Abstract: A surface treatment device that ejects a combination of precursor substances as a directed flow of surface treatment particles. Planar objects are conveyed along a defined plane through the particle flow, a region on the surface of the planar object that the particle flow hits forming a region of direct impact. The device comprises directing means for directing the particle flow to travel along the surface of the planar object in an extended impact region outside the region of direct impact; and flow control means for controlling the extent of the extended impact region which may include a vortex flow. The exposure of the treated surface with the particle flow increases and the probability of the desired surface treatment processes to take place increases.

Abstract: The present invention relates to an apparatus, method, a reaction chamber and a use of a reaction chamber for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus includes a vacuum chamber; a detachable reaction chamber arranged to be installed inside the vacuum chamber, and inside which the substrate is positioned during processing and a precursor system for supplying the at least first and second precursors into the action chamber and for discharging the at least first and second precursors from the reaction chamber. According to the present invention the reaction chamber is provided as a gastight vessel.

Abstract: The invention relates to a method and an apparatus for producing a hydrophobic surface on to a material. The invention involves directing at a surface to be structured a particle spray structuring the surface so as to structure the surface, and coating the structured surface with a hydrophobic material. According to the invention, particles larger than a determined size d2 are separated from the particle spray by at least one impaction nozzle, which particles are directed at the surface to be structured such that they collide with the surface to be structured, producing a structure thereon. Next, the structured surface is coated by a gas deposition method in which the structured surface is subjected to alternate surface reactions of starting materials.

Abstract: Disclosed is an apparatus for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus includes at least one nozzle head having two or more two or more precursor zones for subjecting the surface of the substrate to at least the first and second precursors and a moving mechanism for moving the nozzle head in oscillating movement between a first end position and a second end position. The moving mechanism is arranged to store at least part of the kinetic energy of the nozzle head released in oscillating movement of the nozzle head.

Abstract: The invention relates to an arrangement in connection with an ALD reactor comprising a reaction chamber, the arrangement comprising fittings for feeding a reaction gas to the reaction chamber and for suctioning the reaction gas back, and fittings for feeding a barrier gas. The fittings for feeding and suctioning back the reaction gas and for feeding the barrier gas comprise a middle element having multiple parallel channels which extend through the element, and a first and a second flow-reversing element arranged at ends of the middle element into which the channels open, the flow-reversing elements being arranged to combine the channels in the middle element so as to provide an interchannel flow.

Abstract: The energy saving glass comprises a substantially mutually parallel first surface and second surface, and the glass mass of the energy saving glass contains a solar radiation energy absorbing agent. The solar radiation energy absorbing agent is present in a layer of the glass mass which is close to the first surface, in which layer the concentration of the radiation energy absorbing agent substantially decreases when proceeding from the first surface deeper into the glass mass, such that the absorbing agent is present at the depth of at least 0.1 micrometres and not more than 100 micrometres as measured from the first surface of the glass. In the method, a layer of particulates is grown on the first surface of the glass, which particulates include at least one element or compound of the elements and diffuse and/or dissolve into the surface layer of the glass.

Abstract: The invention relates to an apparatus for producing nanotubes, the apparatus being adapted to produce doped and/or undoped single-walled or multi-walled nanotubes, the apparatus comprising at least a thermal reactor. In accordance with the invention, the reactor is at least of the hottest part thereof and at least partly manufactured from a material that is at least partly sublimed into the thermal reactor as a result of the thermal reactor being heated, and the sublimed material at least partly participates in the growth of the nanotubes.

Abstract: The invention is related to an apparatus and a method for processing a surface of a substrate by exposing the surface of the substrate to alternating surface reactions of at least a first starting material and a second starting material according to the principles of atomic layer deposition method. According to the invention a first starting material is fed on the surface of the substrate locally by means of a source by moving the source in relation to the substrate, and the surface of the substrate processed with the first starting material is exposed to a second starting material present in the atmosphere surrounding the source.

Abstract: A method and apparatus for coating a substrate using one or more liquid starting materials. The substrate is coated by atomizing one or more liquid starting materials into droplets and vaporizing the droplets in a deposition chamber for before the starting materials react on the surface of the substrate. The droplets are guided towards the substrate with electrical forces before the droplets are vaporized.

Abstract: Described herein is an apparatus and nozzle head for coating a surface of a substrate. The apparatus comprising a process chamber having inside a gas atmosphere, a nozzle head arranged inside the process chamber, precursor supply and discharge means. The nozzle head including one or more first precursor nozzles for subjecting the surface of the substrate to the first precursor, one or more second precursor nozzles for subjecting the surface of the substrate to the second precursor and one or more purge gas channels between the first and second precursor zones. In certain aspects, the purge gas channel is at least partly open to the gas atmosphere comprising purge gas for subjecting the surface of the substrate to purge gas.

Abstract: A decorative coating and a method for forming a decorative coating on a gemstone to change the natural visual appearance of the gemstone. The decorative coating comprises an optically absorbing film. Depositing the absorbing film on the substrate comprises the alternating steps of introducing a first precursor to the reaction space such that at least a portion of the first precursor gets adsorbed onto the surface of the substrate, and subsequently purging the reaction space, and introducing a second precursor to the reaction space such that at least a portion of the second precursor reacts with the portion of the first precursor adsorbed onto the surface of the substrate to form a conformal absorbing film on the substrate comprising the gemstone, and subsequently purging the reaction space. The material of the absorbing film is selected from the group of oxides, carbides, noble metals or a mixture thereof.

Abstract: An apparatus and method for coating a substrate using one or more liquid raw materials, includes: at least one atomizer for atomizing the one or more liquid raw materials into droplets, charging means for electrically charging the droplets during or after the atomization and a deposition chamber in which the droplets are deposited on the substrate, the deposition chamber being provided with one or more electric fields for guiding the electrically charged droplets on the substrate. According to the invention there is a charging chamber arranged upstream of the deposition chamber and provided with charging means for electrically charging the droplets.

Abstract: An apparatus and method for electrically charging nanoparticles. The invention including atomizing one or more liquid starting materials into droplets, electrically charging the droplets during or after the atomization and vaporizing the one or more liquid materials of the droplets for generating the nanoparticles from the liquid droplets such that the electrical charge of the droplets is transferred into the nanoparticles for producing electrically charged nanoparticles.

Abstract: A deposit and a method for producing a deposit on a surface of a silicon substrate. The deposit comprises aluminum oxide, and the method comprises in any order the alternating steps of a) introducing into a reaction space one of water and ozone as a precursor for oxygen, b) introducing into a reaction space the other of water and ozone as a precursor for oxygen, c) introducing into a reaction space a precursor for aluminum and subsequently purging the reaction space;with the provisions that when step a) or step b) precedes step c) then the reaction space is purged before step c), and that the reaction space is not purged between step a) and step b), when step a) precedes step b) or when step b) precedes step a).

Abstract: A coating process and apparatus; the apparatus including a unit for forming a mixture that includes at least one precursor of a surface reaction, a unit for atomizing the mixture into droplets, a unit for transporting the droplets of mixture towards a surface of a substrate to be coated with the surface reaction. The unit for forming a mixture are adjusted to mix to the mixture a liquid carrier substance, which is not a precursor of the surface reaction, and the boiling point of which in the defined process space is lower than the boiling point of the precursor of the surface reaction. The proposed arrangement improves both speed and quality of the coating process.

Abstract: A source for feeding one or more gaseous precursors onto a surface of a substrate and an arrangement for processing the substrate by way of subjecting the surface of the substrate to alternately repetitive surface reactions of the precursors, the source including a gas feed member for feeding at least one or more precursors onto the surface of the substrate. The gas feed member is adapted rotatable about a rotation axis, the rotation axis being arranged to extend substantially parallel to the surface of the substrate.

Abstract: The present invention relates to a method for enhancing uniformity of metal oxide coatings formed by Atomic Layer Deposition (ALD) or ALD-type processes. Layers are formed using alternating pulses of metal halide and oxygen-containing precursors, preferably water, and purging when necessary. An introduction of modificator pulses following the pulses of the oxygen-containing precursor affects positively on layer uniformity, which commonly exhibits gradients, particularly in applications with closely arranged substrates. In particular, improvement in layer thickness uniformity is obtained. According to the invention, alcohols having one to three carbon atoms can be used as the modificator.

Abstract: A moisture barrier, device or product having a moisture barrier or a method of fabricating a moisture barrier having at least a polymer layer, and interfacial layer, and a barrier layer. The polymer layer may be fabricated from any suitable polymer including, but not limited to, fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), or ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed by atomic layer deposition (ALD). In embodiments featuring an ALD interfacial layer, the deposited interfacial substance may be, but is not limited to, Al2O3, AlSiOx, TiO2, and an Al2O3/TiO2 laminate. The barrier layer associated with the interfacial layer may be deposited by plasma enhanced chemical vapor deposition (PECVD). The barrier layer may be a SiOxNy film.

Abstract: A thin film photovoltaic cell (10) comprises an n-type semiconductor window layer (40), a p-type semiconductor absorption layer (5) and a pn-junction (6) at the interface between these two layers, wherein the p-type semiconductor absorption layer is formed of cadmium telluride CdTe. According to the present invention, the n-type semiconductor window layer (40) comprises zinc oxide/sulfide Zn (O,S).

Abstract: Process for producing a solar cell substrate, where metal particles are deposited on the surface of substrate. Metal particles are produced by liquid flame spraying method in such a way that the mean diameter of the particles to be between 30 nm and 150 nm and the deposition process is controlled in such a way that the average distance between particles is not more than four times the mean diameter of particles. Apparatus for carrying out such process.