Abstract: A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; a radiation-sensitive acid generator; and a compound represented by the following formula (1). In the following formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; and Xn+ represents a radiation-sensitive onium cation having a valency of n, wherein n is an integer of 1 to 3. It is preferable that R1 in the following formula (1) represents an organic group, and that the organic group has a ring structure. It is preferable that R1 in the following formula (1) represents an organic group, and that the organic group is an acid-labile group. Xn+ in the following formula (1) preferably represents a sulfonium cation, an iodonium cation, or a combination thereof.

Abstract: A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent. R1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X1 and X2 are each independently a single bond, —O—, —S— or —NR?— wherein R? is a hydrogen atom or a monovalent hydrocarbon group. In a case where X1 is —NR?—, R2 is a monovalent organic group or a hydrogen atom. In a case where X2 is —NR?—, R3 is a monovalent organic group or a hydrogen atom. In a case where neither X1 nor X2 is —NR?—, R2 and R3 are each independently a monovalent organic group.

Abstract: A method for producing butadiene comprises a step of supplying a raw material gas containing 2-butene and an oxygen-containing gas containing molecular oxygen to a reactor filled with a catalyst to obtain a produced gas containing butadiene, wherein the catalyst contains a composite oxide containing molybdenum and bismuth, and a proportion of cis-2-butene in 2-butene in the raw material gas is 30 to 90 mol %.

Abstract: A film-forming composition includes: a metal compound; a nitrogen-containing organic compound; and a solvent. The nitrogen-containing organic compound is: a first compound including a nitrogen atom, an aliphatic hydrocarbon group, and at least two hydroxy groups; a second compound including a nitrogen-containing aromatic heterocycle and at least one hydroxy group; or a mixture thereof. A method of forming a resist pattern includes applying the film-forming composition directly or indirectly on a substrate to form a resist underlayer film. An organic-resist-film-forming composition is applied directly or indirectly on the resist underlayer film to form an organic resist film. The organic resist film is exposed to a radioactive ray. The organic resist film exposed is developed.

Abstract: A modified conjugated diene-based polymer is produced by a method reacting a conjugated diene-based polymer having an active terminal, which is a polymer obtained by polymerizing a monomer including a conjugated diene compound in the presence of an alkali metal compound, with a compound [A] represented by formula (1). In formula (1), each of R1 and R2 represents a C1 to C8 hydrocarbyl group and the like; each of R5 and R6 represents a C1 to C8 hydrocarbyl group and the like; each of R3 and R4 represents a C1 to C6 hydrocarbylene group; R7 represents a C1 to C10 hydrocarbylene group; X represents a C1 to C4 hydrocarbyloxy group; each of X2 and X3 represent a C1 to C4 hydrocarbyl group or hydrocarbyloxy group; m is an integer of 1 to 3.

Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.

Abstract: A method for producing linear monoolefins comprises a step of contacting a raw material composition containing a first linear monoolefin having 4 to 8 carbon atoms with an isomerization catalyst at 250 to 390° C. in the presence of 20 ppm by volume or more of molecular oxygen and/or 20 ppm by volume or more of water to perform an isomerization reaction for isomerizing at least a part of the first linear monoolefin to a second linear monoolefin having a different double bond position, wherein the catalyst contains zeolite.

Abstract: Provided is a rubber composition containing: (A) a polymer which has a carbon-carbon unsaturated bond and in which a value ? represented by the following equation (i) is 0.70 or more and 0.

Abstract: A photosensitive resin composition contains at least one compound selected from the group consisting of compound (C1) represented by formula (C1), compound (C2) represented by formula (C2), and a multimer of the compound (C2). Z each independently represents an oxygen atom or a sulfur atom. R31 each independently represents a monovalent hydrocarbon group or a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group, and at least one R31 is a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group when p is 1 and when p is an integer of 2 or more and all of Z is an oxygen atom. R32 and R33 each independently represent a divalent hydrocarbon group, and R34 represents a glycoluril ring structure or an isocyanul ring structure.

Abstract: This liquid crystal display device has a plurality of pixels. Each pixel in the plurality of pixels includes first to fourth alignment regions; these first to fourth alignment regions are arranged in the longitudinal direction of the pixels, and the difference between any two alignment orientations in the first to fourth alignment regions is approximately equal to an integer multiple of 90 degrees. Of the pre-tilt angles defined by a first alignment film and a second alignment film in each of the first to fourth alignment regions, one pre-tilt angle is less than 90 degrees and the other pre-tilt angle is substantially 90 degrees. The optical alignment film is formed using a polymer having an optical alignment group in the side chain, and the content of the optical alignment group in the side chain of the polymer is less than 1.1 mmol/g.

Abstract: A method for producing a plated shaped structure, includes applying a photosensitive resin composition on a substrate to form a photosensitive resin coating film. The photosensitive resin composition includes: (A) a resin whose solubility in alkali is capable of being increased by an action of an acid; (B) a photoacid generator; and (C) a compound which is capable of being decomposed by an action of an acid to form a primary or secondary amine. The photosensitive resin coating film is exposed to light. The photosensitive resin coating film is developed after the exposing to light to form a resist pattern. A plating process is performed using the resist pattern as a mask.

Abstract: An object of the present invention is to provide a photosensitive resin composition that can form an insulating film having low dielectric constant and low dielectric loss tangent and undergoing small changes in elongation properties in response to changes in environmental temperature. The photosensitive resin composition of the present invention contains: a polymer (A) having a structural unit (a1) represented by Formula (a1); a crosslinking agent (B); a photocation generator (C); and a compound (D) represented by Formula (D).

Abstract: A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). R1 and R2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R1 and R2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R1 and R2 are bonded; R3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at ?-, ?- and ?-positions of the carbon atom to which R1 and R2 are bonded; and No fluorine atom is bonded to carbon atoms located at ?- and ?-positions of the carbon atom to which R3 is bonded.

Abstract: An object of the present invention is to provide a photosensitive resin composition that can form an insulating film having low dielectric constant and low dielectric loss tangent and undergoing small changes in elongation properties in response to changes in environmental temperature. The photosensitive resin composition of the present invention contains: a polymer (A) having a structural unit (a1) represented by Formula (a1); a crosslinking agent (B); and a photocation generator (C). [R1 is an unsubstituted or substituted nitrogen-containing heteroaromatic ring or an unsubstituted or substituted aromatic hydrocarbon ring; R2 and R3 are each independently an unsubstituted or substituted aromatic hydrocarbon ring; R4 is an unsubstituted or substituted alkyl group having 2 to 20 carbon atoms; R5 is an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms; and X's are each independently an oxygen atom, a sulfur atom, an ester bond, an amide bond, or —SO2—.

Abstract: A rubber composition contains: (A) a polymer having a carbon-carbon unsaturated bond and exhibiting a value ? of 0.6 or more as obtained by the following formula (i): ?=(p+(0.5×r))/(p+q+(0.5×r)+s)??(i) wherein p, q, r, and s are the proportions by mole of structural units represented by the following formulae (1), (2), (3), and (4), respectively in the polymer: and (B) modified silica.

Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.

Abstract: A method for producing a plated formed product includes: a step (1) of forming on a substrate of the substrate having a metal film a resin film of a photosensitive resin composition containing a sulfur-containing compound having at least one selected from a mercapto group, a sulfide bond, and a polysulfide bond; a step (2) of exposing the resin film; a step (3) of developing the exposed resin film to form a resist pattern film; a step (4) of performing plasma treatment of a substrate having the resist pattern film on the metal film with oxygen-containing gas; and a step (5) of performing, after the plasma treatment, plating treatment with the resist pattern film as a mold.

Abstract: The present invention relates to composite particles, coated particles, a method of producing composite particles, a ligand-containing solid phase carrier, and a method of detecting or separating a target substance in a sample. The above described composite particles each contains an organic polymer and inorganic nanoparticles, wherein the content of the inorganic nanoparticles in the composite particles is more than 80% by mass, and wherein the composite particles have a volume average particle size of from 10 to 1,000 nm.

Abstract: An object of the present invention is to provide a photosensitive resin composition for suppressing standing wave traces and forming a resist pattern film having a rectangular cross section. The photosensitive resin composition of the present invention contains polymer (A) having an acid dissociative group; photoacid generator (B); carbamic acid ester (C) having a hydroxyl group; and solvent (D), the solvent (D) containing at least one solvent (D1) selected from, for example, propylene glycol monomethyl ether acetate and at least one solvent (D2) selected from, for example, dipropylene glycol dimethyl ether.

Abstract: A process of producing 1,3-butadiene includes: a first step of obtaining gases containing 1,3-butadiene by an oxidative dehydrogenation reaction of a raw material gas with a molecular oxygen-containing gas in the presence of a metal oxide catalyst, the raw material gas containing 1-butene and 2-butene and having a proportion of 2-butene to a sum of 1-butene and 2-butene, which is defined as 100% by volume, being not less than 50% by volume; a second step of cooling the produced gases obtained in the first step; and a third step of separating the produced gases having undergone the second step into molecular oxygen and inert gases and other gases containing 1,3-butadiene by selective absorption to an absorbing solvent, wherein the concentration of methyl vinyl ketone in the produced gases having been cooled in the second step is 0% by volume or more and not more than 0.03% by volume.