Abstract: A plurality of substrates is closely stacked together in a Rapid Thermal Processing (RTP) chamber, and the stack is processed simultaneously.
Type:
Grant
Filed:
April 11, 1997
Date of Patent:
April 18, 2000
Assignee:
Steag RTP Systems
Inventors:
Helmut Sommer, Manuela Zwissler, Herbert Kegel
Abstract: An apparatus, method, and system for Rapid Thermal Processing (RTP), whereby the object to be processed is rotated under the radiation sources of the RTP system by a gas jet system, is presented.
Type:
Grant
Filed:
November 24, 1997
Date of Patent:
December 21, 1999
Assignee:
Steag-RTP Systems
Inventors:
Helmut Aschner, Andreas Hauke, Ulrich Walk, Dieter Zernickel
Abstract: A method, system, and apparatus for sending data from a base station to an RF tag, whereby the RF tag comprises an "intention to write to memory" field, and the "intention to write to memory" field is written before writing the data and cleared after the data is successfully written. If the data transmission is interrupted and partial data is written to the tag, the "intention to write to memory" field will not have been cleared when the tag is checked at a later time through interrogation by a base station.
Type:
Grant
Filed:
May 23, 1997
Date of Patent:
October 12, 1999
Assignee:
Intemec IP Corp.
Inventors:
Thomas Anthony Cofino, Daniel Joseph Friedman, Kenneth Alan Goldman, Harley Kent Heinrich
Abstract: A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.
Type:
Grant
Filed:
October 24, 1997
Date of Patent:
October 12, 1999
Assignee:
Steag AST
Inventors:
Werner Blersch, Peter Gruenwald, Michael Maurer, Helmut Merkle, Thomas Theiler, Heinrich Walk
Abstract: A method of producing a film on the surface of a semiconductor wafer in an RTP system, comprising: a) rapidly processing the wafer at a first temperature T.sub.1 in an atmosphere containing a substantial vapor pressure of a first reactive gas; then b) rapidly processing the wafer at a second temperature T.sub.2 in an atmosphere substantially free of the first reactive gas is described.
Type:
Grant
Filed:
October 17, 1997
Date of Patent:
August 10, 1999
Inventors:
Wilfried Lerch, Georg Roters, Peter Muenzinger, Roland Mader
Abstract: A Radio Frequency (RF) transponder (tag), method, and system, whereby the tag has a low current tag oscillator, the oscillation frequency of the tag oscillator set by RF signal from a base station.
Type:
Grant
Filed:
January 8, 1997
Date of Patent:
June 15, 1999
Assignee:
International Business Machines Corporation
Inventors:
David E. Dieska, Daniel Joseph Friedman, Kenneth Alan Goldman, Harley Kent Heinrich
Abstract: A passive radio frequency transponder (RF tag) having a diode rectifier receiver circuit outside the tag power rectification circuit, the tag power rectification circuit supplying power to the electronics of the RF tag. An additional innovative low current circuit protect the signal capacitor from overvoltage produced by the signal diode. An innovative circuit also clips the signal and sharpens it. An innovative low current circuit is used as a comparator to sharpen the signal pulses.
Type:
Grant
Filed:
October 17, 1996
Date of Patent:
March 30, 1999
Assignee:
International Business Machines Corporation
Inventors:
Daniel Joseph Friedman, Harley Kent Heinrich
Abstract: A heat transfer unit for transferring heat between an object and a flowing fluid, comprising a plurality of elongated loops of heat conducting material in the form of a spiral, each elongated loop having a first end and a second end, the first end of each loop connected in a closely spaced apart relationship to the first end of an adjacent loop, the second end of each loop connected in a closely spaced apart relationship to the second end of an adjacent loop.
Abstract: A closable enclosure for rapid thermal processing of semiconductor wafers is presented, wherein the closable enclosure has an enclosed volume less than 10 times the volume of the wafer, and wherein the closable enclosure may be closed about the wafer while the closable enclosure is surrounded by the process gas.
Type:
Grant
Filed:
January 8, 1997
Date of Patent:
February 16, 1999
Assignee:
Steag AST
Inventors:
Guenter Kaltenbrunner, Zsolt Nenyei, Helmut Sommer
Abstract: A rapid thermal processing (RTP) chamber is disclosed, wherein a transparent plate and a body are sealed with a gas tight seal, and wherein the gas tight seal is activated by inflating an inflatable element.
Type:
Grant
Filed:
July 17, 1997
Date of Patent:
February 9, 1999
Assignee:
Steag-Ast
Inventors:
Helmut Aschner, Helmut Merkle, Ulrich Walk, Dieter Zernickel
Abstract: A thin visible and near IR absorbing plate is placed between the radiation source and the object to be processed in a rapid thermal processing system. The object is heated in part by the near IR and far IR radiation from the thin plate, and the material and optically induced heating inhomogeneities are reduced.
Type:
Grant
Filed:
October 2, 1995
Date of Patent:
January 19, 1999
Inventors:
Guenter Kaltenbrunner, Thomas Knarr, Zsolt Nenyei
Abstract: A heat transfer apparatus for transferring heat between an object and a flowing fluid, comprising a plurality of fluid transmissive heat transfer units arranged in a splayed array for transferring heat between an object in contact with the splayed array and a fluid flowing from and to a plurality of interdigitated counterpropagating streams.
Abstract: An apparatus and a method of transporting energy from a base station to energize a remote RF transponder having an energy store is described, comprising transporting power in pulses of frequencies chosen from a randomly ordered list of frequencies, wherein the time between pulses when little power is transmitted is less than the time taken for the remote transponder to deplete the energy store.
Type:
Grant
Filed:
April 3, 1996
Date of Patent:
December 15, 1998
Assignee:
International Business Machines Corporation
Inventors:
Harley Kent Heinrich, Rene Dominic Martinez, Paul Jorge Sousa, Li-Cheng Richard Zai
Abstract: A manifold for directing and channeling the flow of fluid to and from a plurality of interdigitated counterpropagating flowing streams, comprising a continuous folded sheet enclosing a volume, where one aperture in the volume serves as an exit or entrance for a single fluid stream, and a plurality of apertures serve as entrances or exits respectively for a plurality of streams flowing in a first direction, the plurality of streams interdigitated with a plurality of streams flowing in the opposite direction.
Abstract: A method of selecting groups of radio frequency RF transponders (tags) for communication between a base station and the tags. The tags are selected into groups according to a physical attribute ofthe signal sent by the tags to the base station, or according to the physical response of the tags to a physical attribute of the signal sent from the base station to the tags. Communication with the tags is thereby simplified, and the time taken to communicate with the first tag is markedly reduced.
Type:
Grant
Filed:
September 30, 1996
Date of Patent:
July 7, 1998
Assignee:
International Business Machines Corporation
Inventors:
Trieu Can Chieu, Thomas Anthony Cofino, Harley Kent Heinrich, Paul Jorge Sousa, Li-Cheng Richard Zai
Abstract: A method and apparatus for measuring the emission coefficient of a semiconductor material for light of wavelength .lambda. having photon energy less than the semiconductor bandgap energy is introduced. The reflection coefficient for the light of wavelength .lambda. is measured while the semiconductor material is being irradiated with sufficient light having photon energy greater than the bandgap energy that the semiconductor material transmits little light of wavelength .lambda., and the emission coefficient is calculated from the measured reflection coefficient. The temperature of the semiconductor material can be calculated from the emission coefficient and the measured intensity of the thermally emitted radiation of wavelength .lambda..
Type:
Grant
Filed:
April 10, 1996
Date of Patent:
March 10, 1998
Assignee:
AST Electronik, GmbH
Inventors:
Michael Maurer, Wilfried Lerch, Alexander Gschwandtner
Abstract: A reaction chamber for a Rapid Thermal Processing (RTP) system contains an aperture to allow introduction and removal of the object to be processed. The cross sectional area of the aperture is significantly less than the cross sectional area of the reaction chamber. A method of flushing the reaction chamber, using a short time laminar flow of the flush gas, is used in combination with the aperture to increase the throughput of the RTP system.
Type:
Grant
Filed:
February 13, 1995
Date of Patent:
December 3, 1996
Assignee:
AST Elekronik
Inventors:
Zsolt Nenyei, Helmut Merkle, Andreas Tillmann