Hydrogen Bonded Directly To The Silicon Patents (Class 556/487)
  • Patent number: 9023479
    Abstract: Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: May 5, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Sung Ho Son, Yun Bong Kim, Won Seok Jang, Yong Gyun Cho
  • Publication number: 20150119596
    Abstract: Disclosed is a method for refining trimethylsilane, including the steps of (1) preparing an activated carbon loaded with at least copper (II) oxide and zinc oxide; (2) adsorbing a trimethylsilane onto the activated carbon; and (3) bringing a trimethylsilane containing silane, methylsilane or dimethylsilane as an impurity into contact with the activated carbon finished with the step (2) to remove the impurity from the trimethylsilane by adsorbing the impurity. According to this method, heat generation of the activated carbon is suppressed and impurities such as dimethylsilane, etc. can be removed efficiently.
    Type: Application
    Filed: January 16, 2013
    Publication date: April 30, 2015
    Inventors: Takuya Teshima, Takaaki Shibayama, Yosuke Nakamura, Tomoyuki Hiraoka
  • Publication number: 20150080596
    Abstract: A method of producing a hydrosilane compound in a microreactor comprises reducing a halosilane compound in the microreactor and in the presence of a reducing agent to produce the hydrosilane compound.
    Type: Application
    Filed: February 14, 2013
    Publication date: March 19, 2015
    Inventors: Binh Thanh Nguyen, Simon Parsley, Jacob Remacle, Levon Shahinian, Hanh Vo
  • Publication number: 20150065740
    Abstract: The present invention is directed to a process for the synthesis of organohalosilane monomers, comprising the steps of (1) forming a slurry of cyclone fines, ultra fines and/or spent contact mass in a thermally stable solvent and reacting the agitated slurry with an organohalide of the formula R1X in the presence of an additive for a time and at a temperature sufficient to produce organohalosilane monomers having the formulae R1SiHX2, R12SiHX, R13SiX, R1SiX3, and R12SiX2; wherein R1 is a saturated or unsaturated aromatic group, a saturated or unsaturated aliphatic group, alkaryl group, or cycloaliphatic hydrocarbyl group, and X is a halogen; and (2) recovering said organohalosilane monomers.
    Type: Application
    Filed: August 28, 2014
    Publication date: March 5, 2015
    Inventors: Kenrick Martin Lewis, Yanjun Zhu, Abellard T. Mereigh, John Razzano, John David Neely
  • Patent number: 8956552
    Abstract: To provide a compound, when the compound has both a high clearing point and a low crystallization temperature, having a wide temperature range of a liquid crystal phase and also an excellent solubility in other liquid crystal compounds, and further having general physical properties necessary for the compound, namely, stability to heat, light and so forth, a suitable optical anisotropy and a suitable dielectric anisotropy. A compound is represented by formula (1): wherein, for example, Ra and Rb are alkyl having 1 to 10 carbons; A1, A2, A3 and A4 are 1,4-phenylene; Z1, Z2, Z3 and Z4 are a single bond or alkylene having 1 to 4 carbons; and m, n, q and r are independently 0, 1, or 2, and a sum of m, n, q and r is 1, 2, 3 or 4.
    Type: Grant
    Filed: June 17, 2013
    Date of Patent: February 17, 2015
    Assignees: JNC Corporation, JNC Petrochemical Corporation
    Inventor: Yasuyuki Sasada
  • Patent number: 8906455
    Abstract: This invention discloses the method of forming silicon nitride, silicon oxynitride, silicon oxide, carbon-doped silicon nitride, carbon-doped silicon oxide and carbon-doped oxynitride films at low deposition temperatures. The silicon containing precursors used for the deposition are monochlorosilane (MCS) and monochloroalkylsilanes. The method is preferably carried out by using plasma enhanced atomic layer deposition, plasma enhanced chemical vapor deposition, and plasma enhanced cyclic chemical vapor deposition.
    Type: Grant
    Filed: September 21, 2012
    Date of Patent: December 9, 2014
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Liu Yang, Xinjian Lei, Bing Han, Manchao Xiao, Eugene Joseph Karwacki, Jr., Hansong Cheng
  • Publication number: 20140343311
    Abstract: The invention relates generally to transition metal salts, more specifically to iron, nickel, cobalt, manganese and ruthenium salts, activated with silylhydrides, and their use as efficient hydrosilylation catalysts.
    Type: Application
    Filed: May 15, 2014
    Publication date: November 20, 2014
    Inventors: Julie L. Boyer, Aroop Kumar Roy
  • Publication number: 20140330024
    Abstract: The present invention is directed to a selective and efficient process for the hydrosilylation of compounds containing terminally unsaturated 1,3-dienes using iron-based hydrosilylation catalysts. The resulting 1,2-addition products are useful as precursors for various silicone materials or silane- or silyl/silicone-functionalized polyolefins.
    Type: Application
    Filed: May 6, 2014
    Publication date: November 6, 2014
    Inventors: Crisita Carmen Hojilla Atienza, Aroop Kumar Roy, Paul J. Chirik, Keith J. Weller, Johannes G.P. Delis, Tianning Diao
  • Patent number: 8871210
    Abstract: The present invention relates to a compound represented by formula (I): wherein all symbols are as defined here, a salt thereof, a solvate thereof, or a prodrug thereof. The compound of the present invention has an antagonistic activity against CXCR4 and is therefore useful as a preventive and/or therapeutic agent for CXCR4-mediated diseases, for example, inflammatory and immune diseases (for example, rheumatoid arthritis, arthritis, retinopathy, pulmonary fibrosis, rejection of transplanted organ, etc.), allergic diseases, infections (for example, human immunodeficiency virus infection, acquired immunodeficiency syndrome, etc.), psychoneurotic diseases, cerebral diseases, cardiovascular disease, metabolic diseases, and cancerous diseases (for example, cancer, cancer metastasis, etc.), or an agent for regeneration therapy.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: October 28, 2014
    Assignee: Ono Pharmaceutical Co., Ltd.
    Inventors: Masaya Kokubo, Motoyuki Tanaka, Hiroshi Ochiai, Yoshikazu Takaoka, Shiro Shibayama
  • Publication number: 20140249311
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: September 4, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Avril Surgenor, Richard Taylor, Binh Nguyen, MIng-Shin Tzou
  • Publication number: 20140231702
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: August 21, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Aswini Dash, Matthew Olsen, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140231703
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition ? capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: August 21, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140228570
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: August 14, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140228573
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: August 14, 2014
    Applicant: Dow Corning Corporation
    Inventors: Kurt Brandstadt, Simon Cook, Aswini Dash, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140225027
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition ? capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: August 14, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Aswini Dash, Matthew Olsen, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140206863
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: July 24, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Aswini Dash, Matthew Olsen, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140206869
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable, of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: July 24, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Aswini Dash, Matthew Olsen, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140200348
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: July 17, 2014
    Applicant: Dow Corning Corporation
    Inventors: Kurt Brandstadt, Simon Cook, Avril Surgenor, Richard Taylor, Ming-Shin Tzou, Binh Nguyen
  • Publication number: 20140182483
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: July 3, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Matthew Olsen, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140183398
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin.
    Type: Application
    Filed: September 20, 2012
    Publication date: July 3, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Aswini Dash, Matthew Olsen, Avril Surgenor, Richard Taylor, Binh Thanh Nguyen, Ming-Shin Tzou
  • Publication number: 20140187783
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a metal-ligand complex that can be prepared by a method including reacting a metal precursor and a ligand.
    Type: Application
    Filed: September 20, 2012
    Publication date: July 3, 2014
    Inventors: Kurt Brandstadt, Simon Cook, Aswini Dash, Matthew Olsen, Avril Surgenor, Richard Taylor, Binh Nguyen, Ming-Shin Tzou
  • Publication number: 20140072576
    Abstract: The present invention relates to a compound represented by formula (I): wherein all symbols are as defined here, a salt thereof, a solvate thereof, or a prodrug thereof. The compound of the present invention has an antagonistic activity against CXCR4 and is therefore useful as a preventive and/or therapeutic agent for CXCR4-mediated diseases, for example, inflammatory and immune diseases (for example, rheumatoid arthritis, arthritis, retinopathy, pulmonary fibrosis, rejection of transplanted organ, etc.), allergic diseases, infections (for example, human immunodeficiency virus infection, acquired immunodeficiency syndrome, etc.), psychoneurotic diseases, cerebral diseases, cardiovascular disease, metabolic diseases, and cancerous diseases (for example, cancer, cancer metastasis, etc.), or an agent for regeneration therapy.
    Type: Application
    Filed: November 8, 2013
    Publication date: March 13, 2014
    Applicant: ONO PHARMACEUTICAL CO., LTD.
    Inventors: Masaya KOKUBO, Motoyuki TANAKA, Hiroshi OCHIAI, Yoshikazu TAKAOKA, Shiro SHIBAYAMA
  • Publication number: 20130277612
    Abstract: To provide a compound, when the compound has both a high clearing point and a low crystallization temperature, having a wide temperature range of a liquid crystal phase and also an excellent solubility in other liquid crystal compounds, and further having general physical properties necessary for the compound, namely, stability to heat, light and so forth, a suitable optical anisotropy and a suitable dielectric anisotropy. A compound is represented by formula (1): wherein, for example, Ra and Rb are alkyl having 1 to 10 carbons; A1, A2, A3 and A4 are 1,4-phenylene; Z1, Z2, Z3 and Z4 are a single bond or alkylene having 1 to 4 carbons; and m, n, q and r are independently 0, 1, or 2, and a sum of m, n, q and r is 1, 2, 3 or 4.
    Type: Application
    Filed: June 17, 2013
    Publication date: October 24, 2013
    Applicants: JNC CORPORATION
    Inventor: Yasuyuki SASADA
  • Publication number: 20130270480
    Abstract: To provide a compound, when the compound has both a high clearing point and a low crystallization temperature, having a wide temperature range of a liquid crystal phase and also an excellent solubility in other liquid crystal compounds, and further having general physical properties necessary for the compound, namely, stability to heat, light and so forth, a suitable optical anisotropy and a suitable dielectric anisotropy. A compound is represented by formula (1): wherein, for example, Ra and Rb are alkyl having 1 to 10 carbons; A1, A2, A3 and A4 are 1,4-phenylene; Z1, Z2, Z3 and Z4 are a single bond or alkylene having 1 to 4 carbons; and m, n, q and r are independently 0, 1, or 2, and a sum of m, n, q and r is 1, 2, 3 or 4.
    Type: Application
    Filed: October 13, 2011
    Publication date: October 17, 2013
    Applicants: JNC PETROCHEMICAL CORPORATION, JNC CORPORATION
    Inventor: Yasuyuki Sasada
  • Patent number: 8524363
    Abstract: Organosilicone fine particles which are capable of responding to the highly advanced requirements of recent years imposed on them for purposes of actual use, including further improvement in optical characteristics such as total light transmittance and haze as well as heat-resistant colorability related to resin compositions, further improvement in usability (extensions and expansions at the time of use) and feeling (stickiness, roughness and durability) related to cosmetic materials and further improvement in matte effect and factual sense related to paint compositions, as well as methods of their production and cosmetic materials, resin compositions and paint compositions containing such particles are provided. Organosilicone fine particles have tetrahedral general shapes with surfaces each having a concave part with an approximately circular opening. The maximum external diameters L of the organosilicone fine particles have an average value in the range of 0.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: September 3, 2013
    Assignee: Takemoto Yushi Kabushiki Kaisha
    Inventors: Chiaki Saito, Motoki Maeda, Eriko Hatta
  • Publication number: 20130189853
    Abstract: This invention discloses the method of forming silicon nitride, silicon oxynitride, silicon oxide, carbon-doped silicon nitride, carbon-doped silicon oxide and carbon-doped oxynitride films at low deposition temperatures. The silicon containing precursors used for the deposition are monochlorosilane (MCS) and monochloroalkylsilanes. The method is preferably carried out by using plasma enhanced atomic layer deposition, plasma enhanced chemical vapor deposition, and plasma enhanced cyclic chemical vapor deposition.
    Type: Application
    Filed: September 21, 2012
    Publication date: July 25, 2013
    Applicants: TOKYO ELECTRON LIMITED, AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Liu Yang, Xinjian Lei, Bing Han, Manchao Xiao, Eugene Joseph Karwacki, JR., Kazuhide Hasebe, Masanobu Matsunaga, Masato Yonezawa, Hansong Cheng
  • Patent number: 8461368
    Abstract: The present invention relates to a process for preparing organic silane compounds having a ?-cyano ester group. In particular, the present invention relates to a process for preparing organic silane compounds having a ?-cyano ester group, in which ?-cyano ?-cyano containing compounds having an unsaturated group are hydrosilylated using a hydro alkoxy silane in the presence of a platinum-vinyl siloxane catalyst. The preparation process according to the present invention can stably initiate and progress the reaction, minimize the generation of by-products, and prepare organic silane compounds having a ?-cyano ester structure with high yield.
    Type: Grant
    Filed: December 3, 2007
    Date of Patent: June 11, 2013
    Assignee: LG Chem, Ltd.
    Inventors: No Ma Kim, Jeong Min Ha, Sung Soo Yoon
  • Patent number: 8461284
    Abstract: Compositions and methods for controlled polymerization and/or oligomerization of hydrosilanes compounds including those of the general formulae SinH2n and SinH2n+2 as well as alkyl- and arylsilanes, to produce soluble silicon polymers as a precursor to silicon films having low carbon content.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: June 11, 2013
    Assignee: Kovio, Inc.
    Inventors: Dmitry Karshtedt, Joerg Rockenberger, Fabio Zürcher, Brent Ridley, Erik Scher
  • Patent number: 8440750
    Abstract: The invention relates to allyl functionalized precipitated silica, rubber compositions containing such silica, particularly sulfur cured rubber compositions, and articles of manufacture having a component thereof such as, for example tires. The invention particularly relates to synthetic amorphous silica, particularly a precipitated silica, treated with an allyl silane, particularly to a precipitated silica containing allyl functional groups.
    Type: Grant
    Filed: November 12, 2010
    Date of Patent: May 14, 2013
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Bruce Raymond Hahn, Edward Lee Johnson, Abdulkareem Modupe Melaiye, Bing Jiang, Robert Alan Kinsey
  • Patent number: 8420844
    Abstract: Organosilicon compounds are prepared by the addition reaction of a gaseous unsaturated hydrocarbon with a silane or siloxane containing at least one silicon-bonded hydrogen atom in the presence of a hydrosilylation catalyst in a liquid reaction medium. In this process the unsaturated hydrocarbon and optionally the silane or siloxane is dispersed into the liquid reaction medium by a jet eductor (also known as a venturi pump) device and the resultant gas-in-liquid dispersion is introduced into a bubble reactor.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: April 16, 2013
    Assignee: Momentive Performance Materials Inc.
    Inventors: Larry A. Divins, Frank D. Mendicino, John P. Smith, Marco Veri
  • Publication number: 20120245300
    Abstract: This invention relates to a process to functionalize polyolefins comprising contacting a metallocene catalyst with a hydrosilane, and one or more vinyl terminated polyolefins. This invention further relates to the hydrosilane-functionalized polyolefins produced thereby.
    Type: Application
    Filed: March 25, 2011
    Publication date: September 27, 2012
    Inventors: Donna J. Crowther, Jacqueline A. Lovell, Patrick Brant
  • Publication number: 20120220694
    Abstract: Fumed silanized silica with the following physico-chemical data: Grindometer value less than 20. mu. m Tamped density 25 to 85 g/l is prepared by grinding fumed silica which has been silanized. It can be used in silicone rubber.
    Type: Application
    Filed: February 28, 2012
    Publication date: August 30, 2012
    Applicant: Evonik Degussa GmbH
    Inventors: Jürgen MEYER, Mario Scholz
  • Publication number: 20120095248
    Abstract: Process for preparing organoalkoxyhydrosilanes with a boron content less than 100 ppb and of the formula R1xHySi(OR2)z where x+y+z=4 and x, y, z are greater than or equal to 1, wherein, in a first step, a boron-contaminated organohalohydrosilane of the formula R1xHySiHalz where x+y+z=4, x, y, z are greater than or equal to 1, and R1 are linear or branched alkyl, cycloalkyl, aryl, alkenyl or arylalkyl radicals having 1 to 12 carbon atoms and Hal is F, Cl, Br or I, is subjected to a treatment with silica or aluminosilicate and the silica or the aluminosilicate is subsequently removed from the organohalohydrosilane in a second step and then the purified organohalohydrosilane is reacted with alcohol R2—OH where R2 is a methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, isopentyl, neopentyl or tert-pentyl radical.
    Type: Application
    Filed: June 21, 2010
    Publication date: April 19, 2012
    Applicant: Wacker Chemie AG
    Inventors: Wolfgang Knies, Karin Bögershausen
  • Publication number: 20120061679
    Abstract: Compositions and methods for controlled polymerization and/or oligomerization of hydrosilanes compounds including those of the general formulae SinH2n and SinH2n+2 as well as alkyl- and arylsilanes, to produce soluble silicon polymers as a precursor to silicon films having low carbon content.
    Type: Application
    Filed: November 17, 2011
    Publication date: March 15, 2012
    Inventors: Dmitry KARSHTEDT, Joerg ROCKENBERGER, Fabio ZÜRCHER, Brent RIDLEY, Erik SCHER
  • Patent number: 8003724
    Abstract: The invention relates to allyl functionalized precipitated silica, rubber compositions containing such silica, particularly sulfur cured rubber compositions, and articles of manufacture having a component thereof such as, for example tires. The invention particularly relates to synthetic amorphous silica, particularly a precipitated silica, treated with an allyl silane, particularly to a precipitated silica containing allyl functional groups.
    Type: Grant
    Filed: May 17, 2010
    Date of Patent: August 23, 2011
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Bruce Raymond Hahn, Edward Lee Johnson, Abdulkareem Modupe Melaiye, Bing Jiang, Robert Alan Kinsey
  • Publication number: 20110060083
    Abstract: The invention relates to allyl functionalized precipitated silica, rubber compositions containing such silica, particularly sulfur cured rubber compositions, and articles of manufacture having a component thereof such as, for example tires. The invention particularly relates to synthetic amorphous silica, particularly a precipitated silica, treated with an allyl silane, particularly to a precipitated silica containing allyl functional groups.
    Type: Application
    Filed: November 12, 2010
    Publication date: March 10, 2011
    Inventors: Bruce Raymond Hahn, Edward Lee Johnson, Abdulkareem Modupe Melaiye, Bing Jiang, Robert Alan Kinsey
  • Publication number: 20100266489
    Abstract: The invention relates to a method for the treatment of a composition containing inorganic silanes and at least one foreign metal and/or a compound containing a foreign metal, wherein the composition is brought in contact with at least one adsorption agent, and for obtaining the composition, in which the content of foreign metal and/or of a compound containing a foreign metal is reduced, and to a corresponding composition having a reduced foreign metal content, and further to the use of organic resins, activated carbons, silicates, and/or zeolites for the reduction of foreign metals and/or compounds containing foreign metals in compositions of inorganic silanes.
    Type: Application
    Filed: August 20, 2008
    Publication date: October 21, 2010
    Applicant: Evonik Degussa GmbH
    Inventors: Hartwig Rauleder, Ekkehard Mueh, Jaroslaw Monkiewicz, Hans Juergen Hoene, Raymund Sonnenschein
  • Patent number: 7723457
    Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H-[(AHR)n(c-AmHpm-2)q]—H, where each instance of A is independently Si or Ge; R is H, -AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14-a, the formula AkHgR1?h and/or the formula c-AmHpmR1fm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane.
    Type: Grant
    Filed: December 31, 2008
    Date of Patent: May 25, 2010
    Assignee: Kovio, Inc.
    Inventors: Wenzhuo Guo, Vladimir K. Dioumaev, Joerg Rockenberger, Brent Ridley
  • Publication number: 20100072885
    Abstract: An organic light emitting device having a high efficiency and durability is provided. The organic light emitting device includes an anode, a cathode and a layer formed of an organic compound interposed between the anode and the cathode, and contains at least one kind of the fluorene compound represented by the following general formula (I) or (II): wherein R1 to R4 each represent an alkyl group, a fluorinated alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aryl group; and Ar1 to Ar8 represent a substituted or unsubstituted aryl group or a substituted or unsubstituted polycondensed aromatic group.
    Type: Application
    Filed: May 21, 2008
    Publication date: March 25, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Taiki Watanabe, Kazunori Ueno, Koichi Suzuki, Yohei Iwasaki
  • Patent number: 7652164
    Abstract: The Direct Synthesis of trialkoxysilane is carried out by conducting the Direct Synthesis reaction of silicon and alcohol, optionally in solvent, in the presence of a catalytically effective amount of Direct Synthesis catalyst and an effective catalyst-promoting amount of Direct Synthesis catalyst promoter, said promoter being an organic or inorganic compound possessing at least one phosphorus-oxygen bond.
    Type: Grant
    Filed: November 21, 2005
    Date of Patent: January 26, 2010
    Assignee: Momentive Performance Materials Inc.
    Inventors: Kenrick M. Lewis, Abellard T. Mereigh, Chi-Lin O'Young, Rudolph A. Cameron
  • Publication number: 20090130326
    Abstract: An interlayer insulating film enabling an enhancement in a signal processing speed to be obtained, of which a dielectric constant is 2.2 or less. There is provided a method of forming a film on a substrate in accordance with a chemical vapor deposition process, comprising: the feeding step of feeding (c-C5H9)2Si(OCH3)2 by inert gas bubbling; and the deposition step of causing any of decomposition product resulting from decomposition of the (c-C5H9)2Si(OCH3)2 fed in the above feeding step to deposit on the substrate.
    Type: Application
    Filed: January 10, 2006
    Publication date: May 21, 2009
    Applicant: TRI CHEMICAL LABORATORIES INC.
    Inventors: Hideaki Machida, Ikuyo Muramoto, Young Hua Xu
  • Patent number: 7485691
    Abstract: Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H—[(AHR)n(c-AmHpm?2)q]—H, where each instance of A is independently Si or Ge; R is H, —AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)?10 if q=0, q?3 if n=0, and (n+q)?6 if both n and q?0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14?a, the formula AkHgR1?h and/or the formula c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: February 3, 2009
    Assignee: Kovio, Inc
    Inventors: Wenzhuo Guo, Vladimir K. Dioumaev, Joerg Rockenberger, Brent Ridley
  • Patent number: 7326746
    Abstract: Electron donor compounds, suitable for use as adhesives or as components in adhesives, contain a carbon to carbon double bond attached to an aromatic ring and conjugated with the unsaturation in the aromatic ring.
    Type: Grant
    Filed: February 17, 2005
    Date of Patent: February 5, 2008
    Inventors: Osama M. Musa, Donald E. Herr, Nikola A. Nikolic
  • Patent number: 7319159
    Abstract: Silane gas precursor compounds having the formula (I): wherein R1, R2, and R3 each can independently be hydrogen or halogen and wherein the cyclohexadiene ring can have one or more substituents selected from the group consisting of a saturated or unsaturated, straight chain or branched alkyl group, a halogen, NO2, and C?N are disclosed. In one form, the silane gas precursor compound is cyclohexadien-2,4-ylsilane, an air-stable liquid, that can be thermolyzed in a pyrolysis process to efficiently generate high purity silane gas. The compounds of the present invention can thus serve as a “point-of-use” precursor for silane gas.
    Type: Grant
    Filed: September 13, 2006
    Date of Patent: January 15, 2008
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Dovas A. Saulys, Thomas F. Kuech, John A. Roberts
  • Patent number: 7262313
    Abstract: The present invention relates to a novel organic silane compound, and more particularly, to a novel organic silane compound, useful in various applications, for the purpose of improving the affinity of an organic resin to an inorganic filler or improving the adhesion of a coating layer comprising matrix resin to a substrate. It is particularly useful for improving the adhesion of a polarizing plate adhesive for a liquid crystal display to a glass substrate, with little change over time even under hot and humid conditions.
    Type: Grant
    Filed: October 19, 2006
    Date of Patent: August 28, 2007
    Assignee: LG Chem, Ltd.
    Inventors: Michael J. Kim, Noma Kim, Anna Lee, Sera Kim, Sukky Chang, Sungchul Lim
  • Patent number: 7235683
    Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: June 26, 2007
    Assignee: Gelest Inc.
    Inventors: Benigno A. Janeiro, Barry C. Arkles
  • Patent number: 6958408
    Abstract: The invention concerns ligands with at least a fluorosilicone substituent of general formulae (I) and (II); a method for preparing them and their use for producing catalysts useful for olefin polymerisation
    Type: Grant
    Filed: August 2, 2001
    Date of Patent: October 25, 2005
    Assignee: Total Petrochemicals France
    Inventors: Virginie Cheron, Jean-Luc Couturier, Hendrik Hagen, Gerard Van Koten, Berth Jan Deelman
  • Patent number: 6908957
    Abstract: Electron donor compounds, suitable for use as adhesives or as components in adhesives, contain a carbon to carbon double bond attached to an aromatic ring and conjugated with the unsaturation in the aromatic ring.
    Type: Grant
    Filed: August 3, 2001
    Date of Patent: June 21, 2005
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Osama M. Musa, Donald E. Herr, Nikola A. Nikolic
  • Patent number: 6743856
    Abstract: Novel processes for preparing hydridosiloxane and organohydridosiloxane resins are disclosed. The processes of the invention broadly provide for the steps of contacting a silane monomer with a phase transfer catalyst in the presence of a reaction mixture that includes a nonpolar, e.g., hydrocarbon, solvent, and a polar solvent, e.g., alcohol and water. The process is conducted under conditions effective to catalytically convert said silane monomer into hydridosiloxane and organohydridosiloxane resins. Recovery of the products is advantageously aided by the ease of separating the phase transfer catalyst from the dual phase reaction mixture by separating the immiscible polar solvent carrying the catalyst from the nonpolar solvent, that carries the product. Hydridosiloxane and organohydridosiloxane resins produced by the processes of the invention are also provided.
    Type: Grant
    Filed: February 16, 2000
    Date of Patent: June 1, 2004
    Assignee: Honeywell International Inc.
    Inventors: Nigel P. Hacker, Lisa K. Figge, Scott Lefferts
  • Patent number: 6736993
    Abstract: Silicon precursors for forming silicon films. Hexacoordinated silicon beta-diketonate compositions are described, of the formula R2Si(-diketonate)2 or (RO)2Si(&bgr;-diketonate)2, wherein each R is the same as or different from the other R, and each R is independently selected from H, aryl, fluoroaryl, C1-C12 alkyl, C1-C12 fluoroalkyl and C1-C12 silicon-containing alkyl. The precursors are compatible with dopant co-precursors such as transition metal &bgr;-diketonate coordination complexes. The compositions enable low temperature (e.g., <600° C.) formation of gate dielectrics, capacitor films, etc., in the fabrication of VLSI microelectronic devices.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: May 18, 2004
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Chongying Xu, Thomas H. Baum, Bryan C. Hendrix