Cylindrical Electrode Patents (Class 96/49)
  • Patent number: 3960564
    Abstract: A solution for the selective electroless deposition of silver comprising as essential constituents silver salt, ammonium hydroxide and a reducer chosen from tartrate, formaldehyde or hydrazine and an organic compound having one or more cyclic or polar aliphatic groups on the one hand and an SH-group on the other hand.
    Type: Grant
    Filed: October 24, 1974
    Date of Patent: June 1, 1976
    Assignee: U.S. Philips Corporation
    Inventors: Arian Molenaar, Hendrik Jonker
  • Patent number: 3961101
    Abstract: The development of an exposed electron beam sensitive resist film in a two-stage process, rather than in a single stage, with a water wash between stages, improves the sensitivity and resolution that can be achieved for the resist.
    Type: Grant
    Filed: September 16, 1974
    Date of Patent: June 1, 1976
    Assignee: RCA Corporation
    Inventor: Lucian Anthony Barton
  • Patent number: 3961100
    Abstract: The effective sensitivity of a photo- or electron beam resist is improved by contacting the resist film with developer solution and water prior to exposure.
    Type: Grant
    Filed: September 16, 1974
    Date of Patent: June 1, 1976
    Assignee: RCA Corporation
    Inventors: David Isaac Harris, Loren Bainum Johnston
  • Patent number: 3954462
    Abstract: Material useful in electropolymerization processes comprises a conductive support and a layer thereon of a composition comprising a polymerizable monomer and polymerization catalyst precursor which is a combination of an alkali metal nitrite and a primary aromatic amine. Electrolysis of the composition results in diazotization of the amine with subsequent electrolytic generation of polymerization-inducing free radicals. The anodic reaction ensures polymerization at and bonding of the resulting polymer to the support sheet of the material even when used in conjunction with zinc oxide photoconductor cathode layers. The material is particularly useful in negative-working imagery and in the preparation of patterned resist layers.
    Type: Grant
    Filed: April 7, 1972
    Date of Patent: May 4, 1976
    Assignee: Keuffel & Esser Company
    Inventor: Steven Levinos
  • Patent number: 3954472
    Abstract: A subtractive developer for negative working lithographic plates comprising an aqueous solution of an alcohol, preferably n-propanol, a small quantity of ammonium sulfite, and polyvinylpyrolidone in the range of 0.05 - 0.12% by weight. The developer may also contain a small quantity of ammonium sulfate or ammonium chloride.
    Type: Grant
    Filed: August 26, 1974
    Date of Patent: May 4, 1976
    Assignee: S. O. Litho Corporation
    Inventor: John E. Walls
  • Patent number: 3950171
    Abstract: This invention relates to a process for diazotype multicolor reproduction using an improved photosensitive material having a continuous thermoplastic resin pre-coated layer.
    Type: Grant
    Filed: April 24, 1974
    Date of Patent: April 13, 1976
    Assignee: Mita Industrial Co. Ltd.
    Inventors: Kouzi Nihyakumen, Yasui Ueda, Yasutoki Kamezawa, Tatsuo Aizawa
  • Patent number: 3948661
    Abstract: A process for diazo-type multi-color reproduction by which portions of a sensitive paper corresponding to predetermined portions of an original can be colored selectively to different hues by disposing a layer of thermotransferable coupler between an original and diazophotosensitive paper followed by exposure to light and heating of the assembly. The layer of thermotransferable coupler is not applied to the entire image area of the original and the thermotransferable coupler is faster in coupling rate with the diazonium salt under the development conditions than the basic color coupler of the photosensitive paper or developing solution.
    Type: Grant
    Filed: September 30, 1974
    Date of Patent: April 6, 1976
    Assignee: Mita Industrial Company Ltd.
    Inventors: Kouzi Nihyakumen, Taizo Yokoyama, Yasuo Ueda, Yasutcki Kamezawa, Tatsuo Aizawa
  • Patent number: 3944422
    Abstract: An improved process for diazo-type multicolor reproduction comprisingA. exposing to light an assembly comprisingI. an original comprising opaque image areas and complementary non-image areas which transmit light,Ii. a photosensitive layer containing at least one photosensitive diazonium salt (c), an azo coupler (b) and a substantially non-thermovolatile acidic substance (d), the acidic substance (d) being present in an amount of at least 5 mols per mol of the diazonium salt (c), andIii.
    Type: Grant
    Filed: August 31, 1970
    Date of Patent: March 16, 1976
    Assignee: Mita Industrial Company Limited
    Inventors: Kouzi Nihyakumen, Toshihiro Kouchi, Taizo Yokoyama, Yasuo Ueda, Yasutoki Kamezawa, Tatsuo Aizawa
  • Patent number: 3942983
    Abstract: This invention involves an imaging process in which a light image is projected onto a photosensitive medium having a layer capable upon light exposure of directly generating nuclei of a metal more noble than silver, such as palladium, which metal is catalytic to the electroless deposition of a non-noble metal, and thereafter selectively providing non-noble free metal onto the noble metal nuclei by electroless deposition, thereby providing a visible print of the original light image. The photosensitive layer in such media may comprise a compound of a metal more noble than silver and a photosensitive composition which can generate upon light exposure a reducing agent for said noble metal. In another embodiment, the photosensitive layer may contain a photoreducible metal salt which, upon light exposure, generates nuclei of a metal more noble than silver.
    Type: Grant
    Filed: June 9, 1967
    Date of Patent: March 9, 1976
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Umberto Di Blas, Franco Knirsch
  • Patent number: 3933497
    Abstract: Dry photoimaging processes and compositions employing photosensitive coatings of volatile peri-substituted aromatic azido compounds in a permeable film-forming plastic are disclosed.
    Type: Grant
    Filed: June 27, 1974
    Date of Patent: January 20, 1976
    Assignee: American Cyanamid Company
    Inventor: Balwant Singh
  • Patent number: 3933495
    Abstract: A presensitized planographic printing plate which can be used in both negative and positive work comprising a support, a layer formed on the support of a photosensitive substance prepared by the reaction at a pH of not more than 7.5 of a diazonium compound with a coupling agent, e.g., hydroxybenzophenone, and a layer formed on the photosensitive layer of a "one-package" silicone rubber curable at room temperature. A planographic printing plate per se is produced by imagewise exposing the presensitized plate through a negative or positive film, and treating the exposed plate with a treating liquid capable of removing those portions of the presensitized plate which correspond to the image area of the original. Dampening water is not required when printing is carried out using the resulting printing plate.
    Type: Grant
    Filed: May 14, 1973
    Date of Patent: January 20, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Asaji Kondo, Shizuo Miyano, Kenichiro Yazawa
  • Patent number: 3930856
    Abstract: A light-sensitive material comprising a support carrying a coating of a phopolymerisable epoxy resin composition containing, as a photo-sensitive compound capable of catalyzing hardening of the epoxy resin, a diazonium salt soluble in organic solvents and whereof the cation is devoid of basic groups and the anion is selected from the following: difluorophosphate, phosphotungstate, phosphomolybdate, tungstogermanate, silicotungstate and molybdosilicate.
    Type: Grant
    Filed: July 25, 1973
    Date of Patent: January 6, 1976
    Assignee: Ozalid Company Limited
    Inventors: Peter Pinot de Moira, John Philip Murphy