Patents Assigned to Showa Denko K.K.
  • Publication number: 20230067815
    Abstract: Provided are a gasification furnace operating method, a gasification furnace, a two-stage gasification apparatus, a gasification method for an organic raw material, and a two-stage gasification method for organic waste that make it possible to stably operate a gasification furnace over a long period of time. The present invention provides a gasification furnace operating method including, in a gasification furnace into which an organic raw material is introduced and that produces gas and slag, directly or indirectly introducing an alkali metal-containing compound into the gasification furnace to reduce the viscosity of the slag.
    Type: Application
    Filed: December 17, 2020
    Publication date: March 2, 2023
    Applicants: SHOWA DENKO K.K., UBE CORPORATION, EBARA ENVIRONMENTAL PLANT CO., LTD.
    Inventors: Tomoaki FUKUI, Junichi AKIYAMA
  • Publication number: 20230062863
    Abstract: A method for manufacturing an AlN-based laminate includes: forming on or above a substrate 210 a single-crystalline electrode layer 230 containing a metal element; and forming an AlN-based piezoelectric layer 240 on the electrode layer 230 by sputtering. Forming the piezoelectric layer 240 includes applying a pulse voltage to a target during the sputtering at a duty ratio of not more than 4% and at an average power density during pulse application of from 200 W/cm2 to 2500 W/cm2.
    Type: Application
    Filed: January 28, 2022
    Publication date: March 2, 2023
    Applicant: SHOWA DENKO K. K.
    Inventors: Sho TONEGAWA, Akira SAKAWAKI, Daizo ENDO, Kota HASEGAWA
  • Patent number: 11591480
    Abstract: A method of manufacturing a solid electrolytic capacitor, including: a step (A) of providing a conjugated conductive polymer-containing dispersion by polymerizing, in a dispersion medium containing seed particles turned into protective colloid by a polyanion or in a dispersion medium containing the polyanion, a monomer for obtaining a conjugated conductive polymer; a step (B) of preparing a dispersion containing a morpholine compound and the conjugated conductive polymer by adding the morpholine compound to the conjugated conductive polymer-containing dispersion; a step (C) of causing the dispersion to adhere to a porous anode body formed of a valve metal having a dielectric film on a surface thereof; and a step (D) of forming a solid electrolyte layer by removing the dispersion medium from the dispersion containing the morpholine compound and the conjugated conductive polymer, the dispersion adhering to the porous anode body.
    Type: Grant
    Filed: May 9, 2018
    Date of Patent: February 28, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Motoaki Araki, Takashi Okubo
  • Publication number: 20230055947
    Abstract: An acceleration sensor is provided in which a sensitive color plate is provided between two polarizing plates that are in a crossed Nicol disposition, and a silver nanowire dispersion is disposed between the sensitive color plate and one of the polarizing plates.
    Type: Application
    Filed: December 18, 2020
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Yasunao MIYAMURA, Yasushi KADOWAKI, Kuniaki YAMATAKE, Masanao HARA, Shigeru YAMAKI, Hideki OHATA
  • Publication number: 20230055999
    Abstract: A method of manufacturing a SiC epitaxial wafer in which a SiC epitaxial layer is formed on a SiC single crystal substrate, the method including identifying a total number of large-pit defects caused by micropipes in the SiC single crystal substrate and large-pit defects caused by substrate carbon inclusions, both of which are contained in the SiC epitaxial layer, using microscopic and photoluminescence images. Also disclosed is a method of manufacturing a SiC epitaxial wafer in which a SiC epitaxial layer is formed on a single crystal substrate, the method including identifying locations of the large-pit defects caused by micropipes in the SiC single crystal substrate and the large-pit defects caused by substrate carbon inclusions in the SiC epitaxial layer, using microscopic and photoluminescence images.
    Type: Application
    Filed: November 4, 2022
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshitaka Nishihara, Keisuke Fukada
  • Publication number: 20230056113
    Abstract: The present invention relates to a composition including a chloroprene polymer, a molded body, and a method for producing a molded body, and the composition includes a chloroprene polymer (A), and a thiol compound (B) having 2 mercapto groups in a molecule. An amount of the thiol compound (B) is 1.5 to 20 parts by mass per 100 parts by mass of the chloroprene polymer (A).
    Type: Application
    Filed: January 5, 2021
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventor: Ichiro SAGAE
  • Publication number: 20230058675
    Abstract: The invention provides a radically polymerizable resin composition capable of suppressing shrinkage while maintaining strength by adding an appropriate amount of an expansive additive to the radically polymerizable resin composition causing curing shrinkage by a decrease in the free volume of a liquid component during curing. The radically polymerizable resin composition comprises a radically polymerizable compound (A), an expansive additive (B), a radical polymerization initiator (C), and an aggregate (D). The aggregate (D) contains cement. The aggregate (D) is 330 to 800 parts by mass with respect to 100 parts by mass of the radically polymerizable compound (A).
    Type: Application
    Filed: December 21, 2020
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoichiro SAKAGUCHI, Kohei SAITO
  • Publication number: 20230059522
    Abstract: The present invention relates to a latex composition, a molded body, and a method for producing a molded body, and the latex composition includes a chloroprene polymer (A), and a thiol compound (B) having 2 or more mercapto groups in a molecule.
    Type: Application
    Filed: January 5, 2021
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Ichiro SAGAE, Noriko OGAWA
  • Publication number: 20230059734
    Abstract: A piezoelectric film including a piezoelectric body configured to extract radio waves of a required frequency by resonance is provided. The piezoelectric body is based on either of ScAlN or AlN, and an X-ray rocking curve full-width at half-maximum (FWHM) of the piezoelectric body in a lattice plane with a Miller index of (11-20) is not more than 10°.
    Type: Application
    Filed: January 28, 2022
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Sho TONEGAWA, Akira SAKAWAKI, Daizo ENDO, Kota HASEGAWA
  • Publication number: 20230053754
    Abstract: Provided is a laminate including: a substrate 210, an electrode layer 230 disposed on or above the substrate 210 and having a single-crystalline structure containing a metal element; a buffer layer 220 formed between the substrate 210 and the electrode layer 230 and configured to improve crystal orientation of the electrode layer 230; and a piezoelectric layer 240 formed on the electrode layer 230 and made of a piezoelectric body. Each of the buffer layer 220 and the piezoelectric layer 240 has a single-crystalline structure based on a composition of either ScAlN or AlN.
    Type: Application
    Filed: January 28, 2022
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K. K.
    Inventors: Sho Tonegawa, Akira Sakawaki, Daizo Endo, Kota Hasegawa
  • Publication number: 20230056109
    Abstract: The objective of the present invention is to reduce the content of dialkylcarbamoyl chloride contained in a (meth)acrylic acid ester compound having an isocyanate group. The present invention includes a method for producing a (meth)acrylic acid ester compound having an isocyanate group in which the content of dialkylcarbamoyl chloride is 0.1 mass % or less, where the method includes a step (2) in which a predetermined compound (B) and phosgene are brought into contact in the presence of an N-disubstituted formamide compound (A) to obtain a phosgene reaction product, and a step (3) in which the phosgene reaction product obtained in step (2) and a hydroxylamine hydrochloride compound are brought into contact to obtain a (meth)acrylic acid ester compound having a predetermined isocyanate group.
    Type: Application
    Filed: January 4, 2021
    Publication date: February 23, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Tomomitsu WAKABAYASHI, Yoshihiko MAEDA
  • Patent number: 11588148
    Abstract: Powder comprising particles comprising a matrix material and silicon-based domains dispersed in this matrix material, whereby the matrix material is carbon or a material that can be thermally decomposed to carbon, whereby either part of the silicon-based domains are present in the form of agglomerates of silicon-based domains whereby at least 98% of these agglomerates have a maximum size of 3 ?m or less, or the silicon-based domains are not at all agglomerated into agglomerates.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: February 21, 2023
    Assignees: Umicore, Showa Denko K.K.
    Inventors: Stijn Put, Dirk Van Genechten, Jan Gilleir, Nicolas Marx, Arihiro Muto, Nobuaki Ishii, Masataka Takeuchi
  • Patent number: 11587580
    Abstract: A magnetic storage apparatus includes a disk-shaped magnetic recording medium, a motor which drives and rotates the magnetic recording medium, a magnetic head, including a first magnetic head element which reads information from the magnetic recording medium, and a second magnetic head element which writes information to the magnetic recording medium, and a bias circuit which supplies a predetermined bias voltage to the first magnetic head element. The magnetic recording medium has a laminated structure including a magnetic layer disposed above a substrate, and a carbon protective layer disposed above the magnetic layer. The bias circuit supplies to the first magnetic head element a voltage which is in a range of ?0.2 V to ?1.0 V with respect to a potential of the magnetic recording medium.
    Type: Grant
    Filed: April 8, 2022
    Date of Patent: February 21, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Yoshihito Sueoka, Koji Itokazu, Noriya Seiki, Michitaka Takasaki
  • Patent number: 11584821
    Abstract: A polyisocyanurate raw material composition containing a polyfunctional isocyanate, a compound (I) represented by general formula (I) shown below, and an epoxy compound. In general formula (I), each of R1 to R5 represents a hydrogen atom, an alkoxy group of 1 to 10 carbon atoms, an alkyl group of 2 to 10 carbon atoms (or an alkyl group of 1 to 10 carbon atoms in the case of R3 to R5), an aryl group of 6 to 12 carbon atoms, an amino group, a monoalkylamino group of 1 to 10 carbon atoms, a dialkylamino group of 2 to 20 carbon atoms, a carboxy group, a cyano group, a fluoroalkyl group of 1 to 10 carbon atoms, or a halogen atom (provide that R1 and R2 are not both hydrogen atoms).
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: February 21, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Hiroki Kuramoto, Kenichi Nakanishi, Shohei Nishizawa, Yoshishige Okuno
  • Patent number: 11585043
    Abstract: By sequentially performing: a step (I) of dissolving fullerene C70 in an organic solvent to prepare a fullerene solution; a step (II) of immersing a material carbon fiber in the fullerene solution; and a step (III) of extracting the carbon fiber from the fullerene solution and drying the extracted carbon fiber, a carbon fiber on which fullerene C70 adsorbs is obtained.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: February 21, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Takeshi Igarashi, Tomoyuki Takei, Yu Gao, Masumi Kuritani
  • Publication number: 20230046460
    Abstract: In a method for producing a high-molecular-weight polymer sheet, when a monomer composition including silver nanowires is polymerized, the monomer composition is allowed to stand in a state in which a thickness direction of the obtained high-molecular-weight polymer sheet before the polymerization is a vertical direction, and the silver nanowires in the monomer composition are oriented in the vertical direction and polymerized.
    Type: Application
    Filed: December 18, 2020
    Publication date: February 16, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Yasunao MIYAMURA, Yasushi KADOWAKI, Kuniaki YAMATAKE, Masanao HARA, Shigeru YAMAKI, Hideki OHATA
  • Patent number: 11577957
    Abstract: A hexagonal boron nitride powder having an average longer diameter (L) of primary particles in the hexagonal boron nitride powder of more than 10.0 ?m and 30.0 ?m or less, an average thickness (D) of the primary particles in the hexagonal boron nitride powder of 1.0 ?m or more, a ratio of the average longer diameter (L) to the average thickness (D), [L/D], of 3.0 or more and 5.0 or less, and a content of primary particles having a ratio of a longer diameter (1) to a thickness (d), [l/d], of 3.0 or more and 5.0 or less of 25% or more, a method for producing the hexagonal boron nitride powder, and a resin composition and a resin sheet each containing the hexagonal boron nitride powder.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: February 14, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Yuki Otsuka, Masaru Fukasawa
  • Publication number: 20230038132
    Abstract: A SiC epitaxial wafer includes a SiC substrate and an epitaxial layer laminated on the SiC substrate, wherein the epitaxial layer contains an impurity element which determines the conductivity type of the epitaxial layer and boron which has a conductivity type different from the conductivity type of the impurity element, and the concentration of boron is less than 1.0×1014 cm?3 at any position in the plane of the epitaxial layer.
    Type: Application
    Filed: August 2, 2022
    Publication date: February 9, 2023
    Applicant: SHOWA DENKO K. K.
    Inventors: Kensho TANAKA, Yoshikazu Umeta
  • Publication number: 20230039366
    Abstract: The present invention provides a composition which is suppressed in decrease of the etching rate over time. A composition which contains; at least one of a quaternary alkyl ammonium fluoride and a hydrate of a quaternary alkyl ammonium fluoride; (A) an N-substituted amide compound that has no active hydrogen on a nitrogen atom and (B) a dipropylene glycol dimethyl ether, which serve as aprotic solvents; and an antioxidant.
    Type: Application
    Filed: March 24, 2021
    Publication date: February 9, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Kotaro HAYASHI, Susumu NAKAZAKI
  • Publication number: 20230039660
    Abstract: A SiC epitaxial wafer includes a SiC substrate and an epitaxial layer laminated on the SiC substrate, wherein the epitaxial layer contains an impurity element which determines the conductivity type of the epitaxial layer and boron which has a conductivity type different from the conductivity type of the impurity element, and the concentration of boron in the center of the epitaxial layer is less than 5.0×1012 cm?3.
    Type: Application
    Filed: August 2, 2022
    Publication date: February 9, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Kensho TANAKA, Yoshikazu Umeta