Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an impedance matching circuit, a first power supply connected to the balun via the impedance matching circuit, and configured to supply a high frequency to the first electrode via the impedance matching circuit and the balun, a low-pass filter, and a second power supply configured to supply a voltage to the first electrode via the low-pass filter.

Abstract: An inspection apparatus for inspecting an inspection target object, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection target object, and a plurality of X-ray detectors, wherein each of the plurality of X-ray detectors detects X-rays emitted from a foreign substance existing on an inspection target surface of the inspection target object irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.

Abstract: An X-ray imaging apparatus includes an X-ray generation apparatus including an X-ray generation tube having an electron gun and a target configured to receive an electron beam from the electron gun to generate X-rays, a support structure supporting the tube, and a deflector configured to deflect the electron beam, an X-ray detector configured to detect the X-rays from the X-ray generation apparatus, and a control apparatus configured to control the X-ray generation apparatus. The support structure supports the tube to permit at least the target to be pivoted in a state in which the deflector is fixed, and the control apparatus determines, based on use amount of the X-ray generation apparatus and/or change of the X-rays generated by the X-ray generation apparatus, whether it is necessary to pivot the target.

Abstract: An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.

Abstract: An electric component includes an electric circuit and a metal container covering the electric circuit. The metal container includes a side wall portion surrounding the electric circuit, and a closing portion forming an end surface of the metal container while covering an end portion of the side wall portion. An exposed surface of an outer peripheral portion of the closing portion exposed to an outside of the metal container has a roundness in a section perpendicular to the end surface.

Abstract: An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector has an energy resolution not less than 1 keV or the X-ray detector has no energy analysis function.

Abstract: Substrates that are bonding targets are bonded in ambient atmosphere via bonding films, including oxides, formed on bonding faces of the substrates. The bonding films, which are metal or semiconductor thin films formed by vacuum film deposition and at least the surfaces of which are oxidized, are formed into the respective smooth faces of two substrates having the smooth faces that serve as the bonding faces. The bonding films are exposed to a space that contains moisture, and the two substrates are overlapped in the ambient atmosphere such that the surfaces of the bonding films are made to be hydrophilic and the surfaces of the bonding films contact one another. Through this, a chemical bond is generated at the bonded interface, and thereby the two substrates are bonded together in the ambient atmosphere. The bonding strength ? can be improved by heating the bonded substrates at a temperature.

Abstract: A sputtering apparatus includes a first target holder configured to hold a first target such that a first surface of the first target faces the processing space, and a second target holder configured to hold a second target such that a second surface of the second target faces the processing space, wherein the first target holder holds the first target such that an orthogonal projection vector of a first normal vector, which is a normal vector of the first surface, with respect to a virtual plane including the substrate holding surface is directed to a direction away from the substrate, and the second target holder holds the second target such that an orthogonal projection vector of a second normal vector, which is a normal vector of the second surface, with respect to the virtual plane is directed to a direction away from the substrate.

Abstract: A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

Abstract: A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

Abstract: An X-ray generating apparatus includes an electron gun, a target configured to generate X-rays by being irradiated with an electron beam emitted from the electron gun, and a controller configured to control a first mode for thinning the target by irradiating the target with an electron beam with a current adjusted within a first current range and a second mode for generating X-rays by irradiating the target with an electron beam with a current adjusted within a second current range. The first current range has a lower limit larger than an upper limit of the second current range.

Abstract: An ion gun according to one embodiment of the present invention has an anode, a cathode having a first portion and a second portion that face the anode, and a magnet that creates a spatial magnetic field between the first portion and the second portion. An annular gap including a curved portion is provided between the first portion and the second portion of the cathode. The magnet creates lines of magnetic field having the bottom inside with respect to the sectional center line of the gap between the first portion and the second portion of the curved portion.

Abstract: An inspection apparatus for inspecting an inspection target object, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection target object, and a plurality of X-ray detectors, wherein each of the plurality of X-ray detectors detects X-rays emitted from a foreign substance existing on an inspection target surface of the inspection target object irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.

Abstract: An inspection apparatus for inspecting an inspection target object, includes an X-ray generation tube having a target including an X ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to an inspection target surface of the inspection target object, an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X ray generation portion and totally reflected by the inspection target surface, and an adjustment mechanism configured to adjust a relative position between the inspection target surface and the X-ray detector.

Abstract: An X-ray generating apparatus includes an electron gun, a target configured to generate X-rays by being irradiated with an electron beam emitted from the electron gun, and a controller configured to control a first mode for thinning the target by irradiating the target with an electron beam with a current adjusted within a first current range and a second mode for generating X-rays by irradiating the target with an electron beam with a current adjusted within a second current range. The first current range has a lower limit larger than an upper limit of the second current range.

Abstract: An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector has an energy resolution not less than 1 keV or the X-ray detector has no energy analysis function.

Abstract: An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.

Abstract: An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane, and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector includes a long X-ray receiver.

Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.

Abstract: A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.