Patents Assigned to Fujimi Incorporated
  • POLISHING COMPOSITION, METHOD FOR MANUFACTURING POLISHING COMPOSITION, AND POLISHING METHOD
    Publication number: 20220220339
    Abstract: There are provided a polishing composition capable of improving the polishing removal rate of a TEOS film, a method for manufacturing the polishing composition, and a polishing method. A polishing composition contains cationized colloidal silica chemically surface-modified with an amino silane coupling agent and an anionic surfactant, in which the pH value is larger than 3 and smaller than 6.
    Type: Application
    Filed: January 5, 2022
    Publication date: July 14, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Daiki ITO, Toshio SHINODA
  • Composition for surface treatment, method for producing the same, and surface treatment method using the same
    Patent number: 11377627
    Abstract: The present invention provides a means by which it is possible to sufficiently suppress an organic residue while favorably decreasing a ceria residue on a polished object to be polished obtained after being polished using a polishing composition containing ceria. The present invention relates to a composition for surface treatment, which is for a surface treatment of a polished object to be polished obtained after being polished using a polishing composition containing ceria, contains a carboxy group-containing (co)polymer having a structural unit derived from a monomer having a carboxy group or a salt group of the carboxy group, a SOx or NOy partial structure-containing compound having a partial structure represented by SOx or NOy (where x and y each independently denote a real number 1 to 5), and a dispersing medium, and has a pH of 1 or more and 8 or less.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: July 5, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Yukinobu Yoshizaki, Koichi Sakabe, Satoru Yarita, Kenichi Komoto
  • POLISHING COMPOSITION
    Publication number: 20220186078
    Abstract: Provided is a polishing composition having excellent capability of reducing haze on the surface of an object to be polished. The polishing composition provided by the present invention includes an abrasive, a basic compound, a water-soluble polymer, and water. The water-soluble polymer includes at least a water-soluble polymer P1 and a water-soluble polymer P2. Here, the water-soluble polymer P1 is an acetalized polyvinyl alcohol-based polymer, and the water-soluble polymer P2 is a water-soluble polymer other than the acetalized polyvinyl alcohol-based polymer.
    Type: Application
    Filed: March 25, 2020
    Publication date: June 16, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Kohsuke TSUCHIYA, Maki ASADA, Taiki ICHITSUBO
  • FILLER, MOLDED BODY, AND HEAT DISSIPATING MATERIAL
    Publication number: 20220186102
    Abstract: There are provided a filler capable of increasing the thermal conductivity of a molded body of a resin composition obtained by being blended in resins, such as plastics, curable resins, or rubbers, and a molded body and a heat dissipating material having high thermal conductivity. A resin composition containing a filler and a resin is molded to give a molded body, and a heat dissipating material is obtained from the molded body. The filler contains secondary particles which are sintered bodies of powder containing primary particles of ceramic. The filler has a specific surface area measured by the BET method of 0.25 m2/g or less and granule strength measured by a microcompression test of 45 MPa or more.
    Type: Application
    Filed: December 26, 2019
    Publication date: June 16, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Naoki USHIDA, Yuji MASUDA, Mina SATO, Kazuto SATO, Takuya ISAYAMA
  • METHOD OF POLISHING OBJECT TO BE POLISHED CONTAINING MATERIAL HAVING SILICON-SILICON BOND
    Publication number: 20220186077
    Abstract: The present invention provides means capable of achieving both a reduction in the number of defects and a reduction in haze in an object to be polished after polishing at a high level in a method of polishing the object to be polished containing a material having a silicon-silicon bond. The present invention relates to a method of polishing an object to be polished containing a material having a silicon-silicon bond, and the polishing method includes a final polishing step Pf.
    Type: Application
    Filed: January 30, 2020
    Publication date: June 16, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Kohsuke TSUCHIYA, Maki ASADA, Satoshi MOMOTA
  • Thermal spraying matertal
    Patent number: 11359270
    Abstract: Provided is a thermal spraying material capable of forming a thermally sprayed coating film having improved plasma erosion resistance. The invention disclosed here provides a thermal spraying material. This thermal spraying material comprises composite particles in which a plurality of yttrium fluoride microparticles are integrated. In addition, the compressive strength of the composite particles is 5 MPa or more.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: June 14, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Hiroyuki Ibe, Kazuyuki Tsuzuki
  • Titanium phosphate powder, production method therefor, and white pigment for cosmetics
    Patent number: 11345596
    Abstract: The titanium phosphate powder of the present invention includes plate-shaped crystalline particles of titanium phosphate, an average thickness of the plate-shaped crystalline particles is 0.01 ?m or more and less than 0.10 ?m, and an aspect ratio, which is a value obtained by dividing an average primary particle diameter of the plate-shaped crystalline particles by the average thickness, is 5 or more. In the method for producing a titanium phosphate powder of the present invention, a raw material containing titanium and phosphorus is caused to react by a hydrothermal synthesis method, and when the titanium phosphate powder including plate-shaped crystalline particles of titanium phosphate is produced, a mixture of titanium sulfate and phosphoric acid is used as the raw material.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: May 31, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Mayumi Iwakuni, Keiji Ashitaka, Naoya Miwa
  • POLISHING COMPOSITION
    Publication number: 20220162477
    Abstract: The polishing composition provided by the present invention contains an abrasive, a polyvinyl alcohol polymer as a water-soluble polymer, a basic compound, and water, and further contains a trivalent or higher polyvalent organic acid (salt).
    Type: Application
    Filed: March 23, 2020
    Publication date: May 26, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Yoshiko YAMAGUCHI, Osamu GOTO, Kohsuke TSUCHIYA, Taiki ICHITSUBO
  • Polishing composition, production method of the same, polishing method, and manufacturing method of semiconductor substrate
    Patent number: 11339312
    Abstract: The present invention provides means capable of improving an effect of inhibiting polishing of silicon nitride. The present invention relates to a polishing composition containing a cationically modified silica particles, a non-aromatic crosslinked cyclic compound having an organic acid group or a group of a salt thereof, and water.
    Type: Grant
    Filed: March 22, 2021
    Date of Patent: May 24, 2022
    Assignee: FUJIMI INCORPORATED
    Inventor: Akiko Soumiya
  • Polishing composition and polishing method using same
    Patent number: 11332640
    Abstract: The present invention relates to a polishing composition containing an abrasive, a water-soluble polymer, an anionic surfactant, a basic compound, and water, in which the anionic surfactant has an oxyalkylene unit, and an average addition mole number of the oxyalkylene unit of the anionic surfactant is more than 3 and 25 or less. According to the present invention, it is possible to provide a polishing composition which can reduce the haze of a polished object and is also excellent in a polishing removal rate.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: May 17, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Megumi Taniguchi, Kohsuke Tsuchiya, Maki Asada, Taiki Ichitsubo, Hisanori Tansho
  • TITANIUM PHOSPHATE POWDER, PRODUCTION METHOD THEREFOR, AND WHITE PIGMENT FOR COSMETICS
    Publication number: 20220144639
    Abstract: The titanium phosphate powder of the present invention includes plate-shaped crystalline particles of titanium phosphate, an average thickness of the plate-shaped crystalline particles is 0.01 ?m or more and less than 0.10 ?m, and an aspect ratio, which is a value obtained by dividing an average primary particle diameter of the plate-shaped crystalline particles by the average thickness, is 5 or more. In the method for producing a titanium phosphate powder of the present invention, a raw material containing titanium and phosphorus is caused to react by a hydrothermal synthesis method, and when the titanium phosphate powder including plate-shaped crystalline particles of titanium phosphate is produced, a mixture of titanium sulfate and phosphoric acid is used as the raw material.
    Type: Application
    Filed: January 26, 2022
    Publication date: May 12, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Mayumi IWAKUNI, Keiji ASHITAKA, Naoya MIWA
  • Polishing composition
    Patent number: 11319460
    Abstract: Provided is a polishing composition that can effectively improve a polishing removal rate. According to the present invention, a polishing composition for polishing a polishing target material is provided. The polishing composition contains water, an oxidant, and a polishing removal accelerator, and does not contain abrasive. At least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt is contained as the polishing removal accelerator.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: May 3, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Yasuaki Ito, Hiroyuki Oda, Naoto Noguchi
  • Thermal spraying material
    Patent number: 11306383
    Abstract: The present invention provides a thermal spraying material capable of forming a thermally sprayed coating film having improved plasma erosion resistance. This thermal spraying material contains composite particles in which a plurality of yttrium fluoride microparticles are integrated. This thermal spraying material has a lightness L of 91 or less in the Lab color space. This lightness L is more preferably 5 or more.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: April 19, 2022
    Assignee: FUJIMI INCORPORATED
    Inventor: Hiroyuki Ibe
  • Thermal spraying matertal
    Patent number: 11299800
    Abstract: Provided is a thermal spraying material capable of forming a thermally sprayed coating film having improved plasma erosion resistance. The invention disclosed here provides a thermal spraying material. This thermal spraying material comprises composite particles in which a plurality of yttrium fluoride microparticles are integrated. In addition, the compressive strength of the composite particles is 5 MPa or more.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: April 12, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Hiroyuki Ibe, Kazuyuki Tsuzuki
  • EFFICIENT POST-CMP DEFECT REDUCTION USING CLEANERS CONTAINING OXIDIZING AGENTS
    Publication number: 20220098530
    Abstract: The present technology generally relates to liquid compositions for cleaning post-CMP semiconductor surfaces, and methods of cleaning a semiconductor surface having ceria (CeO2) particles thereon.
    Type: Application
    Filed: September 20, 2021
    Publication date: March 31, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Brandon Crockett, Jimmy Granstrom
  • SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
    Publication number: 20220098523
    Abstract: Provided is a means capable of sufficiently removing organic residues on the surface of an object to be polished after polishing. A surface treatment composition includes a polymer having a building block represented by Formula (1) in [Chemical Formula 1], a chelating agent, and water and is used to treat the surface of an object to be polished after polishing, and the chelating agent has at least one of a phosphonic acid group and a carboxylic acid group. In Formula (1), R1 is a hydrocarbon group having 1 to 5 carbon atoms; and R2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms.
    Type: Application
    Filed: August 3, 2021
    Publication date: March 31, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Tsutomu YOSHINO, Sonosuke ISHIGURO
  • COMPOSITION FOR SURFACE TREATMENT, METHOD FOR PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
    Publication number: 20220089981
    Abstract: The present invention provides a means capable of improving a residue removing effect and improving storage stability in a composition for surface treatment which is used for reducing residues on a surface of an object to be polished after being polished chemical mechanical polishing. The present invention relates to a composition for surface treatment, wherein the composition contains a solvent and a dissolved gas, a concentration of the dissolved gas is 0.01 mg/L or more and 10 mg/L or less with respect to a total volume of the composition and the composition is used for reducing residues on a surface of an object to be polished after being polished by chemical mechanical polishing.
    Type: Application
    Filed: January 6, 2020
    Publication date: March 24, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Keita SUZUKI, Yohei TAKAHASHI
  • POLISHING COMPOSITION
    Publication number: 20220089911
    Abstract: Provided is a polishing composition that can effectively improve a polishing removal rate. According to the present invention, a polishing composition for polishing a polishing target material is provided. The polishing composition contains water, an oxidant, and a polishing removal accelerator, and does not contain abrasive. At least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt is contained as the polishing removal accelerator.
    Type: Application
    Filed: December 3, 2021
    Publication date: March 24, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Yasuaki ITO, Hiroyuki ODA, Naoto NOGUCHI
  • THERMAL SPRAY MATERIAL AND METHOD FOR FORMING THERMAL SPRAYED COATING USING SAME
    Publication number: 20220064014
    Abstract: A thermal spray material that enables a thermal sprayed coating, which is capable of exhibiting the same performances as those of the related art, to be obtained more easily than the related art, and a method for forming a thermal sprayed coating using the thermal spray material are provided. A thermal spray material which for forming a thermal sprayed coating containing a rare-earth oxyhalide includes a rare-earth halide powder and a rare-earth oxide powder.
    Type: Application
    Filed: August 4, 2021
    Publication date: March 3, 2022
    Applicant: FUJIMI INCORPORATED
    Inventors: Takaya MASUDA, Kazuya SUGIMURA, Hiroyuki IBE
  • Polishing composition
    Patent number: 11261346
    Abstract: The present invention provides a polishing composition for use in polishing a material having a Vickers hardness of 1500 Hv or higher. The polishing composition comprises an alumina abrasive and water. The alumina abrasive has an isoelectric point that is below 8.0 and is lower than the pH of the polishing composition.
    Type: Grant
    Filed: March 22, 2017
    Date of Patent: March 1, 2022
    Assignee: FUJIMI INCORPORATED
    Inventor: Tomoaki Ishibashi