Abstract: Each memory block in the flash memory is added with corresponding information bit(s) that store(s) information indicating whether erasure of the memory block has been completed before power-off. This allows easily finding out which memory block in the flash memory is undergoing an erase operation at the time of power-off. When the flash memory is powered on again, the information in the corresponding information bit(s) of the memory blocks may be read out and checked to determine whether there is any memory block of which the erasure had not been completed before the last power-off. If so, the memory blocks in the flash memory will be reprogrammed during the re-powering. This can avoid possible failure in reading data from some memory cells in the flash memory.

Abstract: The present disclosure provides a pad structure and a testkey structure and a testing method for a semiconductor device. The pad structure includes: an insulating dielectric layer formed on a substrate; a metal interconnection structure formed in the insulating dielectric layer, the metal interconnection structure comprising a first section and a second section, which are insulated from each other; and a pad formed on the top of the insulating dielectric layer so as to be exposed therefrom at least at its top surface, electrically connected to the first section, and insulated from the second section. With this disclosure, reduced capture of plasma is achievable, mitigating adverse impact of plasma on the semiconductor device.

Abstract: A semiconductor device and a method of fabricating same are disclosed. The semiconductor device includes: an SOI substrate including, stacked from the bottom upward, a lower substrate, a buried insulator layer and a semiconductor layer, wherein active regions surrounded by trench isolation structures are formed in the semiconductor layer; a gate electrode layer formed over the semiconductor layer, the gate electrode layer extending from active regions to trench isolation structures; and a source region and a drain region formed in the active regions that are on opposing sides of the gate electrode layer, wherein at least one end portion of the gate electrode layer laterally spans over interfaces of the active regions and the trench isolation structures toward the source region and/or the drain region. Thereby leakage at the interfaces of the active regions and the trench isolation structures can be reduced, resulting in improved performance of the semiconductor device.

Abstract: A storage device and a manufacturing method thereof are provided and relate to the technology field of storage. The storage device includes storage a first chip and a second chip. The first chip includes a storage array. The storage array includes at least one storage block. The second chip includes a logic control circuit. The logic control circuit includes a global bit line decoder. The global bit line decoder is electrically connected to the at least one storage block. An occupied area after the first chip and the second chip are stacked can be reduced by constructing the global bit line decoder block constituted by the global bit line decoder in the top view projection area of the second chip, thereby reducing plane occupied space of the storage device. This is beneficial for minimizing the size of the storage device.

Abstract: A method of fabricating an IC device is disclosed, in which a dielectric layer is first etched to form a contact opening and a dummy opening. Both do not extend through the dielectric layer, the contact opening has a width greater than that of the dummy opening. A sacrificial layer, which covers inner surface of the dummy opening and the dielectric layer at side surface of the contact opening, and from which the dielectric layer at bottom surface of the contact opening is exposed, is then formed, and under protection of this sacrificial layer, the dielectric layer exposed in the contact opening is etched in a self-aligned manner, a self-aligned contact hole is formed, in which a surface of the conductive structure is exposed. In this way, reliability of a contact that extends in both contact opening and self-aligned contact hole is ensured, avoiding the problem of possible contact failure.

Abstract: A semiconductor device and a method of fabricating thereof are disclosed. The method of fabricating a semiconductor device includes: forming a trench fill structure in a substrate in a pixel area; covering a buffer dielectric layer over a surface of the substrate in the pixel area, the buffer dielectric layer burying the trench fill structure; etching the buffer dielectric layer to form a first opening, which exposes at least a portion of the substrate surrounding sidewalls of a top of the trench fill structure and/or at least a portion of the top of the trench fill structure; and forming a metal grid layer on the buffer dielectric layer, wherein the metal grid layer fills the first opening and is electrically connected to the exposed portion of the substrate and/or the exposed portion of the trench fill structure.

Abstract: The present invention relates to a photosensitive array and an imaging apparatus incorporating the photosensitive array. Each pixel region in the photosensitive array corresponds to a substrate tap region, and the substrate of the pixel region continues with the substrate of the corresponding substrate tap region. The substrate tap region provides a voltage application location for the substrate of the corresponding pixel region. Multiple columns of pixel regions include sets of two adjacent columns, in each of which sets, charge readout regions of each column directly face charge readout regions of the other column while photosensitive regions of each column are separated from photosensitive regions of the other column by the charge readout regions, and each of which sets includes subsets of four pixel regions belonging to two adjacent rows and surrounding a corresponding substrate tap region.

Abstract: A semiconductor device and a manufacturing method thereof are provided. The manufacturing method of a semiconductor device, comprising following steps: providing a substrate and sequentially forming a first mask layer and a second mask layer on the substrate, wherein the second mask layer covers the first mask layer; dry etching the first mask layer using the second mask layer as a mask, wherein the first mask layer has a patterned first opening; and removing the second mask layer and wet etching the substrate using the patterned first mask layer as a mask to form a plurality of trenches on the substrate, wherein the plurality of trenches extend from a surface of the substrate to inside of the substrate, and a cross-sectional width in a cross-section perpendicular to the substrate of the plurality of trenches gradually decreases from the surface of the substrate to the inside of the substrate.

Abstract: A metal lead, a semiconductor device and method of fabricating the same are disclosed, in which a first trench is formed simultaneously with a wiring layer trench, followed by the formation of a second trench in communication with the first trench. After that, a conductive structure is formed simultaneously with a wiring layer by filling a conductive material simultaneously in the first, second and wiring layer trenches. In this way, it is neither necessary to externally connect the conductive structure by forming an additional opening, nor to form the wiring layer by etching a deposited aluminum layer. This saves the use of two photomasks, leading to savings in production cost.

Abstract: A memory device includes a first chip and a second chip. The first chip includes a first storage array and a second storage array. The first storage array includes at least one first storage block. The first storage block includes a plurality of first word lines extending in a first direction and a plurality of first bit lines extending in a second direction. The second storage array includes at least one second storage block. By constructing a first global bit line sub-decoder block in a first overhead projection area formed by the first storage block and constructing a second global bit line sub-decoder block in a second overhead projection area formed by the second storage block, an occupied area of the first chip and the second chip after stacking can be reduced, which reduces an occupied area of the memory device and is beneficial for minimizing the memory device.

Abstract: A storage device and a manufacturing method thereof are provided. The storage device includes a first chip and a second chip. The second chip is stacked on the first chip in a third direction. The first chip includes a storage array, and the storage array includes at least one storage block. An occupied area after the first chip and the second chip are stacked can be reduced by constructing a first local bit line decoder block, a second local bit line decoder block, a first word line decoder block, and a second local bit line decoder block in a top view projection area, thereby reducing plane occupied space of the storage device. This is beneficial for minimizing the size of the storage device.

Abstract: Semiconductor structure, comprising a memory-array unit comprising: a substrate, a memory array disposed on the substrate, and a first bonding region disposed around the memory array. The memory array comprises multiple word lines, multiple bit lines, and multiple source lines. The first bonding region comprises a first substrate-connecting bonding region, a first bit-line bonding region, a first word-line bonding region, and a first source-line bonding region. The first substrate-connecting bonding region is configured to connect the substrate electrically to a surface of the memory-array unit, the first bit-line bonding region is configured to connect the bit lines electrically to the surface of the memory-array unit, the first word-line bonding region is configured to connect the word lines electrically to the surface of the memory-array unit, and the first source-line bonding region is configured to connect the source lines electrically to the surface of the memory-array unit.

Abstract: A bonding structure and a manufacturing method therefor. A first hybrid bonding structure is formed on a first wafer; an interconnection structure and a second hybrid bonding structure are formed on the front surface of a second wafer. The first wafer and the second wafer are bonded by means of the first hybrid bonding structure and the second hybrid bonding structure, a gasket electrically connected to the interconnection structure is formed on the back surface of the second wafer, and the interconnection structure below the gasket and a second conductive bonding pad in the second hybrid bonding structure are provided in a staggered manner in the horizontal direction. According to the solution, the interconnection structure and the second conductive bonding pad are arranged in a staggered manner, so that recesses generated by structural stacking are avoided, and device failure caused by the recesses is further avoided.

Abstract: A grinding control method and device for a wafer, and a grinding device are provided. A grinder is controlled to grind a mass production wafer with a set grinding parameter. In a case that it is determined to perform a test using a test wafer, the grinder may be controlled to grind the test wafer with the set grinding parameter. A first total thickness variation of the grinded test wafer is acquired by a dedicated measurement device, and an updated grinding parameter is acquired based on the first total thickness variation. The grinder is controlled to grind the mass production wafer with the updated grinding parameter. In this way, a wafer with a uniform thickness can be obtained, thereby improving flatness of the grinded wafer.

Abstract: The invention provides a storage structure and an erase method thereof, capable of performing an erase operation on a plurality of memory blocks. The storage structure includes: a first storage body, a second storage body, a third storage body, and a controller. Memory blocks that are consecutively numbered are sequentially alternately stored in the first memory bank, the second memory bank, and the third memory bank, and the controller is configured to control each memory block to sequentially undergo a first process, a second process and a third process. The erase method includes: when a memory block Bi undergoes the third process, a memory block Bi+1 undergoes the second process, and a memory block Bi+2 undergoes the first process at the same time; where i ? [1, n?2]. Three adjacent blocks undergo the first process, the second process, and the third process simultaneously.

Abstract: A wafer structure, a method for manufacturing the wafer structure, and a chip structure. A front surface of a first chip provided with a photosensitive array is bonded to a front surface of a second chip provided with a logic device. An electrical-connection through-hole is provided on a back surface of the first chip at a pad region. The electrical-connection through-hole runs from the back surface of the first chip, via a top wiring layer in the first chip, to a top wiring layer in the second chip. A pad is provided on the electrical-connection through-hole. Hence, integration of a photosensitive device of a stacked type is achieved. There are advantages of a high integration degree and a simple structure. Transmission efficiency of a device is effectively improved, and complexity of a manufacturing process is reduced.

Abstract: A method and an apparatus for determining expansion compensation in a photoetching process, and a method for manufacturing a semiconductor device are provided. A relative vector misalignment value of a first wafer and a second wafer after being bonded is obtained based on a relative position relationship between a first alignment pattern of the first wafer and a second alignment pattern of the second wafer in a boding structure. A relative expansion value of the first wafer and the second wafer is obtained based on the relative vector misalignment value. A developing expansion compensation value in the photoetching process is obtained. The expansion compensation value is used to the photoetching process of a first conductor layer including the first alignment pattern of the first wafer and/or a second conductor layer including the second alignment pattern of the second wafer.

Abstract: A wafer thinning method and a wafer structure are provided. In the wafer thinning method, a to-be-thinned wafer is provided, and the to-be-thinned wafer is grinded on a rear surface of the to-be-thinned wafer. Then, a first planarization process is performed on a rear surface of the grinded wafer to restore surface flatness of the grinded wafer, and a second planarization process is performed on a rear surface of the wafer obtained after the first planarization process is performed until a target thinned thickness is reached.

Abstract: A first wafer, a method of fabricating thereof and a wafer stack are disclosed. The first wafer includes a first substrate, a first dielectric layer on the first substrate, first metal layers embedded in the first dielectric layer, first switching holes extending partially through the first dielectric layer and exposing the first metal layers, a first interconnection layer filling up the first switching holes and electrically connected to the first metal layers, a first insulating layer residing on surfaces of both the first dielectric layer and the first interconnection layer, first contact holes extending through the first insulating layer and exposing the first interconnection layer, and a second interconnection layer filling up the first contact holes and electrically connected to the first interconnection layer. Filling the first contact holes and the first switching holes with different interconnection layers reduces the difficulty in fabricating interconnection structures for the first metal layers.

Abstract: A chip structure, a wafer structure and a method for manufacturing the same are provided in the present disclosure. A first chip and a second chip are bonded by bonding layers of a dielectric material. Top wiring layers are led out through bonding via holes from a back surface of a bonded chip. The bonding via holes are used for bonding and are surrounded by the bonding layers. A top wiring layer of a third chip is led out through bonding pads formed in a bonding layer. The bonding via holes are aligned with and bonded to the bonding pads to achieve bonding of the three chips. The top wiring layer of the third chip is led out from the back surface of the third chip through a lead-out pad.