Patents Represented by Attorney John J. Tomaszewski
  • Patent number: 7501580
    Abstract: A wire management system is provided to neatly and efficiently assembly the many wires of an electronic component system such as a personal computer without tangling and intertwining. The system utilizes a container having axially aligned upright posts with hooks at their upper ends to keep wires wound around the posts in the wound position. A preferred embodiment utilizes axially aligned slots and movable and lockable posts in the slots to change the wiring configuration depending on the wire to be taken up. Clips may also be utilized to secure the wire in the container. Female and male mating flanges allow the user to connect one or more containers increasing the capacity of the wire management system. Another system uses pairs of posts with a space therebetween so that the wire can be wound around the outside of the posts or threaded through the space and also around the posts.
    Type: Grant
    Filed: July 19, 2007
    Date of Patent: March 10, 2009
    Inventors: Anthony S. Pagoto, Don A. Sebastian
  • Patent number: 6824932
    Abstract: A method and apparatus for making phase shift masks are provided wherein an anti-reflective coating used on an opaque pattern layer of the mask fully covers the opaque pattern layer and has not been etched in the etching process to form the phase shift mask. A two-exposure method to form the phase shift mask is used wherein a photoresist having a defined dose-to-clear level is coated on the surface of the mask and the lower surface of the mask is exposed to a blanket exposure in an energy amount less than the dose-to-clear level. The open areas of the upper surface of the mask to be etched are exposed to an energy dose in an amount less than the dose-to-clear level, with the sum of the amounts of the lower surface energy and upper surface energy being at least the dose-to-clear level. The method and apparatus minimizes and/or avoids etching of the anti-reflective coating.
    Type: Grant
    Filed: June 5, 2002
    Date of Patent: November 30, 2004
    Assignee: International Business Machines Corporation
    Inventors: Scott J. Bukofsky, Carlos A. Fonseca, Michael S. Hibbs, Lars W. Liebmann
  • Patent number: 6784229
    Abstract: A cement mortar is provided which is mixed with a liquid media, preferably either water or aqueous latex, for use as a thin-set mortar, medium bed mortar, underlayment mortar and/or grout (pointing mortar). The mortar or grout contains cement, sand and a water retaining agent and is improved by employing an aramid fiber in the mortar. A p-aramid fiber is preferred and it is highly preferred to use the polymer fiber in a pulp form which has a fibrillated structure. The overall performance properties of a cement-based mortar or grout such as a thin-set mortar are significantly improved including sag resistance, open time, bond strength, flexibility, heat aging and water immersion strength.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: August 31, 2004
    Assignee: LATICRETE International, Inc.
    Inventor: Rezvan Rooshenas
  • Patent number: 6776171
    Abstract: An apparatus and method are provided for removing contaminate particulate matter from substrate surfaces such as semiconductor wafers. The method and apparatus use a material, preferably a liquid curable polymer, which is applied as a sacrificial coating to the surface of a substrate containing contaminate particulate matter thereon. An energy source is used to dislodge the contaminate particulate matter from the surface of the wafer into the sacrificial coating so that the particles are partially or fully encapsulated and suspended in the sacrificial coating. The sacrificial coating is then removed. The coating is preferably formed into a film to facilitate removal of the coating by pulling (stripping) the film providing a cleaner substrate surface.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: August 17, 2004
    Assignee: International Business Machines Corporation
    Inventors: Nicole S. Carpenter, Joseph R. Drennan, Alison K. Easton, Casey J. Grant, Andrew S. Hoadley, Kenneth F. McAvey, Jr., Joel M. Sharrow, William A. Syverson, Kenneth H. Yao
  • Patent number: 6719188
    Abstract: A method and apparatus are provided for reworking electronic component assemblies where the components are joined by solder interconnections. A cutting device employing a heated wire, blade or other cutting element is forced against and through the solder interconnections to sever the interconnections. A preferred cutting device employs moving the cutting element transverse to the solder interconnections to also provide a sawing action to the solder interconnections. Another cutting device employs a water jet to provide a high pressure stream of water that cuts and severs the solder interconnections.
    Type: Grant
    Filed: July 24, 2001
    Date of Patent: April 13, 2004
    Assignee: International Business Machines Corporation
    Inventors: Mukta G. Farooq, Raymond A. Jackson, David C. Linnell
  • Patent number: 6713858
    Abstract: An electronic module having enhanced adhesion at the chip passivation and underfill interface is disclosed. The surface of the chip passivation is chemically modified to a sufficient depth such that the cured passivation is more reactive. The modified surface is treated with a polyamine preferably having a cyclic amine group extending from a preferably aliphatic backbone. During reflow of the solder joints of the electronic module by heating, the modified passivation reacts with the polyamine at the amine functionality. Following underfill of the electronic module with a polymeric material, preferably an epoxy resin, the polyamine on the surface of the passivation reacts with the underfill material during curing of the underfill material. The resulting electronic module is more robust since the amine acts as a chemical anchoring site for both the modified passivation and the underfill material.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: March 30, 2004
    Assignee: International Business Machines Corporation
    Inventors: Ramesh R. Kodnani, Luis J. Matienzo, Son K. Tran
  • Patent number: 6682872
    Abstract: Radiation-curable compositions are provided for use in the fabrication of electronic components as passivation coatings; for defect repair in ceramic and thin film products by micropassivation in high circuit density electronic modules to allow product recovery; as a solder mask in electronic assembly processes; for use as protective coatings on printed circuit board (PCB) circuitry and electronic devices against mechanical damage and corrosion from exposure to the environment. The compositions are solvent-free, radiation-curable, preferably uv-curable, containing a polymer binder, which is a pre-formed thermoplastic or elastomeric polymer/oligomer, a monofunctional and/or bifunctional acrylic monomer, a multifunctional (more than 2 reactive groups) acrylated/methacrylated monomer, and a photoinitiator, where all the constituents are mutually miscible forming a homogeneous viscous blend without the addition of an organic solvent. The compositions may also contain inorganic fillers and/or nanoparticle fillers.
    Type: Grant
    Filed: January 22, 2002
    Date of Patent: January 27, 2004
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, Michael Berger, Rebecca Y. Gorrell, Gregg B. Monjeau, Bernadette H. Perry, Thomas A. Wassick
  • Patent number: 6679146
    Abstract: A die and method of gang punching selective holes in thin sheet materials such as greensheets are provided in which slugs of greensheet material formed during the punching operation easily fall through the die and are removed. The die uses a number of plates one of which is a window plate having openings corresponding to openings in a die plate disposed thereon. The window plate openings have a larger diameter than the die plate openings and also a plurality have an oval shape which oval shape openings provide less resistance to the falling slugs and facilitate removal of the slugs from the die. The window plate also preferably has a central grid open area with the remainder of the plate having vertical through-holes corresponding to the through-holes of the die plate. The die also preferably employs a die plate made from at least two sheets of material, i.e.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: January 20, 2004
    Assignee: International Business Machines Corporation
    Inventors: James G. Balz, Mark J. LaPlante, David C. Long, Thomas Weiss
  • Patent number: 6599774
    Abstract: An electronic device is provided comprising a stacked integrated circuit chip assembly wherein the top chip of the assembly is solder connected to the surface of an interconnection substrate with the other chips of the assembly being enclosed in a cavity in the interconnection substrate wherein the cavity and electrical connections of the assembly and between the substrate and top chip are sealed by supplying an encapsulant to the cavity through a through opening in the substrate which communicates with the cavity.
    Type: Grant
    Filed: April 23, 2001
    Date of Patent: July 29, 2003
    Assignee: International Business Machines Corporation
    Inventors: Eric B. Hultmark, Brian C. Noble
  • Patent number: 6596559
    Abstract: An electronic module having enhanced adhesion at the chip passivation and underfill interface is disclosed. The surface of the chip passivation is chemically modified to a sufficient depth such that the cured passivation is more reactive. The modified surface is treated with a polyamine preferably having a cyclic amine group extending from a preferably aliphatic backbone. During reflow of the solder joints of the electronic module by heating, the modified passivation reacts with the polyamine at the amine functionality. Following underfill of the electronic module with a polymeric material, preferably an epoxy resin, the polyamine on the surface of the passivation reacts with the underfill material during curing of the underfill material. The resulting electronic module is more robust since the amine acts as a chemical anchoring site for both the modified passivation and the underfill material.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: July 22, 2003
    Assignee: International Business Machines Corporation
    Inventors: Ramesh R. Kodnani, Luis J. Matienzo, Son K. Tran
  • Patent number: 6565496
    Abstract: An apparatus and method are provided for loading punch pins into a punch pin holding plate of a gang-punch apparatus wherein an individual punch pin is removed from a preloaded punch pin holder or supply plate, transferred to a load station which precisely locates the punch pin shank over the pre-drilled hole in the punch pin holding plate while holding the punch perpendicular and coaxial to the hole and pushes the punch into the punch pin holding plate. A vision system is used to align the hole in the punch pin holding plate and to verify that the punch pin is properly loaded into the holding plate. The above sequence for individual punches is repeated until the desired number of punch pins are transferred from the preloaded holder to the punch pin holding plate.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: May 20, 2003
    Assignee: International Business Machines Corporation
    Inventors: Mark J. LaPlante, David C. Long, Thomas Weiss
  • Patent number: 6548175
    Abstract: The invention is directed to improved conductive adhesives for solder-free interconnections in microelectronic assembly processes such as for chip carrier-to-substrate attachment. These adhesives are characterized by low tensile modulus, low resistivity, high adhesion strength, and durability of these properties during reliability stress conditions of thermal shock, thermal aging, and temperature/humidity (85° C./85%) exposure of the assembled devices. The adhesives contain a homogeneous solution of a siloxane containing epoxide, a curing agent, a curing catalyst and an organic polymeric or oligomeric additive. A conductive filler is added to the solution forming the filler. Preferred fillers are Ag coated with Pd and Ag coated with Au.
    Type: Grant
    Filed: January 11, 2001
    Date of Patent: April 15, 2003
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, Raymond A. Jackson, Amy B. Ostrander, Charles H. Perry, Megan J. Shannon
  • Patent number: 6541709
    Abstract: A multilayer thin film structure having defined strap repair lines thereon and a method for repairing interconnections in the multilayer thin film structure (MLTF) and/or making engineering changes (EC) are provided. The method determines interconnection defects in the MLTF at a thin film layer adjacent the top metal layer of the structure, defines the top surface metallization including a series of orthogonal X conductor lines and Y conductor lines using photoresist and lithography and additive or subtractive metallization techniques and then uses a phototool to selectively expose the photoresist to define top surface strap connections needed to repair the interconnections and/or make EC's, and forms the top surface metallization.
    Type: Grant
    Filed: November 1, 1996
    Date of Patent: April 1, 2003
    Assignee: International Business Machines Corporation
    Inventors: Peter A. Franklin, Arthur G. Merryman, Rajesh S. Patel, Thomas A. Wassick
  • Patent number: 6515061
    Abstract: A paste composition having a high thermal conductivity and a relatively low viscosity is used to provide a thermal conductive connection between an electronic component and a cooling device to increase the heat transfer rate between the component and the device cooling the electronic component. The paste composition comprises a non-aqueous dielectric carrier, thermally conductive filler particles and a specially defined dispersant comprising the self-condensation reaction product of a hydroxy fatty acid, the reaction product having an acid number of about 30-100. A 12-hydroxy stearic acid self condensed reaction product is the preferred dispersant.
    Type: Grant
    Filed: October 28, 1997
    Date of Patent: February 4, 2003
    Assignee: International Business Machines Corporation
    Inventors: Sushumna Iruvanti, Keith Scott Olsen, Krishna Gandhi Sachdev
  • Patent number: 6503874
    Abstract: This invention provides a method for removing flux residue and similar other residues formed on the surfaces of micro electronic components during soldering operations using solder paste and fluxing agents in electronic module assembly component fabrication by a semi-aqueous solvent cleaning process using propylene glycol alkyl ether solvents, preferably the mono alkyl ethers, as replacements for xylene. The electronic components may contain plastic components, for example, a plastic grid array (PBGA) in addition to silicon device chip(s), C4 decaps and SMTs on a ceramic chip carrier with solder columns. Preferred solvents are dipropylene glycol mono methyl ether and tripropylene glycol mono methyl ether, which are both water soluble.
    Type: Grant
    Filed: January 16, 2001
    Date of Patent: January 7, 2003
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, Chon C. Lei
  • Patent number: 6489255
    Abstract: A layer of doped oxide glass is deposited on a semiconductor device in a chemical vapor deposition chamber by reacting gaseous sources of silicon, ozone and at least one boron or phosphorus dopant in a carrier gas, the ozone being present in a ratio of about 9-15 weight percent of the carrier gas. The deposited layer of doped oxide glass contains no greater than about 4 weight percent each of boron and phosphorus concentration and is annealed at a temperature no greater than about 700° C. for a time sufficient to soften and outgas any residual moisture in the oxide glass layer and level the upper surface to a desired degree.
    Type: Grant
    Filed: December 12, 1996
    Date of Patent: December 3, 2002
    Assignee: International Business Machines Corporation
    Inventors: Son Van Nguyen, Christopher Joseph Waskiewicz, Donna Rizzone Cote
  • Patent number: 6433429
    Abstract: Interconnections including copper conductor lines, vias and Damascene lines comprise an insulator or dielectric having openings therein, a first adhesion promoting conductive barrier liner material on the walls and base of the opening, a first conductive layer on the first adhesion material layer, the first conductive layer having a predetermined cross-sectional area and having electromigration resistance, a second adhesion promoting/conductive barrier layer on the first conductive layer and a soft low resistant metal such as copper filling the remainder of the opening forming the line or via. These interconnections have enhanced operating and electromigration life particularly if copper is missing or partially missing in the copper interconnections due to the copper deposition process.
    Type: Grant
    Filed: September 1, 1999
    Date of Patent: August 13, 2002
    Assignee: International Business Machines Corporation
    Inventor: Anthony K. Stamper
  • Patent number: 6432823
    Abstract: An apparatus and method of planarizing objects, particularly electronic components. The off-concentric polishing system of the present invention comprises at least two polishing platens positioned adjacent each other such that the polishing portions of the platens are substantially co-planar. At least one wafer carrier is moveably mounted over the at least two platens such that a wafer may be polished by more than one platen substantially simultaneously. The platen configurations may be in a linear or non-linear configuration such that the wafer being polished is no longer centrally disposed over a single platen but is off-concentrically positioned over multiple platens. The off-concentric positioning of the wafer provides enhanced slurry distribution and endpoint detection. The present invention reduces time and cost in manufacturing electronic components by engaging several polishing conditions simultaneously without the need for sequential polishing.
    Type: Grant
    Filed: November 4, 1999
    Date of Patent: August 13, 2002
    Assignee: International Business Machines Corporation
    Inventors: Cuc K. Huynh, Paul A. Manfredi, Thomas J. Martin, Douglas P. Nadeau, Yutong Wu
  • Patent number: 6427324
    Abstract: A multilayer thin film structure having defined strap repair lines thereon and a method for repairing interconnections in the multilayer thin film structure (MLTF) and/or making engineering changes (EC) are provided. The method comprises determining interconnection defects in the MLTF at a thin film layer adjacent the top metal layer of the structure, defining the top surface metallization including a series of orthogonal X conductor lines and Y conductor lines using photoresist and lithography and additive or phototool to selectively expose the photoresist to define top surface strap connections needed to repair the interconnections and/or make EC's, and forming the top surface metallization.
    Type: Grant
    Filed: July 13, 1998
    Date of Patent: August 6, 2002
    Assignee: International Business Machines Corporation
    Inventors: Peter A. Franklin, Arthur G. Merryman, Rajesh S. Patel, Thomas A. Wassick
  • Patent number: 6426007
    Abstract: This invention provides a method for treating waste water containing organic bases such as tetramethyl ammonium hydroxide and dissolved metals such as Mo, W, Cu and Ni which are generated from mask cleaning and Mo etching processes. The organic base along with Cu and Ni is first removed preferably by passing the effluent through a cation exchange resin followed by passing the cation exchanged effluent through an anion exchange resin to remove the Mo and W metals. The treated waste water meets federal guidelines for dissolved metal contaminant limits for water discharge to water ways. Alternatively, filtered effluent is directly passed through an anion exchange resin to remove Mo and W and the dissolved TMAH and copper and nickel are removed by cation exchange.
    Type: Grant
    Filed: April 29, 1999
    Date of Patent: July 30, 2002
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, Umar M. Ahmad