Abstract: An on-chip circuit to quantitatively measure threshold voltage shifts of a MOSFET. The circuit includes a programmable Vt reference sensor; a programmable Vt monitoring sensor; and a comparator for receiving inputs from the reference and monitoring sensors providing an output flag signal. The shifting of the MOSFET device voltage threshold monitors process variations, geometry sensitivity, plasma damage, stress, and hot carriers and other device damages. The same circuit also measures voltage differences between any two nodes in an integrated circuit chip or wafer.

Abstract: The invention provides an adjustment jig provided with a pattern for adjusting the direction of a reading line of a scanner which reads a target image line by line, which comprises a holder section for holding the scanner, a first pattern provided adjacent to a target reading line to be read by the scanner when the reading line direction of the scanner held is correctly adjusted, and a second pattern provided adjacent to the target reading line on the side opposite to the first pattern with the target reading line positioned therebetween, the second pattern being different from the first pattern in the brightness of at least one of hues which can be read by the scanner or in the width thereof in the reading line direction.

Abstract: An integrated circuit including pairs of strained complementary CMOS field-effect devices consisting of n-FET and p-FET transistors on a substrate. The n-FET is provided with a compressive dielectric stressor, while the p-FET is provided with a tensile stressed dielectric. Each dielectric stressor includes a discrete horizontal segment on a surface overlying and contacting the gate of the respective FET. The stress enhancement is insensitive to PC pitch, and by reducing the height of the polysilicon stack, the scalability which is achieved contributes to a performance improvement. The n-FET leverages higher stress values that are obtainable in the compressive liners are greater than 3 GPa compared to less than 1.5 GPa for tensile liners.

Abstract: A one-time programmable field effect transistor (FET) e-fuse has a silicided gate connected to the drain while the source is grounded. A voltage stimulus applied to the drain forces current to flow through the channel coupling the drain to the source. The magnitude of the current exceeding the threshold current density initiates electromigration of the source/drain silicide into the channel region, such that the source/drain of the FET is shorted to the substrate after programming. Under these constraints, the fuse device conducts current even when the transistor is in the off-state. The MOSFET e-fuse preferably uses a minimum channel length NFET/PFET and scales down its dimensions to conform to those allowed by the technology.

Abstract: An arrangement of pillar shaped p-i-n diodes having a high aspect ration are formed on a semiconductor substrate. Each device is formed by an intrinsic or lightly doped region (i-region) positioned between a P+ region and an N+ region at each end of the pillar. The arrangement of pillar p-i-n diodes is embedded in an optical transparent medium. For a given surface area, more light energy is absorbed by the pillar arrangement of p-i-n diodes than by conventional planar p-i-n diodes. The pillar p-i-n diodes are preferably configured in an array formation to enable photons reflected from one pillar p-i-n diode to be captured and absorbed by another p-i-n diode adjacent to the first one, thereby optimizing the efficiency of energy conversion.

Abstract: The present invention provides a robust global timing resynchronization architecture, a multi-link communications system including the same, and a method for minimizing the effects of resynchronization signal skew, reference clock skew, and PLL static phase error variations on resynchronization of multi-link communications systems.

Abstract: A method is described for computing distance based and pattern density based design rules for the mask layout design of a VLSI chip so that the design satisfying the above design rules when manufactured on a wafer do not violate the specified tolerance on the critical dimensions (CD). The design rules are developed on the computed enclosed energy which is a convolution of the total optical energy and the pattern density of the mask. The total optical energy is the sum of the short range diffraction limited optical energy and the long range optical flare.

Abstract: An integrated system and method to achieve ESD robustness on an integrated circuit (IC) in a fully automated ASIC design environment is described. Electrical characteristics and electrical limits on the power network are translated to power route region constraints for each chip input/output (I/O) cell. Electrical limits on the signal network are translated into signal route region constraints for each chip I/O cell. These constraints are passed on to an I/O floorplanner (automatic placer of I/O cells) that analyzes trade-offs between these constraints. For I/O cells that can not be placed to satisfy both power and signal region constraints, the I/O floorplanner utilizes the knowledge of alternative power distribution structures to group I/Os and create local power grid structures that have the effect of relaxing the power region constraints. Instructions for creating these local power grid structures are passed on to the automatic power routing tool.

Abstract: A method of simulating a production process on the basis of a continuous fluid model with discrete time evolution is described. The method of simulating makes use of assigning production and processing resources of various stations of the fluid model to various fluids with respect to a priority identifier of the fluids. Division of the station resources to various fluids is further based on a momentary amount of the various fluids. Based on the assignment of the station resources to the various fluids, the time evolution of the fluid amounts are determined without having to perform time and resource consuming optimization. Additionally, assignment of station resources can be manually and temporarily modified by a fluid manipulation means allowing for a universal and dynamic modification of the behavior of particular stations without interrupting or affecting the entire simulation process.

Abstract: A FET structure is provided in which at least one stressor element provided at or near one corner of an active semiconductor region applies a stress in a first direction to one side of a channel region of the FET to apply a torsional stress to the channel region of the FET. In a particular embodiment, a second stressor element is provided at or near an opposite corner of the active semiconductor region to apply a stress in a second direction to an opposite side of a channel region of the FET, the second direction being opposite to the first direction. In this way, the first and second stressor elements cooperate together in applying a torsional stress to the channel region of the FET.

Abstract: A communication control apparatus includes search information associated with a tree structure. A mask prefix is associated with at least one entry, each entry including information on the mask length of a mask prefix associated therewith and a sort key. Each entry is assigned to a node in the tree structure according to a sorting order. Each node is linked to a different node at the next lower hierarchy via a branch based on the entry of the node. A destination address of the packet received is first extracted, and a search target node specified by a search control for an entry having information on the best matched prefix of the extracted address is then searched for. After completion of the node-by-node search process, a transfer route is determined for the packet received based on the longest prefix amongst the most appropriate prefixes of all the current search target nodes.

Abstract: A method and a system for validating initial conditions (ICs) generally provided by a user when simulating a VLSI circuit are described. Inconsistent ICs sets are detected and replaced by consistent subsets thereof. The method selects the resistance and source values in a Norton or Thevenin circuit used to enforce the IC, and detects when specified ICs are inconsistent while preserving critical or fragile ICs when a two DC-pass approach is used. It further correlates the set of consistent ICs thus obtained with an equivalent circuit and simultaneously provides an input for future use. This allows a user to be notified and given a measure of how bad the inconsistencies are. Detecting inconsistencies is achieved either by measuring the holding current or by measuring the voltage drift if the two DC-pass approach is used.

Abstract: A method of processing a substrate of a device comprises the as following steps. Form a cap layer over the substrate. Form a dummy layer over the cap layer, the cap layer having a top surface. Etch the dummy layer forming patterned dummy elements of variable widths and exposing sidewalls of the dummy elements and portions of the top surface of the cap layer aside from the dummy elements. Deposit a spacer layer over the device covering the patterned dummy elements and exposed surfaces of the cap layer. Etch back the spacer layer forming sidewall spacers aside from the sidewalls of the patterned dummy elements spaced above a minimum spacing and forming super-wide spacers between sidewalls of the patterned dummy elements spaced less than the minimum spacing. Strip the patterned dummy elements. Expose portions of the substrate aside from the sidewall spacers. Pattern exposed portions of the substrate by etching into the substrate.

Abstract: A method for incrementally calculating the impact of coupling noise on the timing of an integrated circuit (IC) having a plurality of logic stages by performing an initial timing analysis on the IC to provide a first determination of the impact of coupling noise on the timing. One or more design changes to the IC are then performed. In response to the design change, the impact of the coupling noise to the timing is calculated on the logic stage where the change was made and on the logic stages downstream thereof. The results of the calculations are then inputted to a timing analysis tool to adjust the delay and slew of each logic stage where the design change was made and to the logic stages downstream thereof.

Abstract: A MEM switch is described having a free moving element within in micro-cavity, and guided by at least one inductive element. The switch consists of an upper inductive coil; an optional lower inductive coil, each having a metallic core preferably made of permalloy; a micro-cavity; and a free-moving switching element preferably also made of magnetic material. Switching is achieved by passing a current through the upper coil, inducing a magnetic field in the coil element. The magnetic field attracts the free-moving magnetic element upwards, shorting two open wires and thus, closing the switch. When the current flow stops or is reversed, the free-moving magnetic element drops back by gravity to the bottom of the micro-cavity and the wires open. When the chip is not mounted with the correct orientation, gravity cannot be used. In such an instance, a lower coil becomes necessary to pull the free-moving switching element back and holding it at its original position.

Abstract: A method and apparatus for identifying defective partially manufactured semiconductor wafers in a manufacturing line is described, wherein defects caused by silicon erosion created by over-etching the wafer can be detected. The method described herein is based on an in-line test of selected structures, such as FETs, located in the kerfs that surround the integrated circuit chips. Leakage current between the gate and the source-drain region is measured at FETs in each kerf. Based on the measurement, a leakage current map is created and compared to a standard map. In accordance with this comparison and to the distribution of patterns of leakage currents, it is determined whether or not the wafer is defective. This determination is performed in the kerfs after formation of the gate and source-drain regions, and prior to the wafer being completed. By detecting defective wafers at an early stage, considerable manufacturing resources are saved.

Abstract: A substrate under tension and/or compression improves performance of devices fabricated therein. Tension and/or compression can be imposed on a substrate through selection of appropriate gate sidewall spacer material disposed above a device channel region wherein the spacers are formed adjacent both the gate and the substrate and impose forces on adjacent substrate areas. Another embodiment comprises compressive stresses imposed in the plane of the channel using SOI sidewall spacers made of polysilicon that is expanded by oxidation. The substrate areas under compression or tension exhibit charge mobility characteristics different from those of a non-stressed substrate. By controllably varying these stresses within NFET and PFET devices formed on a substrate, improvements in IC performance have been demonstrated.

Abstract: A semiconductor device structure is provided which includes a first field effect transistor (“FET”) having a first channel region, a first source region, a first drain region and a first gate conductor overlying the first channel region. A second FET is included which has a second channel region, a second source region, a second drain region and a second gate conductor overlying the second channel region. The first and second gate conductors are portions of a single elongated conductive member extending over both the first and second channel regions. A first stressed film overlies the first FET, the first stressed film applying a stress having a first value to the first channel region. A second stressed film overlies the second FET, the second stressed film applying a stress having a second value to the second channel region. The second value is substantially different from the first value.

Abstract: A MIM capacitor is formed on a semiconductor substrate having a top surface and including regions formed in the surface selected from a Shallow Trench Isolation (STI) region and a doped well having exterior surfaces coplanar with the semiconductor substrate. A capacitor lower plate is either a lower electrode formed on the STI region in the semiconductor substrate or a lower electrode formed by a doped well formed in the top surface of the semiconductor substrate that may have a silicide surface. A capacitor HiK dielectric layer is formed on or above the lower plate. A capacitor second plate is formed on the HiK dielectric layer above the capacitor lower plate. A dual capacitor structure with a top plate may be formed above the second plate with vias connected to the lower plate protected from the second plate by sidewall spacers.

Abstract: A vertical pass transistor used in a DRAM cell for maintaining a low total leakage current and providing adequate drive current is described together with a method of fabricating such a device. The transistor gate is engineered in lieu of the channel. The vertical pass transistor for the DRAM cell incorporates two gate materials having different work functions. The gate material near the storage node is n-type doped polysilicon. The gate material near the bit line diffusion is made of silicide or metal having a higher work function than the n-polysilicon. The novel device structure shows several advantages: the channel doping is reduced while maintaining a high Vt and a low sub-threshold leakage current; the carrier mobility improves with the reduced channel doping; the body effect of the device is reduced which improves the write back current; and the sub-threshold swing is reduced because of the low channel doping.