Abstract: This invention relates to a method of producing a probe-bound carrier, a probe-bound carrier and a method of detecting or separating a target substance. The method of producing a probe-bound carrier includes: step 1 of mixing a carrier having tosyl groups and a probe; and step 2 of reducing the amount of tosyl groups on a surface of a carrier, in which a proportion of area S2 that is occupied by one tosyl group on a surface of the carrier obtained in the step 2 with respect to area S1A that is occupied by one tosyl group on a surface of the carrier used in the step 1 (S2/S1A×100%) is not less than 140%.

Abstract: A binder for an all-solid-state secondary battery that can control a decrease in ionic conductivity, is excellent in binding properties and oxidation resistance, and can realize favorable cycle life characteristics even under a high voltage; and a binder composition for an all-solid-state secondary battery containing the binder. A binder for an all-solid-state secondary battery includes a polymer (A) which includes a repeating unit (a1) derived from an unsaturated carboxylic acid ester (excluding an unsaturated carboxylic acid ester having a hydroxyl group) and a repeating unit (a2) derived from a compound having a tertiary amino group, a weight-average molecular weight (Mw) of the polymer (A) being from 250000 to 3000000, and an endothermic peak being observed at ?10° C. or lower when differential scanning calorimetry (DSC) is performed on the polymer (A) in accordance with JIS K 7121.

Abstract: A method for producing 1,3-butadiene, including: (A) performing an oxidative dehydrogenation reaction between oxygen and a raw material gas including n-butene in the presence of a metal oxide catalyst, thereby obtaining a produced gas containing 1,3-butadiene; (B) washing the produced gas obtained in (A); (C) contacting the produced gas washed in (B) with a cooling medium to cool the produced gas; and (D) separating the produced gas cooled in (C) into molecular oxygen and inert gases, and other gases containing 1,3-butadiene, by selective absorption into an absorption solvent. In (B), the washing of the produced gas includes blowing the produced gas onto a liquid surface of a washing liquid so that the produced gas contacts the liquid surface of the washing liquid.

Abstract: A radiation-sensitive resin composition contains: an onium salt compound represented by formula (1); a resin containing a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent organic group having a cyclic structure, or a chain hydrocarbon group having 2 or more carbon atoms. X is an oxygen atom, a sulfur atom, or —NR?—. R? is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Z+ is a monovalent onium cation.

Abstract: A chemical structure generating device according to the present invention includes a generator and a controller. The generator produces a product list including one or more compounds, based on a reactant list including one or more compounds and a chemical reaction list. The controller applies the product list as a new reactant list to the generator, updates a database having at least one list of the reactant list and the product list, and allows the generator to produce a new product list based on the new reactant list and the chemical reaction list.

Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.

Abstract: A method for producing a rubber composition may include: mixing modified silica (B), pre-prepared by surface treatment of unmodified silica, with a modified conjugated diene-based polymer (A) and a polymer having crystalline character (C). A crosslinked product may be produced through crosslinking a rubber composition obtained from such a method. The crosslinked product may be used for producing a tire including a tread and a sidewall, wherein at least one of the tread and the sidewall is formed of the crosslinked product.

Abstract: A hydrogenated conjugated diene-based polymer which has a structure formed by bonding a nitrogen-containing compound having two or more alkoxysilyl groups and two or more nitrogen atoms with a plurality of conjugated diene-based polymer chains, wherein: when a composition ratio (molar ratio) in the hydrogenated conjugated diene-based polymer of each of a structural unit represented by formula (1), a structural unit represented by formula (2), a structural unit represented by formula (3), and a structural unit represented by formula (4) is p, q, r, and s, respectively, a value a represented by formula (i) is 0.80 or more and 0.97 or less, and an equilibrium storage modulus E? of the hydrogenated conjugated diene-based polymer is 2.4 MPa or more, ?=(p+(0.5×xr))/(p+q+(0.5×xr)+s) . . .

Abstract: A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle ? (°) of water on the sidewall of the pattern satisfies inequality (1).

Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.

Abstract: The present invention is a photosensitive resin composition including an alkali-soluble resin (A), a polymerizable compound (B), a photoradical polymerization initiator (C), and a solvent (D), in which the polymerizable compound (B) contains at least one kind (B1) selected from a compound represented by the following formula (1) and a compound represented by the following formula (3), having specific Rs, and a content ratio of the compound (B1) contained in the photosensitive resin composition is 15 to 50% by mass. The photosensitive resin composition of the present invention can form a thick-film resist pattern having excellent sensitivity and resolution, and by using the thick-film resist pattern, a plated formed product can be miniaturized.

Abstract: A composition includes a solvent and at least one compound selected from the group consisting of: a first compound which comprises a first structural unit comprising a Si—H bond, and a second structural unit represented by formula (2), and a second compound which comprises the second structural unit represented by the formula (2). X represents a monovalent organic group having 1 to 20 carbon atoms which comprises a nitrogen atom; e is an integer of 1 to 3; R4 represents a monovalent organic group having 1 to 20 carbon atoms, or a hydroxy group, a hydrogen atom, or a halogen atom; and f is an integer of 0 to 2. A sum of e and f is no greater than 3. In the case where the at least one compound is the second compound, f is 1 or 2, and at least one R4 represents a hydrogen atom.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: A radiation-sensitive resin composition contains: a polymer having an acid-labile group, a radiation-sensitive acid generator, a compound represented by the following formula (1), and a solvent. In the formula (1), X represents an oxygen atom or a sulfur atom; R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R2 to R5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and optionally two or more of R2 to R5 taken together represent an alicyclic structure having 3 to 20 ring atoms or an aliphatic heterocyclic structure having 3 to 20 ring atoms together with the carbon atom to which the two or more of R2 to R5 bond; Zn+ represents a cation having a valency of n; and n is an integer of 1 to 3.

Abstract: A composition for resist underlayer film formation, includes a first compound and a solvent. The first compound includes a first group represented by formula (1) and a partial structure comprising an aromatic ring. In the formula (1), R1 represents a single bond or an oxygen atom, R2 represents a divalent chain or alicyclic hydrocarbon group having 1 to 30 carbon atoms, and * denotes a bonding site to a moiety other than the first group of the first compound.

Abstract: A radiation-sensitive resin composition contains: a polymer having a first structural unit represented by formula (1), and a second structural unit represented by formula (2) and having an acid-labile group. A first acid, to be generated from the first acid generating agent, disassociates the acid labile group in the polymer upon heating under a condition involving a temperature of no less than 80° C. and no greater than 140° C. for a time period of 1 minute, and the second acid, to be generated from the second acid generating agent, does not substantially disassociate the acid-labile group under the condition. The polymer is synthesized by RAFT, ATRP, or NMP, and a RAFT agent is at least one selected from the group consisting of a mercaptocarboxylic acid ester, a disulfide, a dithioester, a xanthate, a dithiocarbamate, and a trithiocarbonate.

Abstract: The present invention relates to a magnetic particle dispersion, and the magnetic particle dispersion includes a magnetic particle, an isothiazoline compound, and an aqueous medium.

Abstract: A radiation-sensitive resin composition includes: a first polymer having a first structural unit that includes an acid-labile group; a radiation-sensitive acid generator; and a first compound capable of forming a salt through a structural change in a molecule thereof upon irradiation with a radioactive ray. Basicity of the first compound preferably changes upon irradiation with a radioactive ray. The first compound preferably generates an acid upon irradiation with a radioactive ray. The first compound is preferably represented by formula (1). In formula (1), Ar1 represents a substituted or unsubstituted heteroarenediyl group having 4 to 30 ring atoms and having at least one nitrogen atom as a ring-constituting atom.

Abstract: This method for producing a cell cluster group comprises: a step for putting, into a well, a cell suspension obtained by suspending dispersed cells in a medium, using a cell incubator which includes the well and two or more recesses formed in the bottom of the well and in which the area of an opening of each recess in plan view is at most 1 mm2; a step for centrifuging the cell incubator; and a step for culturing the dispersed cells in the recesses.

Abstract: A polymer composition includes a conjugated diene polymer (A) and a compound (B). The compound (B) is at least one compound selected from the group consisting of a polysiloxane compound and a fluorine-containing compound. The conjugated diene polymer (A) contains, when the composition ratios (molar ratios) in the polymer of the structural units represented by formulas (1) to (4) are p, q, r, and s, respectively, a polymer (A-1) satisfying formula (i). 0.75?(p+(0.5×r))/(p+q+(0.5×r)+s)?0.