Abstract: An exposure apparatus comprises an illumination optical system for irradiating an illuminating light onto a mask having a plurality of patterns for which pattern forming conditions differ from one another, and a projection optical system for projecting images of said plurality of patterns onto a photosensitive substrate, a device for compensating imaging errors of pattern images to be projected onto said substrate, and a control system for controlling the operation of said compensating device in accordance with imaging errors of said plurality of pattern images so that said plurality of pattern images may be projected in specified imaging characteristics.

Abstract: A control device for a motor having a stator that generates traveling vibration waves in an elastic member by the excitation of a piezoelectric member, a rotor pressed to contact with the stator and driven by the traveling vibration waves, and a power supply circuit that generates at least one pair of input alternating voltages which are out of phase for exciting the piezoelectric member, and being driven by the vibration waves, comprises a judgment circuit for judging whether the rotor is in an abnormal operating condition, and an amplifying circuit for increasing the voltage magnitude of a pair of alternating voltages from the power supply circuit to a value greater than a predetermined value exceeding the rated voltage of the motor, in response to the fact that the judgment circuit judges that an abnormal operating condition of the motor is in effect.

Abstract: In a system comprising photographing apparatus for recording photograph information and reproducing apparatus for reproducing the photograph information, control information recorded in the photographing apparatus forces the reproducing apparatus to reproduce photograph information that would otherwise be excluded from reproduction based on consideration of a characteristic of the photograph information.

Abstract: A shake preventing apparatus in a camera, comprises a shake detecting device for detecting an amount of shake upon small motion of the camera, a shake correcting device for correction-driving a photo taking optical system in a direction to keep an image on a plane of a film unshaken, based on the amount of shake detected by the shake detecting device, a shake correction limit determining device for determining a shake correction limit amount which is a limit for the shake correcting device to correct the shake, and a shutter controlling device for controlling a shutter to close when the amount of shake detected by the shake detecting device exceeds the shake correction limit amount determined.

Abstract: A temple tip for a frame of spectacles has a structure in which a portion not touched by the ear is made of the first resin and a portion touched by the ear is made of the second resin having a smaller hardness than the first resin.

Abstract: An electrically driven type microscope may include an interchanging device which interchanges a plurality of objective lenses, a determination device for determining which of the lenses is disposed in an optical path of the microscope, an adjusting system of which adjustment is effected during observation of a sample, a manually settable operating system for drivingly operating the adjusting system, a data recording portion for recording plural sets of manual setting information, each set corresponding to a different objective lens and containing information indicating at least one manual setting of the operating system for the corresponding objective lens, an electrical driving system for driving the adjusting system, and a driving control circuit for controlling the electrical driving system based on information from the set of manual setting information corresponding to an objective lens determined to be in the optical path by the determination device in association with an interchange effected by the inte

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of the using a secondary treatment for hydrogen introduction.

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract: Material handling apparatus shown is a pallet made in one piece from plastic material, having a surface in the form of a ring for supporting a container (not shown), the pallet is arranged in use to provide for discharge of material from a container of flowable (particulate) material, and for stacking and nesting with another similar pallet. The ring is a clamp ring which receives a similar ring of a container which rings can be clamped together by a suitable device to provide a unitary arrangement so that the pallet, or base, and the container can be filled and transported in one location, and discharged at a discharge station. The pallet thus includes the discharge means comprising a conical discharge outlet with a cone valve which can be operated with total containment at a discharge station by use of suitable valves.

Abstract: A projection-exposing apparatus has a mask which has a pattern formed with a pitch P.sub.R, an illuminating optical system for applying illuminating light from a light source to the mask, a projection optical system for projecting an image of the pattern onto a photosensitive substrate, and a deflecting grating member formed with a pitch P.sub.G disposed between the light source and the pattern of the mask for generating diffracted light. The pitch P.sub.G of the deflecting grating member is defined in the relation P.sub.G =2P.sub.R. The diffraction grating member is remote from the pattern on the mask by a distance .DELTA.t, where .DELTA.t .gtoreq.P.sub.G /2NA.sub.IL, NA.sub.IL being the numerical aperture of the illumination optical system.

Abstract: A camera capable of operating in a red-eye prevention mode. The camera has an electronic flash device which is activated by a drive circuit in synchronization with the exposure. The electronic flash device also serve as a pre-light-emission device capable of performing pre-light-emission for the purpose of preventing red-eye effect. When it is judged from the photographing condition that red-eye effect may occur, a controller activates the electronic flash device to effect a pre-light-emission for reducing the size of pupils of eyes of a person to be photographed, before the main flashing which is executed in synchronization with the exposure.

Abstract: A film cartridge is provided with a memory in which information is written manually and/or automatically. When the film cartridge is loaded in a camera, information in the memory may be read and used to control photographic processes in the camera. Certain information may be written in the memory in association with the exposure of each frame of the film. Information may also be written on the film itself. Information stored in the memory may also be used to control processing of exposed film in a photographic laboratory.

Abstract: A camera shake amplitude detecting device comprises a mechanical detector for detecting a shake acceleration when a camera body is shaken, and a mechanical shake calculation device for calculating a shake amplitude of the camera body based on the detection output of the mechanical detector. The mechanical shake calculation device discriminates a time point of change between a positive acceleration and a negative acceleration based on the detection output of the mechanical detector, calculates and integration constant, and calculates a velocity by integrating by time the acceleration detected by the mechanical detector.

Abstract: In order to improve the support rigidity of a steering column in the left to right direction thereof, a spacer made of synthetic resin has portions disposed to be strongly sandwiched between the left and right sides of the steering column and the inner sides of left and right support plate portions of a support bracket for the steering column.

Abstract: An infrared image pickup apparatus includes an infrared ray light source of the lamp bulb type radiating infrared rays including a particular absorption wavelength band in which an object to be detected absorbs light, toward a detection area around the object to be detected, a condensing optical system for condensing the infrared rays from the detection area, and an infrared ray detector for receiving the infrared rays condensed by the condensing optical system and converting them into an electrical signal.

Abstract: A scanning type exposure apparatus includes a mask stage which can move a mask along a predetermined scanning direction; a substrate stage which can move a substrate, onto which a pattern on the mask is to be transferred, along the scanning direction; a fine movement stage which is arranged on one of the mask stage and the substrate stage, and is movable along the scanning direction relative to the one stage; a first measuring device for detecting the position, along the scanning direction, of the fine movement stage; a second measuring device for detecting the position, along the scanning direction, of the other one of the mask stage and the substrate stage; a speed controller for controlling the ratio between the speeds of the mask stage and the substrate stage to a predetermined value while the pattern on the mask is scanning-exposed on the substrate; and a control device for controlling the position of the fine movement stage in accordance with the difference between the position measured by the first mea

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract: An internal focusing zoom lens comprises a first lens group of positive refracting power, a second lens group of negative refracting power, a third lens group of positive refracting power and a fourth lens group of positive refracting power disposed in the named order from the object side, in which at least the first lens group, the third lens group and the fourth lens group move toward an object along the optical axis during zooming from wide angle to telephoto such that an air gap increases between the first lens group and the second lens group, an air gap decreases between the second lens group and the third lens group and an air gap decreases between the third lens group and the fourth lens group, in which the second lens group moves toward the object along the optical axis during focusing, and which satisfies various conditions.

Abstract: A light source apparatus for emitting rectilinear polarized light beams includes a light source unit, a polarizing filter unit for transmitting a first rectilinear polarized component among the light beams emitted from the light source unit but reflecting a second rectilinear polarized component and a light reflecting member for reflecting the second rectilinear polarized component in a direction of the polarizing filter unit and converting a direction of a polarization plane of the reflected second rectilinear polarized component into a direction of a polarization plane of the first rectilinear polarized component.