Patents Assigned to Chi Mei Corporation
  • Publication number: 20140329941
    Abstract: The present invention relates to a liquid crystal alignment agent, a liquid crystal alignment film made by the liquid crystal alignment agent and a liquid crystal display element having the liquid crystal alignment film. The liquid crystal alignment agent comprises a polymer (A) and a solvent (B). The polymer (A) is obtained by reacting a mixture that includes a tetracarboxylic dianhydride component (a) and a diamine component (b). The aforementioned liquid crystal alignment agent has excellent process stability and the charge accumulation can be rapidly relaxed.
    Type: Application
    Filed: April 17, 2014
    Publication date: November 6, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: Wei-Lun CHANG
  • Publication number: 20140322651
    Abstract: A photosensitive polysiloxane composition including a nitrogen-containing heterocyclic compound (A), a polysiloxane (B), an o-naphthoquinone diazide sulfonate (C), and a solvent (D) is provided.
    Type: Application
    Filed: April 17, 2014
    Publication date: October 30, 2014
    Applicant: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Patent number: 8871867
    Abstract: The invention discloses a terminal-modified conjugated diene-vinyl aromatic copolymer and a method for manufacturing the same. The method comprises the following steps. An organic alkali metal initiator is added into a first mixture containing a conjugated diene monomer and a vinyl aromatic hydrocarbon monomer to perform reaction to obtain a conjugated diene-vinyl aromatic copolymer with active terminal. The conjugated diene-vinyl aromatic copolymer with active terminal reacts with polysiloxane to obtain a terminal-modified conjugated diene-vinyl aromatic copolymer. The aforementioned polysiloxane is expressed as chemical formula (I): R1, R2, R3 and R5 independently are alkyl group with 1˜20 carbon atoms. R4 is selected from one of alkyl group, alkoxy group or hydroxyl group with 1˜5 carbon atoms, m is an integer of 2˜50, and n is an integer of 0˜50.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: October 28, 2014
    Assignee: Chi Mei Corporation
    Inventors: Kuei-Lun Cheng, Chen-Pao Huang
  • Publication number: 20140293400
    Abstract: The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.
    Type: Application
    Filed: March 17, 2014
    Publication date: October 2, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: CHING-YUAN TSENG
  • Publication number: 20140296424
    Abstract: The invention relates to a strippable adhesive composition, and it has the advantage of good stripability and coating. The invention also provides a strippable material and method for manufacturing the same and an electronic component and method for manufacturing the same.
    Type: Application
    Filed: March 17, 2014
    Publication date: October 2, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: KUANG-CHIEH LI
  • Publication number: 20140291712
    Abstract: A phosphor and a light emitting device are provided. The phosphor comprises a composition having a formula of (BaaSr1-a)2-zSi5ObNn:EuZ, 0.03<a<0.75, 0<b<1, 7<n<9, and 0.03<z<0.3.
    Type: Application
    Filed: November 12, 2013
    Publication date: October 2, 2014
    Applicant: Chi Mei Corporation
    Inventors: Yuan-Ren Juang, Jen-Shrong Uen
  • Patent number: 8841050
    Abstract: A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a silsesquioxane having at least two thiol groups in a molecule; and a solvent. The silsesquioxane is obtained by subjecting to condensation a silane material which includes a thiol-group-containing silane represented by RaSi(ORb)3. Ra represents a C1-C8 organic group that contains a thiol group and that is free from an aromatic group, or an organic group that contains a thiol group and an aromatic group. Rb independently represents hydrogen, a C1-C6 alkyl group, a C1-C6 acyl group, or a C6-C15 aromatic group.
    Type: Grant
    Filed: September 16, 2013
    Date of Patent: September 23, 2014
    Assignee: Chi Mei Corporation
    Inventors: Kai-Min Chen, Chun-An Shih
  • Patent number: 8834001
    Abstract: An edge light backlight device includes a light guide plate having a base portion and microstructures, LEDs, and a reflective plate. The base portion has a light emitting side, a rear side, and a light incident side. The microstructures are formed on one of the light emitting side and the rear side and each of which extends from the light incident side in a longitudinal direction. Each of the microstructures includes a curved surface with a radius of curvature (R). The light guide plate has a thickness (T). R/T ratio ranges from 0.04 to 0.15 and each of the microstructures has a height ranging from 20 ?m to 300 ?m so that the light guide plate has a performance of local lighting ranging from 1% to 40%.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: September 16, 2014
    Assignee: Chi-Mei Corporation
    Inventors: Cheng-Feng Lin, Chun-Liang Kuo, Hsin-Hung Chen
  • Patent number: 8835559
    Abstract: A rubber-modified polystyrene resin composition is for making an electroplatable article which has a sectioned layer defining a unit area. The rubber-modified polystyrene resin composition includes a resin matrix, occlusion rubber particles dispersed in the resin matrix, and non-occlusion rubber particles dispersed in the resin matrix. A total sectional area ratio of the occlusion rubber particles to the non-occlusion rubber particles in the unit area ranges from 1.1 to 14.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: September 16, 2014
    Assignee: Chi Mei Corporation
    Inventors: Chien-Chung Wu, Chun-Ting Kuo, Wen-Yi Su, Chen-Hsiang Fang
  • Publication number: 20140255845
    Abstract: The invention relates to a photosensitive resin composition that has good heat resistance and good humidity resistance. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.
    Type: Application
    Filed: March 3, 2014
    Publication date: September 11, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: YU-JIE TSAI
  • Patent number: 8828640
    Abstract: This invention relates to a photo-curing polysiloxane composition including a polysiloxane, a quinonediazidesulfonic acid ester, a methylene alkoxyaryl-containing compound as a curing agent, and a solvent for dispersing the polysiloxane, the quinonediazidesulfonic acid ester, and the methylene alkoxyaryl-containing compound. This invention also provides a protecting film made from the photo-curing polysiloxane composition, and an element containing the protecting film.
    Type: Grant
    Filed: November 7, 2012
    Date of Patent: September 9, 2014
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Publication number: 20140246633
    Abstract: A photosensitive resin composition for color filter including an alkai-soluble resin (A-1), an alkai-soluble resin (A-2) having a functional group represented by formula (2), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D), and a pigment (E) is provided, wherein the alkai-soluble resin (A-1) is formed by copolymerizing an ethylenically unsaturated monomer (a-1) having a carboxylic acid group, a compound (a-2) having a cyclicimide group represented by formula (1), and other copolymerizable ethylenically unsaturated monomers (a-3) except for the ethylenically unsaturated monomer (a-1) having the carboxylic acid group and the compound (a-2) having the cyclicimide group represented by formula (1).
    Type: Application
    Filed: February 6, 2014
    Publication date: September 4, 2014
    Applicant: Chi Mei Corporation
    Inventor: Jung-Pin Hsu
  • Publication number: 20140242504
    Abstract: The present invention relates to a positive photosensitive resin composition and a method for forming patterns by using the same. The positive photosensitive resin composition includes a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B), a hydroxycompound (C) and a solvent (D). The novolac resin (A) further includes a hydroxy-type novolac resin (A-1) and a xylenol-type novolac resin (A-2). The hydroxy-type novolac resin (A-1) is synthesized by condensing hydroxyl benzaldehyde compound with aromatic hydroxyl compound. The xylenol-type novolac resin (A-2) is synthesized by condensing aldehyde compound with xylenol compound. The postbaked positive photosensitive resin composition can be beneficially formed to patterns with high film thickness and well cross-sectional profile.
    Type: Application
    Filed: February 19, 2014
    Publication date: August 28, 2014
    Applicant: CHI MEI CORPORATION
    Inventors: Chi-Ming LIU, Chun-An SHIH
  • Patent number: 8785567
    Abstract: A liquid crystal alignment agent includes a polymer and an organic solvent for dissolving the polymer. The polymer contains a repeating structural unit represented by the following formula (I): wherein each of P and Q is a divalent organic group. The liquid crystal alignment agent has a viscosity in the range from 5 to 40 cps at 25° C. A liquid crystal alignment film made of the liquid crystal alignment agent and a liquid crystal display element including the liquid crystal alignment film are also disclosed.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: July 22, 2014
    Assignee: Chi Mei Corporation
    Inventor: Huai-Pin Hsueh
  • Publication number: 20140187723
    Abstract: The present invention relates to a polysiloxane compound having a structure represented by formula 1: wherein each of F1, F2, F3 and F4 is individually selected from one of a first group, a second group, a third group and a fourth group, the first group is selected from a C2˜C10 hydrocarbon group having amino group(s), a C2˜C10 hydrocarbon group having epoxy group(s), a C2˜C10 hydrocarbon group having carbonyl group(s) or a C2˜C10 hydrocarbon group having alkoxy group(s), the second group is a C2˜C10 hydrocarbon group having amino group(s), the third group is selected from a C2˜C10 hydrocarbon group having epoxy group(s), a C2˜C10 hydrocarbon group having carbonyl group(s), a C2˜C10 hydrocarbon group having SiCl group(s) or a C2˜C10 hydrocarbon group having alkoxy group(s), the fourth group is selected from a C2˜C10 hydrocarbon group having aryl group(s) or a C2˜C10 hydrocarbon group having alkoxy group(s).
    Type: Application
    Filed: August 7, 2013
    Publication date: July 3, 2014
    Applicant: Chi Mei Corporation
    Inventors: Kuan-Lin Hsieh, Kuei-Lun Cheng, Chih-Cheng Lee
  • Publication number: 20140187720
    Abstract: Provided is a polymerization method of a modified copolymer of conjugated diene and vinyl aromatic hydrocarbon. A multi-functional vinyl benzene-based compound is reacted with an organic alkali metal compound to form a star shaped compound with multiple active sites. A conjugated diene monomer, a vinyl aromatic hydrocarbon monomer, and the star shaped compound with multiple active sites are reacted with each other to form a copolymer of conjugated diene and vinyl aromatic hydrocarbon. The copolymer of conjugated diene and vinyl aromatic hydrocarbon is then reacted with a modifier to form the modified copolymer of conjugated diene and vinyl aromatic hydrocarbon. The modifier is represented by formula 1, wherein R1 is a C2-C4 alkylene group; R2 is a group at least consisting of a C2-C4 alkylene group and a C1-C3 alkoxy group; m is an integer of 5 to 30; and n is an integer of 5 to 35.
    Type: Application
    Filed: August 7, 2013
    Publication date: July 3, 2014
    Applicant: Chi Mei Corporation
    Inventors: Kuan-Lin Hsieh, Kuei-Lun Cheng, Chih-Cheng Lee
  • Publication number: 20140185304
    Abstract: An optical plate includes a substrate having a light emitting surface, a rear surface opposite to the light emitting surface, and a plurality of microstructures that cooperatively define the light emitting surface and each of which parallelly extends in a light traveling direction. Each of the microstructures includes first and second convex portions and a concave portion disposed between and interconnecting the first and second convex portions, and two adjacent ones of the microstructures are connected. Intersections between the microstructures cooperatively define an imaginary plane, and a lowest point of the concave portion is disposed at one side of the imaginary plane opposite to the rear surface of the substrate.
    Type: Application
    Filed: December 24, 2013
    Publication date: July 3, 2014
    Applicant: CHI MEI CORPORATION
    Inventors: Hsiu-Fang HSIAO, Chueh-Yang TSAI, Chun-Liang KUO, Hsin-Hung CHEN, Chung-Ping HUANG
  • Publication number: 20140187696
    Abstract: A rubber composition and a method for manufacturing the same are provided. The rubber composition includes a main chain modified conjugated diene based polymer and a stabilizer. A weight ratio of the main chain modified conjugated diene based polymer to the stabilizer is 100:0.2˜2.
    Type: Application
    Filed: December 24, 2013
    Publication date: July 3, 2014
    Applicant: Chi Mei Corporation
    Inventors: Kuei-Lun Cheng, Kuan-Lin Hsieh, Chih-Cheng Lee
  • Patent number: 8766525
    Abstract: A phosphor and a manufacturing method thereof, and the light emitting device using the same are provided, wherein the composition formula of the phosphor is Ii-Mm-Aa-Bb—Ot—Nn:Zr, wherein I is selected from the group consisting of Li, Na, and K, M is selected from the group consisting of Ca, Sr, Mg, Ba, Be, and Zn, A is selected from the group consisting of Al, Ga, In, Sc, Y, La, Gd, and Lu, B is selected from the group consisting of Si, Ge, Sn, Ti, Zr, and Hr, and Z is selected from the group consisting of Eu and Ce; m+r=1, 0<i<0.25, 0<a<1, 0<b<2, 1.15<b/a<1.4, 0?t?0.7, 2.1?n?14.4, and 0.001?r?0.095.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: July 1, 2014
    Assignee: Chi Mei Corporation
    Inventors: Yuan Ren Juang, Jen-Shrong Uen
  • Publication number: 20140175347
    Abstract: The present invention relates to a photosensitive resin composition for black matrix, as well as a color filter and a liquid crystal display (LCD) device formed by the composition. The aforementioned photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing vinyl unsaturated group(s) (B), a photo initiator (C), quinonediazide sulfonic acid ester (D), a solvent (E) and black pigment (F). The alkali-soluble resin (A) includes epoxy resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy resin (i) having at least two epoxy groups with a compound (ii) having at least one vinyl unsaturated group and carboxyl group. The aforementioned photo initiator (C) includes an O-acyloxime compound (C-1).
    Type: Application
    Filed: December 16, 2013
    Publication date: June 26, 2014
    Applicant: CHI MEI CORPORATION
    Inventors: Hao-Wei LIAO, I-Chun HSIEH