Shape/taper Patents (Class 977/878)
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Patent number: 11480588Abstract: The invention relates to a method for providing a probe device for scanning probe microscopy, in particular for atomic force microscopy, wherein a scanning probe microscope is used for measuring a sample by means of a tip which is arranged on a cantilever of the probe device and which has a tip geometry. According to the invention, in a step upstream of the manufacturing process producing the tip, the tip geometry is optimized based on a selected tip basic form with regard to defined, required measurement properties, by computer simulating and evaluating the tip geometry, and modifying the tip geometry according to the evaluation with regard to these measurement properties. The invention further relates to a probe device for scanning probe microscopy, in particular for atomic force microscopy, having a cantilever and a tip formed on the cantilever in the nanometer range, with which samples to be measured can be scanned.Type: GrantFiled: November 13, 2018Date of Patent: October 25, 2022Inventor: Bernd Irmer
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Patent number: 8951444Abstract: In a method for functionalizing a carbon nanotube surface, the nanotube surface is exposed to at least one vapor including at least one functionalization species that non-covalently bonds to the nanotube surface, providing chemically functional groups at the nanotube surface, producing a functionalized nanotube surface. A functionalized nanotube surface can be exposed to at least one vapor stabilization species that reacts with the functionalization layer to form a stabilization layer that stabilizes the functionalization layer against desorption from the nanotube surface while providing chemically functional groups at the nanotube surface, producing a stabilized nanotube surface. The stabilized nanotube surface can be exposed to at least one material layer precursor species that deposits a material layer on the stabilized nanotube surface.Type: GrantFiled: June 22, 2010Date of Patent: February 10, 2015Assignee: President and Fellows of Harvard CollegeInventors: Roy G. Gordon, Damon B. Farmer
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Patent number: 8202817Abstract: A nanocarbon aggregate including a graphite aggregate including a graphene sheet having a petal shape and a nanohorn. The petal-shaped graphite aggregate achieves a reduction in the particulate size and a higher dispersibility by allowing the edge of the petal shape to locally absorb a metal, a metal complex and a metal oxide. The nanocarbon aggregate is used for a catalyst support.Type: GrantFiled: January 29, 2008Date of Patent: June 19, 2012Assignee: NEC CorporationInventors: Ryota Yuge, Masako Yudasaka, Sumio Iijima
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Patent number: 8020216Abstract: Probe structures and fabrication techniques are described. The described probe structures can be used as probes for various applications such as conductance measurement probes, field emitter probes, nanofabrication probes, and magnetic bit writing or reading probes.Type: GrantFiled: May 10, 2006Date of Patent: September 13, 2011Assignee: The Regents of the University of CaliforniaInventor: Sungho Jin
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Patent number: 7871530Abstract: Provided is near-field optical probe including: a cantilever arm support portion that is formed of a lower silicon layer of a silicon-on-insulator (SOI) substrate, the cantilever arm support portion having a through hole formed therein at a side of the lower silicon layer; and a cantilever arm forming of a junction oxidation layer pattern and an upper silicon layer pattern on the SOI substrate that are supported on an upper surface of the lower silicon layer and each have a smaller hole than the through hole, a silicon oxidation layer pattern having a tip including an aperture at a vertical end, corresponding with the hole on the upper silicon layer pattern, and an optical transmission prevention layer that is formed on the silicon oxidation layer pattern and does not cover the aperture.Type: GrantFiled: May 14, 2009Date of Patent: January 18, 2011Assignee: Electronics and Telecommunications Research InstituteInventors: Eunkyoung Kim, Sung Q Lee, Kang Ho Park
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Patent number: 7744963Abstract: In one aspect, a method of nanolithography is provided, the method comprising providing a substrate; providing a scanning probe microscope tip; coating the tip with a deposition compound; and subjecting said coated tip to a driving force to deliver said deposition compound to said substrate so as to produce a desired pattern. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.Type: GrantFiled: October 31, 2007Date of Patent: June 29, 2010Assignee: Northwestern UniversityInventors: Chad A. Mirkin, Seunghun Hong, Vinayak P. Dravid
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Patent number: 7578176Abstract: A scanning probe microscope's probe tip dimensions as they exist or existed for a certain data or measurement are inferred based on probe activity taking place since a probe characterization procedure was performed. The inferred probe tip dimensions can be used to correct nanoscale measurements taken by the probe to account for changes in the probe's geometry such as wear.Type: GrantFiled: December 22, 2006Date of Patent: August 25, 2009Assignee: Veeco Metrology, Inc.Inventors: Tianming Bao, Hao-Chih Liu, Gregory A. Dahlen, Rohit Jain
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Patent number: 7485857Abstract: The present invention provides microcoaxial probes fabricated from semiconductor heterostructures that include strained semiconductor bilayers. The microcoaxial probes are well suited for use as scanning probes in scanning probe microscopy, including scanning tunneling microscopy (STM), atomic force microscopy (AFM), scanning microwave microscopy, or a combination thereof.Type: GrantFiled: September 11, 2006Date of Patent: February 3, 2009Assignee: Wisconsin Alumni Research FoundationInventor: Robert H. Blick
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Publication number: 20080154521Abstract: A scanning probe microscope's probe tip dimensions as they exist or existed for a certain data or measurement are inferred based on probe activity taking place since a probe characterization procedure was performed. The inferred probe tip dimensions can be used to correct nanoscale measurements taken by the probe to account for changes in the probe's geometry such as wear.Type: ApplicationFiled: December 22, 2006Publication date: June 26, 2008Inventors: Tianming Bao, Hao-Chih Liu, Gregory A. Dahlen, Rohit Jain
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Patent number: 7319224Abstract: Provided are a semiconductor probe with a resistive tip, and a method of fabricating the semiconductor probe.Type: GrantFiled: September 7, 2005Date of Patent: January 15, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Hong-sik Park, Kyoung-lock Baeck, Ju-hwan Jung, Hyoung-soo Ko, Chul-min Park, Seung-bum Hong