Abstract: Manufacturing planning data for a production process that is managed by a manufacturing execution system is updated by way of a plurality of steps, which include: Gathering data from a PLC level relevant to the manufacturing planning data and the execution of the production process; mapping the gathered data with the current manufacturing planning data in order to determine suggested changes between the gathered data and the current manufacturing planning data; applying a predetermined update scenario for the manufacturing planning data depending on the suggested changes to update the manufacturing planning data; and adapting the current production process and optionally following production processes according to the updated manufacturing planning data. The reliability of the so-called standard data used in production planning processes is thus dramatically improved.

Abstract: A virtual analyzer is provided to estimate either an attribute of a reactant applied during performance of, or an amount of a reactant exhausted by, a process having multiple process parameters (MPPs) that is performed to control an amount of a pollutant emitted into the air. The virtual analyzer includes an interface which receives signals corresponding to attributes of the MPPs. If the process is a wet flue gas desulfurization (WFGD) process, the signals include a signal corresponding to a measured pH level of the applied reactant. If the process is a selective catalytic reduction (SCR) process, the signals include a signal corresponding to a measured amount of the reactant exhausted by the process.

Abstract: Disclosed are systems and methods for on-line monitoring of operation of a process in connection with process measurements indicative of the operation of the process. In some cases, the operation of the process is simulated to generate model data indicative of a simulated representation of the operation of the process and based on the process measurements. A multivariate statistical analysis of the operation of the process is implemented based on the model data and the process measurements. The output data from the multivariate statistical analysis may then be evaluated during the operation of the process to enable the on-line monitoring of the process involving, for instance, fault detection via classification analysis of the output data.

Abstract: Process control system for detecting abnormal events in a process having one or more independent variables and one or more dependent variables. The system includes a device for measuring values of the one or more independent and dependent variables, a process controller having a predictive model for calculating predicted values of the one or more dependent variables from the measured values of the one or more independent variables, a calculator for calculating residual values for the one or more dependent variables from the difference between the predicted and measured values of the one or more dependent variables, and an analyzer for performing a principal component analysis on the residual values. The process controller is a multivariable predictive control means and the principal component analysis results in the output of one or more scores values, T2 values and Q values.

Abstract: The invention relates to a process control system comprising a calculating unit enabling a charge value (W) to be determined from operations occurring in the process control system. Preferably, said process control system comprises a process control computer with a web server and a computer which is used to access the processes control computer via Internet. The charging value (W) is especially a service fee which is to be paid to an application service provider by a user of the process control system.

Abstract: A method for controlling mask fabrication is provided, wherein the method uses statistical process control analysis. A manufacturing model is defined. A process run of a mask is performed as defined by the manufacturing model. A fault detection analysis is performed to reduce a bias in the manufacturing model. A fine-tuning signal is generated in response to a result of the fault detection analysis. The process run operation is adjusted according to the fine-tuning signal.

Abstract: A manufacturing method for the inductor/transformer is disclosed. A simulator is used to simulate the inductance, the quality factor, and the self-resonance frequency of said inductor/transformer to generate at least one group of the area size, the number of the conductive layer, the line width, the number of turns, and/or the line space of the conductive layers and the first conductive layer; the inductor/transformer is manufactured according to the factors. Thereafter, the Monte-Carlo simulation is used to initiate the process variability analysis of the factors of the conductive layer and the first conductive layer, and the geometric size of the inductor/transformer can be modulated according to the results of the process variability analysis during the manufacturing process, such that the inductor/transformer can be manufactured by the process of the generic logic circuit.

Abstract: A method and system for energy management in a power system. Target performance standards are calculated and used to measure performance and to comply with regulatory performance standards. The target performance standards are based on probability theory and are used to control power generation. The amount of corrective power necessary is based on the calculated target performance standards and the deviations of current performance values from the target standards.

Abstract: An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon the template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon the remaining film thickness set value information, calculates a pattern density of the template from the template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from the vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, the distribution of an applied amount for filling a pattern, and the distribution of an applied amount for forming a remai

Abstract: A method and system for monitoring a process in a process plant includes collecting data from a process control system within the process plant, where the data is representative of a normal operation of the process when the process is on-line and operating normally, performing a multivariate statistical analysis to represent the normal operation of the process based on a set of collected on-line process data comprising a measure of the normal operation of the process when the process is on-line and operating normally, and representing a real-time on-line operation of the process using monitored on-line process data as an input to the representation of the normal operation of the process, where the monitored on-line process data comprises a measure of a real-time operation to the process when the process is on-line.

Abstract: A system, method, and computer readable medium for extracting a key process parameter correlative to a selected device parameter are provided. In an embodiment, the key process parameter is determined using a gene map analysis. The gene map analysis includes grouping highly correlative process parameter and determining the correlation of a group to the selected device parameter. In an embodiment, the groups having greatest correlation to the selected device parameter are displayed in a correlation matrix and/or a gene map.

Abstract: A method for controlling a power system control area according to a first and a second control performance standard, wherein operation of the control area determines area control parameter values.

Abstract: The invention relates to a system and a method for analyzing a production process. In order to make it possible to analyze the production process in an improved manner for the purpose of production planning, the invention proposes a method for analyzing a production process in which at least one production device that is controlled by a control program is involved, wherein the method has the following method steps: at least one part of the control program is simulated using a simulation program and instructions which are executed in this case are logged, and an associated data record, in which the real-time requirement of an action caused by the logged instruction on the production device is respectively assigned to the logged instructions, is generated.

Abstract: Comprehensive universal configurable interface for electrical, electronic, and electromechanical control, sensing, and actuation. Circuit, apparatus, method, and signal set for interfacing an electrical or electronic component or a mechanical component generating or effecting an electrical or electronic signal to a control system or device. Comprehensive universal input/output interface system, circuit, and method for interfacing such components and control systems that send or receive analog or digital voltage and/or current inputs over a large range of voltages and/or current without hardware or software switches. Interface and method includes and needs only two terminals for the connection of sensor or actuator. Provides plurality of operation mode circuits to accomplish the following functions: digital input, digital output, analog input, analog output, and others. Supports either voltage or current input and output, and voltage and current capabilities over a broad dynamic range.

Abstract: A system for monitoring an industrial process and taking action based on the results of process monitoring. Actions taken may include process control, paging, voicemail, and input for e-enterprise systems. The system includes an input module for receiving a plurality of parameters from a process for manufacture of a substance or object. The system also includes a library module. The library module includes a plurality of computer aided processes. Any one of the computer aided processes is capable of using each of the plurality of parameters to compare at least two of the plurality of parameters against a training set of parameters. The training set of parameters is generally predetermined. The computer aided process is also capable of determining if the at least two of the plurality of parameters are within a predetermined range of the training set of parameters. Additionally, the system includes an output module for outputting a result based upon the training set and the plurality of parameters.

Abstract: A method for controlling an industrial automation device or process including a control unit, at least one actuator, and at least one device arranged for wireless communication with the control unit. The method determines characteristics of the wireless transmissions used to communicate sensor and/or actuator data to the control unit. The method, a system and a graphic interface enable a user to select a control strategy dependent on a value or values of the characteristics of the wireless communications.

Abstract: A virtual analyzer is provided to estimate either an attribute of a reactant applied during performance of, or an amount of a reactant exhausted by, a process having multiple process parameters (MPPs) that is performed to control an amount of a pollutant emitted into the air. The virtual analyzer includes an interface which receives signals corresponding to attributes of the MPPs. If the process is a wet flue gas desulfurization (WFGD) process, the signals include a signal corresponding to a measured pH level of the applied reactant. If the process is a selective catalytic reduction (SCR) process, the signals include a signal corresponding to a measured amount of the reactant exhausted by the process.

Abstract: A parameter value estimator is provided for a process performed primarily to control emission of a particular non-particulate pollutant, such as NOx and SO2, into the air. The process has multiple process parameters (MPPs) including a parameter representing an amount of the particular non-particulate pollutant emitted. The parameter value estimator includes either a neural network process model or a non-neural network process model. In either case the model represents a relationship between one of the MPPs, other than the parameter representing the amount of the emitted particular non-particulate pollutant, and one or more other of the MPPs. Also included is a processor configured with the logic, e.g. programmed software, to estimate a value of the one MPP based on a value of each of the one or more other MPPs and the one model.

Abstract: An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon the template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon said remaining film thickness set value information, calculates a pattern density of the template from the template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from the vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, the distribution of an applied amount for filling a pattern, and the distribution of an applied amount for forming a rema

Abstract: Dynamic offset determination for each of a plurality of measurement systems for matching the systems is disclosed. One embodiment uses an artifact which is periodically run across the measurement system to be matched. Inputs for each run include the current offsets and historical data for the entire fleet and the new test measurement for the current measurement system under test. Evaluation based on exponentially weighted moving average and median calculation techniques may result in a new, reset offset for one or more measurement systems. The reset offset(s) is then applied to product measurements to nullify any tool matching issues.

Abstract: Methods and systems to detect steady-state operations in a process of a process plant include collecting process data. The collected process data is generated from a plurality of process variables of the process. A multivariate statistical model of the operation of the process is generated using the process data. The multivariate statistical model may be generated from a principal component analysis. The model is executed to generate outputs corresponding to the most significant variations in the process. Statistical measures of the outputs are generated and used to determine whether a steady-state or unsteady-state is related to the process.

Abstract: A method of managing a machinery monitoring system is provided. The machinery monitoring system includes a database of at least one rule set, the rule set including at least one rule expressed as a relational expression of a real-time data output relative to a real-time data input, the relational expression being specific to a plant asset. The method includes importing data representative of a rule set into the machinery monitoring system, applying the at least one rule set to a specific plant asset wherein the at least one rule set is configured to locate the data input using at least a portion of the relative path information, determining a data output of the at least one rule set using the at least one relational expression and the data input, and transmitting the data output to at least one of the machinery monitoring system and the plant monitoring and control system.

Abstract: Methods for selecting one or more golden devices on a golden wafer that exhibit a smooth length and width scaling behavior. Test devices of differing geometry and carried on different chips of the golden wafer are screened with single point measurements of electrical performance. Based upon a statistical analysis of these single point measurements, chips are selected that carry the respective golden device of each given geometry that exhibits optimum electrical performance referenced to a selection criterion. Golden devices identified by the selection process are extensively characterized with a more comprehensive electrical measurement. The parameters derived from these more extensive test measurements on the golden devices are then used for refining a device model for a circuit simulation.

Abstract: An advanced process control (APC) system. The APC system comprises a database for receiving process data from a measurement tool for a plurality of process runs and for storing the process data. A lambda tuner determines a tuned-lambda value corresponding to a process-capability-index value based on upper and lower process control limits and statistics derived from the process data. A process-run controller updates a recipe value based on the received process data and the tuned-lambda value.

Abstract: The present invention provides a system and method for interfacing to a network. The system includes a network interface comprising an embedded network traffic analyzer (NTA) capable of network traffic analyzer filter and capture capabilities. The NTA also includes an artificial intelligence component that facilitates diagnosing and/or prognosing state and/or health of the network (and/or components thereof).

Abstract: According to the present, there is proved a semiconductor fabrication apparatus management system having: a sensor which monitors and outputs a plurality of apparatus parameters of a semiconductor fabrication apparatus which fabricates a semiconductor device; a measurement unit which measures a dimensional value of the semiconductor device, and outputs the dimensional value as dimensional data; an apparatus parameter storage unit which stores the apparatus parameters; a dimensional data storage unit which stores the dimensional data; an apparatus parameter controller which calculates predicted dimensional data by extracting the dimensional data from the dimensional data storage unit, and controls at least one of the plurality of apparatus parameters on the basis of the predicted dimensional data; and an abnormality factor extraction unit which analyzes correlations between the controlled apparatus parameter and other apparatus parameters, and extracts an abnormal apparatus parameter on the basis of a calculat

Abstract: A method for forecasting batch end conditions through their depiction as a multi-dimensional regions of uncertainty is disclosed. A visualization of the current condition of a continuous process and visualization of the simulated effect of user control moves are generated for a user. Volume visualization tools for viewing and querying intersecting solids in 3-dimensional space are utilized to perform the process visualization. Interactive tools for slicing multi-dimensional (>3) regions and drawing superimposed projections in 3-D space are provided. Additionally, graphical manipulation of the views of process conditions is accomplished by changing the hypothetical future values of contributing variables online in order to provide users the ability to simulate the effect of proposed control actions.

Abstract: Disclosed are systems and methods for on-line monitoring of operation of a process in connection with process measurements indicative of the operation of the process. In some cases, the operation of the process is simulated to generate model data indicative of a simulated representation of the operation of the process and based on the process measurements. A multivariate statistical analysis of the operation of the process is implemented based on the model data and the process measurements. The output data from the multivariate statistical analysis may then be evaluated during the operation of the process to enable the on-line monitoring of the process involving, for instance, fault detection via classification analysis of the output data.

Abstract: A system and method is disclosed for the automated real-time collection, extraction, transformation, analysis and presentation of statistical process control (SPC) information. One or more monitored systems or processes generate operational process control information that is stored in its native form. An SPC system iteratively accesses this information, transforms it as required, and performs statistical processing to generate database tables, control charts and other predetermined forms of data output. The statistical processing output is then extracted by an automated SPC data extraction system in real-time. The extracted data is placed in a data wrapper and submitted, likewise in real-time, to one or more statistical analysis systems or models, which process the data to derive new specification limits. The new specification limits are applied to monitored systems and processes resulting in the generation of new operational measurements, which are in turn collected and processed.

Abstract: A system for preserving process variable data relating to the operation of a process is provided. The system is adapted to preserve process variable data obtained before, during, and after the occurrence of an abnormal situation or event. The preserved process variable data maybe communicated from smart field devices or other intelligent equipment relating to the control of the process to a process controller or other higher level control device. The process controller or other higher level control device may then cause the preserved data to be displayed for an operator or other maintenance personnel. The preserved data may also be provided to other process control modules or abnormal situation prevention systems for further analysis to develop methods for preventing the abnormal situation from recurring in the future, or for taking additional steps based on the abnormal situation data to minimize or prevent a further deterioration of the process operation.

Abstract: A controller is provided for directing control of a process performed to control an amount of a pollutant emitted into the air. The process has multiple process parameters (MPPs) The controller includes either a neural network process model or a non-neural network process model. Whichever type model is included, it will represent a relationship between one of the MPPs and other of the MPPs. The controller also includes a control processor having the logic to determine the validity of a measured value of the one MPP based on the one model. The control processor directs control of the process in accordance with the measured value of the one MPP only if the measured value of the one MPP is determined to be valid. On the other hand, if the measured value is determined to be invalid, the control processor may direct control of the process in accordance with an estimated value of the one MPP.

Abstract: A flow control system comprises a flow sensor, a valve controller, a signal processor, a control processor and an interface. The flow sensor generates a sensor signal characterizing a flow rate. The valve controller controls the flow rate as a function of a control output. The signal processor converts the sensor signal into a flow signal characterizing the flow rate as a function of time, and the control processor generates the control output as a function of a setpoint and the flow signals. The interface receives an input representative of the setpoint, transmits a flow output representative of the flow signals, and transmits a diagnostic output directly indicative of an operational condition of the flow control system.

Abstract: A number of methods to support process quality and maintenance during control of an industrial process such as welding are provided. The methods provide, among other things: automatic process limit programming based on runtime data; user-initiated process limit programming based on upcoming data; correlate equipment deterioration based on capability measurement; correlate tip dressers/formers to new; detect electrical deterioration; integrate process data with programmed data for a visual aid; and quantify process variation in welding tools (pareto of stddev of the c-factor).

Abstract: A device for diagnosing operation of an industrial process control or monitoring system includes an input configured to receive an input related to a process signal. A first statistical parameter module provides a first statistical parameter output related to a statistical parameter of the process signal. A filter provides a filter output related to a filtered value of the process signal. A second statistical parameter module provides a second statistical parameter output related to a statistical parameter of the filter output. A diagnostic module diagnoses operation of the industrial process based upon the first and second statistical parameters.

Abstract: A method for controlling a power system control area according to a first and a second control performance standard, wherein operation of the control area determines area control parameter values.

Abstract: Systems and methods that vary multiple data sampling rates, to collect sets of data with different levels of granularity for an industrial system. The data for such industrial system includes sets of data from the “internal” data stream(s) (e.g., history data collected from an industrial unit) and sets of data from an “external” (e.g., traffic data on network services) data stream(s), based in part on the criticality/importance criteria assigned to each collection stage. Each set of data can be assigned its own unique data collection rate. For example, a higher sample rate can be employed when collecting data from the network during an operation stage that is deemed more critical (e.g., dynamic attribution of predetermined importance factors) than the rest of the operation.

Abstract: A field mountable dedicated process diagnostic device is used for diagnosing operation of an industrial control or monitoring system. An input is configured to receive at least one process signal related to operation of the industrial process. A memory contains diagnostic program instructions configured to implement a diagnostic algorithm using the process signal. The diagnostic algorithm is specific to the industrial process. A microprocessor performs the diagnostic program instructions and responsively diagnoses operation of the process based upon the process signal.

Abstract: This document describes a correction signal usable to correct an effect of a disturbance signal on a controlled system or apparatus. In one case this document describes ways in which to diminish a future change to an output signal based on determining that a disturbance signal consistently precedes the future change.

Abstract: A reduced rule set for identifying a root cause of an aberration in an industrial process is generated from a complete rule base. The rule base includes plurality of rules for the industrial process, and each rule comprises a condition of at least one process signal of the industrial process and a fault which corresponds to the condition of at least one process signal. Available process signals are identified. Rules are selectively removed from the rule base to produce the reduced rule set.

Abstract: A computer readable medium comprising instructions which when executed by a computer system causes the computer to implement a method for creating a dynamic value network map of a process flow is provided. For a plurality of processed objects, the method identifies corresponding value stream metrics and triggers a state engine to simulate the process flow. The state engine is configured to manage all operations rules related to the value network map. The method dynamically updates the value stream metrics during the simulation of the value network map.

Abstract: A method for improving critical dimension of a substrate is provided. Manufacturing data of a plurality of critical dimension deviations corresponding to a plurality of areas on the substrate is collected. A plurality of sensitivity data corresponding to the plurality of areas is also collected. A plurality of exposure dosage offsets corresponding to the plurality of areas are calculated based on the plurality of critical dimension deviations and the plurality of sensitivity data.

Abstract: A method is described for determining the effectiveness of maintenance or other improvements to a system having multiple sections and multiple modes of failure. The method uses a simulation model that is dynamic in that it can change during a simulation run to show how a system event such as a failure of one system section can effect a different system section. By running the simulation model multiple times, it may become apparent which system section will benefit most from maintenance or other improvements.

Abstract: In the field of electronic or computerized control apparatuses, known methods of compensating for disturbance signals rely on less than ideal analytical or empirical models. There is provided a controller (200) or method of controlling which observes and learns the correlation between various measured signals and automatically learns how to control the apparatus.

Abstract: A disposition process involves a part proceeding through a sequence of fabrication steps. The process involves obtaining a specified parameter for the part at an individual fabrication step; measuring the specified parameter of the part at the individual fabrication step; obtaining a final specified parameter for the part upon completion of the sequence of fabrication steps; and disposing the part at the individual fabrication step. Disposing the part uses a calculation of probability of the part meeting the final specified parameter.

Abstract: A system that incorporates teachings of the present disclosure may include, for example, a thermal management device having a controller to monitor pressure parameters for hot and cold rooms where the hot and cold rooms are divided by a rack for electronic devices and are substantially isolated from each other, and adjust a flow of cooling air to the cold room where the adjustment of the flow of cooling air to the cold room is based at least in part on the pressure parameters and maintaining a target pressure differential between the hot and cold rooms and where the target pressure differential induces a flow of the cooling air through one or more electronic devices in the rack. Other embodiments are disclosed.

Abstract: At least one substrate location sensor is provided on a piece of equipment containing two adjoined chambers between which substrates may be transferred one at a time. Deviation of substrate position from a predetermined optimal position is measured as a substrate is transferred between the two adjoined chambers. Measured data on the deviation of substrate position is entered into a statistical control program hosted in a computing means. The measured data indicates the level of performance of the robot and/or the condition of alignment of components in one of the two chambers. As the statistical control generates flags based on the measured data, maintenance activities may be performed. Thus, maintenance activities may be performed on a “as-needed” basis, determined by the measurement data on performance of the equipment.

Abstract: An exemplary method for performing fabrication sequence analysis, the method comprising, defining a process group, wherein a process group includes fabrication processes in a fabrication sequence, determining fabrication process paths in the process group to define independent variables, wherein a process path is a plurality of fabrication equipment used to fabricate a particular semiconductor device in the fabrication sequence, receiving a dependent variable for the fabrication sequence, performing analysis of variance to calculate a p-value for the process group, determining whether the p-value is lower than a threshold value, identifying a poor process path responsive to determining that the p-value is lower than a threshold value, and outputting the identified poor process path.

Abstract: A system, method, and medium, the method including receiving parameter information associated with a mailer, associating the parameter information with a mailing, receiving statistical information, the statistical information including historical performance data of at least one carrier, determining a delivery sequence for the mailing based on the received mailer parameter information and the statistical information, and outputting the determined delivery sequence for the mailing.

Abstract: A quality prognostics system and a quality prognostics method for predicting the product quality during manufacturing processes are disclosed, wherein the current production tool parameters sensed during the manufacturing process and several previous quality data collected from the measurement tool are utilized to predict the future product quality, and a conjecture modeling step and prediction modeling step are performed respectively. The conjecture modeling step itself also can be applied for the purpose of virtual metrology. Further, a self-searching step and a self-adjusting step are performed for searching the best combination of various parameters/functions used by the conjecture algorithm or prediction algorithm; and meeting the requirements of new equipment parameters and conjecture/prediction accuracy.

Abstract: The present invention provides an improved method and system for real-time monitoring, validation, optimization and predictive fault analysis in a process control system. The invention monitors process operations by continuously analyzing sensor measurements and providing predictive alarms using models of normal process operation and statistical parameters corresponding to normal process data, and generating secondary residual process models. The invention allows for the creation of a fault analyzer directly from linearly independent models of normal process operation, and provides for automatic generation from such process models of linearly dependent process models. Fuzzy logic is used in various fault situations to compute certainty factors to identify faults and/or validate underlying assumptions.