Patents Assigned to Showa Denko K.K.
  • Patent number: 11650499
    Abstract: There is provided a highly sensitive colorant-containing photosensitive resin composition that can form an excellent crack resistant cured product for use in the formation of organic EL element barrier ribs. One embodiment of the photosensitive resin composition for use in organic EL element barrier ribs comprises: (A) a binder resin; (B) a phenolic hydroxyl group-containing compound having a molecular weight of 260 to 5,000 and a phenolic hydroxyl group equivalent of 80 to 155; (C) a radiation sensitive compound; and (D) a colorant selected from the group consisting of black dyes and black pigments.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: May 16, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Kentaro Furue, Yoshikazu Arai
  • Patent number: 11642721
    Abstract: A horizontal continuous casting apparatus includes a fluid supply pipe for supplying a lubricating fluid to the hollow portion of the mold, which is arranged on one end side of the mold; and, a cooling water cavity for accommodating cooling water cooling an inner peripheral surface of the hollow portion of the mold, which is formed outside the inner peripheral surface, wherein the inner peripheral surface and the inner bottom surface of the cooling water cavity facing the inner peripheral surface form parallel surfaces with each other, and a cooling wall of the mold between the inner peripheral surface and the inner bottom surface is formed so that the heat flux value per unit area from the molten aluminum alloy to the cooling water is 10×105 W/m2 or more.
    Type: Grant
    Filed: July 11, 2022
    Date of Patent: May 9, 2023
    Assignee: SHOWA DENKO K.K.
    Inventor: Yoshifumi Kimura
  • Patent number: 11643749
    Abstract: The present invention provides a crucible and a SiC single crystal growth apparatus capable of improving the efficiency of using source materials. The crucible includes a lid and a container. The container includes a bottom facing the lid. The bottom includes a recess which is recessed towards the lid.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: May 9, 2023
    Assignee: SHOWA DENKO K.K.
    Inventor: Yohei Fujikawa
  • Patent number: 11639330
    Abstract: Provided is a fluorine-containing ether compound that can be suitably used as a material for a lubricant for a magnetic recording medium, capable of forming a lubricant layer having excellent chemical substance resistance and wear resistance even when the thickness is small. A fluorine-containing ether compound represented by the following formula (1): R1—R2—CH2—R3—CH2—R4—R5??(1) In the formula (1), R3 is a perfluoropolyether chain. R2 and R4 are divalent linkage groups having a polar group, and may be the same or different. R1 and R5 are terminal groups bonded to R2 or R4, which may be the same or different, and at least one of R1 and R5 is an organic group having 1 to 8 carbon atoms wherein one or more hydrogen atoms of the organic group is substituted with a cyano group.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: May 2, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Masaki Nanko, Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Tsuyoshi Kato, Hiroyuki Tomita, Katsumi Murofushi, Shohei Nishizawa
  • Publication number: 20230132089
    Abstract: To provide a bonding technique that is capable of bonding a metal and a resin with a sufficient bonding strength. A bonded article including a functional group-carrying metal surface and a functional group-carrying resin surface, which are bonded directly to each other, the functional group-carrying metal surface having one or more kind of a functional group selected from the group consisting of an amino group, an epoxy group, a mercapto group, a styryl group, a (meth)acryloyl group, an isocyanato group, and an alkenyl group, on a surface of a metal, the functional group-carrying resin surface having one or more kind of a functional group selected from the group consisting of an amino group, an epoxy group, a mercapto group, a styryl group, a (meth)acryloyl group, an isocyanato group, and an alkenyl group, on a surface of a resin.
    Type: Application
    Filed: March 9, 2021
    Publication date: April 27, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Kazuo OTANI, Nobuyuki TAKAHASHI
  • Publication number: 20230120626
    Abstract: There is provided a fluorine-containing ether compound represented by the following formula. R1—R2—CH2—R3—CH2—OCH2CH(OH)CH2O—CH2—R3—CH2—R4—R5 (in the formula, R3 represents a perfluoropolyether chain; R2 and R4 represent a divalent linking group having a polar group and may be the same or different from each other; R1 and R5 represent a terminal group bonded to an oxygen atom of R2 or R4 and may be the same or different from each other; and at least one of R1 and R5 is an organic group having 1 to 8 carbon atoms and at least one of hydrogens included in the organic group is substituted by a cyano group).
    Type: Application
    Filed: December 16, 2020
    Publication date: April 20, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Tsuyoshi KATO, Katsumi MUROFUSHI, Daisuke YAGYU, Masaki NANKO, Natsumi SHIBATA
  • Publication number: 20230119637
    Abstract: Provided is a transparent conducting film having a preferable optical property, a preferable electrical property, and further, a superior durability of folding. The transparent conducting film comprises a transparent substrate and a transparent conducting layer formed on at least one of main faces of the transparent substrate, wherein the transparent conducting layer contains a binder resin and a conducting fiber, a cut portion of the transparent conducting film has a straightness of 0.050 mm or less. Preferably, the transparent substrate is a resin film having an elongated resin film or cut out from an elongated film, and can be folded in with a folding axis in the direction perpendicular to the longitudinal direction of the elongated resin film.
    Type: Application
    Filed: May 18, 2021
    Publication date: April 20, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Shigeru YAMAKI, Shuhei YONEDA
  • Publication number: 20230122232
    Abstract: A SiC ingot includes a seed crystal and a single crystal grown on the seed crystal, wherein the single crystal has therein a micropipe passing through the single crystal in a growth direction, and when photoluminescence observation is performed on a plurality of wafers cut out from the single crystal in a direction intersecting the growth direction, an S/N ratio of the micropipe in a first wafer cut out of the plurality of wafers, which is closest to the seed crystal, is higher than an S/N ratio of the micropipe in a second wafer cut out from a position further away from the seed crystal than the first wafer.
    Type: Application
    Filed: October 14, 2022
    Publication date: April 20, 2023
    Applicant: SHOWA DENKO K.K.
    Inventor: Yoshitaka NISHIHARA
  • Patent number: 11631855
    Abstract: The invention relates to a method for producing a slurry for a nonaqueous battery electrode, a method for producing a nonaqueous battery electrode, and a method for producing a nonaqueous battery. The method for producing a slurry for a nonaqueous battery electrode includes a dispersing step of dispersing a conductive auxiliary agent in an aqueous binder composition, and a mixing step of mixing the conductive auxiliary agent-containing binder composition obtained in the dispersing step with an active material. In the conductive auxiliary agent-containing binder composition, a particle diameter at which particles begin to appear, which is measured according to a degree of dispersion by a grain gauge method, is 90 ?m or less.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: April 18, 2023
    Assignee: SHOWA DENKO K. K.
    Inventors: Tomonori Kurata, Kirida Kunanuruksapong, Mitsuru Hanasaki
  • Patent number: 11629433
    Abstract: The invention provides a SiC single crystal production apparatus with high uniformity of temperature distribution in a crystal growth vessel. The SiC single crystal production apparatus includes a crystal growth vessel containing SiC raw material; an insulation part covering the periphery of the crystal growth vessel; a heater used to heat the crystal growth vessel; and a holding member used to hold the crystal growth vessel, wherein the crystal growth vessel is held in a suspended state by the holding member.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: April 18, 2023
    Assignee: SHOWA DENKO K.K.
    Inventor: Tomoya Utashiro
  • Publication number: 20230115042
    Abstract: A fluorine-containing ether compound represented by a formula (1) shown below. R1—(O(CH2)a)b-[A]-[B]—O—CH2—R2—CH2—R3??(1) (In the formula (1), R1 is an alkyl group which may have a substituent, or an organic group having at least one double bond or triple bond. Further, a represents an integer of 2 to 4, and b is 0 or 1. [A] is represented by a formula (2): —(OCH2CH(OH)CH2)c— (wherein c is 1 or 2). [B] is represented by a formula (3): —(O(CH2)eCH(OH)CH2)d— (wherein d is 0 or 1, and e represents an integer of 2 to 4). However, the sum of c in the formula (2) and d in the formula (3) is 2. R2 is a perfluoropolyether chain. R3 is represented by a formula (4): —(OCH2CH(OH)CH2)2—O—CH2(CH2)fOH (wherein f represents an integer of 2 to 5).
    Type: Application
    Filed: February 2, 2021
    Publication date: April 13, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Daisuke YAGYU, Tsuyoshi KATO, Ayano ASANO, Natsumi SHIBATA, Naoya FUKUMOTO
  • Publication number: 20230104309
    Abstract: An electrode body having an electrode, and a primer layer or a plurality of primer layers laminated on the electrode, wherein the at least one primer layer is an in-situ polymerizable composition layer formed from a polymerization product of an in-situ polymerizable composition, a method for producing an electrode body, and an electrochemical element.
    Type: Application
    Filed: March 17, 2021
    Publication date: April 6, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Nobuyuki TAKAHASHI, Kazuo OTANI
  • Patent number: 11618969
    Abstract: A SiC single crystal composite includes: a central portion positioned at a center in plan view; and an outer circumferential portion surrounding an outer circumference of the central portion, in which crystal planes of the central portion and the outer circumferential portion are inclined to each other or different from each other, a boundary is present between the central portion and the outer circumferential portion, and a direction of a crystal constituting the central portion and a direction of a crystal constituting the outer circumferential portion are different from each other via the boundary.
    Type: Grant
    Filed: November 14, 2017
    Date of Patent: April 4, 2023
    Assignees: SHOWA DENKO K.K., DENSO CORPORATION
    Inventors: Yohei Fujikawa, Hideyuki Uehigashi
  • Publication number: 20230099918
    Abstract: There is provided a fluorine-containing ether compound represented by the following formula. R1—R2—CH2—R3—CH2—OCH2CH(OH)CH2O—CH2—R3—CH2—R4—R5 (in the formula. R3 represents a perfluoropolyether chain; R2 and R4 represent a divalent linking group having a polar group; R1 and R5 represent a terminal group bonded to an oxygen atom of R2 or R4; and at least one of R1 and R5 is any one selected from the group consisting of an alkenyl group having 2 to 8 carbon atoms, an alkynyl group having 3 to 8 carbon atoms, an aromatic hydrocarbon-containing group, and an aromatic heterocycle-containing group).
    Type: Application
    Filed: December 17, 2020
    Publication date: March 30, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Tsuyoshi KATO, Katsumi MUROFUSHI, Daisuke YAGYU, Shunya SUZUKI, Ayano ASANO
  • Publication number: 20230090239
    Abstract: The present invention provides a fluorine-containing ether compound represented by the following formula: R1—R2—CH2—R3—CH2—R4—R5 (in the formula, R3 represents a perfluoropolyether chain; R1 and R5 each independently represent any of an alkyl group which may have a substituent, an organic group having a double bond or a triple bond, and a hydrogen atom; —R2—CH2—R3 is represented by -[A]-[B]—O—CH2—R3; R3—CH2—R4— is represented by R3—CH2—O—[C]-[D]-; [A] is represented by Formula (4), [B] is represented by Formula (5), [C] is represented by Formula (6), and [D] is represented by Formula (7)):
    Type: Application
    Filed: December 22, 2020
    Publication date: March 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventor: Masaki NANKO
  • Patent number: 11607656
    Abstract: A fixed-bed multi-tubular reactor for producing an alkenyl acetate by a gas phase catalytic oxidation reaction of a lower olefin, acetic acid and oxygen including a plurality of reaction tubes, a thermometer protection tube inserted into at least one of the plurality of reaction tubes, a thermometer inserted into the thermometer protection tube, and a shield disposed above the reaction tube into which the thermometer protection tube is inserted and attached to the thermometer protection tube, wherein an effective projection region of the shield entirely covers the inlet opening of the reaction tube into which the thermometer protection tube is inserted.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: March 21, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Yasuhiro Iwama, Maiko Ikushima, Kazuki Umehara, Mitsuru Tanaka, Toshiyuki Maki
  • Patent number: 11603627
    Abstract: By sequentially performing: a step (I) of dissolving fullerene C60 in a polyalkylene glycol to prepare a fullerene solution; a step (II) of immersing a material carbon fiber in the fullerene solution; and a step (III) of extracting the carbon fiber from the fullerene solution, washing the extracted carbon fiber with water, and drying the carbon fiber washed with water, a carbon fiber on which fullerene C60 adsorbs is obtained.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: March 14, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Takeshi Igarashi, Tomoyuki Takei, Yu Gao, Masumi Kuritani
  • Patent number: 11603447
    Abstract: The present invention relates to a method of producing a chitin oligomer, including subjecting chitin-containing biomass to partial hydrolysis while pulverizing the chitin-containing biomass with a pulverization apparatus in the co-presence of water and an acid catalyst selected from phosphoric acid, nitrous acid, and an organic acid (Method 1); a method of producing N-acetylglucosamine, including hydrolyzing a chitin oligomer obtained by the Method 1 by adding water thereto, followed by heating (Method 2); and a method of producing a 1-O-alkyl-N-acetylglucosamine, including alcoholyzing a chitin oligomer by adding an alcohol thereto (Method 3).
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: March 14, 2023
    Assignees: SHOWA DENKO K. K., NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY
    Inventors: Ichiro Fujita, Atsushi Fukuoka, Hirokazu Kobayashi
  • Patent number: 11600538
    Abstract: A SiC epitaxial wafer according to an embodiment includes: a SiC substrate; and a SiC epitaxial layer formed on a first surface of the SiC substrate. The in-plane uniformity of a density of Z1/2 centers of the SiC epitaxial layer is 5% or less.
    Type: Grant
    Filed: November 24, 2021
    Date of Patent: March 7, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoto Ishibashi, Koichi Murata, Hidekazu Tsuchida
  • Patent number: 11599023
    Abstract: There is provided a highly sensitive colorant-containing photosensitive resin composition for use in the formation of organic EL element barrier ribs. In one embodiment, the photosensitive resin composition for an organic EL element barrier rib comprises: (A) a binder resin; (B) at least one low molecular weight organic compound having a molar volume of 130 cm3/mol or less and being selected from the group consisting of aromatic carboxylic acids and compounds each having a plurality of phenolic hydroxyl groups; (C) a radiation sensitive compound; and (D) a colorant selected from the group consisting of black dyes and black pigments.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: March 7, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Kentaro Furue, Yuki Miyaishi