abstract: A compound having at least one H—Si group is reacted with an unsaturated aliphatic compound in the presence of a platinum catalyst and at least one organic additive component. The combination of platinum catalyst and additive component is one of: (i) a solution of a Pt(0) complex catalyst in a solvent, with at least one organic amide, or (ii) a solution of a Pt(0) complex catalyst in a solvent, with at least one organic amine, or (iii) a solution of a Pt(0) complex catalyst, in a solvent, with at least one organic nitrite.Type: GrantFiled: October 10, 2002Date of Patent: February 22, 2005Assignee: Degussa AGInventors: Sabine Giessler, Helmut Mack, Dieter Barfurth
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Patent number: 6809213Abstract: A highly efficient method is provided for preparing secondary aminoisobutylalkoxysilanes by reacting hydridoalkoxysilanes with secondary methallylamines in the presence of a hydrosilation catalyst.Type: GrantFiled: May 1, 2001Date of Patent: October 26, 2004Assignee: General Electric CompanyInventors: R. Shawn Childress, Michelle A. Filipkowski, Curtis L. Schilling, Jr.
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Patent number: 6713644Abstract: Chloropropylsilanes are prepared via hydrosilation of olefinic halides with organosilicon hydrides, in the presence of neat platinum free copper containing catalysts. Organosilicon hydrides such as triethylsilane, olefinic halides such as allyl chloride, and catalysts such as copper acetate, copper chloride, copper sulphate, copper hydroxide, copper nitrate, and copper cyanide, can be used in the process.Type: GrantFiled: October 3, 2002Date of Patent: March 30, 2004Assignee: Dow Corning CorporationInventor: Binh Thanh Nguyen
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Patent number: 6489501Abstract: A method for forming at least one product silane, comprising reacting a transition metal hydride with a starting silane in a presence of a catalyst and at a temperature that exceeds a threshold temperature associated with said reacting.Type: GrantFiled: February 26, 2001Date of Patent: December 3, 2002Assignee: General Electric CompanyInventor: Florian Johannes Schattenmann
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Patent number: 6392077Abstract: The present invention relates to a process for preparing organochlorosilanes and more particularly, to the process for preparing organochlorosilanes of R4R3CHSiR1Cl2 (I) by a dehydrohalogenative coupling of hydrochlorosilanes of HSiR1Cl2 (II) with organic halides of R2R3 CHX (III) in the presence of quaternary phosphonium salt as a catalyst to provide better economical matter and yield compared with conventional methods, because only a catalytic amount of phosphonium chloride is required and the catalyst can be separated from the reaction mixture and recycled easily.Type: GrantFiled: August 1, 2001Date of Patent: May 21, 2002Assignee: Korea Institute of Science and TechnologyInventors: Il-Nam Jung, Bok-Ryul Yoo, Joon-Soo Han, Seung-Hyun Kang
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Patent number: 6384258Abstract: A method for the preparation of organylorganooxysilanes containing at least one silicon-carbon bond is provided comprising reacting at least one triorganooxysilane with at least one base.Type: GrantFiled: May 9, 2001Date of Patent: May 7, 2002Assignee: General Electric CompanyInventor: Florian Johannes Schattenmann
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Patent number: 6291698Abstract: The invention relates to a process for preparing vinyl chlorosilanes, that includes thermally and non-catalytically reacting chlorosilane with vinyl chloride at a temperature of 550 to 700° C. by flowing the chlorosilane and vinyl chloride through a ring-gap space in a ring-gap reactor to produce a reaction gas; the ring-gap space having a cross-sectional area and a volume; and, after the flowing, further reacting, adiabatically, the reaction gas in a second zone to produce a hot reaction gas that contains vinylchiorosilane; wherein the second zone has a cross-sectional area that is greater than the cross-sectional area of the ring-gap space; and wherein the second zone has a volume that is in a ratio to the volume of the ring-gap space of 0.15:1 to 1.5:1. The invention also provides an apparatus for carrying out the above process.Type: GrantFiled: April 24, 2000Date of Patent: September 18, 2001Assignee: Degussa Huels AGInventors: Stefan Bade, Bernt Kesper, Robert Koell, Hartwig Rauleder, Uwe Schoen
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Patent number: 6222056Abstract: The invention relates to a process for preparing vinylchlorosilanes by thermal non-catalyzed reaction of chlorosilanes with vinyl chloride at from 550 to 700° C., using a ring-gap reactor which includes rapidly cooling the hot reaction gases after they have flowed through the ring-gap space, by quenching them with a liquid.Type: GrantFiled: April 24, 2000Date of Patent: April 24, 2001Assignee: Degussa Huels AGInventors: Stefan Bade, Hartwig Rauleder, Uwe Schoen, Franz-Michael Bollenrath
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Patent number: 5808128Abstract: The invention relates to a method of manufacturing vinyltrichlorosilane by reacting vinyl chloride with trichlorosilane, at elevated temperature. The reaction is carried out at 400.degree.-850.degree. C., preferably 550.degree.-800.degree. C., in a fluidized bed.Type: GrantFiled: October 15, 1997Date of Patent: September 15, 1998Assignee: Huels AktiengesellschaftInventor: Emmanuel Fiolitakis
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Patent number: 5508460Abstract: An improved method for synthesizing arylsilanes is disclosed. Novel catalysts for use in the method are provided. A method for synthesizing the novel catalysts is also disclosed.Type: GrantFiled: August 15, 1994Date of Patent: April 16, 1996Assignee: Trustees of the University of PennsylvaniaInventors: Donald H. Berry, Peter I. Djurovich
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Patent number: 5344950Abstract: A process for the continuous production of vinylchlorosilanes by reacting vinyl chloride with chlorosilanes at elevated temperature consists of a heatable reaction tube having an internal diameter d.sub.1 and a tubular displacement body having an external diameter d.sub.2 mounted within the reaction tube in an axially symmetrical arrangement and extending over the entire length of the reaction tube, the diameter d.sub.2 being smaller than the diameter d.sub.1.Type: GrantFiled: January 25, 1993Date of Patent: September 6, 1994Assignee: Huls AktiengesellschaftInventors: Willy Hange, Helmut Dietsche, Claus-Dietrich Seiler
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Patent number: 5182246Abstract: A catalyst for hydrogenation, dehydrosilylation of ketones, or hydrosililation of dienes or acetylenes, comprising a complex represented the the formula:A.sup.+ [M.sub.2 H(C)).sub.10 ].sup.-wherein A.sup.+ represents an alkali metal cation, an ammonium cation, an iminium cation, or a phosphonium cation; and M represents a chromium atom, a molybdenum atom, or a tungsten atom; anda process for producing dehydrosilylation products of ketones or hydrosilylation products of dienes or acetylenes, which is characterized by using the complex as a catalyst.Type: GrantFiled: August 23, 1991Date of Patent: January 26, 1993Assignee: Sagami Chemical Research CenterInventors: Takamasa Fuchikami, Yumiko Ubukata, Yasutaka Tanaka
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Patent number: 5118829Abstract: The present invention is a process for substituting cycloalkyl substituents for a silicon bound hydrogen of a silane. The process employs a preformed organoborane compound as a catalyst to increase the apparent rate of the reaction and to increase the yield of desired cycloalkylsilanes.Type: GrantFiled: September 27, 1991Date of Patent: June 2, 1992Assignee: Dow Corning CorporationInventor: John M. Gohndrone
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Patent number: 5075480Abstract: The manufacture of vinyltrichlorosilane by reacting vinylchloride with trichlorosilane at a temperature of 400.degree. to 750.degree. C. in a tubular reactor with a rotating displacement body axial-symmetrically disposed therein is improved by heating the reactants to a temperature of 120.degree. to 400.degree. C. prior to their introduction into the reactor.Type: GrantFiled: April 30, 1991Date of Patent: December 24, 1991Assignee: Huels AktiengesellschaftInventors: Willy Hange, Claus-Dietrich Seiler, Emanuel Fiolitakis, Uwe Schon, Helmut Dietsche
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Patent number: 5041587Abstract: A process for preparing an organic silicon compound is here disclosed which comprises the step of reacting a halogenated hydrocarbon selected from the group consisting ##STR1## wherein each of X.sup.1 to X.sup.16 is selected from the group consisting of hydrogen, an alkyl group, alkenyl group, phenyl group, naphthyl group, alkoxy group, acyl group, alkylamino group and dialkylamino group having 1 to 20 carbon atoms which are unsubstituted or substituted and a halogen atom; and each of at least one of X.sup.1 to X.sup.4, at least one of X.sup.8 to X.sup.10 and at least one of X.sup.11 to X.sup.16 is a halogen atom,with a silane selected from the group consisting of SiH.sub.4, Si.sub.2 H.sub.6 and Si.sub.3 H.sub.8.Type: GrantFiled: February 12, 1990Date of Patent: August 20, 1991Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Masayoshi Itoh, Kenji Iwata, Noriyuki Yanagawa, Tetsura Utsumi, Mineo Kobayashi, Ryo Takeuchi, Tomohiro Abe
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Patent number: 4985580Abstract: The instant invention is a process for the addition of alkyl groups to non-halogen containing silanes. Non-halogen containing silanes are reacted with an alkyl halide in presence of a halogen-accepting metal. The process is run with or without a catalyst, which is effective in improving exchange of alkyl groups from the alkyl halide with hydrogen atoms of the silane.Type: GrantFiled: March 12, 1990Date of Patent: January 15, 1991Assignee: Dow Corning CorporationInventors: Kirk M. Chadwick, Roland L. Halm