Abstract: A photoacid generator compound has formula (I): G+Z???(I) wherein G has formula (II): In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or monocyclic C3-30 cycloalkyl; polycyclic or monocyclic C6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R0 groups are further attached to an adjacent R0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.

Abstract: The present invention relates in essence to a compound which decreases or inhibits the binding of mammalian T-cells to mammalian endothelial cells for use in a method of prophylaxis and/or amelioration and/or treatment of clinical adverse events caused by therapy which comprises re-directing of T-cells against target cells in a patient. Methods of treatment of patients having or being at risk of clinical adverse events caused by therapy which comprises re-directing of T-cells against target cells are also contemplated.

Abstract: The present invention provides a novel organic compound having a high quantum yield and a high color purity. Provided is an organic compound represented by Formula (1) described in Claim 1. In Formula (1), R1 to R20 are each independently selected from hydrogen atoms, halogen atoms, substituted or unsubstituted alkyl groups, substituted or unsubstituted alkoxy groups, substituted or unsubstituted amino groups, substituted or unsubstituted aryl groups, substituted or unsubstituted heterocyclic groups, substituted or unsubstituted aryloxy groups, substituted or unsubstituted thiol groups, silyl groups, and cyano groups.

Abstract: An efficient and highly Markovnikov selective organoactinide-, organolanthanide-, and organozirconium-catalyzed addition of aryl, benzyl, and aliphatic thiols to terminal alkynes is described. The corresponding vinyl sulfides are produced with little or no side-products.

Abstract: The present invention provides a monomer for a polymerizable composition, a polymerizable composition containing the monomers, a polymer formed from the polymerizable composition, and ophthalmic lens blanks and ophthalmic lenses formed from the polymer. The monomer is a compound having the formula (I) or (Ia).

Abstract: There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly)alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X? represents a monovalent polyatomic anion].

Abstract: Disclosed are highly efficient multiphoton absorbing compounds and methods of their use. The compounds generally include a bridge of pi-conjugated bonds connecting electron donating groups or electron accepting groups. The bridge may be substituted with a variety of substituents as well. Solubility, lipophilicity, absorption maxima and other characteristics of the compounds may be tailored by changing the electron donating groups or electron accepting groups, the substituents attached to or the length of the pi-conjugated bridge. Numerous photophysical and photochemical methods are enabled by converting these compounds to electronically excited states upon simultaneous absorption of at least two photons of radiation. The compounds have large two-photon or higher-order absorptivities such that upon absorption, one or more Lewis acidic species, Lewis basic species, radical species or ionic species are formed.

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.

Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a g

Abstract: A crosslinked polysulfide-containing cycloaliphatic compound, useful as a crosslinker for filled sulfur-vulcanizable elastomer compositions, is represented by the general formula: [(CaH2a-)mG1(-CbH2bSx—)n?m]o[CcH2c-G2-CdH2dSy—]p[R]q wherein G1 is a saturated, monocyclic aliphatic group of valence n containing from 5 to 12 carbon atoms and optionally containing at least one halogen or a saturated monocyclic silicone [RSiO—]n[R2SiO—]r group of valence n; G2 is a saturated, divalent cyclic aliphatic group of valence 2 containing from 5 to 12 carbon atoms and optionally containing at least one halogen or a saturated monocyclic silicone [RSiO—]n[R2SiO—]r group of valence n; each R independently is a selected from the group consisting of a hydrogen atom, monovalent hydrocarbon of up to 20 carbon atoms and a halogen atom; each occurrence of subscripts a, b, c, d, m, n, o, p, q, x and y independently is an integer wherein a is 2 to 6; b is 2 to 6; c is 1 to 6; d is 1 to 6; m is 1 or 2; n is 3 to 5; o is a positive

Abstract: The invention relates to new reactive mesogenic compounds (RM), polymerisable liquid crystal (LC) mixtures and polymers comprising them, and the use of the compounds, mixtures and polymers in optical, electrooptical, electronic, semiconducting or luminescent components or devices, in decorative, security or cosmetic applications, especially for use in polymer films having high optical dispersion.

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1?) and/or a compound represented by (b1-1?) (R1?-R3? represents an aryl group or an alkyl group, provided that at least one of R1?-R3? represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1?-R3? may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(?O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety comprising a group represented by general formula (I) (in the formula, R5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).

Abstract: A photoacid generator which can generate an acid efficiently when energy was absorbed, is excellent in the developing property and can form fine patterns, and a cationic polymerization initiator excellent in curability are provided; and a resist composition and a cationically polymerizable composition using them are provided. An aromatic sulfonium salt compound represented by the General Formula (I) below: (wherein each of E1 to E4 independently represents a substituent represented by the General Formula (II) below or the General Formula (III) below). Preferably, in the General Formula (I), r and s are 0; m and n are 0; or n and r are 0, and more preferably, one of m and s in the General Formula (I) is 1.

Abstract: There is provided a fluorine-containing organosulfur compound having an excellent controlling effect on arthropod pests represented by the formula (I): wherein G represents an oxygen atom or a sulfur atom; R2 represents a C1-C4 chain hydrocarbon group which is optionally substituted with a halogen atom, etc.; R3 and R4 independently represent a C1-C4 chain hydrocarbon group or a hydrogen atom; R5 represents a C1-C5 haloalkyl group containing at least one fluorine atom, or a fluorine atom; R6 represents a halogen atom, a cyano group, a nitro group or a -(G1)q-R8 group; R7 represents an amino group etc.; R8 represents a C1-C4 chain hydrocarbon group which is optionally substituted with a halogen atom; m represents an integer of 0 to 5; n represents an integer of 0 to 2; p represents 0 or 1; q represents 0 or 1; and G1 represents an oxygen atom etc.

Abstract: A detergent composition comprising an esterified substituted benzene sulfonate, a hydrogen peroxide source, a soil suspending polymer, and an organic catalyst.

Abstract: Compounds of the formula (I), L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L?3 and L?5 or L?3 and L?5 together denote a single bond, provided that the respective X, X? or X? is not a single bond; and/or L3 and L5, L?3 and L?5 or L?3 and L?5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L?1 and L?3, L?1 and L?, L?5 and L?7, L?1 and L?3, L?1 and L?, or L?5 and L?7, together denote an organic linking group; provided that at least one of L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 is other than hydrogen; X, X? and X? independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an ino

Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

Abstract: The present invention describes phenoxy-acetic acids and pharmaceutical compositions containing the same and methods of using the same. The phenoxy-acetic acids are activators of PPAR-? and should be useful for treating conditions mediated by the same.

Abstract: Provided is a molecular rectifier comprised of a diamondoid molecule and an electron acceptor attached to the diamondoid molecule. The electron acceptor is generally an electron accepting aromatic species which is covalently attached to the diamondoid.

Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent ac

Abstract: An 'onium salt, e.g. a quaternary ammonium salt, of an anionic dye may be prepared by mixing an aqueous solution of a salt of the dye with a solution of a water-insoluble 'onium salt in an organic solvent, and separating a solution of the 'onium salt of the anionic dye in the organic solvent from the residual aqueous solution.

Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.

Abstract: The present invention provides a new monomer and methods of using the monomer to fabricate robust polymer surface coatings with controlled thicknesses between 1 and 5 nanometers. The coatings are composed of a new material containing polymerized monomers of 4-vinylbenzenepropanethiol. The polymer surface coating may be applied to metal and silicon. The method includes exposing a metal substrate to a solution of the monomer in hexanes in order to deposit a monolayer of the monomer onto the metal surface. The substrate is then irradiated with ultraviolet radiation in order to graft a thin polymer coating onto the surface. The procedure can be repeated in order to control the thickness of the coating between about 1 nm and 5 nm. Alternatively, thermally initiated polymerization or deposition of partially oligomerized monomers onto the surface provides nanothin coatings with identical performance.

Abstract: A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7? to R9? each independently represents an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X? represents an anion.

Abstract: A multirange indicator is proposed which permits quantitative dose determination of high-energy actinic radiation, where the dose for different wavelength ranges can be respectively determined in parallel. To this end, the multirange indicator has two indicator systems designed with mutually corresponding properties, thus eliminating any mutual distortion of the results of the dose measurements. The first indicator system is based on a photolatent Lewis acid or photolatent Lewis base, and the second indicator system is based on a polysubstituted triphenylmethane dye. Both the multirange indicator and its use for the production of various dose-measurement devices are described.

Abstract: The present invention relates to novel photoacid generators.

Abstract: An alkyl aryl sulfide of Chemical Formula (III) is prepared by substituting an aryl halogen compound of Chemical Formula (I) with an alkyl lithium organometallic reagent. The sulfide is subsequently reacted with a compound of Chemical Formula (II). Alternatively an aryl halogen compound of Chemical Formula (I) is reacted with Grignard reagent to protect the hydrogen-donating substituent, and then reacted with an alkyl lithium organometallic reagent, and subsequently with sulfur and a compound of Chemical Formula (II). An alkyl aryl sulfide of Chemical Formula (III) is prepared via a one-step reaction without separation or purification of an intermediate compound from various aryl halogen compounds.

Abstract: The present invention provides compounds and compositions, which include: at least one chromophore having strong simultaneous two-photon or multi-photon absorptivity; at least one acid- or radical-generator in close proximity to the chromophore; such that the single- or multi-photon excitation of the chromophore results in the generation of an acid and/or redical that is capable of activating chemistry; and such that compositions of matter based on the componds and compositions of the invention can be photo-patterned by one- or multiphoton excitation.

Abstract: An 'onium salt, e.g. a quaternary ammonium salt, of an anionic dye maybe prepared by mixing an aqueous solution of a salt of the dye with a solution of a water-insoluble 'onium salt in an organic solvent, and separating a solution of the 'onium salt of the anionic dye in the organic solvent from the residual aqueous solution.

Abstract: The use of vinyl sulfides, sulfoxides and sulfones in synthetic chemistry for the production of a wide variety of materials is well known. For example, phenyl vinyl sulfides, sulfoxides and sulfones have been used for the synthesis of important heterocycles, in combinatorial chemistry and as Diels-Alder adducts. Although these compounds have been used extensively for a variety of applications, the isotopically labeled versions have not been reported. A simple route for the isotopically labeled production of these important building blocks has been developed.

Abstract: A monosulfonium salt in which very little unreacted raw material remains, which has a purity of at least 96%, and which has one sulfonio group in its molecule is manufactured without a refining step. After (a) an aryl compound, (b) a sulfoxide compound, (c) a dehydrating agent, and (d) a BF4, PF6, AsF6, or SbF6 salt of an alkali metal or an alkaline earth metal are introduced into a reaction system, (e) an inorganic acid is added, so that the aryl compound (a) and the sulfoxide compound (b) are subjected to dehydration condensation.

Abstract: A process for preparing a functionalized polymerization initiator, the process comprising combining a functionalized styryl compound and an organolithium compound.

Abstract: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.

Abstract: The invention provides novel tetradentate enediyne ligands that are themselves thermally stable, yet react at about room temperature or slightly higher upon addition of metal ions or under photothermal conditions. In another aspect of the invention, a method of treating a disorder in a mammal comprising administering a therapeutically effective amount of a compound or composition is provided. In addition, the free ligand can be delivered to the mammal prior to complexation to metals, such that the ligand is exposed to a metal in the body and forms a metal complex in vivo. Furthermore, a metal complex of the invention can be administered to the mammal such that the complex exchanges the first metal center with another endogenous metal in order to form a second metal complex in vivo. The second metal complex is capable of forming a benzenoid diradical under physiological conditions and/or under photothermal conditions.

Abstract: An ionic compound comprising a cationic portion having a hydroxyl group and/or a carboxylic acid group and an anionic portion of the formula (1): [BR4]???(1) wherein R may be the same or different and represents a phenyl group substituted with F or CF3. Preferably, the anionic portion is [B(C6F5)4]?, [B(C6H4CF3)4]? or [B(C6H3F2)4]?. In other aspects, a radiation polymerization initiator and a resin composition comprising the ionic compound are provided. A resin composition prepared by using the radiation polymerization initiator generates a small amount of outgas during reaction and has excellent reactivity and transparency.

Abstract: Disclosed herein are compounds comprising or a pharmaceutically acceptable salt or a prodrug thereof; wherein Y, A, B, J, and E are further described. Methods, compositions, and medicaments related thereto are also disclosed.

Abstract: Compounds represented by formula (I), prodrugs thereof and salts thereof, and pharmaceutical compositions comprising the same as an active ingredient (wherein each symbol has the meaning as defined in the specification.).

Abstract: Compounds of a formula: wherein Ring A represents an optionally-substituted aromatic ring; Ring B represents an optionally-substituted cyclic hydrocarbon group; Z represents an optionally-substituted cyclic group; R1 represents a hydrogen atom, an optionally-substituted hydrocarbon group, an optionally-substituted heterocyclic group, or an acyl group; R2 represents an optionally-substituted amino group; D represents a chemical bond or a divalent group; E represents —CO—, —CON(Ra)—, COO—, N(Ra)CON(Rb)—, —N(Ra)COO—, —N(Ra)SO2—, N(Ra)—, —O—, —S—, —SO— or —SO2— (in which Ra and Rb each independently represent a hydrogen atom or an optionally-substituted hydrocarbon group); G represents a chemical bond or a divalent group; L represents (1) a chemical bond or (2) a divalent hydrocarbon group optionally having from 1 to 5 substituents selected from; (i) a C1-6 alkyl group, (ii) a halogeno-C1-6 alkyl group, (iii) a phenyl group, (iv) a benzyl group, (v) an optionally-substituted amino group, (vi) an optionally

Abstract: A mild, palladium-free synthetic protocol for the cross-coupling reaction of vinyl or aryl iodides and thiols or selenols using, in certain embodiments, 10 mol % CuI and 10 mol % neocuproine, with NaOt-Bu as the base, in toluene at 110 ° C. A variety of vinyl/aryl sulfides and vinyl/aryl selenides can be synthesized in excellent yields from readily available iodides and thiols or selenols.

Abstract: A stimulus sensitive composition containing a compound capable of generating an acid or a radical on receipt of an external stimulus, the compound being represented by the following formula (I): wherein Y represents a group having a bridged cyclic structure; R1 and R2 each independently represent a hydrogen atom, an alkyl group or an aryl group; R1 and R2 may be taken together to form a ring; Y1 and Y2 each independently represent an alkyl group or an aryl group; Y1 and Y2 may be taken together to form a ring; and X? represents a non-nucleophilic anion.

Abstract: The present invention is generally directed to luminescent lanthanide compounds with phosphine oxide, phosphine oxide-sulfide, pyridine N-oxide, and phosphine oxide-pyridine N-oxide ligands. It also relates to electronic devices in which the active layer includes a lanthanide complex.

Abstract: A photosensitive composition of the present invention has excellent sensitivity and pattern profile, which comprises an acid generator having a specific structure.

Abstract: Substituted (Z)-styrylbenzyl sulfones of the formulae (I, II, III, IV), pharmaceutically acceptable salts thereof, and compositions thereof are provided as cell antiproliferative agents, including, for example, anticancer agents.

Abstract: The invention relates to new mono-, oligo- and poly-difluorovinyl(hetero)arylenes comprising one or more identical or different recurring units of formula I wherein D, D′, Ar, a and b have the meanings as defined in herein. Furthermore the inventions relates to their synthesis, their use as semiconductors or charge transport materials and their different applications.

Abstract: The invention relates to pentafluorosulfuranylbenzene derivatives of the formula I in which R1, A1, A2, Z1, L1, L2, L3 and n are as defined herein and to the use thereof in liquid-crystalline media.

Abstract: The present invention relates to certain phenalkyloxy-phenyl derivatives of formula (I) and analogs, to a process for preparing such compounds, which compounds have utility in treating clinical conditions associated with insulin resistance, to methods for their therapeutic use and to pharmaceutical compositions containing them.

Abstract: Disclosed are compositions from which radically initiated oligomers/polymers having a controlled molecular weight, low polydispersity and a vinyl or dienyl end group are prepared. Further subjects of the invention are a process for controlled radical polymerization, oligomers/polymers obtainable by said process and the use of specific addition fragmentation agents for the polymerization process. The addition fragmentation agents are new in part and these are also subject of the present invention. The addition fragmentation agents are of the formula (Ia), (Ib) or (Ic) where Y is a group which activates the double bond towards Michael addition.

Abstract: A sulfonium salt compound designated by a general formula (I), a photoresist composition containing the sulfonium salt compound and a method for patterning by employing the sulfonium salt compound.

Abstract: Onium salts of substituted phenylmethylbenzene-sulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and peeling, and improved pattern profile after development.