Electromagnetic Radiation Or Resulting Heat Utilized (e.g., Gamma Rays, X-rays, Atomic Particles Uv, Visible, Ir, Actinic, Laser, Microwave Or Radio Wave, Etc.) Patents (Class 65/33.2)
  • Publication number: 20030089132
    Abstract: A heat diffusion plate and a heating plate are placed in a heat treatment chamber in this order. The heating plate is used for preliminarily heating a glass substrate to a temperature in a range from 200° C. to 400° C. The glass substrate thus preliminarily heated is subjected to a heat treatment by flash light irradiation by a xenon flash lamp. The flash light irradiation makes it possible to uniformly heat an amorphous silicon film on the glass substrate, and consequently to be poly-crystallized. Thus, it becomes possible to provide a heat treatment technique capable of carrying out a uniform heat treatment on the silicon film on the glass substrate sufficiently.
    Type: Application
    Filed: November 7, 2002
    Publication date: May 15, 2003
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Tatsufumi Kusuda
  • Patent number: 6550277
    Abstract: The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers.
    Type: Grant
    Filed: November 10, 2000
    Date of Patent: April 22, 2003
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Bruno Uebbing, Jan Vydra
  • Publication number: 20030037570
    Abstract: A method of thermally treating a glass or glass-like material, preferably a glass sheet, without the use of conventional tunnel-type furnaces, to effect rapid heating of glass and glass-like materials from any initial temperature to any required temperature so that the glass sheet can be processed by shaping, bending, tempering, annealing, coating and floating of the glass sheet without cracking of the glass sheet is described. In the inventive method a microwave radiation with appropriate uniformity, frequency and power density is chosen so as to accomplish glass heating from any initial temperature to any required (e.g., softened) temperature in a selected short time while ensuring that the temperature distribution on the external surfaces and in the interior of the glass sheet that arises from microwave exposure is uniform enough to prevent the exposed glass sheet's internal thermal stress from exceeding its modulus of rupture, thereby avoiding glass breakage.
    Type: Application
    Filed: June 24, 2002
    Publication date: February 27, 2003
    Inventors: Vladislav E. Sklyarevich, Mykhaylo Shevelev
  • Patent number: 6513347
    Abstract: For heat conditioning flat panel glass substrates the substrates are directly exposed in vacuum to the radiation of lamps, the lamps being selected so that their spectral radiation characteristics (b, c) fit with the absorption characteristics (a) of the glass of the substrate.
    Type: Grant
    Filed: January 12, 2000
    Date of Patent: February 4, 2003
    Assignee: Balzers Hochvakuum AG
    Inventors: Arnaud Deschamps, Willi Mueller, Stephan Rhyner, Aitor Galdos
  • Patent number: 6494062
    Abstract: This invention relates to a method of rendering fused silica resistant to compaction caused by UV laser beam irradiation. The method of the invention results is a fused silica member that is desensitized to compaction caused by the long-term exposure to UV laser beams. The invention includes a means to pre-compact fused silica members using high energy radiation.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: December 17, 2002
    Assignee: Corning Incorporated
    Inventor: Thomas P. Seward, III
  • Publication number: 20020139143
    Abstract: Known is a method of producing a quartz glass crucible in which a crucible base body is provided at least in part with an inner layer in which the formation of cristobalite is induced by using a crystallization promoter. On the basis thereof, in order to provide an inexpensive method of producing a quartz glass crucible with reproducible characteristics for long service lives, it is suggested according to the invention that the crystallization promoter and a reducing substance are introduced into the inner layer.
    Type: Application
    Filed: July 10, 2001
    Publication date: October 3, 2002
    Inventors: Gabriele Korus, Hilmar Laudahn, Martin Arndt, Udo Gertig
  • Publication number: 20020100294
    Abstract: The present invention discloses a method of aligning scintillator crystalline structures for computed tomography imaging and a system of use. Crystal seeds are deposited inside a glass melt and are then grown to form a plurality of layer crystallites. While growing the crystallites, a field is applied to align each crystallite structure in a uniform orientation. As a result, the crystallites are configured to reduce light scattering and improve the overall efficiency of the CT system. A CT system is disclosed implementing a scintillator array having a plurality of scintillators, each scintillator being formed of a plurality of uniformly aligned crystallites. Each crystallite includes a receiving surface and an exiting surface configured perpendicular to an x-ray beam. Further, the receiving surface and the exiting surface are connected by a plurality of surface walls arranged parallel to the x-ray beam.
    Type: Application
    Filed: April 2, 2002
    Publication date: August 1, 2002
    Inventors: David M. Hoffman, Haochuan Jiang
  • Publication number: 20020090493
    Abstract: In the present invention, a surface 7 of a glass substrate 1 is irradiated with a laser beam 2 to thereby form a V-shaped groove 6. At that time, the laser beam 2 is condensed outside and above the glass substrate 1. The distance between a beam-condensing point 4 of the laser beam 2 and the surface 7 of the glass substrate 1 is changed to thereby make it possible to change the angle between opposite side surfaces of the V-shaped groove. The angle is in a range of from 30 degrees to 120 degrees. Further, the laser beam used in the present invention is pulsed light, preferably with a pulse width not larger than 10 picoseconds.
    Type: Application
    Filed: November 13, 2001
    Publication date: July 11, 2002
    Inventors: Kenji Kamada, Koji Ohta, Jun Yamaguchi, Tadashi Koyama
  • Patent number: 6408649
    Abstract: A method of thermally treating a glass or glass-like material, preferably a glass sheet, without the use of conventional tunnel-type furnaces, to effect rapid heating of glass and glass-like materials from any initial temperature to any required temperature so that the glass sheet can be processed by shaping, bending, tempering, annealing, coating and floating of the glass sheet without cracking of the glass sheet is described. In the inventive method a microwave radiation with appropriate uniformity, frequency and power density is chosen so as to accomplish glass heating from any initial temperature to any required (e.g., softened) temperature in a selected short time while ensuring that the temperature distribution on the external surfaces and in the interior of the glass sheet that arises from microwave exposure is uniform enough to prevent the exposed glass sheet's internal thermal stress from exceeding its modulus of rupture, thereby avoiding glass breakage.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: June 25, 2002
    Assignee: Gyrotron Technology, Inc.
    Inventors: Vladislav E. Sklyarevich, Mykhaylo Shevelev
  • Publication number: 20020062662
    Abstract: The invention relates to a method for ceramizing starting glass of glass-ceramics into glass-ceramics, comprising at least the following steps:
    Type: Application
    Filed: August 23, 2001
    Publication date: May 30, 2002
    Inventors: Ulrich Fotheringham, Hauke Esemann, Bernd Hoppe, Rudiger Sprengard, Michael Kluge, Falk Gabel
  • Publication number: 20010054300
    Abstract: Voltage is applied between electrodes (14a, 14b) under UV irradiation to perform a UV excitation poling, thereby producing microcrystal particles at a core unit (10a). Accordingly, second-order optical nonlinearity is developed at the core unit (10a) of an optical fiber (10). Under a high-temperature condition, a second-order optical nonlinearity can be imparted by a comparatively low-voltage UV excitation poling when a second-order optical nonlinearity decreases.
    Type: Application
    Filed: August 15, 2001
    Publication date: December 27, 2001
    Inventors: Takumi Fujiwara, Syuji Matsumoto, Akira Ikushima
  • Patent number: 6327874
    Abstract: There is provided a glass-ceramic substrate for a magnetic information storage medium having a data zone and a landing zone capable of stably lifting a magnetic head in the landing zone and also capable of reducing the amount of lifting of the magnetic head in the data zone for realizing a high recording density. The landing zone has a multiplicity of projections or depressions formed by irradiation of laser beam. A CO2 laser or a laser diode pumped solid-state laser can be used for this purpose. The surface roughness (Ra) of a polished surface of the landing zone is within a range from 3 Å to 9 Å, height of the projections or depressions is within a range from 50 Å to 300 Å, surface roughness (Ra) of the projections or depressions is within a range from 10 Å to 50 Å and interval of the projections or depressions is within a range from 10 &mgr;m to 200 &mgr;m.
    Type: Grant
    Filed: June 4, 1999
    Date of Patent: December 11, 2001
    Assignee: Kabushiki Kaisha Ohara
    Inventor: Naoyuki Goto
  • Publication number: 20010045106
    Abstract: The present invention provides a two stage process of thermal separation of CFCs and HCFCs followed by vitrification of the waste into a commercially viable glass. In the first stage, the hydrogenated compounds are reacted at elevated temperature with water and a metal oxide such as calcium oxide to form a halide salt and carbon dioxide. In the second stage of the process, the brine slag is reacted at elevated temperature with the carbon dioxide from stage one and glass-forming raw materials such as silicon dioxide to produce a glass. The final glass product incorporates the halide into the glass.
    Type: Application
    Filed: March 20, 2001
    Publication date: November 29, 2001
    Inventors: Christopher J. Ludwig, Frederic M. Schwartz
  • Patent number: 6309991
    Abstract: Fused silica stepper lens for photolithographic application are disclosed which are resistant to laser-induced damage, specifically, compaction or densification which can lead to an increase in the optical path length of the lens. The figure compares the phase front distortions of a standard fused silica with the phase front distortions observed in two inventive stepper lens fused silica.
    Type: Grant
    Filed: February 25, 1999
    Date of Patent: October 30, 2001
    Assignee: Corning Incorporated
    Inventors: Nicholas F. Borrelli, Thomas P. Seward, III, Charlene Smith
  • Patent number: 6298691
    Abstract: Method is disclosed for making glass having both polarizing and non-polarizing regions integral thereto by either ion-exchange or by exposure to light and heat. The polarizing regions of the resulting glass is effective in polarizing light radiation, that is, the glass exhibits permanent dichroic behavior and has at least some polarizing effect in the wavelength range of 400 to 700 nm. The base glass composition contains Cu, Ag and at least one halide such that the resulting precipitated crystal phase consists of a halide.
    Type: Grant
    Filed: October 21, 1999
    Date of Patent: October 9, 2001
    Assignee: Corning Incorporated
    Inventors: Nicholas F. Borrelli, Dennis W. Smith
  • Patent number: 6295841
    Abstract: A fused silica glass which exhibits low compaction when exposed to high intensity excimer radiation, also exhibits low optical path distortion after exposure to a high intensity radiation dose. Also disclosed is a method for improving the select ratio of fused silica glass for photolithography, by predicting the optical path distortion of the glass under use by determining the intrinsic densification of the glass at a given number of pulses and fluence per pulse. Mathematical modeling methods are also disclosed for use in producing a fused silica stepper lens having low compaction under high intensity excimer radiation; and for determining optical path distortion caused by high energy radiation in fused silica glass.
    Type: Grant
    Filed: February 25, 1999
    Date of Patent: October 2, 2001
    Assignee: Corning Incorporated
    Inventors: Douglas C. Allan, William R. Powell, Nicholas F. Borrelli, Thomas P. Seward, III, Charlene M. Smith
  • Publication number: 20010011465
    Abstract: This invention relates to a method of rendering fused silica resistant to compaction caused by UV laser beam irradiation. The method of the invention results is a fused silica member that is desensitized to compaction caused by the long-term exposure to UV laser beams. The invention includes a means to pre-compact fused silica members using high energy radiation.
    Type: Application
    Filed: January 31, 2001
    Publication date: August 9, 2001
    Inventor: Thomas P. Seward
  • Patent number: 6269661
    Abstract: The present invention provides a method for manufacturing an optical component that have increased transmittance in the ultraviolet region of the spectrum. The method includes the steps of cutting out a part from a block material; polishing optical sides of the part; subjecting the part to heat treatment at a temperature of between 100 and 900° C.; and subjecting the part to acid treatment.
    Type: Grant
    Filed: July 6, 1999
    Date of Patent: August 7, 2001
    Assignee: Nikon Corporation
    Inventors: Hiroki Jinbo, Akiko Moriya, Norio Komine
  • Patent number: 6266978
    Abstract: A simple method for producing a synthetic quartz glass having excellent homogeneity and high transmittance, which is useful as an optical material in producing steppers equipped with an ArF excimer laser as a radiation source. A method for producing a synthetic quartz glass for use in ArF excimer laser lithography, which comprises irradiating a highly homogeneous synthetic quartz glass containing less than 60 ppb of Na with ultraviolet radiation having a maximum wavelength of 260 nm for not less than the duration expressed by the equation: Y=(80X−1880)/Z wherein X represents an Na concentration (ppb), Y represents the duration of irradiation (hours), and Z represents the illuminance of an ultraviolet radiation on an irradiated surface (mW/cm2).
    Type: Grant
    Filed: September 9, 1999
    Date of Patent: July 31, 2001
    Assignees: Heraeus Quarzglas GmbH, Shin-Etsu Quartz Products Co., Ltd.
    Inventors: Takayuki Oshima, Akira Fujinoki, Hiroyuki Nishimura, Yasuyuki Yaginuma
  • Patent number: 6205818
    Abstract: A method of rendering fused silica resistant to compaction caused by UV laser beam irradiation. The method of the invention results in a fused silica member that is desensitized to compaction caused by the long-term exposure to UV laser beams. The invention includes a means to pre-compact fused silica members using high energy radiation.
    Type: Grant
    Filed: December 14, 1998
    Date of Patent: March 27, 2001
    Assignee: Corning Incorporated
    Inventor: Thomas P. Seward, III
  • Patent number: 6199404
    Abstract: A manufacturing method for a gas discharge type display panel makes it possible to manufacture an environmentally friendly substrate with high accuracy and yet at low cost. According to the manufacturing methods electrodes are formed on a back substrate by photolithography or printing, then a glass paste is printed to a height of approximately 10 &mgr;m-500 &mgr;m by printing. A barrier rib blanks are produced by rolling under pressure the glass paste by using a roller provided with grooves. The roller is heated in advance. The barrier rib blanks are sintered into the barrier ribs.
    Type: Grant
    Filed: October 21, 1997
    Date of Patent: March 13, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Michifumi Kawai, Ryohei Satoh, Masahito Ijuin, Tomohiko Murase, Takao Terabayashi, Nobuyuki Ushifusa, Yoshihiro Kato, Shigeaki Suzuki, Seiichi Tsuchida, Yutaka Naito, Seiichi Yasumoto, Osami Kaneto