Ring Containing Patents (Class 568/77)
  • Patent number: 8932797
    Abstract: A photoacid generator compound has formula (I): G+Z???(I) wherein G has formula (II): In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or monocyclic C3-30 cycloalkyl; polycyclic or monocyclic C6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R0 groups are further attached to an adjacent R0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: January 13, 2015
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Suzanne M. Coley, James F. Cameron, Paul J. LaBeaume, Ahmad E. Madkour, Owendi Ongayi, Vipul Jain
  • Publication number: 20140227272
    Abstract: The present invention relates in essence to a compound which decreases or inhibits the binding of mammalian T-cells to mammalian endothelial cells for use in a method of prophylaxis and/or amelioration and/or treatment of clinical adverse events caused by therapy which comprises re-directing of T-cells against target cells in a patient. Methods of treatment of patients having or being at risk of clinical adverse events caused by therapy which comprises re-directing of T-cells against target cells are also contemplated.
    Type: Application
    Filed: February 8, 2014
    Publication date: August 14, 2014
    Applicant: AMGEN RESEARCH (MUNICH) GMBH
    Inventors: Peter Kufer, Dirk Nagorsen, Juergen Scheele, Gerhard Zugmaier, Matthias Klinger, Patrick Hoffmann, Virginie Naegele, Elaine-Pashupati Dopfer
  • Publication number: 20140225968
    Abstract: The present invention provides a novel organic compound having a high quantum yield and a high color purity. Provided is an organic compound represented by Formula (1) described in Claim 1. In Formula (1), R1 to R20 are each independently selected from hydrogen atoms, halogen atoms, substituted or unsubstituted alkyl groups, substituted or unsubstituted alkoxy groups, substituted or unsubstituted amino groups, substituted or unsubstituted aryl groups, substituted or unsubstituted heterocyclic groups, substituted or unsubstituted aryloxy groups, substituted or unsubstituted thiol groups, silyl groups, and cyano groups.
    Type: Application
    Filed: September 5, 2012
    Publication date: August 14, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Jun Kamatani, Naoki Yamada, Akihito Saitoh
  • Publication number: 20140142319
    Abstract: An efficient and highly Markovnikov selective organoactinide-, organolanthanide-, and organozirconium-catalyzed addition of aryl, benzyl, and aliphatic thiols to terminal alkynes is described. The corresponding vinyl sulfides are produced with little or no side-products.
    Type: Application
    Filed: December 16, 2013
    Publication date: May 22, 2014
    Applicant: Northwestern University
    Inventors: Tobin J. Marks, Charles J. Weiss, Stephen D. Wobser
  • Patent number: 8729203
    Abstract: The present invention provides a monomer for a polymerizable composition, a polymerizable composition containing the monomers, a polymer formed from the polymerizable composition, and ophthalmic lens blanks and ophthalmic lenses formed from the polymer. The monomer is a compound having the formula (I) or (Ia).
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: May 20, 2014
    Inventors: Timothy Charles Higgs, Richard Alexander Young
  • Patent number: 8617787
    Abstract: There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly)alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X? represents a monovalent polyatomic anion].
    Type: Grant
    Filed: February 4, 2010
    Date of Patent: December 31, 2013
    Assignee: San-Apro, Ltd.
    Inventors: Issei Suzuki, Hideki Kimura
  • Patent number: 8597549
    Abstract: Disclosed are highly efficient multiphoton absorbing compounds and methods of their use. The compounds generally include a bridge of pi-conjugated bonds connecting electron donating groups or electron accepting groups. The bridge may be substituted with a variety of substituents as well. Solubility, lipophilicity, absorption maxima and other characteristics of the compounds may be tailored by changing the electron donating groups or electron accepting groups, the substituents attached to or the length of the pi-conjugated bridge. Numerous photophysical and photochemical methods are enabled by converting these compounds to electronically excited states upon simultaneous absorption of at least two photons of radiation. The compounds have large two-photon or higher-order absorptivities such that upon absorption, one or more Lewis acidic species, Lewis basic species, radical species or ionic species are formed.
    Type: Grant
    Filed: June 26, 2007
    Date of Patent: December 3, 2013
    Assignee: The California Institute of Technology
    Inventors: Brian Cumpston, Matthew Lipson, Seth R. Marder, Joseph W. Perry
  • Patent number: 8541157
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: September 24, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Sho Abe
  • Patent number: 8512934
    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a g
    Type: Grant
    Filed: September 29, 2008
    Date of Patent: August 20, 2013
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Hitoshi Yamato
  • Patent number: 8470197
    Abstract: A crosslinked polysulfide-containing cycloaliphatic compound, useful as a crosslinker for filled sulfur-vulcanizable elastomer compositions, is represented by the general formula: [(CaH2a-)mG1(-CbH2bSx—)n?m]o[CcH2c-G2-CdH2dSy—]p[R]q wherein G1 is a saturated, monocyclic aliphatic group of valence n containing from 5 to 12 carbon atoms and optionally containing at least one halogen or a saturated monocyclic silicone [RSiO—]n[R2SiO—]r group of valence n; G2 is a saturated, divalent cyclic aliphatic group of valence 2 containing from 5 to 12 carbon atoms and optionally containing at least one halogen or a saturated monocyclic silicone [RSiO—]n[R2SiO—]r group of valence n; each R independently is a selected from the group consisting of a hydrogen atom, monovalent hydrocarbon of up to 20 carbon atoms and a halogen atom; each occurrence of subscripts a, b, c, d, m, n, o, p, q, x and y independently is an integer wherein a is 2 to 6; b is 2 to 6; c is 1 to 6; d is 1 to 6; m is 1 or 2; n is 3 to 5; o is a positive
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: June 25, 2013
    Assignee: Momentive Performance Materials Inc.
    Inventors: Richard W. Cruse, William Michael York, Carla Recker, Thomas Kramer, Katharina Herzog
  • Patent number: 8455563
    Abstract: The invention relates to new reactive mesogenic compounds (RM), polymerisable liquid crystal (LC) mixtures and polymers comprising them, and the use of the compounds, mixtures and polymers in optical, electrooptical, electronic, semiconducting or luminescent components or devices, in decorative, security or cosmetic applications, especially for use in polymer films having high optical dispersion.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: June 4, 2013
    Assignee: Merck Patent GmbH
    Inventors: Owain Llyr Parri, Donald Gordon Graham, Alison Linda May
  • Patent number: 8415085
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1?) and/or a compound represented by (b1-1?) (R1?-R3? represents an aryl group or an alkyl group, provided that at least one of R1?-R3? represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1?-R3? may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(?O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: April 9, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Yoshiyuki Utsumi, Takehiro Seshimo, Akiya Kawaue
  • Patent number: 8338076
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety comprising a group represented by general formula (I) (in the formula, R5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: December 25, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Hideo Hada, Takehiro Seshimo, Kensuke Matsuzawa, Keita Ishiduka, Kotaro Endo
  • Patent number: 8227624
    Abstract: A photoacid generator which can generate an acid efficiently when energy was absorbed, is excellent in the developing property and can form fine patterns, and a cationic polymerization initiator excellent in curability are provided; and a resist composition and a cationically polymerizable composition using them are provided. An aromatic sulfonium salt compound represented by the General Formula (I) below: (wherein each of E1 to E4 independently represents a substituent represented by the General Formula (II) below or the General Formula (III) below). Preferably, in the General Formula (I), r and s are 0; m and n are 0; or n and r are 0, and more preferably, one of m and s in the General Formula (I) is 1.
    Type: Grant
    Filed: August 4, 2008
    Date of Patent: July 24, 2012
    Assignee: Adeka Corporation
    Inventors: Tetsuyuki Nakayashiki, Kentaro Kimura
  • Patent number: 8216974
    Abstract: There is provided a fluorine-containing organosulfur compound having an excellent controlling effect on arthropod pests represented by the formula (I): wherein G represents an oxygen atom or a sulfur atom; R2 represents a C1-C4 chain hydrocarbon group which is optionally substituted with a halogen atom, etc.; R3 and R4 independently represent a C1-C4 chain hydrocarbon group or a hydrogen atom; R5 represents a C1-C5 haloalkyl group containing at least one fluorine atom, or a fluorine atom; R6 represents a halogen atom, a cyano group, a nitro group or a -(G1)q-R8 group; R7 represents an amino group etc.; R8 represents a C1-C4 chain hydrocarbon group which is optionally substituted with a halogen atom; m represents an integer of 0 to 5; n represents an integer of 0 to 2; p represents 0 or 1; q represents 0 or 1; and G1 represents an oxygen atom etc.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: July 10, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Kumamoto, Hiroyuki Miyazaki
  • Patent number: 8119586
    Abstract: A detergent composition comprising an esterified substituted benzene sulfonate, a hydrogen peroxide source, a soil suspending polymer, and an organic catalyst.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: February 21, 2012
    Assignee: The Procter and Gamble Company
    Inventors: Jeffrey John Scheibel, Scott Leroy Cron, Xinbei Song, Kevin Patrick Christmas, Gregory Scot Miracle
  • Patent number: 8067643
    Abstract: Compounds of the formula (I), L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L?3 and L?5 or L?3 and L?5 together denote a single bond, provided that the respective X, X? or X? is not a single bond; and/or L3 and L5, L?3 and L?5 or L?3 and L?5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L?1 and L?3, L?1 and L?, L?5 and L?7, L?1 and L?3, L?1 and L?, or L?5 and L?7, together denote an organic linking group; provided that at least one of L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 is other than hydrogen; X, X? and X? independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an ino
    Type: Grant
    Filed: April 4, 2007
    Date of Patent: November 29, 2011
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Stephan Ilg
  • Patent number: 8012672
    Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Grant
    Filed: September 24, 2007
    Date of Patent: September 6, 2011
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
  • Patent number: 7943669
    Abstract: The present invention describes phenoxy-acetic acids and pharmaceutical compositions containing the same and methods of using the same. The phenoxy-acetic acids are activators of PPAR-? and should be useful for treating conditions mediated by the same.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: May 17, 2011
    Assignee: High Point Pharmaceuticals, LLC
    Inventor: Soren Ebdrup
  • Publication number: 20110082053
    Abstract: Provided is a molecular rectifier comprised of a diamondoid molecule and an electron acceptor attached to the diamondoid molecule. The electron acceptor is generally an electron accepting aromatic species which is covalently attached to the diamondoid.
    Type: Application
    Filed: January 30, 2009
    Publication date: April 7, 2011
    Inventors: Wanli Yang, Zhi-Xun Shen, Harindran C. Manoharan, Nicholas A. Melosh, Michael A. Kelly, Andrey A. Fokin, Peter R. Schreiner, Jason C. Randel
  • Patent number: 7901867
    Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent ac
    Type: Grant
    Filed: June 21, 2006
    Date of Patent: March 8, 2011
    Assignee: BASF SE
    Inventors: Jean-Pierre Wolf, Attila Latika, Jean-Luc Birbaum, Stephan Ilg, Pascal Hayoz
  • Patent number: 7863459
    Abstract: An 'onium salt, e.g. a quaternary ammonium salt, of an anionic dye may be prepared by mixing an aqueous solution of a salt of the dye with a solution of a water-insoluble 'onium salt in an organic solvent, and separating a solution of the 'onium salt of the anionic dye in the organic solvent from the residual aqueous solution.
    Type: Grant
    Filed: December 18, 2006
    Date of Patent: January 4, 2011
    Assignee: Sun Chemical Corporation
    Inventor: Robert Lines
  • Patent number: 7833690
    Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: November 16, 2010
    Assignee: The University of North Carolina at Charlotte
    Inventors: Kenneth E. Gonsalves, Mingxing Wang
  • Patent number: 7829155
    Abstract: The present invention provides a new monomer and methods of using the monomer to fabricate robust polymer surface coatings with controlled thicknesses between 1 and 5 nanometers. The coatings are composed of a new material containing polymerized monomers of 4-vinylbenzenepropanethiol. The polymer surface coating may be applied to metal and silicon. The method includes exposing a metal substrate to a solution of the monomer in hexanes in order to deposit a monolayer of the monomer onto the metal surface. The substrate is then irradiated with ultraviolet radiation in order to graft a thin polymer coating onto the surface. The procedure can be repeated in order to control the thickness of the coating between about 1 nm and 5 nm. Alternatively, thermally initiated polymerization or deposition of partially oligomerized monomers onto the surface provides nanothin coatings with identical performance.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: November 9, 2010
    Assignee: The University of Memphis Research Foundation
    Inventors: Evgueni Pinkhassik, Larry Todd Banner, Benjamin T. Clayton
  • Patent number: 7776510
    Abstract: A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7? to R9? each independently represents an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X? represents an anion.
    Type: Grant
    Filed: June 9, 2008
    Date of Patent: August 17, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takeshi Iwai, Hideo Hada, Keita Ishiduka, Akiya Kawaue, Hiroaki Shimizu, Kyoko Ohshita, Tsuyoshi Nakamura, Komei Hirahara, Yuichi Suzuki, Takehiro Seshimo
  • Publication number: 20100081208
    Abstract: A multirange indicator is proposed which permits quantitative dose determination of high-energy actinic radiation, where the dose for different wavelength ranges can be respectively determined in parallel. To this end, the multirange indicator has two indicator systems designed with mutually corresponding properties, thus eliminating any mutual distortion of the results of the dose measurements. The first indicator system is based on a photolatent Lewis acid or photolatent Lewis base, and the second indicator system is based on a polysubstituted triphenylmethane dye. Both the multirange indicator and its use for the production of various dose-measurement devices are described.
    Type: Application
    Filed: September 24, 2009
    Publication date: April 1, 2010
    Applicant: Tesa SE
    Inventors: Klaus KEITE-TELGENBÜSCHER, Hermann NEUHAUS-STEINMETZ
  • Patent number: 7678528
    Abstract: The present invention relates to novel photoacid generators.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: March 16, 2010
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: M. Dalil Rahman, Munirathna Padmanaban
  • Publication number: 20090264660
    Abstract: An alkyl aryl sulfide of Chemical Formula (III) is prepared by substituting an aryl halogen compound of Chemical Formula (I) with an alkyl lithium organometallic reagent. The sulfide is subsequently reacted with a compound of Chemical Formula (II). Alternatively an aryl halogen compound of Chemical Formula (I) is reacted with Grignard reagent to protect the hydrogen-donating substituent, and then reacted with an alkyl lithium organometallic reagent, and subsequently with sulfur and a compound of Chemical Formula (II). An alkyl aryl sulfide of Chemical Formula (III) is prepared via a one-step reaction without separation or purification of an intermediate compound from various aryl halogen compounds.
    Type: Application
    Filed: October 21, 2005
    Publication date: October 22, 2009
    Inventors: Heonjoong Kang, Jungyeob Ham, Jaeyoung Ko
  • Patent number: 7459106
    Abstract: The present invention provides compounds and compositions, which include: at least one chromophore having strong simultaneous two-photon or multi-photon absorptivity; at least one acid- or radical-generator in close proximity to the chromophore; such that the single- or multi-photon excitation of the chromophore results in the generation of an acid and/or redical that is capable of activating chemistry; and such that compositions of matter based on the componds and compositions of the invention can be photo-patterned by one- or multiphoton excitation.
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: December 2, 2008
    Assignee: The Arizona Board of Regents on Behalf of the University of Arizona
    Inventors: Seth Marder, Joseph Perry, Wenhui Zhou, Stephen M. Kuebler, J. Kevin Cammack
  • Publication number: 20080287686
    Abstract: An 'onium salt, e.g. a quaternary ammonium salt, of an anionic dye maybe prepared by mixing an aqueous solution of a salt of the dye with a solution of a water-insoluble 'onium salt in an organic solvent, and separating a solution of the 'onium salt of the anionic dye in the organic solvent from the residual aqueous solution.
    Type: Application
    Filed: December 18, 2006
    Publication date: November 20, 2008
    Applicant: Sun Chemical Corp
    Inventor: Robert Lines
  • Publication number: 20080269527
    Abstract: The use of vinyl sulfides, sulfoxides and sulfones in synthetic chemistry for the production of a wide variety of materials is well known. For example, phenyl vinyl sulfides, sulfoxides and sulfones have been used for the synthesis of important heterocycles, in combinatorial chemistry and as Diels-Alder adducts. Although these compounds have been used extensively for a variety of applications, the isotopically labeled versions have not been reported. A simple route for the isotopically labeled production of these important building blocks has been developed.
    Type: Application
    Filed: February 22, 2008
    Publication date: October 30, 2008
    Inventor: Rodolfo A. Martinez
  • Publication number: 20080249270
    Abstract: A monosulfonium salt in which very little unreacted raw material remains, which has a purity of at least 96%, and which has one sulfonio group in its molecule is manufactured without a refining step. After (a) an aryl compound, (b) a sulfoxide compound, (c) a dehydrating agent, and (d) a BF4, PF6, AsF6, or SbF6 salt of an alkali metal or an alkaline earth metal are introduced into a reaction system, (e) an inorganic acid is added, so that the aryl compound (a) and the sulfoxide compound (b) are subjected to dehydration condensation.
    Type: Application
    Filed: May 23, 2008
    Publication date: October 9, 2008
    Inventors: Masashi Date, Hideki Kimura, Shinji Yamashita, Jiro Yamamoto
  • Patent number: 7405262
    Abstract: A process for preparing a functionalized polymerization initiator, the process comprising combining a functionalized styryl compound and an organolithium compound.
    Type: Grant
    Filed: July 11, 2003
    Date of Patent: July 29, 2008
    Assignee: Bridgestone Corporation
    Inventors: Thomas Antkowiak, Christine Rademacher, Anthony Ramic, David F. Lawson
  • Publication number: 20080138742
    Abstract: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
    Type: Application
    Filed: October 23, 2007
    Publication date: June 12, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Kunihiko KODAMA, Tomotaka TSUCHIMURA, Hiroshi SAEGUSA, Hideaki TSUBAKI
  • Patent number: 7211636
    Abstract: An ionic compound comprising a cationic portion having a hydroxyl group and/or a carboxylic acid group and an anionic portion of the formula (1): [BR4]???(1) wherein R may be the same or different and represents a phenyl group substituted with F or CF3. Preferably, the anionic portion is [B(C6F5)4]?, [B(C6H4CF3)4]? or [B(C6H3F2)4]?. In other aspects, a radiation polymerization initiator and a resin composition comprising the ionic compound are provided. A resin composition prepared by using the radiation polymerization initiator generates a small amount of outgas during reaction and has excellent reactivity and transparency.
    Type: Grant
    Filed: June 22, 2005
    Date of Patent: May 1, 2007
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yugo Yamamoto, Yasushi Mizuta
  • Patent number: 7211603
    Abstract: The invention provides novel tetradentate enediyne ligands that are themselves thermally stable, yet react at about room temperature or slightly higher upon addition of metal ions or under photothermal conditions. In another aspect of the invention, a method of treating a disorder in a mammal comprising administering a therapeutically effective amount of a compound or composition is provided. In addition, the free ligand can be delivered to the mammal prior to complexation to metals, such that the ligand is exposed to a metal in the body and forms a metal complex in vivo. Furthermore, a metal complex of the invention can be administered to the mammal such that the complex exchanges the first metal center with another endogenous metal in order to form a second metal complex in vivo. The second metal complex is capable of forming a benzenoid diradical under physiological conditions and/or under photothermal conditions.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: May 1, 2007
    Assignee: Indiana University Research and Technology Corporation
    Inventors: Jeffrey M. Zaleski, Diwan Singh Rawat
  • Patent number: 7183324
    Abstract: Disclosed herein are compounds comprising or a pharmaceutically acceptable salt or a prodrug thereof; wherein Y, A, B, J, and E are further described. Methods, compositions, and medicaments related thereto are also disclosed.
    Type: Grant
    Filed: November 23, 2004
    Date of Patent: February 27, 2007
    Assignee: Allergan, Inc.
    Inventors: Yariv Donde, Mark Holoboski, Mari F. Posner, Robert M. Burk, Michael E. Garst
  • Patent number: 7179817
    Abstract: Compounds represented by formula (I), prodrugs thereof and salts thereof, and pharmaceutical compositions comprising the same as an active ingredient (wherein each symbol has the meaning as defined in the specification.).
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: February 20, 2007
    Assignee: ONO Pharmaceutical Co., Ltd.
    Inventors: Takuya Seko, Masahiko Terakado, Hiroshi Kohno, Shinya Takahashi
  • Patent number: 7160887
    Abstract: Compounds of a formula: wherein Ring A represents an optionally-substituted aromatic ring; Ring B represents an optionally-substituted cyclic hydrocarbon group; Z represents an optionally-substituted cyclic group; R1 represents a hydrogen atom, an optionally-substituted hydrocarbon group, an optionally-substituted heterocyclic group, or an acyl group; R2 represents an optionally-substituted amino group; D represents a chemical bond or a divalent group; E represents —CO—, —CON(Ra)—, COO—, N(Ra)CON(Rb)—, —N(Ra)COO—, —N(Ra)SO2—, N(Ra)—, —O—, —S—, —SO— or —SO2— (in which Ra and Rb each independently represent a hydrogen atom or an optionally-substituted hydrocarbon group); G represents a chemical bond or a divalent group; L represents (1) a chemical bond or (2) a divalent hydrocarbon group optionally having from 1 to 5 substituents selected from; (i) a C1-6 alkyl group, (ii) a halogeno-C1-6 alkyl group, (iii) a phenyl group, (iv) a benzyl group, (v) an optionally-substituted amino group, (vi) an optionally
    Type: Grant
    Filed: October 19, 1999
    Date of Patent: January 9, 2007
    Assignee: Takeda Pharmaceutical Company Limited
    Inventors: Satoru Oi, Nobuhiro Suzuki, Kazuyoshi Aso, Yoshihiro Banno
  • Patent number: 7112697
    Abstract: A mild, palladium-free synthetic protocol for the cross-coupling reaction of vinyl or aryl iodides and thiols or selenols using, in certain embodiments, 10 mol % CuI and 10 mol % neocuproine, with NaOt-Bu as the base, in toluene at 110 ° C. A variety of vinyl/aryl sulfides and vinyl/aryl selenides can be synthesized in excellent yields from readily available iodides and thiols or selenols.
    Type: Grant
    Filed: July 12, 2004
    Date of Patent: September 26, 2006
    Assignee: University of Massachusetts
    Inventors: Dhandapani Venkataraman, Craig G. Bates, Rattan K. Gujadhur
  • Patent number: 7094515
    Abstract: A stimulus sensitive composition containing a compound capable of generating an acid or a radical on receipt of an external stimulus, the compound being represented by the following formula (I): wherein Y represents a group having a bridged cyclic structure; R1 and R2 each independently represent a hydrogen atom, an alkyl group or an aryl group; R1 and R2 may be taken together to form a ring; Y1 and Y2 each independently represent an alkyl group or an aryl group; Y1 and Y2 may be taken together to form a ring; and X? represents a non-nucleophilic anion.
    Type: Grant
    Filed: March 15, 2004
    Date of Patent: August 22, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kunihiko Kodama, Hyou Takahashi
  • Patent number: 7074504
    Abstract: The present invention is generally directed to luminescent lanthanide compounds with phosphine oxide, phosphine oxide-sulfide, pyridine N-oxide, and phosphine oxide-pyridine N-oxide ligands. It also relates to electronic devices in which the active layer includes a lanthanide complex.
    Type: Grant
    Filed: December 14, 2004
    Date of Patent: July 11, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Vladimir Grushin, Norman Herron, Viacheslav A. Petrov, Nora Sabina Radu, Ying Wang
  • Patent number: 7033727
    Abstract: A photosensitive composition of the present invention has excellent sensitivity and pattern profile, which comprises an acid generator having a specific structure.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: April 25, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kunihiko Kodama
  • Patent number: 6833480
    Abstract: Substituted (Z)-styrylbenzyl sulfones of the formulae (I, II, III, IV), pharmaceutically acceptable salts thereof, and compositions thereof are provided as cell antiproliferative agents, including, for example, anticancer agents.
    Type: Grant
    Filed: August 21, 2003
    Date of Patent: December 21, 2004
    Assignee: Temple University - Of The Commonwealth System of Higher Education
    Inventors: E. Premkumar Reddy, M. V. Ramana Reddy
  • Patent number: 6824706
    Abstract: The invention relates to new mono-, oligo- and poly-difluorovinyl(hetero)arylenes comprising one or more identical or different recurring units of formula I wherein D, D′, Ar, a and b have the meanings as defined in herein. Furthermore the inventions relates to their synthesis, their use as semiconductors or charge transport materials and their different applications.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: November 30, 2004
    Assignee: Merck Patent Gesellschaft mit beschrank Haftung
    Inventors: Martin Heeney, Louise Farrand, Mark Giles, Marcus Thompson, Steven Tierney, Maxim Shkunov, David Sparrowe, Iain McCulloch
  • Patent number: 6630210
    Abstract: The invention relates to pentafluorosulfuranylbenzene derivatives of the formula I in which R1, A1, A2, Z1, L1, L2, L3 and n are as defined herein and to the use thereof in liquid-crystalline media.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: October 7, 2003
    Assignee: Merck GmbH
    Inventors: Peer Kirsch, Joachim Krause, Michael Heckmeier
  • Patent number: 6630509
    Abstract: The present invention relates to certain phenalkyloxy-phenyl derivatives of formula (I) and analogs, to a process for preparing such compounds, which compounds have utility in treating clinical conditions associated with insulin resistance, to methods for their therapeutic use and to pharmaceutical compositions containing them.
    Type: Grant
    Filed: June 3, 2002
    Date of Patent: October 7, 2003
    Assignee: AstraZeneca AB
    Inventors: Jonas Fägerhag, Lanna Li, Eva-Lotte Lindstedt Alstermark
  • Patent number: 6576684
    Abstract: Disclosed are compositions from which radically initiated oligomers/polymers having a controlled molecular weight, low polydispersity and a vinyl or dienyl end group are prepared. Further subjects of the invention are a process for controlled radical polymerization, oligomers/polymers obtainable by said process and the use of specific addition fragmentation agents for the polymerization process. The addition fragmentation agents are new in part and these are also subject of the present invention. The addition fragmentation agents are of the formula (Ia), (Ib) or (Ic) where Y is a group which activates the double bond towards Michael addition.
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: June 10, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Vincent Desobry, Peter Murer, Anne Schuwey
  • Patent number: 6528232
    Abstract: A sulfonium salt compound designated by a general formula (I), a photoresist composition containing the sulfonium salt compound and a method for patterning by employing the sulfonium salt compound.
    Type: Grant
    Filed: October 31, 2000
    Date of Patent: March 4, 2003
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
  • Patent number: 6416928
    Abstract: Onium salts of substituted phenylmethylbenzene-sulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and peeling, and improved pattern profile after development.
    Type: Grant
    Filed: October 5, 2000
    Date of Patent: July 9, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Jun Watanabe, Satoshi Watanabe, Shigehiro Nagura