Abstract: Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.

Abstract: Disclosed is a method for refining trimethylsilane, including the steps of (1) preparing an activated carbon loaded with at least copper (II) oxide and zinc oxide; (2) adsorbing a trimethylsilane onto the activated carbon; and (3) bringing a trimethylsilane containing silane, methylsilane or dimethylsilane as an impurity into contact with the activated carbon finished with the step (2) to remove the impurity from the trimethylsilane by adsorbing the impurity. According to this method, heat generation of the activated carbon is suppressed and impurities such as dimethylsilane, etc. can be removed efficiently.

Abstract: A method of producing a hydrosilane compound in a microreactor comprises reducing a halosilane compound in the microreactor and in the presence of a reducing agent to produce the hydrosilane compound.

Abstract: The present invention is directed to a process for the synthesis of organohalosilane monomers, comprising the steps of (1) forming a slurry of cyclone fines, ultra fines and/or spent contact mass in a thermally stable solvent and reacting the agitated slurry with an organohalide of the formula R1X in the presence of an additive for a time and at a temperature sufficient to produce organohalosilane monomers having the formulae R1SiHX2, R12SiHX, R13SiX, R1SiX3, and R12SiX2; wherein R1 is a saturated or unsaturated aromatic group, a saturated or unsaturated aliphatic group, alkaryl group, or cycloaliphatic hydrocarbyl group, and X is a halogen; and (2) recovering said organohalosilane monomers.

Abstract: To provide a compound, when the compound has both a high clearing point and a low crystallization temperature, having a wide temperature range of a liquid crystal phase and also an excellent solubility in other liquid crystal compounds, and further having general physical properties necessary for the compound, namely, stability to heat, light and so forth, a suitable optical anisotropy and a suitable dielectric anisotropy. A compound is represented by formula (1): wherein, for example, Ra and Rb are alkyl having 1 to 10 carbons; A1, A2, A3 and A4 are 1,4-phenylene; Z1, Z2, Z3 and Z4 are a single bond or alkylene having 1 to 4 carbons; and m, n, q and r are independently 0, 1, or 2, and a sum of m, n, q and r is 1, 2, 3 or 4.

Abstract: This invention discloses the method of forming silicon nitride, silicon oxynitride, silicon oxide, carbon-doped silicon nitride, carbon-doped silicon oxide and carbon-doped oxynitride films at low deposition temperatures. The silicon containing precursors used for the deposition are monochlorosilane (MCS) and monochloroalkylsilanes. The method is preferably carried out by using plasma enhanced atomic layer deposition, plasma enhanced chemical vapor deposition, and plasma enhanced cyclic chemical vapor deposition.

Abstract: The invention relates generally to transition metal salts, more specifically to iron, nickel, cobalt, manganese and ruthenium salts, activated with silylhydrides, and their use as efficient hydrosilylation catalysts.

Abstract: The present invention is directed to a selective and efficient process for the hydrosilylation of compounds containing terminally unsaturated 1,3-dienes using iron-based hydrosilylation catalysts. The resulting 1,2-addition products are useful as precursors for various silicone materials or silane- or silyl/silicone-functionalized polyolefins.

Abstract: The present invention relates to a compound represented by formula (I): wherein all symbols are as defined here, a salt thereof, a solvate thereof, or a prodrug thereof. The compound of the present invention has an antagonistic activity against CXCR4 and is therefore useful as a preventive and/or therapeutic agent for CXCR4-mediated diseases, for example, inflammatory and immune diseases (for example, rheumatoid arthritis, arthritis, retinopathy, pulmonary fibrosis, rejection of transplanted organ, etc.), allergic diseases, infections (for example, human immunodeficiency virus infection, acquired immunodeficiency syndrome, etc.), psychoneurotic diseases, cerebral diseases, cardiovascular disease, metabolic diseases, and cancerous diseases (for example, cancer, cancer metastasis, etc.), or an agent for regeneration therapy.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition ? capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition ? capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable, of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin.

Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.

Abstract: The present invention relates to a compound represented by formula (I): wherein all symbols are as defined here, a salt thereof, a solvate thereof, or a prodrug thereof. The compound of the present invention has an antagonistic activity against CXCR4 and is therefore useful as a preventive and/or therapeutic agent for CXCR4-mediated diseases, for example, inflammatory and immune diseases (for example, rheumatoid arthritis, arthritis, retinopathy, pulmonary fibrosis, rejection of transplanted organ, etc.), allergic diseases, infections (for example, human immunodeficiency virus infection, acquired immunodeficiency syndrome, etc.), psychoneurotic diseases, cerebral diseases, cardiovascular disease, metabolic diseases, and cancerous diseases (for example, cancer, cancer metastasis, etc.), or an agent for regeneration therapy.

Abstract: To provide a compound, when the compound has both a high clearing point and a low crystallization temperature, having a wide temperature range of a liquid crystal phase and also an excellent solubility in other liquid crystal compounds, and further having general physical properties necessary for the compound, namely, stability to heat, light and so forth, a suitable optical anisotropy and a suitable dielectric anisotropy. A compound is represented by formula (1): wherein, for example, Ra and Rb are alkyl having 1 to 10 carbons; A1, A2, A3 and A4 are 1,4-phenylene; Z1, Z2, Z3 and Z4 are a single bond or alkylene having 1 to 4 carbons; and m, n, q and r are independently 0, 1, or 2, and a sum of m, n, q and r is 1, 2, 3 or 4.

Abstract: To provide a compound, when the compound has both a high clearing point and a low crystallization temperature, having a wide temperature range of a liquid crystal phase and also an excellent solubility in other liquid crystal compounds, and further having general physical properties necessary for the compound, namely, stability to heat, light and so forth, a suitable optical anisotropy and a suitable dielectric anisotropy. A compound is represented by formula (1): wherein, for example, Ra and Rb are alkyl having 1 to 10 carbons; A1, A2, A3 and A4 are 1,4-phenylene; Z1, Z2, Z3 and Z4 are a single bond or alkylene having 1 to 4 carbons; and m, n, q and r are independently 0, 1, or 2, and a sum of m, n, q and r is 1, 2, 3 or 4.

Abstract: Organosilicone fine particles which are capable of responding to the highly advanced requirements of recent years imposed on them for purposes of actual use, including further improvement in optical characteristics such as total light transmittance and haze as well as heat-resistant colorability related to resin compositions, further improvement in usability (extensions and expansions at the time of use) and feeling (stickiness, roughness and durability) related to cosmetic materials and further improvement in matte effect and factual sense related to paint compositions, as well as methods of their production and cosmetic materials, resin compositions and paint compositions containing such particles are provided. Organosilicone fine particles have tetrahedral general shapes with surfaces each having a concave part with an approximately circular opening. The maximum external diameters L of the organosilicone fine particles have an average value in the range of 0.

Abstract: This invention discloses the method of forming silicon nitride, silicon oxynitride, silicon oxide, carbon-doped silicon nitride, carbon-doped silicon oxide and carbon-doped oxynitride films at low deposition temperatures. The silicon containing precursors used for the deposition are monochlorosilane (MCS) and monochloroalkylsilanes. The method is preferably carried out by using plasma enhanced atomic layer deposition, plasma enhanced chemical vapor deposition, and plasma enhanced cyclic chemical vapor deposition.

Abstract: The present invention relates to a process for preparing organic silane compounds having a ?-cyano ester group. In particular, the present invention relates to a process for preparing organic silane compounds having a ?-cyano ester group, in which ?-cyano ?-cyano containing compounds having an unsaturated group are hydrosilylated using a hydro alkoxy silane in the presence of a platinum-vinyl siloxane catalyst. The preparation process according to the present invention can stably initiate and progress the reaction, minimize the generation of by-products, and prepare organic silane compounds having a ?-cyano ester structure with high yield.

Abstract: Compositions and methods for controlled polymerization and/or oligomerization of hydrosilanes compounds including those of the general formulae SinH2n and SinH2n+2 as well as alkyl- and arylsilanes, to produce soluble silicon polymers as a precursor to silicon films having low carbon content.

Abstract: The invention relates to allyl functionalized precipitated silica, rubber compositions containing such silica, particularly sulfur cured rubber compositions, and articles of manufacture having a component thereof such as, for example tires. The invention particularly relates to synthetic amorphous silica, particularly a precipitated silica, treated with an allyl silane, particularly to a precipitated silica containing allyl functional groups.

Abstract: Organosilicon compounds are prepared by the addition reaction of a gaseous unsaturated hydrocarbon with a silane or siloxane containing at least one silicon-bonded hydrogen atom in the presence of a hydrosilylation catalyst in a liquid reaction medium. In this process the unsaturated hydrocarbon and optionally the silane or siloxane is dispersed into the liquid reaction medium by a jet eductor (also known as a venturi pump) device and the resultant gas-in-liquid dispersion is introduced into a bubble reactor.

Abstract: This invention relates to a process to functionalize polyolefins comprising contacting a metallocene catalyst with a hydrosilane, and one or more vinyl terminated polyolefins. This invention further relates to the hydrosilane-functionalized polyolefins produced thereby.

Abstract: Fumed silanized silica with the following physico-chemical data: Grindometer value less than 20. mu. m Tamped density 25 to 85 g/l is prepared by grinding fumed silica which has been silanized. It can be used in silicone rubber.

Abstract: Process for preparing organoalkoxyhydrosilanes with a boron content less than 100 ppb and of the formula R1xHySi(OR2)z where x+y+z=4 and x, y, z are greater than or equal to 1, wherein, in a first step, a boron-contaminated organohalohydrosilane of the formula R1xHySiHalz where x+y+z=4, x, y, z are greater than or equal to 1, and R1 are linear or branched alkyl, cycloalkyl, aryl, alkenyl or arylalkyl radicals having 1 to 12 carbon atoms and Hal is F, Cl, Br or I, is subjected to a treatment with silica or aluminosilicate and the silica or the aluminosilicate is subsequently removed from the organohalohydrosilane in a second step and then the purified organohalohydrosilane is reacted with alcohol R2—OH where R2 is a methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, isopentyl, neopentyl or tert-pentyl radical.

Abstract: Compositions and methods for controlled polymerization and/or oligomerization of hydrosilanes compounds including those of the general formulae SinH2n and SinH2n+2 as well as alkyl- and arylsilanes, to produce soluble silicon polymers as a precursor to silicon films having low carbon content.

Abstract: The invention relates to allyl functionalized precipitated silica, rubber compositions containing such silica, particularly sulfur cured rubber compositions, and articles of manufacture having a component thereof such as, for example tires. The invention particularly relates to synthetic amorphous silica, particularly a precipitated silica, treated with an allyl silane, particularly to a precipitated silica containing allyl functional groups.

Abstract: The invention relates to allyl functionalized precipitated silica, rubber compositions containing such silica, particularly sulfur cured rubber compositions, and articles of manufacture having a component thereof such as, for example tires. The invention particularly relates to synthetic amorphous silica, particularly a precipitated silica, treated with an allyl silane, particularly to a precipitated silica containing allyl functional groups.

Abstract: The invention relates to a method for the treatment of a composition containing inorganic silanes and at least one foreign metal and/or a compound containing a foreign metal, wherein the composition is brought in contact with at least one adsorption agent, and for obtaining the composition, in which the content of foreign metal and/or of a compound containing a foreign metal is reduced, and to a corresponding composition having a reduced foreign metal content, and further to the use of organic resins, activated carbons, silicates, and/or zeolites for the reduction of foreign metals and/or compounds containing foreign metals in compositions of inorganic silanes.

Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H-[(AHR)n(c-AmHpm-2)q]—H, where each instance of A is independently Si or Ge; R is H, -AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14-a, the formula AkHgR1?h and/or the formula c-AmHpmR1fm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane.

Abstract: An organic light emitting device having a high efficiency and durability is provided. The organic light emitting device includes an anode, a cathode and a layer formed of an organic compound interposed between the anode and the cathode, and contains at least one kind of the fluorene compound represented by the following general formula (I) or (II): wherein R1 to R4 each represent an alkyl group, a fluorinated alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group; and Ar1 to Ar8 represent a substituted or unsubstituted aryl group or a substituted or unsubstituted polycondensed aromatic group.

Abstract: The Direct Synthesis of trialkoxysilane is carried out by conducting the Direct Synthesis reaction of silicon and alcohol, optionally in solvent, in the presence of a catalytically effective amount of Direct Synthesis catalyst and an effective catalyst-promoting amount of Direct Synthesis catalyst promoter, said promoter being an organic or inorganic compound possessing at least one phosphorus-oxygen bond.

Abstract: An interlayer insulating film enabling an enhancement in a signal processing speed to be obtained, of which a dielectric constant is 2.2 or less. There is provided a method of forming a film on a substrate in accordance with a chemical vapor deposition process, comprising: the feeding step of feeding (c-C5H9)2Si(OCH3)2 by inert gas bubbling; and the deposition step of causing any of decomposition product resulting from decomposition of the (c-C5H9)2Si(OCH3)2 fed in the above feeding step to deposit on the substrate.

Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H—[(AHR)n(c-AmHpm?2)q]—H, where each instance of A is independently Si or Ge; R is H, —AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14?a, the formula AkHgR1?h and/or the formula c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane.

Abstract: Electron donor compounds, suitable for use as adhesives or as components in adhesives, contain a carbon to carbon double bond attached to an aromatic ring and conjugated with the unsaturation in the aromatic ring.

Abstract: Silane gas precursor compounds having the formula (I): wherein R1, R2, and R3 each can independently be hydrogen or halogen and wherein the cyclohexadiene ring can have one or more substituents selected from the group consisting of a saturated or unsaturated, straight chain or branched alkyl group, a halogen, NO2, and C?N are disclosed. In one form, the silane gas precursor compound is cyclohexadien-2,4-ylsilane, an air-stable liquid, that can be thermolyzed in a pyrolysis process to efficiently generate high purity silane gas. The compounds of the present invention can thus serve as a “point-of-use” precursor for silane gas.

Abstract: The present invention relates to a novel organic silane compound, and more particularly, to a novel organic silane compound, useful in various applications, for the purpose of improving the affinity of an organic resin to an inorganic filler or improving the adhesion of a coating layer comprising matrix resin to a substrate. It is particularly useful for improving the adhesion of a polarizing plate adhesive for a liquid crystal display to a glass substrate, with little change over time even under hot and humid conditions.

Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.

Abstract: The invention concerns ligands with at least a fluorosilicone substituent of general formulae (I) and (II); a method for preparing them and their use for producing catalysts useful for olefin polymerisation

Abstract: Electron donor compounds, suitable for use as adhesives or as components in adhesives, contain a carbon to carbon double bond attached to an aromatic ring and conjugated with the unsaturation in the aromatic ring.

Abstract: Novel processes for preparing hydridosiloxane and organohydridosiloxane resins are disclosed. The processes of the invention broadly provide for the steps of contacting a silane monomer with a phase transfer catalyst in the presence of a reaction mixture that includes a nonpolar, e.g., hydrocarbon, solvent, and a polar solvent, e.g., alcohol and water. The process is conducted under conditions effective to catalytically convert said silane monomer into hydridosiloxane and organohydridosiloxane resins. Recovery of the products is advantageously aided by the ease of separating the phase transfer catalyst from the dual phase reaction mixture by separating the immiscible polar solvent carrying the catalyst from the nonpolar solvent, that carries the product. Hydridosiloxane and organohydridosiloxane resins produced by the processes of the invention are also provided.

Abstract: Silicon precursors for forming silicon films. Hexacoordinated silicon beta-diketonate compositions are described, of the formula R2Si(-diketonate)2 or (RO)2Si(&bgr;-diketonate)2, wherein each R is the same as or different from the other R, and each R is independently selected from H, aryl, fluoroaryl, C1-C12 alkyl, C1-C12 fluoroalkyl and C1-C12 silicon-containing alkyl. The precursors are compatible with dopant co-precursors such as transition metal &bgr;-diketonate coordination complexes. The compositions enable low temperature (e.g., <600° C.) formation of gate dielectrics, capacitor films, etc., in the fabrication of VLSI microelectronic devices.