Patents Assigned to Chi Mei Corporation
  • Liquid crystal alignment agent, and liquid crystal alignment film and liquid crystal display element formed from the liquid crystal alignment agent
    Patent number: 8673177
    Abstract: A liquid crystal alignment agent includes a polymer and an organic solvent for dissolving the polymer. The polymer is obtained by subjecting a diamine composition and a tetracarboxylic dianhydride compound to a polymerization reaction. The diamine composition includes a first diamine compound, a second diamine compound, and a third diamine compound as defined in the specification. A liquid crystal alignment film formed from the liquid crystal alignment agent and a liquid crystal display element including the liquid crystal alignment film are also disclosed.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: March 18, 2014
    Assignee: Chi Mei Corporation
    Inventor: Tsung-Pei Tsai
  • Modified high cis conjugated diene copolymer and manufacturing method of the same
    Patent number: 8674030
    Abstract: A modified conjugated diene polymer and a manufacturing method for the same are provided. The modified conjugated diene polymer is manufactured by the method including, forming a conjugated diene polymer by a polymerization step and making it react with a first modifier and then react with a second modifier. The modified conjugated diene polymer has over 97% of cis-1,4 structure. A PDI of the modified conjugated diene polymer is bigger than 1.8 and smaller than 2.5. The first modifier has a chemical formula of X—R1-Si(R2)3. The second modifier has a chemical formula of R3-Si(R4)3.
    Type: Grant
    Filed: November 6, 2012
    Date of Patent: March 18, 2014
    Assignee: Chi Mei Corporation
    Inventors: Chih-Cheng Lee, Kuei-Lun Cheng
  • POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME
    Publication number: 20140065526
    Abstract: The present invention relates to a positive photosensitive resin composition and a method for forming patterns by using the same. The positive photosensitive resin composition includes a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B), a dye (C) and a solvent (D). The novolac resin (A) further includes hydroxy-type novolac resin (A-1), which is synthesized by condensing hydroxylbenzaldehyde compound with aromatic hydroxyl compound. The dye (C) includes at least one (C-1) selected from the group consisting of diazo dye, anthraquinone dye and chromium (III, Cr3+) azo dye, as well as triarylmethane dye (C-2). Since the positive photosensitive resin composition can form colorfully fine patterns on metal circuits, and such patterns are not decolored after being etched, thereby beneficially blocking the reflected light of the metal circuits.
    Type: Application
    Filed: August 20, 2013
    Publication date: March 6, 2014
    Applicant: CHI MEI CORPORATION
    Inventors: Kai-Min CHEN, Chun-An SHIH
  • LIGHT GUIDE PLATE, LIGHT-EMITTING UNIT AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE SAME
    Publication number: 20140049728
    Abstract: The present invention relates to a light guide plate, a light-emitting unit having the light guide plate and a liquid crystal display device having the light-emitting unit. The light guide plate includes a light guide layer that has dot patterns. The dot patterns are formed by coating and drying a pattern-forming ink composition on a bottom surface. The pattern-forming ink composition includes an acrylate-based resin having a saturated alicyclic group (A) and a solvent (B). By utilizing the aforementioned light guide plate, the liquid crystal display device with low color difference can be fabricated.
    Type: Application
    Filed: August 5, 2013
    Publication date: February 20, 2014
    Applicant: CHI MEI CORPORATION
    Inventors: Chih-Hung LIN, Chia-Hui YU
  • PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF
    Publication number: 20140051017
    Abstract: The present invention relates to a photosensitive resin composition, which comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photoinitiator (C), ortho-naphthoquinone diazide sulfonic acid ester (D), a thermal initiator (E) and a solvent (F). The photosensitive resin composition added with the ortho-naphthoquinone diazide sulfonic acid ester (D) and the thermal initiator (E) can have excellent resolution and development adherence. Moreover, the present invention further provides a spacer or a protective film formed by the aforementioned photosensitive resin composition, as well as a liquid crystal display device (LCD) including the aforementioned spacer or protective film.
    Type: Application
    Filed: August 1, 2013
    Publication date: February 20, 2014
    Applicant: CHI MEI CORPORATION
    Inventors: I-Chun HSIEH, Hao-Wei LIAO
  • Color liquid crystal display device comprising a red filter segment having a red pigment combination wherein the weight ratio of an azo-based red pigment and an anthraquinone-based red pigment ranges from 20/80 to 80/20
    Patent number: 8654285
    Abstract: A color liquid crystal display device includes a liquid crystal display element and a backlight unit. The liquid crystal display element includes a color filter having a red filter segment, a green filter segment, and a blue filter segment. The red filter segment is prepared from a red photosensitive resin composition which includes a pigment combination, an alkali-soluble resin, a compound having an ethylenic group, and a photoinitiator. The pigment combination includes an azo-based red pigment and an anthraquinone-based red pigment. A weight ratio of the azo-based red pigment to the anthraquinone-based red pigment ranges from 20/80 to 80/20. The backlight unit is coupled to the liquid crystal display element and has a color temperature ranging from 6,000 K to 20,000 K.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: February 18, 2014
    Assignee: Chi Mei Corporation
    Inventors: Bo-Hsuan Lin, Jung-Pin Hsu, Chung-En Cheng, Duan-Chih Wang
  • MANUFACTURING METHOD OF LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL ALIGNMENT ELEMENT
    Publication number: 20140017398
    Abstract: The present invention provides a free radical polymerizable liquid crystal alignment agent having superior coating ability, a manufacturing method, which comprises the process of coating the liquid crystal alignment agent onto a substrate, and processing the liquid crystal alignment agent with dehydration/ring-closure reaction and free radical polymerization, enables obtaining a liquid crystal alignment film with superior reliability, superior voltage holding ratio and easy control of pretilt angle, and enables the manufacture of a liquid crystal display element provided with a liquid crystal alignment film. The free radical polymerizable liquid crystal alignment agent comprises a molecular compound containing at least 2 polymerizable maleamic acid groups and an organic solvent.
    Type: Application
    Filed: September 17, 2013
    Publication date: January 16, 2014
    Applicant: Chi Mei Corporation
    Inventor: Huai-Pin Hsueh
  • Polysiloxane-grafted polyimide resin composition and flexible substrate made therefrom
    Patent number: 8618236
    Abstract: A polysiloxane-grafted polyimide resin composition includes a polysiloxane-grafted polyimide resin, and a solvent. The polysiloxane-grafted polyimide resin is represented by Formula (I): wherein W represents a tetravalent organic group, R represents a trivalent organic group, and X1 and X2 independently represent a polysiloxane-containing group.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: December 31, 2013
    Assignee: Chi Mei Corporation
    Inventors: Yu-Hao Liang, Li-Tao Hsu, Huai-Pin Hsueh
  • Compatibilizer and blend polymer composition including the same
    Patent number: 8598272
    Abstract: A blend polymer composition includes a styrene-based polymer, a non-styrene-based polymer, and a compatibilizer having a block copolymer. The block copolymer includes: a first block including a first monomer unit having an epoxy group, and a second monomer unit selected from an acrylate-based monomer unit, a methacrylate-based monomer unit, and a combination thereof; and a second block including a styrene-based monomer unit. The block copolymer has an epoxy equivalent ranging from 1000 g/eq to 20000 g/eq and a molecular weight distribution index ranging from 1.0 to 2.0.
    Type: Grant
    Filed: January 5, 2011
    Date of Patent: December 3, 2013
    Assignee: Chi Mei Corporation
    Inventors: Jui-Hsi Hsu, Ming-Chou Kao
  • POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF
    Publication number: 20130306970
    Abstract: The invention relates to a positive photosensitive resin composition without color off after etching. The invention also provides a method for manufacturing a thin-film transistor array substrate, a thin-film transistor array substrate and a liquid crystal display device.
    Type: Application
    Filed: May 9, 2013
    Publication date: November 21, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: KAI-MIN CHEN, CHUN-AN SHIH
  • PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF
    Publication number: 20130310497
    Abstract: A photo-curing polysiloxane composition for forming a protective film having superior chemical resistance and development resistance is disclosed. The photo-curing polysiloxane composition includes: a polysiloxane component including at least one polysiloxane having at least one alkenyl group; a quinonediazide compound; a fluorene derivative component including at least one fluorene derivative compound having at least one double-bond-containing group; and a solvent.
    Type: Application
    Filed: May 2, 2013
    Publication date: November 21, 2013
    Applicant: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL ALIGNMENT ELEMENT USING THE SAME
    Publication number: 20130310572
    Abstract: The present invention provides a free radical polymerizable liquid crystal alignment agent having superior coating ability, a manufacturing method, which comprises the process of coating the liquid crystal alignment agent onto a substrate, and processing the liquid crystal alignment agent with dehydration/ring-closure reaction and free radical polymerization, enables obtaining a liquid crystal alignment film with superior reliability, superior voltage holding ratio and easy control of pretilt angle, and enables the manufacture of a liquid crystal display element provided with a liquid crystal alignment film. The free radical polymerizable liquid crystal alignment agent comprises a molecular compound containing at least 2 polymerizable maleamic acid groups and an organic solvent.
    Type: Application
    Filed: July 29, 2013
    Publication date: November 21, 2013
    Applicant: Chi Mei Corporation
    Inventor: Huai-Pin Hsueh
  • PHOTOSENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND USES THEREOF
    Publication number: 20130299755
    Abstract: The invention relates to a photosensitive resin composition, and it has the advantages of a high development speed and good compatibility. The invention also provides a method for manufacturing a color filter, color filter and liquid crystal display device.
    Type: Application
    Filed: May 6, 2013
    Publication date: November 14, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: BAR-YUAN HSIEH, JUNG-PIN HSU, BO-HSUAN LIN
  • PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF
    Publication number: 20130280541
    Abstract: Disclosed is a photo-curing polysiloxane composition including: a polysiloxane; a quinonediazidesulfonic acid ester; and a pyridine derivative of Formula (II) wherein one to three of R1-R5 independently represent a hydroxyl-substituted C1-C6 alkyl group, and the rest of R1-R5 independently represent hydrogen or a C1-C6 alkyl group.
    Type: Application
    Filed: April 11, 2013
    Publication date: October 24, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Ming-Ju Wu, Chun-An Shih
  • PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS OF THE SAME
    Publication number: 20130277627
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a solvent, (F) a black pigment, and (G) a metal chelate. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization.
    Type: Application
    Filed: March 13, 2013
    Publication date: October 24, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • LIQUID CRYSTAL ALIGNMENT AGENT, AND LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT FORMED FROM THE LIQUID CRYSTAL ALIGNMENT AGENT
    Publication number: 20130281618
    Abstract: A liquid crystal alignment agent including a polymer composition and a solvent. The polymer composition is obtained by subjecting a mixture including a tetracarboxylic dianhydride component, a multi-amine component of formula (I) defined herein, and a diamine component to a reaction. The diamine component includes a diamine compound of formula (II) defined herein.
    Type: Application
    Filed: February 26, 2013
    Publication date: October 24, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Tsung-Pei Tsai, Huai-Pin Hsueh
  • POLYSILOXANE-GRAFTED POLYIMIDE RESIN COMPOSITION AND FLEXIBLE SUBSTRATE MADE THEFEFROM
    Publication number: 20130267651
    Abstract: A polysiloxane-grafted polyimide resin composition includes a polysiloxane-grafted polyimide resin, and a solvent. The polysiloxane-grafted polyimide resin is represented by Formula (I): wherein W represents a tetravalent organic group, R represents a trivalent organic group, and X1 and X2 independently represent a polysiloxane-containing group.
    Type: Application
    Filed: December 21, 2012
    Publication date: October 10, 2013
    Applicant: CHI MEI CORPORATION
    Inventor: CHI MEI CORPORATION
  • PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF
    Publication number: 20130260108
    Abstract: A photo-curing polysiloxane composition includes a polysiloxane, a quinonediazidesulfonic acid ester, a fluorene-containing compound, and a solvent. The polysiloxane is obtained by subjecting a silane monomer component to condensation. A protective film formed from the photo-curing polysiloxane composition, and an element containing the protective film, are also discussed.
    Type: Application
    Filed: March 11, 2013
    Publication date: October 3, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Photo-curing polysiloxane composition and protective film formed from the same
    Patent number: 8546061
    Abstract: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains 25 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 10,000 to 80,000 based on a total weight of the polysiloxane when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 400 and 100,000 measured by gel permeation chromatography. The amount of oligomers in the polysiloxane having a molecular weight less than 800 is from 0 wt % to 10 wt % based on a total weight of the photo-curing polysiloxane composition. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.
    Type: Grant
    Filed: November 8, 2011
    Date of Patent: October 1, 2013
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE
    Publication number: 20130244177
    Abstract: A photosensitive resin composition is provided, which comprises an alkali-soluble resin (A), a polysiloxane polymer (B), a compound containing vinyl unsaturated group(s) (C), a photoinitiator (D), a solvent (E), a black pigment (F) and a light stabilizer (G). The alkali-soluble resin (A) includes a resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy compound having at least two epoxy groups (a-1) with a compound having at least one vinyl unsaturated group and carboxyl group (a-2). The light stabilizer (G) includes a UV absorber (G-1) and/or a hindered amine (G-2). Therefore, the photosensitive resin composition has an excellent temporal stability, and a black matrix formed by such composition has a better heat resistance.
    Type: Application
    Filed: March 8, 2013
    Publication date: September 19, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao