Tricyclo Ring System In Acid Moiety Patents (Class 560/117)
  • Patent number: 9218969
    Abstract: An example embodiment relates to a patterning process including forming a photoresist pattern on a structure. The photoresist pattern includes a cross-linked surface that is insoluble in an organic solvent. The process also includes spin-on coating a dielectric layer on the photoresist pattern, partially removing the dielectric layer to form a plurality of dielectric spacers surrounding the photoresist pattern, and removing the photoresist pattern.
    Type: Grant
    Filed: September 27, 2011
    Date of Patent: December 22, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyoung Mi Kim, Jin Ha Jeong
  • Patent number: 9050311
    Abstract: This invention pertains generally to prostacyclin analogs and methods for their use in promoting vasodilation, inhibiting platelet aggregation and thrombus formation, stimulating thrombolysis, inhibiting cell proliferation (including vascular remodeling), providing cytoprotection, preventing atherogenesis and inducing angiogenesis. Generally, the compounds and methods of the present invention increase the oral bioavailability and circulating concentrations of treprostinil when administered orally.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: June 9, 2015
    Assignee: United Therapeutics Corporation
    Inventors: Ken Phares, David Mottola, Hitesh Batra
  • Publication number: 20150141669
    Abstract: Provided are a fluorine-containing amino acid prodrug represented by general formula (I) that makes a fluorine-containing amino acid which is a group 2 metabotropic glutamate receptor agonist into a prodrug, or a pharmaceutically acceptable salt thereof.
    Type: Application
    Filed: May 31, 2013
    Publication date: May 21, 2015
    Applicant: TAISHO PHARMACEUTICAL CO., LTD.
    Inventors: Takashi Hashihayata, Norikazu Otake, Naoki Miyakoshi, Kazunari Sakagami
  • Publication number: 20150086926
    Abstract: A carboxylic acid sulfonium salt having formula (1) is provided wherein R0 is hydrogen or a monovalent hydrocarbon group, R01 and R02 are hydrogen or a monovalent hydrocarbon group, at least one of R0, R01, and R02 has a cyclic structure, L is a single bond or forms an ester, sulfonate, carbonate or carbamate bond with the vicinal oxygen atom, R2, R3 and R4 are monovalent hydrocarbon groups. The sulfonium salt functions as a quencher in a resist composition, enabling to form a pattern of good profile with minimal LWR, rectangularity, and high resolution.
    Type: Application
    Filed: September 9, 2014
    Publication date: March 26, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Masahiro Fukushima, Tomohiro Kobayashi, Ryosuke Taniguchi
  • Publication number: 20150086753
    Abstract: A norbornane-2-spiro-?-cycloalkanone-??-spiro-2?-norbornane-5,5?,6,6?-tetracarboxylic dianhydride represented by the following general formula (1): wherein the formula (1), n represents an integer of 0 to 12, and R1s, R2, R3 each independently represents a hydrogen atom or the like.
    Type: Application
    Filed: June 12, 2014
    Publication date: March 26, 2015
    Applicant: JX NIPPON OIL & ENERGY CORPORATION
    Inventors: Toshihiko MATSUMOTO, Shinichi KOMATSU
  • Publication number: 20150064622
    Abstract: A compound represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group which may have a halogen atom; R2 and R3 each independently represent a hydrogen atom or a C1-C6 monovalent saturated hydrocarbon group, and R4 represents a C1-C6 monovalent saturated linear hydrocarbon group, a C3-C6 monovalent saturated branched hydrocarbon group, a C5-C12 monovalent alicyclic hydrocarbon group or a C5-C12 monovalent alicyclic hydrocarbon-containing group, or R3 and R4 represent a C2-C6 heterocyclic ring together with an oxygen atom and a carbon atom; A1 represents a single bond, or *-A2-X1-(A3-X2)a— where A2 and A3 each independently represent a C1-C6 alkanediyl group, X1 and X2 each independently represent an oxygen atom, a carbonyloxy group or an oxycarbonyl group, and “a” represents 0 or 1; A4 represents a C1-C6 alkanediyl group; Ad represents a divalent adamantanediyl group.
    Type: Application
    Filed: September 2, 2014
    Publication date: March 5, 2015
    Inventors: Isao YOSHIDA, Koji ICHIKAWA
  • Patent number: 8952191
    Abstract: A composition including one or more ester resins useful for various applications is disclosed. For example, the composition including one or more ester resins may function as a component that is incorporated into an ink composition.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: February 10, 2015
    Assignee: Xerox Corporation
    Inventors: Adela Goredema, Rina Carlini, Jennifer L. Belelie, Naveen Chopra, Kentaro Morimitsu
  • Publication number: 20140356787
    Abstract: A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0? represents a monovalent counteranion).
    Type: Application
    Filed: May 30, 2014
    Publication date: December 4, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshitaka Komuro, Takaaki Kaiho, Toshiaki Hato, Akiya Kawaue, Junichi Tsuchiya, Yoshiyuki Utsumi
  • Publication number: 20140350288
    Abstract: The present disclosure provides methods of preparing glucagon-like peptide-1 (GLP-1) receptor modulators, such as compounds of Formula (II) or (VI), or intermediates thereof. The compounds that may be prepared by the described methods are useful for regulating blood glucose levels and/or treating a disease mediated by a GLP-1 receptor (e.g., diabetes).
    Type: Application
    Filed: May 27, 2014
    Publication date: November 27, 2014
    Applicants: Academia Sinica, Chi-Ming Liang
    Inventors: Klim King, Rong-Jie Chein
  • Publication number: 20140350100
    Abstract: The present disclosure provides novel glucagon-like peptide-1 (GLP-1) receptor modulators such as compounds of Formula (I) or (II), and pharmaceutically acceptable salts thereof. The present disclosure also provides pharmaceutical compositions, kits, and uses that involve the GLP-1 receptor modulators for regulating blood glucose levels and/or treating diabetes via, e.g., modulating the endogenous signaling pathways mediated by the GLP-1 receptor.
    Type: Application
    Filed: May 27, 2014
    Publication date: November 27, 2014
    Applicants: Academia Sinica
    Inventors: Klim King, Rong-Jie Chein
  • Publication number: 20140342288
    Abstract: The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3?, wherein a hydrogen atom or an electron-donating group bonds to an ? carbon atom with respect to SO3?, and an electron-withdrawing group bonds to a ? carbon atom with respect to SO3?; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 20, 2014
    Applicant: JSR CORPORATION
    Inventors: Hiroshi TOMIOKA, Takakazu KIMOTO, Yusuke ASANO
  • Publication number: 20140296561
    Abstract: A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl(meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.
    Type: Application
    Filed: June 17, 2014
    Publication date: October 2, 2014
    Inventors: Youichi OHSAWA, Masaki OHASHI, Seiichiro TACHIBANA, Jun HATAKEYAMA
  • Patent number: 8802352
    Abstract: A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+are defined in the specification.
    Type: Grant
    Filed: August 6, 2012
    Date of Patent: August 12, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Yuichi Mukai, Isao Yoshida
  • Publication number: 20140162188
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OH)—R3 group (R3?H, CH3, or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: November 15, 2013
    Publication date: June 12, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masaki Ohashi
  • Publication number: 20140154625
    Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).
    Type: Application
    Filed: July 8, 2013
    Publication date: June 5, 2014
    Inventor: Ken MARUYAMA
  • Patent number: 8653301
    Abstract: A novel tricyclodecane monomethanol monocarboxylic acid and derivatives thereof, which can be raw materials for highly heat-resistant alicyclic polyesters, are provided. A tricyclodecane monomethanol monocarboxylic acid represented by the following formula (I) and derivatives thereof.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: February 18, 2014
    Assignees: Hitachi Chemical Company, Ltd., National Institute of Advanced Industrial Science and Technology
    Inventor: Hiroyuki Kawakami
  • Publication number: 20130337378
    Abstract: A sulfonium salt comprising (a) a polymerizable substituent, (b) a sulfonium cation, and (c) a sulfonate anion within a common molecule is capable of generating a sulfonic acid in response to high-energy radiation or heat. A resist composition comprising the sulfonium salt as base resin has high resolution and is suited for precise micropatterning by ArF immersion, EB or EUV lithography.
    Type: Application
    Filed: May 30, 2013
    Publication date: December 19, 2013
    Inventors: Masaki Ohashi, Jun Hatakeyama
  • Publication number: 20130338313
    Abstract: The invention is based on the discovery that a remarkable improvement in the performance of maleimide thermosets can be achieved by incorporating amide-extended maleimides into an adhesive formulation. Amide-extended maleimides described herein can be used to toughen bismaleimide thermosetting materials without sacrificing any thermal stability. Amide-extended maleimides are readily prepared by reacting a bismaleimide with an appropriate amine via the well-known Michael addition reaction. Acylation of the resulting secondary amines provides the amide-extended maleimide. The acylating agent can also be used to introduce polymerizable functional groups into the backbones of these thermoset monomers. Amide-extended acrylate and methacrylate monomers can also be prepared.
    Type: Application
    Filed: August 19, 2013
    Publication date: December 19, 2013
    Applicant: Designer Molecules, Inc.
    Inventors: Stephen M. Dershem, Farhad G. Mizori
  • Patent number: 8598292
    Abstract: Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F2 excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like.
    Type: Grant
    Filed: February 10, 2010
    Date of Patent: December 3, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yoshihisa Arai, Takehiko Isobe
  • Publication number: 20130317250
    Abstract: By using an organic base when a carboxylic acid bromodifluoroethyl ester is sulfinated by using a sulfinating agent, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt. By oxidizing the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt. By using the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt as a raw material and exchanging it into an onium salt directly or through saponification/esterification, there can be obtained a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid onium salt.
    Type: Application
    Filed: July 5, 2013
    Publication date: November 28, 2013
    Applicant: Central Glass Company, Limited
    Inventors: Yuji HAGIWARA, Masashi NAGAMORI, Masaki FUJIWARA, Jonathan Joachim JODRY, Satoru NARIZUKA
  • Patent number: 8580486
    Abstract: There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: November 12, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Masashi Nagamori, Satoru Narizuka, Susumu Inoue, Takashi Kume
  • Publication number: 20130295505
    Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).
    Type: Application
    Filed: July 8, 2013
    Publication date: November 7, 2013
    Inventor: Ken MARUYAMA
  • Publication number: 20130260316
    Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.
    Type: Application
    Filed: May 30, 2013
    Publication date: October 3, 2013
    Inventor: Ken MARUYAMA
  • Publication number: 20130244185
    Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R1 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3.
    Type: Application
    Filed: September 14, 2012
    Publication date: September 19, 2013
    Applicant: JSR Corporation
    Inventors: Yasuhiko MATSUDA, Takanori Kawakami
  • Patent number: 8524952
    Abstract: A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: September 3, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Seiji Kita, Masashi Ogiwara, Mitsuharu Kitamura, Dai Oguro, Gou Higashihara
  • Patent number: 8519177
    Abstract: A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: August 27, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Seiji Kita, Masashi Ogiwara, Mitsuharu Kitamura, Dai Oguro, Gou Higashihara
  • Publication number: 20130209938
    Abstract: A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general formula (4). In the formula, X independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 6; R1 represents a hydrogen atom, or an alkyl, alkenyl, oxoalkyl, aryl or aralkyl group; any of hydrogen atoms on carbons in R1 may be substituted with a substituent; R2 represents RAO or RBRCN; and A represents a divalent group. This fluorine-containing sulfonic acid salt can serve as a photoacid generator having high solubility in a resist solvent and thus can suitably be used for a resist composition such that the resist composition shows high resolution, wide DOF, small LER and high sensitivity to form a good pattern shape in lithographic processes.
    Type: Application
    Filed: October 14, 2011
    Publication date: August 15, 2013
    Applicant: Central Glass Company, Ltd.
    Inventors: Ryozo Takihana, Satoru Narizuka
  • Publication number: 20130197079
    Abstract: The present invention provides novel mGlu2/3 agonists useful in the treatment of neurological or psychiatric disorders.
    Type: Application
    Filed: January 29, 2013
    Publication date: August 1, 2013
    Applicant: Eli Lily and Company
    Inventor: Eli Lily and Company
  • Patent number: 8481242
    Abstract: A salt represented by the formula (X): wherein Q1 and Q2, L1 and L2, ring W1, R5, w, v, Z+ and W10 are defined in the specification.
    Type: Grant
    Filed: November 16, 2010
    Date of Patent: July 9, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Mitsuyoshi Ochiai, Masako Sugihara
  • Publication number: 20130164674
    Abstract: Disclosed are an acrylic monomer having a structure represented by formula (1), a polymer containing a repeating unit derived from the acrylic monomer, and a resist composition prepared by using the polymer, which exhibits excellent adhesiveness, storage stability, and enhanced line width roughness, exhibits excellent resolution in both C/H patterns and L/S patterns, has an excellent process window so that an excellent pattern profile can be obtained regardless of the type of the substrate, and exhibits improved contrast.
    Type: Application
    Filed: December 21, 2012
    Publication date: June 27, 2013
    Applicant: KOREA KUMHO PETROCHEMICAL CO., LTD.
    Inventor: KOREA KUMHO PETROCHEMICAL CO., LTD.
  • Publication number: 20130157197
    Abstract: A resist composition comprising: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid-generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound represented by general formula (c1) shown below. In the formula, R1 represents a hydrogen atom or a hydrocarbon group of 1 to 20 carbon atoms which may have a substituent; each of R2 and R3 independently represents a hydrogen atom or a hydrocarbon group of 1 to 20 carbon atoms which may have a substituent; at least two of R1 to R3 may be mutually bonded to form a ring; X represents an oxygen atom or a sulfur atom; n represents 0 or 1; and Z+ represents an organic cation.
    Type: Application
    Filed: December 6, 2012
    Publication date: June 20, 2013
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Tokyo Ohka Kogyo Co., Ltd
  • Publication number: 20130157195
    Abstract: A molecular glass compound includes (A) a tetrameric reaction product of a specific aromatic compound having at least one hydroxy group, and a specific polycyclic or fused polycyclic aromatic aldehyde; and (B) an acid-removable protecting group as an adduct with the hydroxy group of the aromatic compound and/or a hydroxy group of the polycyclic or fused polycyclic aromatic aldehyde. A photoresist composition including the molecular glass compound, and a coated substrate including a layer of the photoresist composition are also disclosed.
    Type: Application
    Filed: September 21, 2012
    Publication date: June 20, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventor: Rohm and Haas Electronic Materials LLC
  • Publication number: 20130130175
    Abstract: A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
    Type: Application
    Filed: January 17, 2013
    Publication date: May 23, 2013
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventor: Central Glass Company, Limited
  • Patent number: 8435717
    Abstract: A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: May 7, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Yuji Hagiwara, Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiko Maeda
  • Publication number: 20130072553
    Abstract: This invention relates to the drugs, derivatives and analogs containing adamantane structures of new indication applications of anti-tumor. The invention also relates to above compounds to treat tumors and other diseases with FIG. 1. These drugs, derivatives and analogs are generated by the modification of the parent or fragment structures and formation of pharmaceutically acceptable salts, complex salts or prodrug. The drugs, derivatives and analogs as described are administered alone or together with at least one known anti-tumor and immune chemotherapeutic agent including treatment of viral, bacterial and fungal diseases, neurological diseases, endocrine system diseases, and immune system diseases.
    Type: Application
    Filed: December 25, 2009
    Publication date: March 21, 2013
    Inventor: Lifeng Xu
  • Publication number: 20130065186
    Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 14, 2013
    Applicant: JSR Corporation
    Inventors: Yasuhiko MATSUDA, Takanori Kawakami
  • Publication number: 20130052588
    Abstract: A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.
    Type: Application
    Filed: August 20, 2012
    Publication date: February 28, 2013
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Isao YOSHIDA, Yuichi MUKAI, Koji ICHIKAWA
  • Publication number: 20130045446
    Abstract: A radiation-sensitive resin composition includes a sulfonium compound represented by a general formula (1), and a first polymer that serves as a base resin. R represents a group represented by a general formula (2). n1 to n3 each independently represent an integer of 0 to 5 and n1+n2+n3?1. X? represents an anion. The sulfonium compound is preferably a compound represented by a following general formula (1-1).
    Type: Application
    Filed: August 31, 2012
    Publication date: February 21, 2013
    Applicant: JSR CORPORATION
    Inventors: Mitsuo SATO, Kazuo NAKAHARA
  • Publication number: 20130040239
    Abstract: A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+ are defined in the specification.
    Type: Application
    Filed: August 6, 2012
    Publication date: February 14, 2013
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Yuichi MUKAI, Isao YOSHIDA
  • Publication number: 20130005997
    Abstract: A 2,2-bis(fluoroalkyl)oxirane (A) is prepared by reacting a fluorinated alcohol (1) with a chlorinating, brominating or sulfonylating agent under basic conditions to form an oxirane precursor (2) and subjecting the oxirane precursor to ring closure under basic conditions. R1 and R2 are fluoroalkyl groups, R3 and R4 are hydrogen or monovalent hydrocarbon groups, X is chlorine, bromine or —OSO2R5 group, and R5 is alkyl or aryl.
    Type: Application
    Filed: June 19, 2012
    Publication date: January 3, 2013
    Inventors: Masayoshi SAGEHASHI, Takeru WATANABE, Youichi OHSAWA, Koji HASEGAWA, Masaki OHASHI
  • Publication number: 20120315580
    Abstract: A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C1-C30 monovalent organic group, X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m1 and m2 independently each represent an integer of 1 to 4, and Z+ represents an organic cation.
    Type: Application
    Filed: June 7, 2012
    Publication date: December 13, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro MASUYAMA, Yuichi MUKAI
  • Publication number: 20120295201
    Abstract: A compound represented by formula (I): wherein T1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 each independently represent a C3-C36 hydrocarbon ring, R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R3 and R4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.
    Type: Application
    Filed: May 18, 2012
    Publication date: November 22, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Isao YOSHIDA
  • Publication number: 20120270155
    Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca
    Type: Application
    Filed: April 18, 2012
    Publication date: October 25, 2012
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
  • Publication number: 20120264061
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1?) and/or a compound represented by (b1-1?) (R1?-R3? represents an aryl group or an alkyl group, provided that at least one of R1?-R3? represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1?-R3? may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(?O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).
    Type: Application
    Filed: May 23, 2012
    Publication date: October 18, 2012
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo HADA, Yoshiyuki Utsumi, Takehiro Seshimo, Akiya Kawaue
  • Publication number: 20120264060
    Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 respectively represent a C3-C36 hydrocarbon ring, R1 and R2 respectively represent a hydrogen atom or C1-C6 alkyl group, R3 represents C1-C6 alkyl group, t represents an integer of 0 to 2 and Z+ represents an organic counter ion
    Type: Application
    Filed: April 10, 2012
    Publication date: October 18, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Isao YOSHIDA, Yuko YAMASHITA
  • Publication number: 20120238775
    Abstract: A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
    Type: Application
    Filed: March 19, 2012
    Publication date: September 20, 2012
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Seiji Kita, Masashi Ogiwara, Mitsuharu Kitamura, Dai Oguro, Gou Higashihara
  • Publication number: 20120203024
    Abstract: A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y1, Y2, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
    Type: Application
    Filed: February 7, 2012
    Publication date: August 9, 2012
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon OH, Jin Bong Shin, Tae Gon Kim, Dong Chul Seo
  • Publication number: 20120203026
    Abstract: Provided is a method for manufacturing a tricyclodecane mono-methanol monocarboxylic acid derivative that can be used as a raw material for high heat-resistant alicyclic polyesters and the like. The provided method for manufacturing a tricyclodecane mono-methanol monocarboxylic acid derivative is characterized in that a tricyclodecane mono-methanol monocarboxylic acid derivative represented by the following formula (III) is obtained by reacting the dicyclopentadiene represented by the following formula (I) with a formic acid compound in the presence of a catalytic system containing a ruthenium compound, a cobalt compound, and a halide salt, to give a tricyclodecene monocarboxylic acid derivative represented by the formula (II), and then hydroformylating the tricyclodecene monocarboxylic acid derivative. (in the formulae (II) and (III), R represents a hydrogen, an alkyl group having 1 to 5 carbon atoms, a vinyl group, or a benzyl group.
    Type: Application
    Filed: July 8, 2010
    Publication date: August 9, 2012
    Inventors: Hiroyuki Kawakami, Kenichi Tominaga, Kazuhiko Sato
  • Publication number: 20120164580
    Abstract: A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).
    Type: Application
    Filed: March 2, 2012
    Publication date: June 28, 2012
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hideo Hada, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita, Hiroaki Shimizu, Yasuhiro Yoshii
  • Publication number: 20120157705
    Abstract: A novel tricyclodecane monomethanol monocarboxylic acid and derivatives thereof, which can be raw materials for highly heat-resistant alicyclic polyesters, are provided. A tricyclodecane monomethanol monocarboxylic acid represented by the following formula (I) and derivatives thereof.
    Type: Application
    Filed: July 9, 2010
    Publication date: June 21, 2012
    Inventor: Hiroyuki Kawakami