Abstract: Formulations of solutions and processes are described to form a substrate including a dopant. In particular implementations, the dopant may include arsenic (As). In an embodiment, a dopant solution is provided that includes a solvent and a dopant. In a particular embodiment, the dopant solution may have a flashpoint that is at least approximately equal to a minimum temperature capable of causing atoms at a surface of the substrate to attach to an arsenic-containing compound of the dopant solution. In one embodiment, a number of silicon atoms at a surface of the substrate are covalently bonded to the arsenic-containing compound.
Type:
Application
Filed:
November 5, 2012
Publication date:
May 8, 2014
Applicant:
DYNALOY, LLC
Inventors:
Spencer Erich Hochstetler, Kimberly Dona Pollard, Leslie Shane Moody, Peter Borden Mackenzie, Junjia Liu