Hydrogen Bonded Directly To The Silicon Patents (Class 556/487)
  • Patent number: 6703083
    Abstract: Silicon compounds having a low viscosity and a low threshold voltage and improved mutual solubility, a liquid crystal composition comprising the same and a liquid crystal display using the liquid crystal composition. The silicon compound is represented by formula (1): wherein Y1 is, for example, alkylene having 1 to 10 carbon atoms, Y2 is, for example, hydrogen, halogen, —CN, —C≡C—CN, or alkyl having 1 to 10 carbon atoms; A1, A2, A3, and A4 each are, for example, independently 1,4-cyclohexylene, 1,4-cyclohexenylene, 1,4-phenylene, or 1,4-phenylene; Z1, Z2 and Z3 each are independently a single bond, —(CH2)2—, —OCH2—, —CH2O—, —CH═CH—, —C≡C—, —(CH2)4—, —O(CH2)3—, —(CH2)3O—, —COO—, —OCO—, —OCF2—, or —CF2O—; and p and q each are independently 0 or 1.
    Type: Grant
    Filed: February 28, 2002
    Date of Patent: March 9, 2004
    Assignees: Chisso Corporation, Chisso Petrochemical Corporation
    Inventors: Takashi Kato, Yasuyuki Koizumi, Yasuhiro Kubo, Kanetsugu Terashima
  • Patent number: 6696588
    Abstract: The invention provides a novel silicon-containing compound having an oxidation potential of 0.3 to 1.5 V on the basis of a standard hydrogen electrode, wherein at least one alkoxy group is bonded to a silicon atom and at least one aromatic amine group is also bonded to the silicon atom. An organic electroluminescence device having excellent mechanical and electric contact between an electrode and an organic layer is also provided by treating the surface of an anode with using a surface-treating agent comprising the above silicon-containing compound.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: February 24, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Masato Ueda, Isao Yahagi, Makoto Kitano
  • Patent number: 6500414
    Abstract: The present invention relates to a process for protecting hair and skin from the deleterious effects of ultra violet radiation using topical applications of a novel dimethicone copolyol compounds bearing ultra violet absorbing substituents.
    Type: Grant
    Filed: August 22, 2001
    Date of Patent: December 31, 2002
    Assignee: Siltech LLC
    Inventor: Anthony J. O'Lenick, Jr.
  • Patent number: 6413646
    Abstract: The present invention is directed to acyl and carbonate blocked phenolic silanes of the general structural formula is: (RIC(═O)O)yC6RII6−y−z[CxH2xSi(ORIII)3−a(RIV)a]z where RI is H, CH3 or RVO; RII is H or RVO; RIII is alkyl, phenyl or acyl from 1 to 6 carbon atoms; RIV is hydrogen, alkyl or phenyl from 1 to 6 carbon atoms; RV is a linear or branched alkyl group from 1 to 4 carbon atoms; y is an integer from 1 to 3; z is an integer from 1 to 3; x is an integer from 2 to 6 and a is an integer from 0 to 2.
    Type: Grant
    Filed: July 29, 1999
    Date of Patent: July 2, 2002
    Assignee: Crompton Corporation
    Inventors: Eric R. Pohl, Scot M Turner
  • Patent number: 6410770
    Abstract: This invention includes a process for producing an alkylsilane, comprising reducing an alkoxysilane in the presence of an alkali metal hydride in the presence of a high boiling solvent. The alkylsilane has a boiling point lower than the boiling point of the solvent, which is typically diglyme. This invention also includes a chloride-free alkylsilane formed from the reduction of an alkoxysilane in the presence of an alkali metal hydride. The alkylsilane produced according to the process of the present invention may be useful in microelectronic applications, such as in the production of chloride-free low dielectric constant materials which may be produced by the chemical vapor deposition of such silanes.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: June 25, 2002
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Gerald Larson
  • Patent number: 6369258
    Abstract: The invention provides a novel silicon-containing compound having an oxidation potential of 0.3 to 1.5 V on the basis of a standard hydrogen electrode, wherein at least one alkoxy group is bonded to a silicon atom and at least one aromatic amine group is also bonded to the silicon atom. An organic electroluminescence device having excellent mechanical and electric contact between an electrode and an organic layer is also provided by treating the surface of an anode with using a surface-treating agent comprising the above silicon-containing compound.
    Type: Grant
    Filed: March 2, 1998
    Date of Patent: April 9, 2002
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Masato Ueda, Isao Yahagi, Makoto Kitano
  • Patent number: 6365764
    Abstract: Metallocene compounds having two fluorenyl ligands bridged with a single silicon or germanium atom, said atom having two substituent groups containing a total of at least four carbon atoms, are useful as catalyst components for the polymerization of olefins. Particularly, it is possible to prepare high molecular weight atactic polypropylene with improved yields with respect to the known catalysts.
    Type: Grant
    Filed: June 19, 2000
    Date of Patent: April 2, 2002
    Assignee: Basell Technology Company BV
    Inventors: Luigi Resconi, Robert L. Jones
  • Patent number: 6346595
    Abstract: The present invention relates to novel dimethicone copolyol compounds bearing ultra violet absorbing substituents. This invention also relates to compositions of matter, in particular cosmetic compositions, comprising the above novel compounds, which are especially well suited for the photoprotection of the skin and/or the hair against the deleterious effects of UV radiation, in particular solar radiation.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: February 12, 2002
    Assignee: Siltech LLC
    Inventor: Anthony J. O'Lenick, Jr.
  • Patent number: 6291389
    Abstract: A cationic catalyst composition comprising a reactive cation and a compatible non-coordinating anion is preferably used at a temperature of 20° C. or less to produce olefin polymers, particularly polymers and copolymers of isobutylene.
    Type: Grant
    Filed: May 12, 1999
    Date of Patent: September 18, 2001
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Timothy Daniel Shaffer, Anthony Jay Dias, Ira David Finkelstein, Myron Bernard Kurtzman
  • Patent number: 6150549
    Abstract: A novel silane compound is disclosed, which is used as a suitable strating material (monomer) of polysilane eligible for the precursor of electroconductive- and photoconductive-materials such as phtoresists as well as polymerization initiators and silicone carbide-based ceramics and which is useful for chemical vapor deposition.
    Type: Grant
    Filed: July 30, 1998
    Date of Patent: November 21, 2000
    Assignee: Nippon Mitsubishi Oil Corporation
    Inventors: Masaki Minami, Keizo Ikai, Mitsuo Matsuno
  • Patent number: 6046350
    Abstract: A novel tertiary alkylsilane is disclosed, which is useful as a variety of starting materials such as for photoreactive materials including semiconductor materials, insulative materials and photoresists, polymerization initiators and silicone-based ceramics precursors and is contributive to the safe and efficient production of high grade semiconductors.
    Type: Grant
    Filed: December 9, 1998
    Date of Patent: April 4, 2000
    Assignee: Nippon Oil Co., Ltd.
    Inventors: Keizo Ikai, Masaki Minami, Iwane Shiozaki
  • Patent number: 5965762
    Abstract: New chlorohydrosilane derivatives having the general formula (I) and preparation method thereof. The chlorohydrosilane derivatives (I) of the present invention which have both Si--Cl and Si--H bonds are prepared by partially reducing chlorosilane of the formula (II) which have at least two Si--Cl bonds with lithiumaluminum hydride. The chlorohydrosilane derivatives (I) of the present invention, which have both Si--H and Si--Cl bonds in a molecule can be advantageously used in preparing various compounds because a Si--H bond enables the hydrosilylation with unsaturated organic compounds, while a Si--Cl bond can participate in hydrolysis or in a reaction with a nucleophilic compound such as Grignard reatent: ##STR1## wherein R.sup.1 is straight, branched, or cyclic alkyl group having 1 to 30 carbon atoms, which can include an aromatic group or heterocyclic group, and R.sup.
    Type: Grant
    Filed: July 9, 1998
    Date of Patent: October 12, 1999
    Assignee: Korea Institute of Science and Technology
    Inventors: Il Nam Jung, Bok Ryul Yoo, Joon Soo Han, Weon-Cheol Lim
  • Patent number: 5929187
    Abstract: A novel branched siloxane-silalkylene copolymer containing a plurality of silicon-bonded hydrogen atoms or silicon-bonded alkoxy groups in the molecule. The copolymers are used to improve properties, such as, mechanical strength, adhesiveness, and durability of an end product.
    Type: Grant
    Filed: February 23, 1998
    Date of Patent: July 27, 1999
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventor: Makoto Yoshitake
  • Patent number: 5880306
    Abstract: Silyl cation of the formula Si.sup.+ R.sub.2 R' wherein R denotes a hydrogen, a hydrocarbon or fluorine and R' denotes a norbornyl or cyclopentenyl containing substituent is free of co-ordination with a solvent and is stable at a temperature of upto at least 40.degree.C. Also disclosed is a compound consisting of the cation and a borate or carborane anion, a composition comprising the cation and a solvent and a process for making the cation.
    Type: Grant
    Filed: August 26, 1997
    Date of Patent: March 9, 1999
    Assignee: Dow Corning, Ltd.
    Inventor: Norbert Auner
  • Patent number: 5859247
    Abstract: The present invention provides several methods of synthesis and separation in which organic/fluorous phase separation techniques are used to effect separations. The present invention also provides novel compositions of matter comprising fluorous Si, Sn and Ge compounds.
    Type: Grant
    Filed: July 31, 1996
    Date of Patent: January 12, 1999
    Assignee: University of Pittsburgh
    Inventors: Dennis P. Curran, Sabine Hadida Ruah, Masahide Hoshino, Armido Studer, Peter Wipf, Patrick Jeger, Sun-Young Kim, Rafael Ferritto
  • Patent number: 5760019
    Abstract: Compounds of formula I ##STR1## in which X is OHY is H, OH methyl or F,A and B are independentlya) alkyl of one to ten carbons or heteroatoms,b) aryl of four to seven carbons or heteroatoms,c) cyclic of three to ten carbons or heteroatoms, or moieties of the formulas ##STR2## in a), b), c), d), e) and f), CH is bonded to silicon; R.sup.1 to R.sup.11 are independently hydrogen, alkyl of 1 to 10 carbons or heteroatoms, aryl of 4 to 14 carbons or heteroatoms, arylalkyl of 5 to 20 carbons or heteroatoms, substituted carbonyl or unsubstituted carbonyl;heteroatoms are nitrogen, oxygen, silicon or sulfur; andat least one of A and B is independently moieties d, e or f.The compounds of formula I inhibit protease enzymes and can be used as pharmaceuticals.
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: June 2, 1998
    Assignee: The Research Foundation of State University of New York
    Inventors: Scott McN. Sieburth, Alfred M. Mutahi
  • Patent number: 5675014
    Abstract: The present invention relates to a process for the preparation of organo silicon disulfide compounds. The process involves reacting a mercaptoalkoxysilane with a dithiobis(benzothiazole) compound.
    Type: Grant
    Filed: January 22, 1996
    Date of Patent: October 7, 1997
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Martin Paul Cohen, Dane Kenton Parker, Lawson Gibson Wideman
  • Patent number: 5663358
    Abstract: The present invention relates to a process for the preparation of organo silicon disulfide compounds. The process involves reacting a mercaptoalkoxysilane with a sulfenamide compound.
    Type: Grant
    Filed: January 22, 1996
    Date of Patent: September 2, 1997
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Martin Paul Cohen, Lawson Gibson Wideman
  • Patent number: 5646326
    Abstract: Alkylhydrogenchlorosilanes of formula IR.sub.(4-n-m) SiCl.sub.n H.sub.m (I),wherein m and n are each equal to 1 or 2 and m+n.ltoreq.3 and R is an alkyl group having from 1 to 5 carbon atoms, are prepared by reacting alkylchlorosilanes of formula IIR.sub.(4-p) SiCl.sub.p (II),wherein p is equal to 1, 2 or 3, with hydrogen.The alkylhydrogenchlorosilanes are employed as a starting material in hydrosilylation reactions.
    Type: Grant
    Filed: November 21, 1995
    Date of Patent: July 8, 1997
    Assignee: Huels Aktiengesellschaft
    Inventor: Joachim Schuler
  • Patent number: 5527938
    Abstract: The present invention relates to (2-arylpropyl)silanes represented by the formula (III) and a process for the preparation of the formula (III) by the Friedel-Crafts alkylation of various substituted aromatic compounds represented by the formula (I) with allylchlorosilanes as represented by the formula (II) in the presence of Lewis acid catalysts such as aluminum chloride. ##STR1## In the formulas (I) and (III), R and R' represent independently hydrogen, alkyl (C.sub.1 -C.sub.4), phenoxy, fluoro, chloro, bromo, mercapto, mercaptomethyl and Ar represents phenyl ring, naphthalene ring, or biphenyl ring. X.sup.1, X.sup.2, and X.sup.3 represent hydrogen or chloro group; and wherein formula (III) according to the present invention specifically excludes the compounds of the general formula (III) in which X.sup.1, X.sup.2 and X.sup.3 are all chloro group, and R is hydrogen and R' is hydrogen, chloro or bromo, and X.sup.1 is hydrogen and X.sup.2 and X.sup.3 are all chloro, and R and R' are all hydrogen.
    Type: Grant
    Filed: July 19, 1994
    Date of Patent: June 18, 1996
    Assignee: Korea Institute of Science and Technology
    Inventors: Il N. Jung, Bok R. Yoo, Bong W. Lee, Seung H. Yeon
  • Patent number: 5523437
    Abstract: A tertiary phosphine compound of the formula (1): ##STR1## wherein R.sup.1 and R.sup.2 represent independently from each other a hydrogen atom or a methyl group, or together form --CH.dbd.CH--CH.dbd.CH--; R.sup.3 is a hydrogen atom or a cycloalkyl group having 5 to 7 carbon atoms or a lower alkyl group which may be substituted with a halogen atom, a lower alkoxy group, a lower alkoxyalkoxy group or a phenyl group; X.sup.1 is a halogen atom when both R.sup.1 and R.sup.2 are hydrogen atoms, or a hydrogen atom, a halogen atom, a lower alkyl group or a lower alkoxy group when at least one of R.sup.1 and R.sup.2 is not a hydrogen atoms; and m is an integer of 1 to 5, which is useful as a ligand of a transition metal complex that can catalyze various reactions.
    Type: Grant
    Filed: July 26, 1994
    Date of Patent: June 4, 1996
    Assignee: Sumitomo Chemical Co., Ltd.
    Inventors: Tamio Hayashi, Yasuhiro Uozumi, Kazunori Iwakura, Isao Kurimoto, Masayoshi Minai
  • Patent number: 5492736
    Abstract: The present invention is a process for forming a fluorine-containing silicon oxide film on a substrate by plasma-enhanced chemical vapor deposition using a fluorinated silicon source of the formula: ##STR1## wherein at least one of R.sup.1 -R.sup.6 is fluorine and the remaining R groups are independently H, F, non-fluorinated-, partially fluorinated- or perfluorinated-: alkyl, alkenyl, alkynyl, aryl or benzylic groups, or C.sub.x H.sub.2x when one or more of R.sup.1, R.sup.2 or R.sup.3 is connected to R.sup.4, R.sup.5 or R.sup.6 through a bridging group C.sub.y H.sub.2y ; where x is 1-6, and y is 0-6; where M is Si or C and n is 0-6 and R.sup.7 is independently H, F, C.sub.z H.sub.2z+1 where z is 1-6 or C.sub.r H.sub.s F.sub.t where r is 1-6, s is (2r+1-t); t is 1 to (2r+1) . The present invention is also the film formed by that process and several novel source materials used in the process.
    Type: Grant
    Filed: November 28, 1994
    Date of Patent: February 20, 1996
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Ravi K. Laxman, Arthur K. Hochberg, David A. Roberts, Raymond N. Vrtis
  • Patent number: 5491266
    Abstract: This invention relates to asymmetric syntheses in which a prochiral or chiral compound is contacted in the presence of an optically active metal-ligand complex catalyst to produce an optically active product.
    Type: Grant
    Filed: June 20, 1994
    Date of Patent: February 13, 1996
    Assignee: Union Carbide Chemicals & Plastics Technology Corporation
    Inventors: James E. Babin, Gregory T. Whiteker
  • Patent number: 5474716
    Abstract: Disclosed are processes for the preparation of new bridged cyclopentadienylmagnesium compounds of the general formula Q(CpR.sub.a)(Cp'R'.sub.a ')Mg, and the use thereof for preparing bridged metallocenes.
    Type: Grant
    Filed: February 22, 1995
    Date of Patent: December 12, 1995
    Assignee: Witco GmbH
    Inventor: Richard Lisowsky
  • Patent number: 5475078
    Abstract: A novel fluorinated organosilicon compound, exhibiting excellent solvent resistance, chemical resistance and mold release, which is represented by general formula (1): ##STR1## wherein Rf is a divalent group represented by general formula (2): ##STR2## wherein Y is a fluorine atom or CF.sub.3 group; l is an integer of 0-8; k and m are integers of 0-4; j and n are integers of 0 or 1; except when j=k=l=m=n=0.
    Type: Grant
    Filed: May 20, 1993
    Date of Patent: December 12, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shinichi Sato, Takashi Matsuda, Kouji Takano, Toshio Takago
  • Patent number: 5475076
    Abstract: The invention relates to organo(poly)siloxane compositions which have long shelf life in the absence of water, but can be crosslinked in the presence of water, even at room temperature, to give elastomers with elimination of alcohols, and to a process for the preparation of such compositions.
    Type: Grant
    Filed: July 29, 1994
    Date of Patent: December 12, 1995
    Assignee: Wacker-Chemie GmbH
    Inventors: Rudolf Braun, Petra Absmaier
  • Patent number: 5453221
    Abstract: Disclosed are new bridged cyclopentadienylmagnesium compounds of the general formula Q(CpR.sub.a) (Cp'R'.sub.a')Mg, processes for the preparation thereof, and the use thereof for preparing bridged metallocenes.
    Type: Grant
    Filed: February 22, 1995
    Date of Patent: September 26, 1995
    Assignee: Witco GmbH
    Inventor: Richard Lisowsky
  • Patent number: 5374760
    Abstract: A fluorine-containing organosilicon compound and a method for its preparation are disclosed, said compound having the general formula ##STR1## in which R.sup.1 represents a monovalent hydrocarbon group, excluding alkenyl group, R.sup.2 represents a divalent organic group, a is 2 or 3, and m is an integer having a value of 4 to 12.
    Type: Grant
    Filed: March 14, 1994
    Date of Patent: December 20, 1994
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventor: Hideki Kobayashi
  • Patent number: 5360938
    Abstract: This invention relates to asymmetric syntheses in which a prochiral or chiral compound is contacted in the presence of an optically active metal-ligand complex catalyst to produce an optically active product.
    Type: Grant
    Filed: July 16, 1992
    Date of Patent: November 1, 1994
    Assignee: Union Carbide Chemicals & Plastics Technology Corporation
    Inventors: James E. Babin, Gregory T. Whiteker
  • Patent number: 5338876
    Abstract: Alkenylchlorosilane of formula I and a direct synthesis thereof are disclosed, wherein silicon metal is reacted with mixed gas comprising alkenyl chloride of formula II and hydrogen chloride or alkyl chloride of formula III in the presence of copper catalyst at a temperature range from 220.degree. C. to 350.degree. C. ##STR1## In formula I, R.sub.1 represents hydrogen, methyl, SiHCl.sub.2, SiCl.sub.3 or CH.sub.2 SiCl.sub.3 and R.sub.2 represents hydrogen or chlorine. ##STR2## In formula II, R.sub.3 represents hydrogen or chlorine and R.sub.2 represents hydrogen, methyl or CH.sub.2 Cl.Cl--R.sub.5 (III)In formula III, R.sub.5 represents hydrogen, C.sub.1 -C.sub.4 alkyl or CH.sub.2 CH.sub.2 Cl.
    Type: Grant
    Filed: June 10, 1993
    Date of Patent: August 16, 1994
    Assignee: Korea Institute of Science and Technology (KIST)
    Inventors: Il N. Jung, Seung H. Yeon, Bong W. Lee, Bok R. Yoo
  • Patent number: 5277838
    Abstract: The invention relates to compounds of the formula ##STR1## in which R.sup.3 is a hydrogen atom or a radical of the formulaR.sup.1 --R.sup.5 --O--(CH.sub.2).sub.y --,in which R.sup.1 is a halogen atom, a hydroxyl group, a C.sub.1 - to C.sub.18 -alkoxy group, a C.sub.1 - to C.sub.18 -alkyl group or a cholesteryl radical, R.sup.5 is a phenylene or biphenylene radical which may be linked to a phenylene radical via the --OOC-- group or a phenylene radical linked the --OOC-- group, y is an integer of from 3 to 12, R.sup.2 is selected from the group consisting of a radical of the formulaR.sup.6 --R.sup.1 and R.sup.7 --SiCH.sub.3).sub.2 H,where R.sup.6 is a single chemical bond or a phenylene, biphenylene or cyclohexylene racial or a phenylene radical linked to the --OOC-- or --COO-- radical or a phenylene radical linked to a cyclohexyl radical through the --OOC-- group, R.sup.
    Type: Grant
    Filed: December 4, 1991
    Date of Patent: January 11, 1994
    Assignee: Consortium fur elektrochemische Industrie GmbH
    Inventors: Wolfgang Haas, Norman Haberle, Rainer Winkler, Franz-Heinrich Kreuzer
  • Patent number: 5214077
    Abstract: New organosilicon compounds are disclosed which contain (meth)acryloxy groups and consist of average units of the formula ##STR1## in which the radicals R are the same or different and represent monovalent, optionally halogenated hydrocarbon radicals having from 1 to 18 carbon atom(s) per radical, X is a radical which may be the same or different and represents a chlorine atom or a radical of the formula --OR.sup.1, where R.sup.1 represents an alkyl radical having from 1 to 8 carbon atom(s) per radical, which can be substituted by an ether oxygen atom, a is 0 or 1, with an average of from 0.01 to 1.0, b is 0, 1, 2 or 3, with an average of from 0.0 to 3.0, c is 0, 1, 2 or 3, with an average of from 0.0 to 3.0, the sum of a+b+c.ltoreq.4, and is an average of from 1.5 to 4.0, and A is a radical of the formula ##STR2## where x is 0 or 1 and y is 0 or 1, with the proviso that the sum of x+y is 1, z is 1, 2, 3 or 4, R.sup.2 represents a hydrogen atom or a methyl radical, R.sup.
    Type: Grant
    Filed: April 13, 1992
    Date of Patent: May 25, 1993
    Assignee: Wacker-Chemie GmbH
    Inventors: Christian Herzig, Bernard Deubzer, Inge Sigl
  • Patent number: 5140087
    Abstract: The present invention relates to an organosiloxane compound suitable for the modification of silicone rubbers and synthetic resins, an organosiloxane compound useful as its intermediate, and a process for preparing them. The organosiloxane compound of the present invention can be represented by the general formula (IV) ##STR1## wherein j is an integer of 1 to 2000, R is an alkyl group having 1 to 4 carbon atoms, and R.sup.1 is a pentafluorophenyl group or a straight-chain or a branched fluoroalkyl group represented by the formula (II)C.sub.a H.sub.b F.sub.2a-b+1 (II)wherein a is an integer of 3 to 18, and b is an integer of 0 to 2a.The siloxane compounds of the present invention also include compounds having siloxane chains, at least one of the chains having a substituent with a fluorine atom containing group at the terminal thereof.
    Type: Grant
    Filed: October 30, 1990
    Date of Patent: August 18, 1992
    Assignee: Chisso Corporation
    Inventors: Takahiro Saho, Yoshinori Akutsu, Takaharu Nakano, Nobumasa Ohtake
  • Patent number: 5126473
    Abstract: A process is described for the hydrided of halogen-substituted compounds of the second to fourth period of Groups III to V of the periodic system, with the exception of gallium, aluminum, carbon, or nitrogen. A finely-granulated aluminum is added to a molten salt melt that consists of 50-67 molar % AlCl.sub.3 (anhydrous) and 50 to 33 molar % of sodium chloride. Then to the stirred, or by some other means dispersed suspension, hydrogen is introduced to hydrided the finely-dispersed aluminum. Thereafter the mixture is reacted with the halogen-substituted compound and the resulting hydrided compound is renewed.
    Type: Grant
    Filed: August 10, 1990
    Date of Patent: June 30, 1992
    Assignee: Degussa Aktiengesellschaft
    Inventors: Hans-Juergen Klockner, Ralf Schmoll, Peter Panster, Peter Kleinschmit
  • Patent number: 5087716
    Abstract: Difunctional halo silicon amide compounds are prepared by cleaving the nitrogen-silicon bond in a nitrogen-silicon heterocycle with a reactive halide. The reaction is straight forward with no intermediates or byproducts. The halo functionality is capable of capping any SiOH group. When the other functionality is an acrylamide, the capped entity may be polymerized or crosslinked by free radical initiators of the acrylamide functionality thereby producing useful products such as paper release coatings and photoresists.
    Type: Grant
    Filed: December 24, 1990
    Date of Patent: February 11, 1992
    Assignee: Dow Corning Corporation
    Inventors: Antony P. Wright, Padmakumari J. Varaprath
  • Patent number: 5082958
    Abstract: Difunctional halo silicon amide compounds are prepared by cleaving the nitrogen-silicon bond in a nitrogen-silicon heterocycle with a reactive halide. The reaction is straight forward with no intermediates or byproducts. The halo functionality is capable of capping any SiOH group. When the other functionality is an acrylamide, the capped entity may be polymerized or crosslinked by free radical initiators of the acrylamide functionality thereby producing useful products such as paper release coatings and photoresists.
    Type: Grant
    Filed: January 22, 1990
    Date of Patent: January 21, 1992
    Assignee: Dow Corning Corporation
    Inventors: Antony P. Wright, Padmakumari J. Varaprath
  • Patent number: 5041587
    Abstract: A process for preparing an organic silicon compound is here disclosed which comprises the step of reacting a halogenated hydrocarbon selected from the group consisting ##STR1## wherein each of X.sup.1 to X.sup.16 is selected from the group consisting of hydrogen, an alkyl group, alkenyl group, phenyl group, naphthyl group, alkoxy group, acyl group, alkylamino group and dialkylamino group having 1 to 20 carbon atoms which are unsubstituted or substituted and a halogen atom; and each of at least one of X.sup.1 to X.sup.4, at least one of X.sup.8 to X.sup.10 and at least one of X.sup.11 to X.sup.16 is a halogen atom,with a silane selected from the group consisting of SiH.sub.4, Si.sub.2 H.sub.6 and Si.sub.3 H.sub.8.
    Type: Grant
    Filed: February 12, 1990
    Date of Patent: August 20, 1991
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Masayoshi Itoh, Kenji Iwata, Noriyuki Yanagawa, Tetsura Utsumi, Mineo Kobayashi, Ryo Takeuchi, Tomohiro Abe
  • Patent number: 5017717
    Abstract: Difunctional halo silicon amide compounds are prepared by cleaving the nitrogen-silicon bond in a nitrogen-silicon heterocycle with a reactive halide. The reaction is straight forward with no intermediates or byproducts. The halo functionality is capable of capping any SiOH group. When the other functionality is an acrylamide, the capped entity may be polymerized or crosslinked by free radical initiators of the acrylamide functionality thereby producing useful products such as paper release coatings and photoresists.
    Type: Grant
    Filed: October 30, 1990
    Date of Patent: May 21, 1991
    Assignee: Dow Corning Corporation
    Inventors: Antony P. Wright, Padmakumari J. Varaprath
  • Patent number: 4990633
    Abstract: New fluorinated bisaryloxy-substituted alkenes are prepared by reaction of substituted phenols with perhaloalkenes and can be used as electrical insulating agents.
    Type: Grant
    Filed: May 4, 1989
    Date of Patent: February 5, 1991
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Negele, Dietmar Beilefeldt, Thomas Himmler, Albrecht Marhold
  • Patent number: 4980443
    Abstract: A new organohydrogenpolysiloxane compound and a new fluorosilicone polymer each have unique properties which allow for the preparation of faster curing coating compositions having longer bath life than those disclosed in the art. In a preferred embodiment the new polymers are mixed together to provide, along with a metal-containing hydrosilylation catalyst and a catalyst inhibitor to provide improved coating compositions which are useful for preparing a release linear to protect silicone pressure sensitive adhesives.
    Type: Grant
    Filed: June 4, 1990
    Date of Patent: December 25, 1990
    Assignee: Dow Corning Corporation
    Inventors: Craig K. Kendziorski, Charles E. Neal, Jr., Loretta A. Sobieski, Thomas J. Tangney, David L. Stickles
  • Patent number: 4841084
    Abstract: The present invention relates to new hexacoordinate silicon complexes, the process for their preparation and their application.These new complexes correspond to the general formula I: ##STR1## in which: A represents an alkali metal or alkaline earth metal except for magnesium, andn=0 or 1.
    Type: Grant
    Filed: December 24, 1985
    Date of Patent: June 20, 1989
    Assignee: Centre National de la Recherche Scientifique
    Inventors: Robert J. Corriu, Genevieve E. Cerveau, Claude G. Chuit, Catherine Reye
  • Patent number: 4831081
    Abstract: The present invention is directed to a method for crosslinking reactive polyolefins using a rhodium catalyzed hydrosilation reaction and novel siloxanes as crosslinkers.Also disclosed are novel siloxane compounds which are useful in the crosslinking of polyolefins and polyolefin compositions which have been crosslinked through use of the claimed process and siloxane crosslinkers.
    Type: Grant
    Filed: September 30, 1987
    Date of Patent: May 16, 1989
    Assignee: Union Carbide Corporation
    Inventors: Roswell E. King, III, Herbert E. Petty
  • Patent number: 4781942
    Abstract: A process for forming on the surface of a substrate a layer of a siloxane polymer by exposing the substrate to a first vapor phase monomer precursor having the formula SiR.sub.x H.sub.4-x where x is 1 to 4 and R is alkyl or phenyl, and a second vapor phase oxygen-containing precursor in the presence of radiation of a predetermined wavelength to bring about the reaction to form the siloxane polymer which deposits on the surface of substrate. The monomer precursor may comprise a mixture, such as SiRH.sub.3 and SiR.sub.2 H.sub.2 with each other or with SiR.sub.3 H. By varying the composition of such mixtures, the composition of the siloxane polymer may be chosen to provide predetermined properties, and, further, may be varied throughout the thickness of the deposited layer.
    Type: Grant
    Filed: December 19, 1985
    Date of Patent: November 1, 1988
    Assignee: Hughes Aircraft Company
    Inventors: Richard N. Leyden, James T. Hall
  • Patent number: 4649207
    Abstract: Derivatives of diphenylhexafluoropropane having the formula: ##STR1## where R is an unsubstituted or substituted alkylene, an epoxy, a silyl or alkoxysilyl group; and where X and Y are hydrogen or halogen. The derivatives are useful in formulating polymer structures.
    Type: Grant
    Filed: May 13, 1986
    Date of Patent: March 10, 1987
    Assignee: Hughes Aircraft Company
    Inventors: Kreisler S. Y. Lau, William J. Kelleghan
  • Patent number: 4617413
    Abstract: The present invention relates to new pentacoordinate silicon complexes, the process for their preparation and their application to the preparation of organosilanes.The pentacoordinate silicon complexes according to the invention correspond to the general formula I: ##STR1## in which: R denotes an alkyl, alkenyl, alkynyl, aryl, aralkyl, aralkenyl, aralkynyl or alkylaryl radical in which the aliphatic fragments are linear, branched or cyclic and contain from 1 to 20 carbon atoms,A represents an alkali metal or alkaline earth metal, with the proviso however that A represents neither sodium nor potassium when R is a phenyl radical, andn=1 or 2.
    Type: Grant
    Filed: December 24, 1985
    Date of Patent: October 14, 1986
    Assignee: Centre National de la Recherche Scientifique
    Inventors: Robert J. Corriu, Genevieve E. Cerveau, Claude G. Chuit, Catherine Reye
  • Patent number: 4604480
    Abstract: A method for the preparation of a first sulfone compound of the formula: ##STR1## wherein R.sub.a is ##STR2## where R.sub.b is Br and R.sub.c is H except that R.sub.b and R.sub.c together may be an electron pair when R.sub.6 is a radical of the formula: ##STR3## wherein X.sub.1 is independently chlorine, bromine or iodine and R.sub.1 and R.sub.2 are independently at each occurrence hydrogen or, substituted or unsubstituted, phenyl or alkyl where the substituents are halogen or alkoxy or additional --SO.sub.2 Br groups; provided that, each carbon atom of R.sub.1 or R.sub.2 which contains --SO.sub.2 Br also contains an X.sub.1 group and wherein R.sub.3 through R.sub.9 are independently --OZ,--C.sub.6 M.sub.5,--Z,--SiZ.sub.3 or --X.sub.2, where Z is hydrogen or substituted or unsubstituted phenyl, alkyl, alkenyl or alkynyl; X.sub.2 is chlorine, bromine, iodine or fluorine; M is independently at each occurrence Z or X.sub.2 ; R.sub.3 and R.sub.4 may together be an electron pair; two or more of R.sub.3, R.sub.
    Type: Grant
    Filed: August 15, 1983
    Date of Patent: August 5, 1986
    Assignee: The Research Foundation of State University of New York
    Inventors: Eric Block, Mohammad Aslam
  • Patent number: 4309558
    Abstract: A method for producing mono-substituted dichlorosilanes selectively with a high yield from dichlorosilane is provided. According to this method, dichlorosilane and a specified compound having a double bond at .alpha.-position are reacted in the presence of a catalyst which is a homogeneous complex of ruthenium, rhodium, nickel or platinum, and a phosphine compound, or is a ruthenium chloride.
    Type: Grant
    Filed: September 5, 1979
    Date of Patent: January 5, 1982
    Assignee: Chisso Corporation
    Inventors: Isao Koga, Yohji Terui, Masuhito Ohgushi
  • Patent number: 4230815
    Abstract: Novel silicon-containing derivatives of polybutadiene or copolymers of butadiene with other copolymerizable monomer or monomers in which organosilicon-containing groups are bonded to the carbon atoms in the main chain of the butadiene polymers through the carbon-silicon linkages. These derivatives of butadiene polymers are produced by the addition reaction of an organosilicon compound having one hydrogen atom directly bonded to the silicon atom in the molecule to the double bonds in the butadiene polymers. They have a good fluidity, a small temperature dependency of viscosity, an excellent thermal stability and a high anti-oxidation resistance, as well as a good compatibility with siliceous fillers which are added to give improved workability and transparency to the compositions. The compositions to which a crosslinking agent and a curing catalyst are added can be cured into a rubber-like elastomer having excellent properties suitable for applications in various fields.
    Type: Grant
    Filed: July 20, 1978
    Date of Patent: October 28, 1980
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Itoh, Kimitaka Kumagae