Patents Assigned to Tohoku Techno Arch Co., Ltd.
  • Patent number: 9711262
    Abstract: A compound superconducting wire 10 includes a reinforcement portion 12 and a compound superconductor 11. In the reinforcement portion 12, an assembly of plural reinforcement elements 4 are disposed. The reinforcement elements 4 each include plural reinforcement filaments 1 disposed in a stabilizer 2, and a stabilizing layer 3 at the outer periphery thereof. The reinforcement filaments 1 each mainly contain one or more metals selected from the group consisting of Nb, Ta, V, W, Mo, Fe, and Hf, an alloy consisting of two or more metals selected from the aforementioned group, or an alloy consisting of copper and one or more metals selected from the aforementioned group.
    Type: Grant
    Filed: October 9, 2014
    Date of Patent: July 18, 2017
    Assignee: TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Masahiro Sugimoto, Hirokazu Tsubouchi, Kazuo Watanabe, Satoshi Awaji, Hidetoshi Oguro
  • Publication number: 20170172711
    Abstract: The present invention provides a dental member, which has a reduced size, and thus prevents damages to tooth roots upon implantation, has high strength and low elasticity, and is excellent in engraftment stability after implantation. The dental member is produced with an amorphous alloy having a composition represented by formula: ZraNibCucAld [wherein “a” ranges from 60 to 75 at. %, “b” ranges from 11 to 30 at. %, “c” ranges from 1 to 16 at. %, and “d” ranges from 5 to 20 at. %] and is used as an orthodontic anchor screw wherein the screw part has a core diameter of 0.5-1.0 mm or a length of 2-5 mm, a one-piece-type dental implant wherein the screw part has the largest diameter of 0.5-2.9 mm and a length of 2-13.4 mm, or a two-piece-type dental implant wherein the screw part has the largest diameter of 0.5-2.9 mm and a length of 2-5.9 mm.
    Type: Application
    Filed: February 5, 2015
    Publication date: June 22, 2017
    Applicants: MARUEMU WORKS CO., LTD., TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Teruko YAMAMOTO, Yoshihiko YOKOYAMA
  • Publication number: 20170044433
    Abstract: An illuminant has a short fluorescence lifetime, high transparency, and high light yield and a radiation detector uses the illuminant. The illuminant is appropriate for a radiation detector for detecting gamma-rays, X-rays, ?-rays, and neutron rays, and has high radiation resistance, a short fluorescence decay time and high emission intensity. The illuminant has a garnet structure using emission from the 4f5d level of Ce3+, and includes a garnet illuminant prepared by co-doping of at least one type of monovalent or divalent cation at a molar ratio of 7000 ppm or less with respect to all cations, to an illuminant having a garnet structure represented by general formula CexRE3?xM5+yO12+3y/2 (where 0.0001?x?0.3, 0?y?0.5 or 0?y??0.5, M is one type or two or more types selected from Al, Lu, Ga, and Sc, and RE is one type or two or more types selected from La, Pr, Gd, Tb, Yb, Y, and Lu).
    Type: Application
    Filed: April 30, 2015
    Publication date: February 16, 2017
    Applicants: TOHOKU TECHNO ARCH CO., LTD., C & A CORPORATION
    Inventors: Kei KAMADA, Akira YOSHIKAWA, Yuui YOKOTA, Shunsuke KUROSAWA, Yasuhiro SHOJI
  • Publication number: 20170011886
    Abstract: Disclosed is a plasma processing apparatus including: a processing container; and a partition plate made of an insulating material, having a plurality of openings, and configured to partition an inside of the processing container into a plasma generating chamber and a processing chamber. A first conductive member made of a conductive material is provided on a surface of the processing chamber side of the partition plate, and the first conductive member is applied with at least one of an AC voltage, and a DC voltage of a polarity that is opposite to a polarity of charged particles guided from the plasma generating chamber into the processing chamber through each of the openings.
    Type: Application
    Filed: July 7, 2016
    Publication date: January 12, 2017
    Applicants: TOKYO ELECTRON LIMITED, TOHOKU TECHNO ARCH CO., LTD
    Inventors: Toshihisa NOZAWA, Kazuki MOYAMA, Ryo MIYAMA, Seiji SAMUKAWA
  • Publication number: 20160336190
    Abstract: Provided is a method for forming a low dielectric constant film on a substrate placed in a processing chamber inside a processing container. The method includes: generating plasma using microwaves by supplying at least a noble gas to a plasma generation chamber, which is formed above the processing chamber inside the processing container; forming a low dielectric constant film on the substrate by supplying particles from the plasma generation chamber to the processing chamber and supplying a precursor gas to the processing chamber through a shield unit provided between the plasma generation chamber and the processing chamber, the shield unit having a plurality of openings configured to communicate the plasma generation chamber with the processing chamber, and having a shielding property against ultraviolet light; and then, performing a heat treatment on the substrate.
    Type: Application
    Filed: January 14, 2015
    Publication date: November 17, 2016
    Applicants: TOKYO ELECTRON LIMITED, TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Yoshiyuki KIKUCHI, Yasuaki SAKAKIBARA, Seiji SAMUKAWA
  • Publication number: 20160211145
    Abstract: Disclosed is a method for etching a group III-V semiconductor, including irradiating, under an atmosphere of an organic gas, neutral particles to a group III-V semiconductor layer formed on a substrate to cause a complex reaction, thereby etching the group III-V semiconductor layer.
    Type: Application
    Filed: January 19, 2016
    Publication date: July 21, 2016
    Applicants: TOKYO ELECTRON LIMITED, TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Xun Gu, Yoshiyuki Kikuchi, Seiji Samukawa
  • Publication number: 20160204467
    Abstract: One embodiment provides a solid-state battery that has a positive-electrode layer, a negative-electrode layer, and a lithium-ion-conducting solid electrolyte layer disposed between the positive-electrode layer and the negative-electrode layer. The positive-electrode layer and/or the solid electrolyte layer contains a sulfide solid electrolyte, the negative-electrode layer and/or the solid electrolyte layer contains a solid electrolyte comprising a hydride of a complex, and at least part of the sulfide solid electrolyte is in contact with at least part of the solid electrolyte comprising a hydride of a complex.
    Type: Application
    Filed: August 27, 2014
    Publication date: July 14, 2016
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Genki NOGAMI, Mitsugu TANIGUCHI, Atsushi UNEMOTO, Motoaki MATSUO, Shinichi ORIMO
  • Publication number: 20160204466
    Abstract: One embodiment provides a solid-state battery that has a positive-electrode layer; a negative-electrode layer; and a lithium-ion-conducting solid electrolyte layer disposed between the positive-electrode layer and the negative-electrode layer. The positive-electrode layer contains a positive-electrode active material and a solid electrolyte comprising a hydride of a complex. Said positive-electrode active material is sulfur-based, and the solid electrolyte layer contains a solid electrolyte comprising a hydride of a complex.
    Type: Application
    Filed: August 27, 2014
    Publication date: July 14, 2016
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Genki NOGAMI, Mitsugu TANIGUCHI, Masaru TAZAWA, Atsushi UNEMOTO, Motoaki MATSUO, Shinichi ORIMO
  • Patent number: 9180207
    Abstract: The present invention relates to a model animal spontaneously developing anemia. More specifically, the invention relates to a transgenic non-human mammal spontaneously developing anemia associated with a postnatal decrease in production of erythropoietin (Epo), Epo-producing cells prepared from the transgenic non-human mammal, and a screening method using the Epo-producing cells.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: November 10, 2015
    Assignee: TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Masayuki Yamamoto, Naoko Minegishi, Shun Yamazaki
  • Publication number: 20150197853
    Abstract: Provided is a substrate processing including: a plasma generation source configured to generate the plasma within the processing container; a substrate holding mechanism configured to hold the substrate within the processing container; a separation plate disposed between the plasma generation source and the substrate holding mechanism and having a plurality of openings formed therein, in which the plurality of openings are configured to neutralize the plasma generated in the plasma generation source so as to form neutral particles, and to irradiate the neutral particles onto the substrate; and a directivity adjusting mechanism configured to adjust directivity of the neutral particles irradiated onto the substrate such that a plurality of peak values of an incident angle distribution of the neutral particles on the substrate are distributed at positions which are deviated from a normal direction of the substrate and located on both sides of the normal direction.
    Type: Application
    Filed: January 15, 2015
    Publication date: July 16, 2015
    Applicants: TOHOKU TECHNO ARCH CO., LTD., TOKYO ELECTRON LIMITED
    Inventors: Kiyotaka ISHIBASHI, Yoshiyuki KIKUCHI, Seiji SAMUKAWA
  • Patent number: 9022947
    Abstract: Continuous measurement of breathing impedance with extremely high precision is enabled by executing noise elimination. A loudspeaker applies an air vibration pressure by an oscillation wave to an oral cavity, the oscillation wave being obtained by frequency-cuffing so executed that the oscillation wave has only the frequency component that is left after the culling is executed from a plurality of different frequencies and being generated by a pulse signal for pulse drive with pulses made positive and negative separately in correspondence to the time of exhalation and the time of inhalation. A pressure inside the oral cavity is detected and a breathing flow is detected, and a signal obtained by the detection is Fourier-transformed to obtain a spectrum. Analysis of the spectrum is performed to obtain breathing impedance.
    Type: Grant
    Filed: April 12, 2010
    Date of Patent: May 5, 2015
    Assignees: Chest M.I. Incorporated, Tohoku Techno Arch Co., Ltd.
    Inventors: Hajime Kurosawa, Yoshio Shimizu, Toshiaki Hoki
  • Patent number: 8980428
    Abstract: Porous silicon particles and complex porous silicon particles suitable for negative electrode materials etc. for lithium-ion batteries, which achieve high capacity and good cycling characteristics, are provided. Porous silicon particles formed by the joining of a plurality of silicon microparticles, and having an average particle diameter of 0.1 ?m to 1000 ?m, a three-dimensional network structure having continuous gaps, an average porosity of 15 to 93%, and a structure in which the particles of a whole particle are uniform. Complex porous silicon particles formed by the joining of a plurality of silicon microparticles and a plurality of silicon compound particles, and characterized by containing a compound of silicon and composite elements, having an average particle diameter of 0.1 ?m to 1000 ?m, and having a three-dimensional network structure having continuous gaps.
    Type: Grant
    Filed: March 12, 2013
    Date of Patent: March 17, 2015
    Assignees: Furukawa Electric Co., Ltd., Tohoku Techno Arch Co., Ltd.
    Inventors: Hirokazu Yoshida, Kazutomi Miyoshi, Kazuhiko Kurusu, Toshio Tani, Koji Hataya, Takeshi Nishimura, Hidemi Kato, Takeshi Wada
  • Patent number: 8969812
    Abstract: The garnet-type crystal for a scintillator of the present invention is represented by General Formula (1), (2), or (3), Gd3-x-yCexREyAl5-zGazO12??(1) wherein in Formula (1), 0.0001?x?0.15, 0?y?0.1, 2<z?4.5, and RE represents at least one selected from Y, Yb, and Lu; Gd3-a-bCeaLubAl5-cGacO12??(2) wherein in Formula (2), 0.0001?a?0.15, 0.1<b?3, and 2<c?4.5; Gd3-p-qCerRE?qAl5-rGarO12??(3) wherein in Formula (3), 0.0001?p?0.15, 0.1<q?3, 1<r?4.5, and RE? represents Y or Yb.
    Type: Grant
    Filed: January 27, 2012
    Date of Patent: March 3, 2015
    Assignees: Furukawa Co., Ltd., Tohoku Techno Arch Co., Ltd.
    Inventors: Akira Yoshikawa, Takayuki Yanagida, Kei Kamada, Hiroki Sato, Kosuke Tsutsumi, Takanori Endo, Shigeki Ito
  • Publication number: 20140326424
    Abstract: The Present invention provides an arc melting furnace apparatus and a method of controlling arc discharge, in which a melt material having been melted can be stirred efficiently, avoiding labor intensive work. The furnace is provided with a mold 3 having a recess 3a and provided in a melting chamber 2, a non-consumable discharge electrode 5 for heating and melting a melt material accommodated in the recess 3a, a power source unit 10 for supplying electric power to the non-consumable discharge electrode 5, and a control device 11 which controls the power source unit to control output intensity of the arc discharge from the non-consumable discharge electrode. The control device 11 controls output current from the power source unit 10 and its current frequency to vary the output intensity of the arc discharge from the non-consumable discharge electrode 5 and stir a molten metal resulting from heating and melting the melt material.
    Type: Application
    Filed: August 9, 2012
    Publication date: November 6, 2014
    Applicants: TOHOKU TECHNO ARCH CO., LTD., DIAVAC LIMITED
    Inventors: Motohiro Kameyama, Yoshiaki Kawai, Yoshihiko Yokoyama, Akihisa Inoue
  • Publication number: 20140202286
    Abstract: A metal powder production method and a metal powder production device capable of reducing the size of the device, reducing costs, and obtaining spherical metal powder are provided. Supply means supplies a downward flow of molten metal, and a plurality of jet burners emit flame jets to the downward flow of the molten metal supplied from the supply means. Each of the jet burners is provided to emit the flame jet from the same angle and from each of positions rotationally symmetrical with each other with respect to the downward flow of the molten metal.
    Type: Application
    Filed: May 18, 2012
    Publication date: July 24, 2014
    Applicants: HARD INDUSTRY YUGEN KAISHA, TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Yoshihiko Yokoyama, Takuichi Yamagata, Torao Yamagata
  • Patent number: 8669367
    Abstract: To provide a method whereby a 2-azaadamantane can easily be obtained in good yield. A method for producing a 2-azaadamantane represented by the formula (1), which comprises cyclizing a compound represented by the following formula (2) in the presence of an acid.
    Type: Grant
    Filed: August 14, 2012
    Date of Patent: March 11, 2014
    Assignees: Nissan Chemical Industries, Ltd., Tohoku Techno Arch Co., Ltd.
    Inventors: Toshimasa Hamada, Noriaki Nagahama, Masami Kozawa, Yoshiharu Iwabuchi, Masatoshi Shibuya, Masaki Tomizawa, Yusuke Sasano
  • Publication number: 20140053288
    Abstract: The present invention relates to a model animal spontaneously developing anemia. More specifically, the invention relates to a transgenic non-human mammal spontaneously developing anemia associated with a postnatal decrease in production of erythropoietin (Epo), Epo-producing cells prepared from the transgenic non-human mammal, and a screening method using the Epo-producing cells.
    Type: Application
    Filed: March 29, 2012
    Publication date: February 20, 2014
    Applicant: TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Masayuki Yamamoto, Naoko Minegishi, Shun Yamazaki
  • Patent number: 8651169
    Abstract: An arc melting furnace apparatus is provided which reduces an operation burden on a worker and shortens working hours. An arc melting furnace apparatus 1 includes a housing 2 having formed therein a melting chamber 2a, a hearth 4 provided within the melting chamber 2a and having a recessed portion 4a, and a heating mechanism 10 for heating and melting a metal material supplied into the recessed portion 4 to generate an alloy ingot. The apparatus comprises a turning member 23 rotatably supported on a supporting member 21 standing within the melting chamber 2a, a perimeter edge of the turning member 23 rotating and moving along the inner surface of the recessed portion 4a to lift the alloy ingot generated in the recessed portion 4a above the hearth 4 and turn it over, and a resilient turn-over assisting member 24 provided above an upper end of the recessed portion 4a.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: February 18, 2014
    Assignees: Diavac Limited, Tohoku Techno Arch Co., Ltd.
    Inventors: Masaki Nagata, Motohiro Kameyama, Yoshihiko Yokoyama, Akihisa Inoue
  • Publication number: 20130333812
    Abstract: To provide a copper alloy of the FCC structure containing Ni: 3.0 to 29.5 mass %, Al: 0.5 to 7.0 mass %, and Si: 0.1 to 1.5 mass %, with the remainder consisting of Cu and incidental impurities, wherein the copper alloy is of the high strength, but is excellent in workability, and has high electrical conductivity, and can control property thereof, by precipitating a ?? phase of the L12 structure including Si at an average particle diameter of 100 nm or less in a parent phase of the copper alloy.
    Type: Application
    Filed: December 13, 2011
    Publication date: December 19, 2013
    Applicants: Tohoku Techno Arch Co., Ltd., Nippon Seisen Co., Ltd.
    Inventors: Kiyohito Ishida, Rysuke Kainuma, Ikuo Ohnuma, Toshihiro Omori, Takashi Miyamoto, Hiroki Sato
  • Publication number: 20130306874
    Abstract: The garnet-type crystal for a scintillator of the present invention is represented by General Formula (1), (2), or (3), Gd3-x-yCexREyAl5-zGazO12??(1) wherein in Formula (1), 0.0001?x?0.15, 0?y?0.1, 2<z?4.5, and RE represents at least one selected from Y, Yb, and Lu; Gd3-a-bCeaLubAl5-cGacO12??(2) wherein in Formula (2), 0.0001?a?0.15, 0.1<b?3, and 2<c?4.5; Gd3-p-qCerRE?qAl5-rGarO12??(3) wherein in Formula (3), 0.0001?p?0.15, 0.1<q?3, 1<r?4.5, and RE? represents Y or Yb.
    Type: Application
    Filed: January 27, 2012
    Publication date: November 21, 2013
    Applicants: TOHOKU TECHNO ARCH CO., LTD., FURUKAWA CO., LTD.
    Inventors: Akira Yoshikawa, Takayuki Yanagida, Kei Kamada, Hiroki Sato, Kosuke Tsutsumi, Takanori Endo, Shigeki Ito