Abstract: A memory device includes a memory array, a first latch and a first logic element. The memory array is configured to operate according to a first global write signal. The first latch is configured to generate a first latch write data based on a clock signal. The first logic element is configured to generate the first global write signal based on the clock signal and the first latch write data.

Abstract: An integrated circuit includes multiple memory cells, a first pair of complementary data lines, a second pair of complementary data lines, multiple first word lines, and multiple second word lines. The memory cells include a first array of memory cells and a second array of memory cells. The first pair of complementary data lines are coupled to the first array of memory cells. The second pair of complementary data lines are coupled to the second array of memory cells. Lengths of the first pair of complementary data lines are shorter than lengths of the second pair of complementary data lines. The first word lines and the second word lines are arranged according to a predetermined ratio of a number of the first word lines to a number of the second word lines. The predetermined ratio is less than 1.

Abstract: An IC structure includes first and second gates, first and second source/drain regions, and an isolation region. The first and second gates each have a first portion extending along a first direction and a second portion extending along a second direction. The first source/drain regions are respectively on opposite sides of the first portion of the first gate. The second source/drain regions are respectively on opposite sides of the first portion of the second gate. The isolation region has a lower portion between a first one of the first source/drain regions and a first one of the second source/drain regions, and an upper portion partially overlapping with the second portion of first gate and the second portion of the second gate. A width of the lower portion is a less than a width of the upper portion.

Abstract: An integrated circuit comprising an n-type drift region, a gate structure directly on a first portion of the n-type drift region, a drain structure formed in a second portion of the n-type drift region, the gate structure and the drain structure being separated by a drift region length, a resist protective oxide (RPO) formed over a portion of the n-type drift region between the gate structure and the drain structure, a field plate contact providing a direct electrical connection to the resist protective oxide.

Abstract: A method includes forming a body region of a first conductivity type and a doped region of a second conductivity type in a semiconductor substrate; forming a gate structure the substrate, and first gate spacers respectively on first and second sides of the gate structure; depositing a second spacer layer and a third spacer layer over the gate structure; patterning the third spacer layer into third gate spacers respectively on the first and second sides of the gate structure; removing a first one of the third gate spacers from the first side of the gate structure, while leaving a second one of the third gate spacers on the second side of the gate structure; and patterning the second spacer layer into a second gate spacer by using the second one of the third gate spacers as an etching mask.

Abstract: A device includes an electrostatic discharge (ESD) protection switch and an ESD driver. The ESD driver is configured to receive a first voltage at a first terminal and receive a second voltage at a second terminal and includes a first trigger circuit and a first resistor. The first trigger circuit includes a first input terminal and a first output terminal. The first input terminal is configured to receive the first voltage. The first resistor is coupled between the first output terminal and the second terminal. When the first voltage received at the first terminal is a first overvoltage and a voltage difference between the first voltage and the second voltage is higher than a first voltage threshold, the ESD driver outputs a first trigger signal to turn on the ESD protection switch.

Abstract: An integrated circuit includes integrated circuit includes a memory bank, a first group of word lines, a second group of word lines, an access circuit, a converter circuit and a decoder circuit. The first group of word lines is coupled to the memory bank. The second group of word lines is coupled to the memory bank, and arranged in order with the first group of word lines. The access circuit is configured to read the memory bank. The converter circuit is configured to control the access circuit at least based on a first control signal. The decoder circuit is configured to generate the first control signal at least according to a first bit and a second bit of an address signal. The first bit and the second bit indicates one group of the first group of word lines and the second group of word lines.

Abstract: A method includes steps of dividing a first arrangement of metal lines in a circuit layout into two sets of metal lines, a first set of metal lines in a peripheral area, and a second set of metal lines in a center area. The arrangement of metal lines is configured to electrically connect to contacts of a second layer of the circuit layout. The method includes adjusting a metal line perimeter of at least one metal line in the center area to make a second arrangement of metal lines, where each adjusted metal line perimeter is separated from contacts in the second layer of the integrated circuit layout by at least a check distance.

Abstract: A semiconductor device includes substrate, a first gate structure, a second gate structure, and an epitaxy layer. The first gate structure and the second gate structure are over the substrate, in which the first gate structure and the second gate structure each comprises a shielding electrode, a gate electrode over the shielding electrode, and a first gate dielectric layer vertically separating the shielding electrode from the gate electrode. The epitaxy layer is over the substrate and cups an underside of the first gate structure and the second gate structure, in which the epitaxy layer comprises a doped region laterally between the first gate dielectric layer of the first gate structure and the first gate dielectric layer of the second gate structure, a dopant concentration of the doped region being non-uniform along a lateral direction.

Abstract: A circuit includes a tracking word line, a power switch, a tracking bit line, a sense circuit. The power switch is coupled between the tracking word line and a first node. The power switch is configured to discharge a voltage level on the first node in response to a clock pulse signal transmitted through the tracking word line to the power switch. The tracking bit line is coupled between the first node and a plurality of tracking cells in a memory array. The sense circuit is coupled between the first node and a second node. The sense circuit is configured to generate a negative bit line enable signal in response to that the voltage level on the first node is below a threshold voltage value of the sense circuit.

Abstract: An integrated circuit includes a control circuit and first to second voltage generation circuits. The control circuit is coupled between a first voltage terminal providing a first supply voltage and a first node coupled to a first capacitive unit. The first voltage generation circuit includes at least one first transistor that has a source terminal receiving a second supply voltage, a drain terminal coupled to a second node in contact with a second capacitive unit, and a gate terminal coupled to the first node. The second voltage generation circuit is coupled to the first voltage terminal and the first and second nodes. Firstly the control circuit turns on the at least one first transistor to adjust a voltage level of the second node to have the second supply voltage. The second voltage generation circuit adjusts a voltage level of the first node to have the first supply voltage.

Abstract: A memory device includes a local input/output circuit and a main input/output circuit. The local input/output circuit is configured to generate a first local write signal based on a first global write signal and a second global write signal, and configured to transmit the first local write signal to a plurality of first bit lines. The main input/output circuit include a first latch and logic elements. The first latch is configured to generate a first bit write mask signal based on a clock signal. The logic elements are configured to generate the first global write signal and the second global write signal based on the clock signal and the first bit write mask signal.

Abstract: A memory circuit includes a NAND logic gate configured to receive a first bit line signal and a second bit line signal, and to generate a first signal. The memory circuit further includes a first N-type transistor coupled to the NAND logic gate, and configured to receive a first pre-charge signal. The memory circuit further includes a second N-type transistor coupled to the first N-type transistor and a reference voltage supply, and configured to receive a first clock signal. The memory circuit further includes a first latch coupled to the NAND logic gate, and configured to latch the first signal in response to at least the first clock signal or the first pre-charge signal.

Abstract: An integrated circuit includes a plurality of memory cells, a first pair of complementary data lines, and a second pair of complementary data lines. The plurality of memory cells include a first array of memory cells and a second array of memory cells. The first pair of complementary data lines are coupled to the first array of memory cells. The second pair of complementary data lines are different from the first pair of complementary data lines and are coupled to the second array of memory cells. A number of memory cells in the first array of memory cells is different from a number of memory cells in the second array of memory cells.

Abstract: A circuit includes a plurality of registers, each register including SRAM cells, a read port configured to receive a read address, a write port configured to receive a write address, a selection circuit, a latch circuit, and a decoder coupled in series between the read and write ports and the plurality of registers, and a control circuit. Responsive to a clock signal and read and write enable signals, the control circuit causes the selection circuit, the latch circuit, and the decoder to select a first register of the plurality of registers in a read operation based on the read address, and select a second register of the plurality of registers in a write operation based on the write address.

Abstract: A semiconductor device includes a first semiconductor region having a first conductivity type and a second semiconductor region having a second conductivity type, a source region and a body contact region in the second semiconductor region. The semiconductor device also includes a channel region, in the second semiconductor region, located laterally between the source region and the first semiconductor region, a gate dielectric layer overlying both the channel region and a portion of the first semiconductor region, and a gate electrode overlying the gate dielectric layer. The semiconductor device further includes a conformal conductive layer covering an upper surface of the body contact region and a side surface of the source region.

Abstract: An integrated circuit includes a middle active-region structure between a group-one active-region structure and a group-two active-region structure. The integrated circuit also includes a main circuit, a group-one circuit, and a group-two circuit. The main circuit includes at least one boundary gate-conductor intersecting the middle active-region structure. The group-one circuit includes a group-one isolation structure separating the group-one active-region structure into a first part in the group-one circuit and a second part in a first adjacent circuit. The group-two circuit includes a group-two isolation structure separating the group-two active-region structure into a first part in the group-two circuit and a second part in a second adjacent circuit.

Abstract: A circuit includes an output node and an amplifier and first and second branches coupled between power supply and reference nodes. The first branch includes a first switching device coupled between a first amplifier input and the reference node, the second branch includes a second switching device coupled between the output node and a second amplifier input, and a third switching device is coupled between the power supply and output nodes. Responsive to a first voltage level on the power supply node, each of the first and second switching devices is switched off and the third switching device is switched on, and responsive to a second voltage level on the power supply node greater than the first voltage level, each of the first and second switching devices is switched on and the third switching device is switched off.

Abstract: A semiconductor device includes a substrate, a first well region in the substrate, a gate structure over the substrate, a second well region and a third well region in the substrate and under the gate structure, and a source region and a drain region on opposite sides of the gate structure. The drain region is in the second well region and the source region is in the third well region. The drain region has a first doped region and a second doped region, and the first doped region and the second doped region have different conductivity types.

Abstract: A method includes specifying a target memory macro, and determining failure rates of function-blocks in the target memory macro based on an amount of transistors and area distributions in a collection of base cells. The method also includes determining a safety level of the target memory macro, based upon a failure-mode analysis of the target memory macro, from a memory compiler, based on the determined failure rate.