Thiol Or Thioether Containing Patents (Class 568/29)
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Patent number: 10030023Abstract: The invention provides a mercaptoalkylglycoluril represented by the general formula (I): wherein R1 and R2 each independently represent a hydrogen atom, a lower alkyl group, or a phenyl group; R3, R4, and R5 each independently represent a hydrogen atom or a mercaptoalkyl group selected from a mercaptomethyl group, a 2-mercaptoethyl group, and a 3-mercaptopropyl group; and n is 0, 1, or 2. The invention further provides an epoxy resin composition comprising an epoxy resin and the mercaptoalkylglycoluril, and a method for producing a laminate or a multilayer printed circuit board using the same.Type: GrantFiled: November 28, 2014Date of Patent: July 24, 2018Assignee: SHIKOKU CHEMICALS CORPORATIONInventors: Takeshi Kumano, Takuma Takeda, Noboru Mizobe
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Patent number: 9156124Abstract: Soft polishing pads for polishing semiconductor substrates are described. A soft polishing pad includes a molded homogeneous polishing body having a thermoset, closed cell polyurethane material with a hardness approximately in the range of 20 Shore D to 45 Shore D.Type: GrantFiled: July 8, 2010Date of Patent: October 13, 2015Assignee: NexPlanar CorporationInventors: William Allison, Diane Scott, Robert Kerprich, Ping Huang, Richard Frentzel
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Publication number: 20140378649Abstract: The use of Michael addition curing chemistries in compositions comprising sulfur-containing polymers such as polythioethers and polysulfides useful in aerospace sealant applications are disclosed. Sulfur-containing adducts comprising terminal Michael acceptor groups are also disclosed. In particular, sulfur-containing polymers and sulfur containing Michael acceptor adducts having terminal 1-(ethylenesulfonyl)-n-(vinylsulfonyl)alkanol groups are disclosed.Type: ApplicationFiled: June 21, 2013Publication date: December 25, 2014Inventors: JUEXIAO CAI, LAWRENCE G. ANDERSON, MARFI ITO, RENHE LIN
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Publication number: 20140378650Abstract: Bis(sulfonyl)alkanol-containing polythioethers, compositions containing bis(sulfonyl)alkanol-containing polythioethers, methods of synthesizing bis(sulfonyl)alkanol-containing polythioethers and the use of bis(sulfonyl)alkanol-containing polythioethers in aerospace sealant applications are disclosed. The bis(sulfonyl)alkanol-containing polythioethers have bis(sulfonyl)alkanol groups incorporated into the backbone of the polythioether. Cured sealant compositions comprising the bis(sulfonyl)alkanol-containing polythioethers exhibit enhanced properties suitable for aerospace sealant applications.Type: ApplicationFiled: June 21, 2013Publication date: December 25, 2014Inventors: CHANDRA RAO, JUEXIAO CAI, RENHE LIN
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Publication number: 20140353175Abstract: A process for derivatization of an elemental carbon surface comprising exposing the carbon surface to a reaction mixture containing a thiol and a free radical initiator, and inducing decomposition of the initiator to free radicals so that moieties from the thiol become covalently attached to the carbon surface. The process can derivatize carbon with a redox active compound having a functional group which can be converted electrochemically between reduced and oxidized forms. Such derivatized carbon may be used in an electrode of an electrochemical sensor.Type: ApplicationFiled: December 21, 2012Publication date: December 4, 2014Inventors: Lynne Crawford, Nathan Lawrence, Timothy Jones
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Publication number: 20140357896Abstract: Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt. wherein R1 represents an electron withdrawing group; R2 and R3 each independently represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an acyl group, a halogenated alkyl group, a halogen atom, a hydroxyl group, a cyano group, or a nitro group; p and q each independently represent an integer of 0 to 5; and X? represents a monovalent counter anion.Type: ApplicationFiled: May 29, 2014Publication date: December 4, 2014Applicants: SAN-APRO LTD., TOKYO OHKA KOGYO CO., LTD.Inventors: Issei Suzuki, Takuya Ikeda, Yusaku Takashima, Takeshi Furuta, Yoshitaka Komuro, Yoshiyuki Utsumi, Takaaki Kaiho, Toshiaki Hato
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Publication number: 20140275461Abstract: Sulfone-containing polythioethers, compositions containing sulfone-containing polythioethers, methods of synthesizing sulfone-containing polythioethers and the use of sulfone-containing polythioethers in aerospace sealant applications are disclosed. The sulfone-containing polythioethers have sulfone groups incorporated into the backbone of the polythioether. Cured sealant compositions comprising the sulfone-containing polythioethers exhibit enhanced thermal resistance.Type: ApplicationFiled: March 15, 2013Publication date: September 18, 2014Applicant: PRC-DeSoto International, Inc.Inventors: Chandra Rao, Juexiao Cai, Renhe Lin
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Patent number: 8404758Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.Type: GrantFiled: May 17, 2011Date of Patent: March 26, 2013Assignee: The Regents of the University of Colorado, a body corporateInventors: Christopher N. Bowman, Timothy F. Scott
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Publication number: 20130005993Abstract: The present invention provides a diaryl sulfone compound represented by Formula (1) below: wherein R1 to R4 and R1? to R4? are the same or different; each represents hydrogen, C1-4 alkyl, or halogen; and R5 is (thio)glycidyl, acryloyl, or the like; and a method for producing the same. According to the present invention, a novel compound useful as a monomer for producing synthetic resin having a high refractive index and excellent transparency for optical materials can be efficiently produced with a simple production process, using an inexpensive material as a starting material.Type: ApplicationFiled: March 9, 2011Publication date: January 3, 2013Applicant: Sumitomo Seika Chemicals Co., Ltd.Inventors: Paul Kuad, Hisaaki Kanda, Takeshi Fujiwara, Hiroyuki Shiraishi
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Publication number: 20130005982Abstract: The present invention provides a diaryl sulfone compound represented by Formula (1): wherein R1 to R4 and R1? to R4? are the same or different, and each represents hydrogen, C1-4 alkyl, or halogen, and R5 represents C2-6 alkenyl, C1-4 alkyl, or aromatic heterocyclic group; a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with thiol salt compound having an alkylene group; and a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with a thiol salt compound having a hydroxyl group, and subjecting the resulting compound to reaction with a halogenating agent, followed by a dehydrohalogenation reaction.Type: ApplicationFiled: March 9, 2011Publication date: January 3, 2013Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Paul Kuad, Hisaaki Kanda, Takeshi Fujiwara, Hiroyuki Shiraishi
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Patent number: 8318427Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.Type: GrantFiled: September 21, 2011Date of Patent: November 27, 2012Assignee: Affymetrix, Inc.Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
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Patent number: 8293724Abstract: Fatty acid amide hydrolase (FAAH) is an enzyme responsible for the degradation of oleamide (an endogenous sleep-inducing lipid) and anandamide (an endogenous ligand for cannabinoid receptors). Disclosed herein are potent inhibitors of FAAH and methods for their use for treating a variety of disorder, including hypertension and cardiac hypertrophy.Type: GrantFiled: April 6, 2010Date of Patent: October 23, 2012Assignee: The United States of America, as represented by the Secretary, Department of Health and Human ServicesInventors: George Kunos, Alexandros Makriyannis
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Publication number: 20120157658Abstract: This invention relates to methods, compositions, and apparatuses for producing macrocyclic compounds. First, one or more reactants are provided in a reaction medium, which are capable of forming the macrocyclic compound through a desired reaction pathway that includes at least cyclization, and which are further capable of forming undesired oligomers through a undesired reaction pathway that includes undesirable oligomerization. Oligomerization of such reactions in the reaction medium is modulated to reduce formation of undesired oligomers and/or to reduce separation of the undesired oligomers from the reaction medium, relative to a corresponding unmodulated oligomerization reaction, thereby maximizing yields of the macrocyclic compound. The macrocyclic compound so formed is then recovered from the reaction medium. Preferably, the macrocyclic compound spontaneously separates from the reaction medium via phase separation.Type: ApplicationFiled: November 8, 2011Publication date: June 21, 2012Inventors: Thomas E. Johnson, Billy T. Fowler
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Publication number: 20120021902Abstract: (4-Trifluoromethyl-3-thiobenzoyl)cyclohexanediones and use thereof as herbicides A description is given of (4-trifluoromethyl-3-thiobenzoyl)cyclohexanediones of the formula (I) and of their use as herbicides. In this formula (I), X, R1, R2, R3, and R4 are radicals such as hydrogen and organic radicals such as alkyl. A and Z are oxygen or alkylene.Type: ApplicationFiled: July 19, 2011Publication date: January 26, 2012Applicant: BAYER CROPSCIENCE AGInventors: Hartmut AHRENS, Andreas VAN ALMSICK, Elmar GATZWEILER, Dieter FEUCHT, Isolde HÄUSER-HAHN, Stefan LEHR, Christopher Hugh ROSINGER
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Publication number: 20110300484Abstract: Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).Type: ApplicationFiled: October 8, 2009Publication date: December 8, 2011Applicant: BASF SEInventors: Hitoshi Yamato, Toshikage Asakura, Yuichi Nishimae
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Patent number: 8062844Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.Type: GrantFiled: January 21, 2011Date of Patent: November 22, 2011Assignee: Affymetrix, Inc.Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
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Patent number: 8043786Abstract: The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5.Type: GrantFiled: February 20, 2004Date of Patent: October 25, 2011Assignee: JSR CorporationInventors: Satoshi Ebata, Yong Wang, Isao Nishimura
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Patent number: 8017656Abstract: A compound given by the formula (I): has an excellent controlling activity against noxious arthropods.Type: GrantFiled: November 1, 2006Date of Patent: September 13, 2011Assignee: Sumitomo Chemical Company, LimitedInventor: Hiroyuki Miyazaki
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Publication number: 20110171577Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(?O)—, —S(?O)—, —S(?O)2— and —OS(?O)2—, provided that —C(?O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.Type: ApplicationFiled: March 24, 2011Publication date: July 14, 2011Applicant: FUJIFILM CORPORATIONInventors: Tomotaka TSUCHIMURA, Koji SHIRAKAWA, Toru TSUCHIHASHI, Hideaki TSUBAKI
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Patent number: 7910312Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.Type: GrantFiled: July 16, 2010Date of Patent: March 22, 2011Assignee: Affymetrix, Inc.Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
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Publication number: 20110015441Abstract: The present invention relates to a process for producing a sulfone compound of the following formula (3), characterized in that an allyl sulfone compound of the formula (1) and an allyl halide compound of the formula (2) are reacted in an organic solvent in the presence of an alkali metal hydroxide and a phase-transfer catalyst: wherein A is CH2 or C?O; Ar is an aryl group optionally having 1 to 3 substitutents; and the wavy line means that the steric relation to the double bond which the wavy line is bound to is of E-form, Z-form or a mixture of E/Z; wherein X is a halogen atom; and the wavy line means the same as defined above; and wherein A, Ar and the wavy line mean the same as defined above. The present invention also relates to a process for producing a carotenoid from the same sulfone compound.Type: ApplicationFiled: March 3, 2009Publication date: January 20, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Toshiya Takahashi, Orhan Ozturk
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Patent number: 7862996Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.Type: GrantFiled: December 28, 2006Date of Patent: January 4, 2011Assignee: Affymetrix, Inc.Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
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Patent number: 7858703Abstract: Sealant and potting formulations are provided which are prepared from components including ungelled mercapto-terminated polymer(s) prepared by reacting reactants comprising polyvinyl ether monomer(s) and polythiol material(s); curing agent(s) reactive with a mercapto group of the mercapto-terminated polymer; and additive(s) selected from the group consisting of fillers, adhesion promoters, plasticizers and catalysts.Type: GrantFiled: August 26, 2009Date of Patent: December 28, 2010Assignee: PRC DeSoto International, Inc.Inventors: Jonathan D. Zook, Susan E. DeMoss, David W. Jordan, Chandra B. Rao, Hakam Singh, Ahmed Sharaby
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Publication number: 20100305095Abstract: The present invention relates to, inter alia, the use of a compound capable of inhibiting 4-hydroxyphenylpyruvate dioxygenase (HPPD) in an animal in the manufacture of a medicament for use in the treatment and/or prevention of depression. The invention also provides for the use of a compound capable of inhibiting HPPD in an animal in the manufacture of a medicament for use in the treatment of the withdrawal symptoms associated with an addictive drug which causes dopamine dependant associative learning disorders in said animal. In a particular embodiment said HPPD inhibitor is selected from the group consisting of the compound depicted as compound 1; 2; and 3.22.Type: ApplicationFiled: August 18, 2006Publication date: December 2, 2010Inventors: Kim Zachary Travis, John Posner
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Publication number: 20100261674Abstract: Fatty acid amide hydrolase (FAAH) is an enzyme responsible for the degradation of oleamide (an endogenous sleep-inducing lipid) and anandamide (an endogenous ligand for cannabinoid receptors). Disclosed herein are potent inhibitors of FAAH and methods for their use for treating a variety of disorder, including hypertension and cardiac hypertrophy.Type: ApplicationFiled: April 6, 2010Publication date: October 14, 2010Inventors: George Kunos, Alexandros Makriyannis
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Patent number: 7812194Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.Type: GrantFiled: August 30, 2006Date of Patent: October 12, 2010Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Toshiaki Aoai
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Publication number: 20100216970Abstract: This invention relates to methods, compositions, and apparatuses for producing macrocyclic compounds. First, one or more reactants are provided in a reaction medium, which are capable of forming the macrocyclic compound through a desired reaction pathway that includes at least cyclization, and which are further capable of forming undesired oligomers through a undesired reaction pathway that includes undesirable oligomerization. Oligomerization of such reactions in the reaction medium is modulated to reduce formation of undesired oligomers and/or to reduce separation of the undesired oligomers from the reaction medium, relative to a corresponding unmodulated oligomerization reaction, thereby maximizing yields of the macrocyclic compound. The macrocyclic compound so formed is then recovered from the reaction medium. Preferably, the macrocyclic compound spontaneously separates from the reaction medium via phase separation.Type: ApplicationFiled: May 3, 2010Publication date: August 26, 2010Inventors: Thomas E. Johnson, Billy T. Fowler
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Patent number: 7771490Abstract: Disclosed are thiol dyes of formula (I), wherein R1, R2, R3, R4 and R5 independently from each other are hydrogen; unsubstituted or substituted, straight-chain or branched, monocyclic or polycyclic, interrupted or uninterrupted C1-C14alkyl; C2-C14alkenyl; C6-C10aryl; C6-C10aryl-C1-C10alkyl; or C5-C10alkyl(C5-C10aryl); A is a residue of an organic dye; and Y1 is the direct bond; C1C10alkylene; C5-C10cycloalkylene; C5-C12arylene; or C5-C12arylene-(C1-C10alkylene). The compounds are used to dye hair with or without reducing agents. Furthermore, the present invention relates to compositions comprising thiol dyes of formula (I) and to process for the preparation of theses compounds.Type: GrantFiled: August 21, 2006Date of Patent: August 10, 2010Assignee: Ciba CorporationInventors: Victor Paul Eliu, Beate Fröhling, Dominique Kauffmann
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Publication number: 20100174113Abstract: The invention relates to a process for preparing aromatic sulphonylimides, to the sulphonylimides obtained, and to the use thereof as salt of an electrolyte. The sulphonylimides correspond to the formula [R—SO2—N—SO2R?]rM (I). R? is an ArZL- group. R? is a perfluoroalkyl group or an ArZL- group. Z is an S, SO or SO2 group. L is a —(CF2)n—CFRf— group. n is 0 or 1; Rf represents F or a C1 to C8 perfluoroalkyl group; Ar is an aromatic group. M represents H, an alkali metal cation, an alkaline earth metal cation, a trivalent or tetravalent metal cation, or an organic cation. The process consists in preparing a compound RSO2N(R?)SO2R? from RSO2F, and in replacing the group R? by nucleophilic substitution reaction so as to obtain the compound (I), R? being a benzyl or trimethylsilyl group.Type: ApplicationFiled: July 17, 2007Publication date: July 8, 2010Applicants: INSTITUT NATIONAL POLYTECHNIQUE DE GRENOBLE, ERAS-LABO, UNIVERSITE CLAUDE BERNARD LYON 1Inventors: Jean-Yves Sanchez, Bernard Langlois, Maurice Medebielle, Fabien Toulgoat, Fannie Alloin, Elie Paillard, Cristina Iojoiu
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Publication number: 20100087526Abstract: Inhibitors of the enzyme prenylated methylated protein methyl esterase (PMPMEase), the last step in the prenylation process for many eukaryotic proteins, having the general structure R1—X-A-B(R2)—Y or R1—X-A(R2)—B—Y, where R1 is preferably a polyisoprenyl group, X is a linking group, Y is a group that promotes affinity interactions to the active site of PMPMEase and imparts hydrolysis resistance to the inhibitor, A and B are bridge atoms, and R2 is a characteristic-providing substituent.Type: ApplicationFiled: April 6, 2009Publication date: April 8, 2010Inventor: Nararius Saah Lamango
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Patent number: 7687578Abstract: Sealant and potting formulations are provided which are prepared from components including ungelled mercapto-terminated polymer(s) prepared by reacting reactants comprising polyvinyl ether monomer(s) and polythiol material(s); curing agent(s) reactive with a mercapto group of the mercapto-terminated polymer; and additive(s) selected from the group consisting of fillers, adhesion promoters, plasticizers and catalysts.Type: GrantFiled: August 19, 2003Date of Patent: March 30, 2010Assignee: PRC-DeSoto International, Inc.Inventors: Jonathan D. Zook, Susan E. DeMoss, David W. Jordan, Chandra B. Rao, Hakam Singh, Ahmed Sharaby
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Patent number: 7501535Abstract: The invention provides novel six and seven-carbon termini-differentiated polypropionate stereotetrads and stereopentads useful in syntheses of natural products. The invention also provides a novel alkylative sulfenylation-desulfonylation process that efficiently transforms enantiopure epoxyvinyl sulfones to syn and anti dienylsulfides in two operations.Type: GrantFiled: September 15, 2003Date of Patent: March 10, 2009Assignee: Purdue Research FoundationInventors: Philip L. Fuchs, David J. Meyers, Eduardo Torres, Taesik Park, In C. Kim, Yuzhong Chen, Douglas Lantrip, Jerry B. Evarts, Jr.
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Publication number: 20090062285Abstract: The invention relates to a sulfur-containing compound and the preparation thereof. The invention also relates to the uses of the sulfur-containing compound in inhibiting inducible nitric oxide synthase and/or cyclooxygenase-2 and in treating the diseases associated with inducible nitric oxide synthase and/or cyclooxygenase-2. This invention also describes a series of chemical analogues of the said sulfur-containing compound and the preparation of these compounds.Type: ApplicationFiled: July 14, 2008Publication date: March 5, 2009Applicant: National Sun Yat-Sen UniversityInventors: Jyh-Horng Sheu, Chih-Hua Chao, Zhi-Hong Wen
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Patent number: 7452673Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.Type: GrantFiled: January 16, 2007Date of Patent: November 18, 2008Assignee: Affymetrix, Inc.Inventors: Glenn H. McGall, Andrea Cupoletti
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Publication number: 20080255232Abstract: Compounds useful in the treatment of disorders characterized by deposits of amyloid aggregates are herein described together with pharmaceutical compounds containing the same. In particular the compounds of the present invention are those having the Formula (I) as reported below, where the radicals have the meaning indicated in the description.Type: ApplicationFiled: October 12, 2006Publication date: October 16, 2008Applicant: SIGMA-TAU INDUSTRIE FARMACEUTICHE RIUNITE S.P.A.Inventors: Patrizia Minetti, Roberto Di Santo
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Patent number: 7071327Abstract: A superabsorbent polysaccharide can be obtained by crosslinking a polysaccharide or derivative thereof with at least 1% by weight of a flexible spacer having a chain length of at least 9 chain atoms and having terminal activated coupling groups. The flexible spacer may comprise a polyalkyleneglycol with a molecular weight from about 400 to 10,000. The coupling groups may be provided by divinyl sulphone units.Type: GrantFiled: March 9, 2001Date of Patent: July 4, 2006Assignee: SCA Hygiene Products ABInventors: Guiseppe Mensitieri, Fabrizio Porro, Luigi Nicolais, Alessandro Sannino
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Patent number: 7067322Abstract: Disclosed are methods for making surface plasmon resonance-capable arrays wherein molecules, such as proteins or nucleic acids, or cells, are adhered to a metal substrate. The metal substrates are modified by depositing an ?-modified alkanethiol monolayer to the substrate and then contacting the ?-modified monolayer with a heterobifunctional linking compound. Biomolecules or cells can then be attached to the heterobifunctional linking compound. Also disclosed are arrays wherein glutathione-containing molecules are immobilized on the substrate and GST-containing molecules are then specifically immobilized onto the substrate, taking advantage of the affinity between glutathione and GST.Type: GrantFiled: March 15, 2002Date of Patent: June 27, 2006Assignee: Wisconsin Alumni Research FoundationInventors: Robert M. Corn, Emily A. Smith, Bernard Weisblum, Matthew G. Erickson, Andrew T. Ulijasz, Matthew J. Wanat
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Patent number: 6770776Abstract: Fluorocarbon compounds are synthesized by reacting a substrate hydrocarbyl compound containing at least one sp3-hybridized halophoric carbon atom bearing at least two halogen atom substituents, at least one of which is a halogen atom having an atomic number greater than that of fluorine and the at least one halophoric carbon atom being bonded to at least one chalcogen, with at least one reactant which comprises a complex of a Bronstedt base with a defined amount n of hydrofluoric acid, n being at least 3 and not greater than 20.Type: GrantFiled: September 25, 2001Date of Patent: August 3, 2004Assignee: Rhone-Poulenc ChimieInventors: Robert Janin, Laurent Saint-Jalmes
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Patent number: 6768022Abstract: The present invention relates to a method for causing sodium sulfide or a mixture of sodium sulfide and sulfur to react with diazonium salt formed by diazotizing anthranilic acid, wherein the Na/S atomic ratio as calculated on the basis of the employed sodium sulfide and sulfur is adjusted to within the range of 1.33 to 2.0 during the reaction. Thus is made practicable the manufacture of thiosalicylic acid in a high yield without going through the individual route of isolating and reducing dithiosalicylic acid.Type: GrantFiled: December 11, 2002Date of Patent: July 27, 2004Assignee: Air Water Chemical Inc.Inventor: Keiichi Yokota
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Patent number: 6749987Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.Type: GrantFiled: October 17, 2001Date of Patent: June 15, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Kunihiko Kodama, Toshiaki Aoai
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Patent number: 6740782Abstract: The invention aims at providing novel sulfur compounds, molecular compounds containing the same as the component compound, and so on. The above aim is achieved by using sulfur compounds of the general formula (I) wherein Rs are each independently hydrogen, optionally substituted C1-6 alkyl, optionally substituted C2-6 alkenyl, optionally substituted aryl, chloro, or bromo; m is an integer of 0, 1, or 2; and Z is a group represented by any of the general formulae (II) to (V) (wherein R and m are each as defined above; W is hydrogen or C1-6 alkyl; and Y is a direct bond, C1-3 alkylene, or phenylene).Type: GrantFiled: September 12, 2002Date of Patent: May 25, 2004Assignee: Nippon Soda Co., Ltd.Inventors: Ryu Sato, Hiroshi Suzuki
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Patent number: 6699884Abstract: Methods of treating cyclooxygenase-2 mediated disorders comprising administering to a subject a therapeutically effective amount of one or more fluoro-substituted benzenesulfonyl compounds corresponding to Formula I: wherein A, X, n, R1, R2, and R3 are as described in the specification, and novel fluoro-substituted benzenesulfonyl compounds within Formula I.Type: GrantFiled: December 13, 2002Date of Patent: March 2, 2004Assignee: Pharmacia CorporationInventors: David L. Brown, Matthew J. Graneto, Cindy L. Ludwig, John M. Molyneaux, John J. Talley
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Patent number: 6608061Abstract: A medicament for treatment of cancer comprising a compound represented by the following general formula (I) or a physiologically acceptable salt thereof: Ar1—S—R1—S—Ar2 wherein R1 represents a nonmetal bridging group; Ar1 and Ar2 independently represent a group selected from the group consisting of an aryl group which has, on its ring, one to three hydroxyl groups optionally substituted with a monovalent group and said aryl group may have one to three substituents other than hydroxyl group on its ring; and a heteroaryl group which has, on its ring, one to three hydroxyl groups optionally substituted with a monovalent group, and said heteroaryl group may have one to three substituents other than hydroxyl group on its ring.Type: GrantFiled: February 14, 2000Date of Patent: August 19, 2003Assignees: Kyoma Hakko Kogyo Co., Ltd., Fuji Photo Film Co., Ltd.Inventors: Yoshiyuki Yonetani, Takeshi Takahashi, Yuko Kanda, Tamio Mizukami, Tatsuya Tamaoki, Shun-ichi Ikeda, Masanobu Takashima, Naoki Asanuma, Tadashi Inaba, Hiroshi Takeuchi, Hiroshi Kawamoto, Yoshihisa Tsukada, Masato Satomura, Hiroshi Kitaguchi
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Publication number: 20030032657Abstract: Methods of treating cyclooxygenase-2 mediated disorders comprising administering to a subject a therapeutically effective amount of one or more fluoro-substituted benzenesulfonyl compounds corresponding to Formula I: 1Type: ApplicationFiled: April 16, 2002Publication date: February 13, 2003Applicant: Pharmacia CorporationInventors: David L. Brown, Matthew J. Graneto, Cindy L. Ludwig, John M. Molyneaux, John J. Talley
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Publication number: 20030018070Abstract: A medicament for treatment of cancer comprising a compound represented by the following general formula (I) or a physiologically acceptable salt thereof:Type: ApplicationFiled: February 14, 2000Publication date: January 23, 2003Inventors: YOSHIYUKI YONETANI, TAKESHI TAKAHASHI, YUKO KANDA, TAMIO MIZUKAMI, TATSUYA TAMAOKI, SHUN-ICHI IKEDA, MASANOBU TAKASHIMA, NAOKI ASANUMA, TADASHI INABA, HIROSHI TAKEUCHI, HIROSHI KAWAMOTO, YOSHIHISA TSUKADA, MASATO SATOMURA, HIROSHI KITAGUCHI
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Patent number: 6492514Abstract: The present invention relates to compounds of general formula (I) wherein X1 and X2 are different form each other and have the meanings reported in the following description Y is a simple bond, C1-C12 linear or branched alkyl groups, —O—, —S—, >S═O, >SO2, NR17—, wherein R17 is H, C1-C12 linear or branched alkyl groups, COR1, and photopolymerisable formulations containing as photoinitiators the aforementioned compounds of formula (I).Type: GrantFiled: May 16, 2001Date of Patent: December 10, 2002Assignee: Lamberti S.p.A.Inventors: Enzo Meneguzzo, Marco Visconti, Domenico Badone-Italy, Giuseppe Li Bassi
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Method for making unsymmetrically substituted fluorenyl compounds for nonlinear optical applications
Patent number: 6379590Abstract: A new method for producing unsymmetrically substituted fluorenyl compounds, one step of which is the preparation of 2,7-disubstituted fluoren-9-one derivatives via the nucleophilic substitution of a compound of the formula D wherein A′ is selected from the group consisting of —Br, —Cl, —F, —NO2, and —CN; A is selected from the group consisting of —NO2, —CN, —CO2R, —C(O)R, —SO2R, —SO2RF, —C(CN)═C(CN)2 and —CH═C(CN)2; RF is —CpF2p+1, p=from about 0 to about 10; R is an straight, branched or cyclic aliphatic alkyl group having about 1 to 10 carbon atoms, or an aromatic group such as phenyl or naphthyl; and is a carbonyl or a protected carbonyl such as a ketal or thio-ketal such as wherein R′ is —CrH2r+1; R″ is —(CH2)r—; and r is independently 2 or 3, with a nucleophilic reagent in the presence of an aprotic solventType: GrantFiled: December 2, 1994Date of Patent: April 30, 2002Assignee: AlliedSignal Inc.Inventors: Chengjiu Wu, Jianhui Shan -
Patent number: 6376716Abstract: A process for the preparation of an aromatic thiophenol represented by the formula (I): Yn—Ar—(SH)m(I), wherein Ar represents an aromatic hydrocarbon; Y represents at least one substituent bonded to a carbon atom constituting the aromatic ring of Ar, which substituent is selected from the group consisting of halogen, nitro, nitrile, sulfone, sulfamoyl and hydrocarbylsulfonyl groups; m is an integer of 1 or more; and n is an integer of 1 or more, which comprises (a) reacting an aromatic thioether represented by the formula (II): Yn—Ar—(SR)m(II), wherein R represents a monovalent secondary or tertiary hydrocarbyl, or a monovalent primary hydrocarbyl group represented by the formula: —CH2—R1 or —CH2—CR2═C (R2)2, wherein R1 represents a monovalent aromatic ring group optionally substituted by a monovalent hydrocarbyl group, and each of R2 is the same or different from each other and represents hydrogen or a monovalent hydrocarbyl group, with (A) a Lewis acid inType: GrantFiled: May 4, 2000Date of Patent: April 23, 2002Assignee: Nippon Finechemical Co., Ltd.Inventors: Isamu Arai, Tutomu Yamaguchi, Yoko Hida
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Patent number: 6326519Abstract: Diallylic sulfides represented by Formula I wherein: R1 and R2 are independently chosen from the group consisting of —CHO, —CH2Cl, —CH2Br, —CH2I, —CH2OH, CH2OSO2CF3, —CH2OSO2Ph, —CH2OSO2C6H4CH3 and —CH2OSO2CH3 and processes for making the same.Type: GrantFiled: June 4, 2001Date of Patent: December 4, 2001Inventors: Sangho Koo, Hojin Choi, Minsoo Park, Minkoo Ji
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Patent number: 6255343Abstract: 2,2-Difluoro HETE derivatives and methods of their use for treating dry eye are disclosed.Type: GrantFiled: October 23, 2000Date of Patent: July 3, 2001Assignee: Alcon Universal Ltd.Inventor: David B. Belanger