Patents Represented by Attorney, Agent or Law Firm Ronald R. Snider
  • Patent number: 6835709
    Abstract: A stimulative perfume composition which demonstrates an excellent stimulative effect uses an anisaldehyde as the stimulative agent. The stimulative perfume composition includes an effective amount of the anisaldehyde in perfume ingredients.
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: December 28, 2004
    Assignee: Shiseido Co., Ltd.
    Inventors: Ken Shoji, Seiichi Hirose, Sumie Taguchi
  • Patent number: 6817712
    Abstract: A metallic vapor deposition lens provided with a protection coat is provided, the surface of which lens is finished smooth and good at abrasion-proof characteristic. The metallic vapor deposition lens of the invention is characterized in that a filmy layer 2 made from a metallic material m is formed on at least one side surface of a lens proper 1 by vapor deposition and a polymerized and hardening layer 3 made from diethylene glycol bis(allyl carbonate) is overlaid on said metallic deposition filmy layer 2 so as to protect the surface of said filmy layer 2.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: November 16, 2004
    Assignee: Nicoh Optical Co., Ltd.
    Inventor: Hokao Hayashi
  • Patent number: 6815645
    Abstract: A heating apparatus 20 comprises a container 2 having a work housing space 1 formed therein, and a heat source 3 for heating a work W in the work housing space 1. The apparatus further comprises a heat ray reflecting member 10 having a heat reflecting surface 10a thereof composed of a heat ray reflecting material, so as to allow the heat ray generated in the work housing space 1 to reflect on the heat reflecting surface 10a to thereby change the direction thereof towards the works W. The heat reflecting material is provided for reflecting heat ray in a specific wavelength band, comprises a stack of a plurality of element reflecting layers comprising materials having transparent properties to the heat ray, in which in the element reflecting layers, two adjacent layers are composed of a combination of materials differed from each other in refractive indices to the heat ray, while keeping difference between the refractive indices of 1.1 or larger.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: November 9, 2004
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventor: Takao Abe
  • Patent number: 6814811
    Abstract: It is an object of the present invention to provide not only a semiconductor wafer obtained by forming a semiconductor thin film with uniform resistivity and substantially no slip dislocation on a main surface of a semiconductor single crystal substrate having a relatively low dopant concentration, as large as 300 mm or more in diameter but also a vapor phase growth apparatus by means of which such a semiconductor wafer can be produced. A dopant gas is supplied into a reaction chamber 10 through all of the inlet ports 18a to 18f disposed in a width direction of the reaction chamber 10 from a common gas pipe 22a functioning as a main dopant gas pipe. Further, the dopant gas is additionally supplied through inner inlet ports 18a and 18b, and middle inlet ports 18c and 18d, as specific gas inlet ports, into the reaction chamber 10 from first and second auxiliary dopant gas pipes 22b and 22c.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: November 9, 2004
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventor: Hiroki Ose
  • Patent number: 6808047
    Abstract: An escape device for allowing a person to escape from a high position to a predetermined landing point. The escape device basically includes: an elastic cord element elastically stretchable to a maximum length substantially at the landing point; a container element provided at the high position; and a carrier element connected with the elastic cord element. Accordingly, a person can descend via the carrier element from the high position and softly land on the landing point. A plurality of carrier elements may be provided and connected together via plural elastic cord elements and auxiliary ropes, using disengagement mechanism, to provide a multistage escape device, so that the carrier elements can be disengaged from one another in sequence when they are falling so as to permit person(s) to descend and softly land on a ground at the landing point.
    Type: Grant
    Filed: August 26, 2002
    Date of Patent: October 26, 2004
    Inventor: Maki Takeshima
  • Patent number: 6807451
    Abstract: A system for order-receiving and delivery of a packaging medium adapted to package an article, which includes whole ordering and delivery processes concerning the packaging medium. This system allows a client to effect a data receiving and transmission with a designer and obtain an individual ID from the designer so that a basic data is transmitted from the client to a terminal server owned by the designer. In the system, the designer has an arithmetic unit by which the basic data is converted into a design data, and the client can take one or more actions to check to see if such design data complies with conditions and requirements proposed by the client, or not. After that checking, the design data is transmitted to a manufacturer who then manufactures packaging medium according to the design data and delivers resulting packaging medium to the client.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: October 19, 2004
    Assignee: Sydek Co., Ltd.
    Inventors: Katsuhiko Shida, Hiroto Shibata
  • Patent number: 6793338
    Abstract: The present invention relates to the rimless spectacles with lens holding stability, the jointing condition between the respective lenses and the parts to be engaged thereto of which spectacles is very stable and which shape stability lasts for a long period of time. Such rimless spectacles is provided as not only being stable in the jointing condition between the respective lenses and the parts to be engaged thereto so as to keep its shape intact for a long period of time and simplifying the number of the assembly parts so as to be advantageous for the parts inventory control as well as the maintenance thereof, but also improving the production efficiency thereof.
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: September 21, 2004
    Assignee: Masunaga Optical Mfg., Co., Ltd.
    Inventor: Satoru Masunaga
  • Patent number: 6791814
    Abstract: An ion generating apparatus 1 has an electric cleaning mechanism 79 for burning out attachment adhered on an ion generating electrode 7 by electric heating. Adhesion of dirt and the like onto the end portion of the electrode where an electron generation field concentrates will considerably ruin the ion generation efficiency. So that burning out of attachment adhered onto the end portion 7a of the ion generating electrode 7 using the electric cleaning mechanism 79 is extremely effective in terms of avoiding such nonconformity. Object of the cleaning will be attained to a sufficient degree if only the dirt adhered onto the sharpened end portion of the electrode 7, which is responsible for the ion generation, is selectively removed, which is also advantageous in simplifying the apparatus since there is no need to excessively raise the electric heating capacity of the electric cleaning mechanism 79.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: September 14, 2004
    Assignee: Nihon Pachinko Parts Co., Ltd.
    Inventors: Yoshiichi Adachi, Yuji Kato
  • Patent number: 6787383
    Abstract: The light-emitting device 100 has an ITO electrode layer 8 for applying drive voltage for light emission to a light emitting layer section 24, where the light from the light emitting layer section 24 is extracted as being passed through the ITO electrode layer 8. Between the light emitting layer section 24 and the ITO electrode layer 8, an electrode contact layer 7 composed of In-containing GaAs is located so as to contact with such ITO electrode layer 8, where occupied areas and unoccupied areas for the electrode contact layer 7 are arranged in a mixed manner on the contact interface with the transparent electrode layer 8. The electrode contact layer 7 can be obtained by annealing a stack 13, which comprises a GaAs layer 7″ formed on the light emitting layer section 24 and the ITO electrode layer 8 formed so as to contact with the GaAs layer 7″, to thereby allow In to diffuse from the ITO electrode layer to the GaAs layer 7″.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: September 7, 2004
    Assignees: Shin-Etsu Hanotai Co., Ltd., Nanoteco Corporation
    Inventors: Shunichi Ikeda, Masato Yamada, Nobuhiko Noto, Shinji Nozaki, Kazuo Uchida, Hiroshi Morisaki
  • Patent number: 6786599
    Abstract: A polarized lens of plastic lamination is provided, which lens is of high quality and highly durable in use while being inexpensively and stably producible without inconsistency in quality. The issues of the prior polarized plastic lens as produced by the blanking and hot machining method, the injection mold-heat bonding method or the sandwiching method are solved by making the most of the ductility and casting performance inherent in diethylene glycol bis(allyl carbonate) and combining therewith the optical characteristics of a polarized film made of poly(vinyl alcohol) resin as well as transparency and durability inherent in a polycarbonate resin plate so as to produce a polarized lens of plastic lamination.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: September 7, 2004
    Assignee: Nicoh Optical Co., Ltd.
    Inventor: Hokao Hayashi
  • Patent number: 6784494
    Abstract: A silicon oxide film 3′, 3″ is formed on each of the main surfaces of a first silicon single crystal substrate 1 (bond wafer) and a second silicon single crystal substrate 2 (base wafer), and the first and second silicon single crystal substrates are then brought into close contact so as to locate the silicon oxide films 3′, 3″ in between in an atmosphere of a clean air supplied through a boron-releasable filter, to thereby produce an SOI wafer 10. The second silicon single crystal substrate 2 employed herein comprises a silicon single crystal substrate having a bulk resistivity of 100 &OHgr;·cm or above. In thus produced SOI wafer 10, the silicon oxide film 3 has a depth profile of boron concentration in which the boron concentration reaches maximum at a thickness-wise position. This ensures manufacturing of SOI wafer excellent in high-frequency characteristics.
    Type: Grant
    Filed: August 13, 2002
    Date of Patent: August 31, 2004
    Assignee: Shin-Etsu Handotai, Co., Ltd.
    Inventor: Kiyoshi Mitani
  • Patent number: 6781158
    Abstract: A GaAsP-base light emitting element capable of sustaining an excellent light emission property for a long period, and a method for manufacturing thereof are provided. The light emitting element 1 has a p-n junction interface responsible for light emission formed between a p-type GaAs1-aPa layer 9 and an n-type GaAs1-aPa layer 8, and has a nitrogen-doped zone 8c formed in a portion including the p-n junction interface between such p-type GaAs1-aPa layer 9 and n-type GaAs1-aPa layer 8. Such element can be manufactured by fabricating a plurality of light emitting elements by varying nitrogen concentration Y of the nitrogen-doped zone 8c while keeping a mixed crystal ratio a of the p-type GaAs1- aPa layer 9 and n-type GaAs1-aPa layer 8 constant; finding an emission luminance/nitrogen concentration relationship by measuring emission luminance of the individual light emitting elements; and adjusting the nitrogen concentration of the nitrogen-doped zone 8c so as to fall within a range from 1.05Yp to 1.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: August 24, 2004
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Akio Nakamura, Masayuki Shinohara, Masahisa Endo
  • Patent number: 6777257
    Abstract: In the light emitting device having, a light emitting layer portion and a current spreading layer, respectively composed of a Group III-V compound semiconductor, formed on a single crystal substrate, the light emitting layer portion is formed on the single crystal substrate by the metal organic vapor-phase epitaxy process, and on such light emitting layer portion the current spreading layer is formed by the hydride vapor-phase epitaxy process. A high-concentration doped layer is also formed in a surficial area including the main surface on the electrode forming side of the current spreading layer, so as to have a carrier concentration of p-type dopant higher than that in the residual portion of the current spreading layer.
    Type: Grant
    Filed: May 13, 2003
    Date of Patent: August 17, 2004
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Masayuki Shinohara, Masato Yamada
  • Patent number: 6778281
    Abstract: A phase shift fringe image analysis method comprises the steps of shifting an object to be observed and a reference relative to each other by using a phase shift device, obtaining fringe image data at three or more phase shift positions having a given phase gap therebetween, and determining a phase of the object by analyzing thus obtained plurality of fringe image data items. The positional data of at least three phase positions are specified, and the whole or part of the fringe image data on which carrier fringes at these phase positions are superposed is subjected to a predetermined arithmetic operation so as to carry out a phase analysis and determine the phase of the object.
    Type: Grant
    Filed: January 22, 2002
    Date of Patent: August 17, 2004
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Zongtao Ge
  • Patent number: 6775072
    Abstract: A compact, inexpensive single-focus lens in a three-element configuration comprises, successively from an object side, a first lens with a low power having at least one aspheric surface, a second lens with a positive refracting power having a convex form on an image surface side, and a third lens with a low power having at least one aspheric surface.
    Type: Grant
    Filed: May 22, 2002
    Date of Patent: August 10, 2004
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Kenichi Sato
  • Patent number: 6773111
    Abstract: A projection type display apparatus decomposes white light emitted from a light source into color light components, combines the color light components after image modulation, and projects a desirable image onto a screen by using a projection lens. A lens element constituting a part of the projection lens is disposed upstream a color light combining device for combining the color light components.
    Type: Grant
    Filed: June 18, 2003
    Date of Patent: August 10, 2004
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Chikara Yamamoto
  • Patent number: 6771420
    Abstract: An optical device has a light-transmitting optical substrate formed with a multilayer film and a barrier layer disposed on the multilayer film side thereof. The light-transmitting optical substrate has a refractive index Ns (at a reference wavelength of 632.8 nm) falling within the range of 1.7≦Ns≦1.9, whereas the barrier layer has a refractive index Nb (at a reference wavelength of 632.8 nm) falling within the range of −0.1≦Nb−Ns≦0.1.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: August 3, 2004
    Assignees: Fuji Photo Optical Co., Ltd., Victor Company of Japan, Ltd.
    Inventors: Naoki Ozawa, Atsushi Enomoto, Kenji Yasuda, Yoshio Kojima, Satoru Moriya, Masanobu Shigeta, Toshiya Sakuma
  • Patent number: 6768554
    Abstract: In a fringe analysis method comprising the step of subjecting fringe image data carrying wavefront information of an object to be observed to Fourier transform method so as to determine a wavefront of the object, the fringe image data is multiplied by a window function corresponding to an effective data area of the fringe image data before the Fourier transform method is applied to.
    Type: Grant
    Filed: February 5, 2001
    Date of Patent: July 27, 2004
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Zongtao Ge
  • Patent number: 6758807
    Abstract: An electronic endoscope equipped with an electronic zoom IC circuit that optically scales an object under observation using power scaling lenses and performs electronic power scaling processing on an image obtained by a CCD, wherein the electronic endoscope sets a predetermined depth of field by driving the power scaling lenses with the image optically magnified based on an operation of a variable depth switch and maintains the magnification immediately before this switch operation through electronic power scaling processing. This makes it possible to change a depth of field and observe an image magnified under an equal magnification focused in the depth direction on the monitor. The electronic endoscope can also form a plurality of still images of different depths of field based on an operation of the freeze switch and record optimal still images.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: July 6, 2004
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Itsuji Minami
  • Patent number: 6760114
    Abstract: A support apparatus for an optical wave interferometer reference plate comprises a support member for supporting an outer peripheral face of the reference plate. The support member is bonded to the outer peripheral face of the reference plate at a plurality of positions spaced from each other along the circumferential direction of the outer peripheral face and adapted to deform elastically in a circumferential/diametric direction of the reference plate but less in the optical axis direction of the reference plate than in the circumferential/diametric direction.
    Type: Grant
    Filed: May 29, 2002
    Date of Patent: July 6, 2004
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventors: Toshikazu Akaogi, Hiroshi Shibamoto