Patents Assigned to Chi Mei Corporation
  • Patent number: 9062195
    Abstract: The present invention relates to a red photosensitive resin composition for a color filter and an application of the same. The red photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a cationic polymerized compound (C), a cationic photo-initiator (D) and an organic solvent (E). The pigment (A) includes a first pigment (A-1), and the first pigment (A-1) is a brominated-diketo-pyrrolo-pyrrole pigment. The aforementioned red photosensitive resin composition is advantageously applied for the color filter with better brightness, contrast, temporal stability of sensitivity and development resistance.
    Type: Grant
    Filed: May 6, 2014
    Date of Patent: June 23, 2015
    Assignee: CHI MEI CORPORATION
    Inventor: Wei-Kai Ho
  • Patent number: 9063419
    Abstract: Disclosed is a photosensitive polysiloxane composition including: a polysiloxane; a quinonediazidesulfonic acid ester; a pyridine derivative of Formula (II) wherein one to three of R1-R5 independently represent a hydroxyl-substituted C1-C6 alkyl group, and the rest of R1-R5 independently represent hydrogen or a C1-C6 alkyl group; and a solvent.
    Type: Grant
    Filed: April 11, 2013
    Date of Patent: June 23, 2015
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Patent number: 9063412
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a first solvent, and (F) a black pigment dispersion. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the black pigment dispersion (F) to the polysiloxane (B) ranges from 5 to 35. Application of the photosensitive resin composition is also disclosed.
    Type: Grant
    Filed: February 4, 2013
    Date of Patent: June 23, 2015
    Assignee: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih
  • Patent number: 9057006
    Abstract: The invention relates to a photo-curing and strippable adhesion composition, and it has the advantage of good reworkability and weatherability. The invention also provides a strippable material and method for manufacturing the same and an electronic component and method for manufacturing the same.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: June 16, 2015
    Assignee: CHI MEI CORPORATION
    Inventor: Kuang-Chieh Li
  • Patent number: 9056526
    Abstract: Provided is a polymerization method of a modified copolymer of conjugated diene and vinyl aromatic hydrocarbon. A multi-functional vinyl benzene-based compound is reacted with an organic alkali metal compound to form a star shaped compound with multiple active sites. A conjugated diene monomer, a vinyl aromatic hydrocarbon monomer, and the star shaped compound with multiple active sites are reacted with each other to form a copolymer of conjugated diene and vinyl aromatic hydrocarbon. The copolymer of conjugated diene and vinyl aromatic hydrocarbon is then reacted with a modifier to form the modified copolymer of conjugated diene and vinyl aromatic hydrocarbon. The modifier is represented by formula 1, wherein R1 is a C2-C4 alkylene group; R2 is a group at least consisting of a C2-C4 alkylene group and a C1-C3 alkoxy group; m is an integer of 5 to 30; and n is an integer of 5 to 35.
    Type: Grant
    Filed: August 7, 2013
    Date of Patent: June 16, 2015
    Assignee: Chi Mei Corporation
    Inventors: Kuan-Lin Hsieh, Kuei-Lun Cheng, Chih-Cheng Lee
  • Patent number: 9029051
    Abstract: A photosensitive resin composition is provided, which comprises an alkali-soluble resin (A), a polysiloxane polymer (B), a compound containing vinyl unsaturated group(s) (C), a photoinitiator (D), a solvent (E), a black pigment (F) and a light stabilizer (G). The alkali-soluble resin (A) includes a resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy compound having at least two epoxy groups (a-1) with a compound having at least one vinyl unsaturated group and carboxyl group (a-2). The light stabilizer (G) includes a UV absorber (G-1) and/or a hindered amine (G-2). Therefore, the photosensitive resin composition has an excellent temporal stability, and a black matrix formed by such composition has a better heat resistance.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: May 12, 2015
    Assignee: Chi Mei Corporation
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • Patent number: 9029052
    Abstract: A photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a pigment, an alkali-soluble resin, a compound containing an ethylenically unsaturated group, a photoinitiator, and an organic solvent. The photosensitive resin composition has the advantages of high contrast, low post-baking color difference, and good linearity of high precision pattern.
    Type: Grant
    Filed: November 26, 2014
    Date of Patent: May 12, 2015
    Assignee: Chi Mei Corporation
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9023589
    Abstract: A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule; and a solvent. A protective film which is formed from the photosensitive resin composition and an element which includes the protective film are also provided.
    Type: Grant
    Filed: September 16, 2013
    Date of Patent: May 5, 2015
    Assignee: Chi Mei Corporation
    Inventors: Kai-Min Chen, Chun-An Shih
  • Patent number: 8980506
    Abstract: The present invention relates to a photosensitive resin composition, which comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photoinitiator (C), ortho-naphthoquinone diazide sulfonic acid ester (D), a thermal initiator (E) and a solvent (F). The photosensitive resin composition added with the ortho-naphthoquinone diazide sulfonic acid ester (D) and the thermal initiator (E) can have excellent resolution and development adherence. Moreover, the present invention further provides a spacer or a protective film formed by the aforementioned photosensitive resin composition, as well as a liquid crystal display device (LCD) including the aforementioned spacer or protective film.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: March 17, 2015
    Assignee: Chi Mei Corporation
    Inventors: I-Chun Hsieh, Hao-Wei Liao
  • Patent number: 8962739
    Abstract: A liquid crystal alignment agent includes a polyamic acid dispersion and a polyimide dispersion. Viscosity of the polyamic acid dispersion and viscosity of the polyimide dispersion satisfy the following relationship: VA-2?VA-1?4 cps wherein VA-2 is viscosity of the polyimide dispersion measured at a solid content of 6 wt % at a temperature of 25° C., and VA-1 is viscosity of the polyamic acid dispersion measured at a solid content of 6 wt % at a temperature of 25° C. A liquid crystal alignment film formed from the liquid crystal alignment agent and a liquid crystal display element including the liquid crystal alignment film are also disclosed.
    Type: Grant
    Filed: May 9, 2012
    Date of Patent: February 24, 2015
    Assignee: Chi Mei Corporation
    Inventor: Yu-Hao Liang
  • Patent number: 8936891
    Abstract: The invention relates to a photosensitive polysiloxane composition that has good thermal transmittance, good chemical resistance and good sensitivity and good refractivity. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: January 20, 2015
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Patent number: 8921024
    Abstract: A photosensitive polysiloxane composition for forming a protective film having superior sensitivity is disclosed. A protective film formed from the photosensitive polysiloxane composition and an element including the protective film are also disclosed. The photosensitive polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonic acid ester, a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule, and a solvent.
    Type: Grant
    Filed: December 6, 2013
    Date of Patent: December 30, 2014
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Patent number: 8907023
    Abstract: The present invention relates to a polysiloxane compound having a structure represented by formula 1: wherein each of F1, F2, F3 and F4 is individually selected from one of a first group, a second group, a third group and a fourth group, the first group is selected from a C2˜C10 hydrocarbon group having amino group(s), a C2˜C10 hydrocarbon group having epoxy group(s), a C2˜C10 hydrocarbon group having carbonyl group(s) or a C2˜C10 hydrocarbon group having alkoxy group(s), the second group is a C2˜C10 hydrocarbon group having amino group(s), the third group is selected from a C2˜C10 hydrocarbon group having epoxy group(s), a C2˜C10 hydrocarbon group having carbonyl group(s), a C2˜C10 hydrocarbon group having SiCl group(s) or a C2˜C10 hydrocarbon group having alkoxy group(s), the fourth group is selected from a C2˜C10 hydrocarbon group having aryl group(s) or a C2˜C10 hydrocarbon group having alkoxy group(s).
    Type: Grant
    Filed: August 7, 2013
    Date of Patent: December 9, 2014
    Assignee: Chi Mei Corporation
    Inventors: Kuan-Lin Hsieh, Kuei-Lun Cheng, Chih-Cheng Lee
  • Publication number: 20140356786
    Abstract: The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B); a photoinitiator (C); a solvent (D); and an organic acid (E). The alkali-soluble resin (A) comprises a resin having an unsaturated group (A-1) synthesized by polymerizing a mixture, and the mixture comprises an epoxy compound having at least two epoxy groups (i) and a compound having at least one carboxyl group and at least one vinyl unsaturated group (ii). A molecular weight of said organic acid (E) is below 1000.
    Type: Application
    Filed: May 19, 2014
    Publication date: December 4, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: LI-TING HSIEH
  • Publication number: 20140350179
    Abstract: The present invention relates to a liquid crystal alignment agent, a liquid crystal alignment film made by the liquid crystal alignment agent and a liquid crystal display element having the liquid crystal alignment film. The liquid crystal alignment agent includes a polymer composition (A) and a solvent (B). The polymer composition (A) is synthesized by reacting a mixture that includes a tetracarboxylic dianhydride component (a) and a diamine component (b). The aforementioned liquid crystal alignment agent has a better long-term printability.
    Type: Application
    Filed: May 1, 2014
    Publication date: November 27, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: Tsung-Pei TSAI
  • Publication number: 20140346416
    Abstract: The invention relates to a blue photosensitive resin composition, and it has the advantage of good developing-resistance, good ageing stability of sensitivity and good contrast. The invention also provides a method for producing a color filter, a color filter and a liquid crystal display device.
    Type: Application
    Filed: May 19, 2014
    Publication date: November 27, 2014
    Applicant: CHI MEI CORPORATION
    Inventors: JUNG-PIN HSU, DUAN-CHIH WANG
  • Patent number: 8895665
    Abstract: Provided is a synthesis method of a modified conjugated diene polymer. Conjugated diene monomers are reacted in a reaction system. A modifier is added into the reaction system while the reaction proceeds to a predetermined extent. The modifier has a structure represented by formula (1): wherein R1-R11 each independently represent a C1-C5 alkyl group; 1?m?300; 0?a?65; 0?b?65; 0?c?40; 0<a+b; 0?c/(a+b+c)?0.8; the X and Y are structures respectively represented by formula (2) and formula (3): wherein R12, R16, and R17 each independently represent a C1-C5 alkylene group and R13-R15 each independently represent a C1-C5 alkyl group.
    Type: Grant
    Filed: June 25, 2013
    Date of Patent: November 25, 2014
    Assignee: Chi Mei Corporation
    Inventors: Chih-Cheng Lee, Kuei-Lun Cheng, Chen-Pao Huang, Kuan-Lin Hsieh
  • Publication number: 20140343185
    Abstract: The present invention relates to a red photosensitive resin composition for a color filter and an application of the same. The red photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a cationic polymerized compound (C), a cationic photo-initiator (D) and an organic solvent (E). The pigment (A) includes a first pigment (A-1), and the first pigment (A-1) is a brominated-diketo-pyrrolo-pyrrole pigment. The aforementioned red photosensitive resin composition is advantageously applied for the color filter with better brightness, contrast, temporal stability of sensitivity and development to resistance.
    Type: Application
    Filed: May 6, 2014
    Publication date: November 20, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: Wei-Kai HO
  • Publication number: 20140335352
    Abstract: The invention relates to a photo-curing and strippable adhesion composition, and it has the advantage of good reworkability and weatherability. The invention also provides a strippable material and method for manufacturing the same and an electronic component and method for manufacturing the same.
    Type: Application
    Filed: April 30, 2014
    Publication date: November 13, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: KUANG-CHIEH LI
  • Publication number: 20140326929
    Abstract: A conductive paste is provided, which includes 3 wt % to 20 wt % of epoxy resin, 10 wt % to 25 wt % of solvent, 0.3 wt % to 5 wt % of latent curing agent, 3.5 wt % to 35 wt % of flaky metal powder surface-treated by saturated fatty acid, and 35 wt % to 75 wt % of flaky metal powder surface-treated by unsaturated fatty acid.
    Type: Application
    Filed: March 20, 2014
    Publication date: November 6, 2014
    Applicant: Chi Mei Corporation
    Inventors: Chan-Li Hsueh, Chung-Ping Li, Chu-Yun Cheng