Patents Assigned to JSR Corporation
  • RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
    Publication number: 20220283498
    Abstract: A radiation-sensitive resin composition includes: a resin having a polystyrene-equivalent weight-average molecular weight of 8,000 or less; a radiation-sensitive acid generator; and a solvent. The resin includes: a structural unit A represented by formula (1); a structural unit B having a phenolic hydroxyl group; and a structural unit C having an acid-dissociable group. The structural unit B is other than the structural unit A; and the structural unit C is other than the structural unit A or B. In the formula (1), RX is a hydrogen atom or a methyl group; and Ar is a monovalent aromatic hydrocarbon group having a substituent represented by —ORY. The substituent is bonded to a carbon atom next to a carbon atom bonded to a main chain of the resin. RY is a hydrogen atom or a protective group to be deprotected by action of an acid.
    Type: Application
    Filed: February 11, 2022
    Publication date: September 8, 2022
    Applicant: JSR CORPORATION
    Inventors: Katsuaki NISHIKORI, Kazuya Kiriyama, Natsuko Kinoshita, Takuhiro Taniguchi
  • Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion
    Patent number: 11429024
    Abstract: The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar1; and RG represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: August 30, 2022
    Assignee: JSR CORPORATION
    Inventors: Ryuichi Nemoto, Tsuyoshi Furukawa
  • Modification method of surface of base, composition, and polymer
    Patent number: 11426761
    Abstract: A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R1s are identical or different.
    Type: Grant
    Filed: August 24, 2020
    Date of Patent: August 30, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Miki Tamada, Hitoshi Osaki, Tomoki Nagai
  • RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER
    Publication number: 20220269172
    Abstract: Provided are: a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer which enable forming a resist pattern with favorable sensitivity to exposure light and superiority in terms of CDU performance and resolution. The radiation-sensitive resin composition contains: a polymer having: a first structural unit represented by formula (1), and a second structural unit derived from a (meth)acrylic acid ester including an acid-labile group; and a radiation-sensitive acid generator.
    Type: Application
    Filed: February 17, 2022
    Publication date: August 25, 2022
    Applicant: JSR CORPORATION
    Inventors: Katsuaki NISHIKORI, Kazuya KIRIYAMA, Takuhiro TANIGUCHI, Ken MARUYAMA
  • Method for manufacturing porous particles, porous particles, carrier, column, and method for separating target substance
    Patent number: 11421102
    Abstract: To provide a porous particle with which non-specific adsorption is hardly generated although the porous particle is a synthetic polymer-based particle, the mechanical strength is high, and the dynamic binding capacity is high in a case where a ligand is bound to the porous particle; and a method for producing the same. A method for producing a porous particle, including the following steps 1 and 2; (step 1) dissolving at least one or more of polymers selected from the group consisting of a vinyl alcohol polymer and an ethylene-vinyl alcohol copolymer in an aqueous solvent to prepare a polymer solution; and (step 2) dispersing the polymer solution in a non-aqueous solvent to form a W/O emulsion.
    Type: Grant
    Filed: November 24, 2016
    Date of Patent: August 23, 2022
    Assignees: JSR CORPORATION, JSR LIFE SCIENCES, LLC, JSR MICRO N.V.
    Inventors: Kunihiko Kobayashi, Masaaki Kanahara
  • COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER
    Publication number: 20220259741
    Abstract: A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including —B(OR)2; a group including —PO(OR)2; and a group including —P(OR)2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the group (X) at an end of a main chain thereof or at an end of a side chain thereof.
    Type: Application
    Filed: May 3, 2022
    Publication date: August 18, 2022
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki KOMATSU, Motohiro Shiratani
  • RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
    Publication number: 20220260908
    Abstract: A radiation-sensitive resin composition includes: a first polymer having a first structural unit which includes a phenolic hydroxyl group, and a second structural unit which includes an acid-labile group and a carboxy group which is protected by the acid-labile group; a second polymer having a third structural unit represented by the following formula (S-1), and a fourth structural unit which is a structural unit other than the third structural unit and is represented by the following formula (S-2); and a radiation-sensitive acid generator, wherein the acid-labile group includes a monocyclic or polycyclic ring structure having no fewer than 3 and no more than 20 ring atoms.
    Type: Application
    Filed: August 27, 2021
    Publication date: August 18, 2022
    Applicant: JSR CORPORATION
    Inventors: Tetsurou KANEKO, Hiromitsu NAKASHIMA, Yuushi MATSUMURA, Junya SUZUKI, Shuto MORI, Hiroyuki ISHII
  • LIQUID CRYSTAL DISPLAY DEVICE
    Publication number: 20220252943
    Abstract: In this liquid crystal display device, a plurality of pixels 30 are arranged in a display region. The liquid crystal display device comprises a first substrate 11 in which a pixel electrode 15 having slits 15a is provided, a second substrate disposed face to the first substrate 11, a liquid crystal layer 13 containing liquid crystal molecules that have negative dielectric anisotropy, a first alignment film 22, and a second alignment film 23. The slits 15a are positioned in each alignment region of a plurality of alignment regions in the pixels 30, and have oblique slit parts extending in an oblique direction with respect to sides of the pixels 30. The angle ? formed by the direction in which the oblique slit parts extends and a liquid crystal projection direction is 15 degrees or more and 85 degrees or less.
    Type: Application
    Filed: July 21, 2020
    Publication date: August 11, 2022
    Applicant: JSR CORPORATION
    Inventors: Yoshihiko KURODA, Koichi MIYACHI
  • CROSS-LINKED PRODUCT AND TIRE
    Publication number: 20220251351
    Abstract: A cross-linked product obtained through crosslinking a polymer composition that contains a rubber component, an inorganic filler and a cross-linking agent and that satisfies conditions (a) to (c): (a) the rubber component contains a conjugated diene-based polymer (A) having, when composition ratios (molar ratios) in the conjugated diene-based polymer (A) of structural units represented by formulae (1) to (4) are p, q, r, and s, respectively, a value ? represented by formula (i) of 0.80 or more and 0.97 or less; (b) a blending ratio of the conjugated diene-based polymer (A) is 10% by mass or more relative to a total amount of the rubber component; and (c) a blending ratio of the inorganic filler is 40 to 150 parts by mass relative to 100 parts by mass of the rubber component, wherein the Tg of the cross-linked product is ?25° C. or lower.
    Type: Application
    Filed: March 30, 2020
    Publication date: August 11, 2022
    Applicant: JSR CORPORATION
    Inventors: Takumi ADACHI, Yuto SAKAGAMI, Hirofumi SENGA, Takuya SANO, Takato FUKUMOTO, Michitaka KAIZU, Toshimitsu KIKUCHI, Toshiyuki HAYAKAWA
  • RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
    Publication number: 20220252978
    Abstract: A radiation-sensitive composition includes a polymer including first and second structural units, a first compound that generates a first acid upon irradiation with radioactive ray, and a second compound that generates a second acid upon irradiation with radioactive ray. The first structural unit includes an acid-labile group, the first acid does not substantially dissociate the acid-labile group under 110° C. and a period of 1 min, the second acid dissociates the acid-labile group under 110° C. and a period of 1 min, and the second structural unit includes a monovalent group of formula (X), where Ar1 is a group obtained by removing (a+b) hydrogen atoms from an unsubstituted aryl group, RXA is a monovalent iodine atom, an iodinated alkyl group or an iodinated alkoxy group, RXB is a monovalent organic group, a is an integer of 1 to 10, and b is an integer of 1 to 10.
    Type: Application
    Filed: April 28, 2022
    Publication date: August 11, 2022
    Applicant: JSR CORPORATION
    Inventor: Ken MARUYAMA
  • IMMUNOGLOBULIN-BINDING PROTEIN AND AFFINITY SUPPORT USING SAME
    Publication number: 20220242975
    Abstract: An affinity support having improved binding capacity for target proteins. An immunoglobulin-binding protein including a mutant immunoglobulin-binding domain, an affinity support including a solid-phase support and the immunoglobulin-binding protein immobilized thereto. The mutant immunoglobulin-binding domain consists of an amino acid sequence having at least 85% identity with an amino acid sequence of any of SEQ ID NOs: 1 to 12.
    Type: Application
    Filed: February 28, 2020
    Publication date: August 4, 2022
    Applicants: JSR CORPORATION, JSR LIFE SCIENCES, LLC, JSR MICRO N.V.
    Inventors: Toshinari HONDA, Satoshi NAKAMURA, Shunsuke ONOGI, Tomoaki HAGA
  • Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound
    Patent number: 11402757
    Abstract: A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Ar1 represents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Ar2 is a group bonding to a carbon atom of the aromatic heteroring in Ar1 and represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: August 2, 2022
    Assignee: JSR CORPORATION
    Inventors: Naoya Nosaka, Yuushi Matsumura, Hiroki Nakatsu, Kazunori Takanashi, Hiroki Nakagawa
  • POLYMER, COMPOSITION, MOLDED ARTICLE, CURED PRODUCT AND LAMINATE
    Publication number: 20220235179
    Abstract: A novel polymer having high glass transition temperature and an excellent balance between heat resistance, high refractive index and mechanical properties, and a composition and molded article containing the polymer are provided. The polymer according to the invention has a first structural unit represented by at least one of formulae (1-1), (1-2) and (1-3) below and a second structural unit having either a secondary amino structure or a tertiary amino structure at two or more terminals.
    Type: Application
    Filed: April 5, 2022
    Publication date: July 28, 2022
    Applicant: JSR CORPORATION
    Inventors: Ryouyuu HIFUMI, Toshiaki KADOTA, Nobuyuki MIYAKI, Shintarou FUJITOMI, Yasutaka YOSHIDA, Ryouji TATARA
  • MACROPHAGE IMAGING AGENT
    Publication number: 20220226512
    Abstract: Composite particles, each of which is obtained by forming, on the surface of a gadolinium oxide-containing particle, a cover film that contains a polymer obtained by polymerizing a monomer component containing a monomer having an ethylenically unsaturated bond; a macrophage imaging agent which contains the composite particles; and a method for producing composite particles, wherein a monomer component containing a monomer having an ethylenically unsaturated bond and gadolinium oxide-containing particles are mixed with each other, and after emulsifying the thus-obtained monomer component-containing mixture in water in the presence of a surfactant and a polymerization initiator in water, the monomer component is polymerized, thereby forming cover films on the surfaces of the gadolinium oxide-containing particles.
    Type: Application
    Filed: May 27, 2020
    Publication date: July 21, 2022
    Applicants: KYOTO UNIVERSITY, NATIONAL CEREBRAL AND CARDIOVASCULAR CENTER, JSR CORPORATION
    Inventors: Teruyuki KONDO, Yu KIMURA, Aoi SON, Tetsuya MATSUDA, Hirohiko IMAI, Hirokazu KOSEKI, Tomohiro AOKI, Katsuyuki TAKASE, Masaaki MIYAJI, Koji TAMORI, Takeaki MASUDA, Hirokazu KAI
  • RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND
    Publication number: 20220229367
    Abstract: A radiation-sensitive resin composition includes: a first polymer including a structural unit which includes an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. R1 represents a monovalent organic group having 1 to 20 carbon atoms; R2 represents a monovalent organic group having 1 to 20 carbon atoms; X represents a divalent organic group having 1 to 20 carbon atoms; and Y represents a divalent hydrocarbon group having 1 to 20 carbon atoms. The divalent organic group represented by X, the monovalent organic group represented by R2, or both has a fluorine atom.
    Type: Application
    Filed: April 5, 2022
    Publication date: July 21, 2022
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Satoshi OKAZAKI, Taiichi FURUKAWA
  • System-based extension of qEOM algorithm for quantum computation of excited-state properties
    Patent number: 11392849
    Abstract: Systems and methods that facilitate motion formalism utilizing quantum computing, to compute matrix operators in terms of commutators between qubit operators and measurements on the quantum hardware, wherein the commutators are computed utilizing symbolic calculus. Embodiments reduce computational cost of generalized eigenvalue synthesis relying on symbolic calculus and parallelization. Embodiments disclosed herein can also develop estimators of excited-states properties, considering constants of motion (e.g. spin) and non-constants of motions (e.g. dipoles, density matrices).
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: July 19, 2022
    Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, JSR CORPORATION
    Inventors: Mario Motta, Pauline Ollitrault, Stephen Wood, Panagiotis Barkoutsos, Joseph Latone, Ivano Tavernelli, Gavin Jones, Edward Pyzer-Knapp, Yuya Onishi
  • Polymer, antimicrobial agent, disinfectant, antimicrobial material, disinfectant material, antimicrobial method, and disinfecting method
    Patent number: 11384172
    Abstract: Provided is a polymer having antimicrobial and disinfecting properties against a wide range of kinds of germs. A polymer, including: a polymer chain having a repeating unit represented by the following formula (1); and a partial structure (excluding the polymer chain) derived from a compound containing a group represented by —NH—. [In formula (1), R1 represents a hydrogen atom or a methyl group, Z represents a group forming an organic ammonium salt, —NR5R6 (where R5 and R6 each independently represent a hydrogen atom, or a substituted or unsubstituted hydrocarbon group), or a substituted or unsubstituted nitrogen-containing heterocyclic group, and X represents a single bond, or a divalent linking group.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: July 12, 2022
    Assignees: JSR CORPORATION, JAPAN AS REPRESENTED BY DIRECTOR-GENERAL OF NATIONAL INSTITUTE of INFECTIOUS DISEASES, JSR LIFE SCIENCES CORPORATION
    Inventors: Hidenori Naruse, Atsushi Itou, Shigeru Ikawa, Tsutomu Shimokawa, Masato Suzuki, Mari Matsui, Satowa Suzuki, Keigo Shibayama, Kazuhiro Ikkyuu
  • COMPOSITION, FILM, METHOD OF FORMING FILM, METHOD OF FORMING PATTERN, METHOD OF FORMING ORGANIC-UNDERLAYER-FILM REVERSE PATTERN, AND METHOD OF PRODUCING COMPOSITION
    Publication number: 20220204535
    Abstract: A composition includes: a metal compound including a ligand; and a solvent. The ligand is derived from a compound represented by formula (1). L represents an oxygen atom or a single bond; R1 represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; R2 and R3 each independently represent a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, or R2 and R3 bind with each other and represent an alicyclic structure having 3 to 20 ring atoms together with the carbon atom to which R2 and R3 bond, or le and either R2 or R3 bind with each other and represent a lactone ring structure having 4 to 20 ring atoms or a cyclic ketone structure having 4 to 20 ring atoms together with the atom chain to which le and either R2 or R3 bond.
    Type: Application
    Filed: March 17, 2022
    Publication date: June 30, 2022
    Applicant: JSR CORPORATION
    Inventors: Yuusuke OOTSUBO, Ryuichi SERIZAWA, Kazunori SAKAI
  • Composition for pattern formation, and pattern-forming method
    Patent number: 11370872
    Abstract: A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: June 28, 2022
    Assignee: JSR Corporation
    Inventors: Masafumi Hori, Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Takehiko Naruoka
  • COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD OF PRODUCING PATTERNED SUBSTRATE, AND COMPOUND
    Publication number: 20220197144
    Abstract: A composition includes: a compound including an aromatic hydrocarbon ring structure, and a partial structure represented by formula (1) which bonds to the aromatic hydrocarbon ring structure; and a solvent. The aromatic hydrocarbon ring structure has no fewer than 25 carbon atoms. In the formula (1), X represents a group represented by formula (i), (ii), (iii), or (iv); and *'s denote binding sites to two adjacent carbon atoms constituting the aromatic hydrocarbon ring structure. A method of producing a patterned substrate, includes applying the composition directly or indirectly on a substrate to form a resist underlayer film; forming a resist pattern directly or indirectly on the resist underlayer film; and carrying out etching using the resist pattern as a mask.
    Type: Application
    Filed: March 8, 2022
    Publication date: June 23, 2022
    Applicant: JSR CORPORATION
    Inventors: Naoya NOSAKA, Tsubasa ABE, Masato DOBASHI, Kazunori TAKANASHI