Patents Examined by Amanda C. Walke
  • Patent number: 11485814
    Abstract: Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methods of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.
    Type: Grant
    Filed: May 10, 2022
    Date of Patent: November 1, 2022
    Assignee: SPARKLING TYCOON LIMITED
    Inventors: Hao Zhang, Yuanxi Liao
  • Patent number: 11489204
    Abstract: An electrolyte solution containing a solvent. The solvent contains a compound (1) represented by the following formula (1), wherein Ra, Rb, Rc, and Rd are the same as or different from each other, and are each —H, —F, —CH3, or —CF3; at least one of Ra, Rb, Rc, or Rd is —F or —CF3; and at least one of Ra, Rb, Rc, or Rd is —CH3, and a compound (2) represented by the following formula (2), wherein Re is a C1-C5 linear or branched alkyl or alkoxy group optionally containing an ether bond; Rf is a C1-C5 linear or branched alkyl group optionally containing an ether bond; and at least one of Re or Rf contains a fluorine atom. Also disclosed is an electrochemical device including the electrolyte solution, a lithium-ion secondary battery including the electrolyte solution and a module including the electrochemical device.
    Type: Grant
    Filed: January 26, 2018
    Date of Patent: November 1, 2022
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shigeaki Yamazaki, Hiroyuki Arima, Kenzou Takahashi
  • Patent number: 11482706
    Abstract: A resin for an energy device electrode contains a structural unit derived from a nitrile group-containing monomer; and a structural unit derived from a monomer represented by the following Formula (I), wherein the resin does not contain a structural unit that is derived from a carboxy group-containing monomer and that contains a carboxy group, or the resin has a ratio of a structural unit that is derived from a carboxy group-containing monomer and that contains a carboxy group of 0.01 moles or less with respect to 1 mole of the structural unit derived from a nitrile group-containing monomer, and a ratio of the structural unit derived from a nitrile group-containing monomer to a total of structural units derived from each monomer is from 90% by mole to less than 100%.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: October 25, 2022
    Assignee: SHOWA DENKO MATERIALS CO., LTD.
    Inventors: Shunsuke Nagai, Hiroki Kuzuoka, Kenji Suzuki, Nobuyuki Ogawa
  • Patent number: 11482732
    Abstract: Disclosed are system and methods for manufacturing a solid-state electrolyte to be used in an electrochemical cell. The method can include forming a solid-state electrolyte from a material having a compositional property and a structural property, the material having been selected by: (i) providing material properties of a material, wherein the material properties comprise both compositional and structural information; (ii) calculating a first distortion parameter of a material, wherein the first distortion parameter represents the degree of lattice distortion of the material; (iii) determining an estimated ionic mobility value of the material using the one or more distortion parameters; (iv) varying the provided material properties using isovalent substitution and determining a second ionic mobility value from a second distortion parameter by repeating steps (i)-(iii); and (v) comparing the first and second ionic mobility values to select the superior material derivative.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: October 25, 2022
    Assignee: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
    Inventors: Donald J. Siegel, Kwangnam Kim
  • Patent number: 11479525
    Abstract: A composition includes a perfluorinated propenylamine represented by the following general formula (1): Each occurrence of Rf1 and Rf2 is: (i) independently a linear or branched perfluoroalkyl group having 1-8 carbon atoms and optionally comprises one or more catenated heteroatoms; or (ii) bonded together to form a ring structure having 4-8 carbon atoms and that optionally comprises one or more catenated heteroatoms. At least 60 wt. % of the perfluorinated propenylamine is in the form of the E isomer, based on the total weight of the perfluorinated propenylamine in the composition.
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: October 25, 2022
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: William M. Lamanna, Michael J. Bulinski, Sean M. Smith, Alexandre R. Monteil, Michael G. Costello, John G. Owens
  • Patent number: 11476519
    Abstract: A method for manufacturing a battery module includes accommodating a battery cell assembly having at least one battery cell in a module case, and injecting a thermally conductive adhesive through at least one injection hole provided in a bottom portion of the module case so that the module case is coated with the thermally conductive adhesive.
    Type: Grant
    Filed: January 26, 2021
    Date of Patent: October 18, 2022
    Inventors: Soo-Youl Kim, Jae-Hun Yang, Han-Jong Yoon, Jae-Min Lee, Hae-Ryong Jeon, Young-Ho Choi
  • Patent number: 11469420
    Abstract: The present disclosure is directed to providing a binder composition for a non-aqueous secondary battery electrode which can improve the peel strengths of electrodes while increasing the pressibilities of pre-pressing electrode mixed material layers. The presently disclosed binder composition contains a polymer A, wherein the polymer A includes an aliphatic conjugated diene monomer unit and a nitrile-group containing monomer unit, and the polymer A has a THF-insoluble content of 20% by mass or less.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: October 11, 2022
    Assignee: ZEON CORPORATION
    Inventor: Naoki Takahashi
  • Patent number: 11467495
    Abstract: To address the needs in the art, a method of fabricating a meta-surface antireflective coating that includes forming on a substrate or in a film on the substrate, using a patterning method, a pattern of nanostructures, where the nanostructures include a pattern of nanowires or a pattern of nanoparticles, or the pattern nanowires and the pattern of nanoparticles, where the nanostructures are arranged to form a metasurface AR coating, where the metasurface AR coating reflects incident light in a double-dip reflectance according to a doubly-resonant arrangement of the metasurface AR coating, where the metasurface AR coating comprises a structure for a direct light pathway and a resonant light pathway.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: October 11, 2022
    Assignee: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Concetto Eugenio Andrea Cordaro, Emanuele Francesco Pecora, Mark L. Brongersma, Jorik van de Groep
  • Patent number: 11467494
    Abstract: [Problem] To provide a positive type photosensitive polysiloxane composition that can manufacture a cured film having a high surface smoothness, in which generation of wrinkles is suppressed even without adding a curing auxiliary or performing flood exposure. [Means for Solution] A positive type photosensitive polysiloxane composition comprising (I) a polysiloxane, (II) a carboxylic acid compound that is a monocarboxylic acid or a dicarboxylic acid, of 200 to 50,000 ppm based on the total mass of the composition, (III) a diazonaphthoquinone derivative, and (IV) a solvent, and a method for manufacturing a cured film using the composition.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: October 11, 2022
    Assignee: MERCK PATENT GMBH
    Inventors: Takashi Fuke, Naofumi Yoshida, Atsuko Noya
  • Patent number: 11467490
    Abstract: Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: October 11, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Yukako Anryu, Koji Ichikawa
  • Patent number: 11460773
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: December 30, 2019
    Date of Patent: October 4, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara, Masaki Ohashi
  • Patent number: 11460770
    Abstract: A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rbd1 to Rbd3 each independently represent an aryl group which may have a substituent, provided that one or more of Rbd1 to Rbd3 are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X? represents a counter anion.
    Type: Grant
    Filed: December 2, 2019
    Date of Patent: October 4, 2022
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takuya Ikeda, Junichi Miyakawa
  • Patent number: 11460772
    Abstract: A positive resist composition comprising a base polymer comprising recurring units containing an optionally substituted amino group and iodine exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: October 4, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 11453835
    Abstract: Polymers used as rolling lubricating agents, to compositions including said polymers, and to alkali metal films including the polymers or compositions on the surface(s) thereof. The use of said polymers and compositions is also described for strip-rolling alkali metals or alloys thereof in order to obtain thin films. Methods for producing said thin films, which are suitable for use in electrochemical cells, are also described. An improved lubricant according to formula I, which, for example, achieves enhanced conductivity, and/or enables the production of electrochemical cells having an improved life span in cycles.
    Type: Grant
    Filed: June 4, 2020
    Date of Patent: September 27, 2022
    Assignee: HYDRO-QUEBEC
    Inventors: Karim Zaghib, Michel Armand, Patrick Bouchard, Serge Verreault, Julie Hamel-Pâquet, Gabriel Girard
  • Patent number: 11456454
    Abstract: A mixed conductor represented by Formula 1: A1±xM2±yO4????Formula 1 wherein, in Formula 1, A is a monovalent cation, and M is at least one of a monovalent cation, a divalent cation, a trivalent cation, a tetravalent cation, a pentavalent cation, or a hexavalent cation, 0?x?1, 0?y?2, and 0???1, with the proviso that when M includes vanadium, 0<??1, and wherein the mixed conductor has an inverse spinel crystal structure.
    Type: Grant
    Filed: October 16, 2019
    Date of Patent: September 27, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sangbok Ma, Hyukjae Kwon, Hyunpyo Lee, Donghwa Seo, Dongmin Im
  • Patent number: 11448961
    Abstract: A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.
    Type: Grant
    Filed: September 5, 2019
    Date of Patent: September 20, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama, Kenji Yamada
  • Patent number: 11450867
    Abstract: A fuel cell system includes a fuel cell including a fuel electrode being supplied with fuel gas and an oxidant electrode being supplied with oxidant gas and generating electric power by causing the fuel gas and the oxidant gas to react with each other, a voltmeter measuring an output voltage of the fuel cell, an ammeter measuring an output current of the fuel cell, a restricting valve provided upstream and downstream of an oxidant electrode side of the fuel cell and being opened in a power generation state and being closed in a stopped state or under the oxygen consuming control, and a load control unit controlling a current value of an output current to be output by the fuel cell and, under the oxygen consuming control, controlling the output voltage of the fuel cell such that the output current reduces as the output voltage of the fuel cell increases.
    Type: Grant
    Filed: December 24, 2019
    Date of Patent: September 20, 2022
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Keitaro Yamamori, Tomoya Ogawa, Hiroaki Mori
  • Patent number: 11435667
    Abstract: Provided are a polymer for an organic bottom anti-reflective coating and a bottom anti-reflective coating composition containing the same. More specifically, provided are a polymer for an organic bottom anti-reflective coating capable of relieving reflection of exposure light and irradiation light on a substrate of a photoresist layer applied on the substrate in a lithographic process of manufacturing a semiconductor device, and a bottom anti-reflective coating composition containing the same.
    Type: Grant
    Filed: July 4, 2018
    Date of Patent: September 6, 2022
    Assignees: SK Innovation Co., Ltd., SK Global Chemical Co., Ltd.
    Inventors: Minho Jung, Cheolwoo Kim, Jinsu Ham, Sunjoo Kim, Myung Jun Park, Namkyu Lee, Hyesoo Lee
  • Patent number: 11435666
    Abstract: A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
    Type: Grant
    Filed: October 31, 2019
    Date of Patent: September 6, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Emiko Ono, Masayoshi Sagehashi, Masahiro Fukushima, Yuki Kera
  • Patent number: 11435665
    Abstract: A resist composition comprising a base polymer and an onium salt of N-carbonylsulfonamide having iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: September 6, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara