Abstract: The invention is directed to a paper support for photographic printing paper having a topside and a backside, at least said topside being provided with a pigmented coating based on clay and/or other pigment, said coating having a clay content of less than 3.3 g/m2, which topside of the pigmented coating has an average surface roughness RA of 1.0 ?m or less, and is provided with at least one pigmented polymer resin layer.

Abstract: A scintillating structure for aligning an electron or ion beam using a detector while exposing a wafer, which may be a wafer or mask, is described. The structure is formed by a resist including a polymer with carboxylic acid groups, anhydride groups, and an acid-sensitive group, for instance tert.-butylester; a photoreactive compound which releases an acid upon irradiation with UV light, electrons, or ions; a solvent; and at least one scintillating substance such as anthracene, naphthaline and/or 1,4-bis-(5-phenyl-2-oxazolyl)-benzol. After a developing and silylating step, the cross-linked structure is inert with respect to solvents of additional resists that are applied over the structure. The scintillating structure is thus not dissolved, which improves the quality of online controlled electron or ion beam writing.

Abstract: A photoresist with adjustable polarized light response and a photolithography process using the photoresist. The photoresist and the photolithography process are suitable for use in an exposure optical system with a high numerical aperture. The photoresist includes a photosensitive polymer that can absorb the exposure light source to generate an optical reaction. The photosensitive polymer can also be oriented along a direction of an electric field or a magnetic field. The response for the photosensitive upon a polarized light is determined by an angle between the predetermined direction and the polarized light. In addition, the photolithography process adjusts the orientation of the photosensitive polymer, so that the P-polarized light has a weaker response than that of the S-polarized light to compensate for the larger transmission coefficient of the P-polarized light with a high numerical aperture, so as to prevent the photoresist pattern deformation.

Abstract: An intermediate layer composition having a silicon-containing polymer(A) having a specific structure and a pattern-forming process using the same.

Abstract: The present invention relates to a color-developing agent resin composition, which contains: (1) a phenolic resin represented by formula I; and (2) a blend of graft copolymers of a phenolic resin and a multivalent metal salt polymer of a substituted aryl carboxylic acid, said graft copolymers are represented by (II) and (III). The present invention further relates to a resin emulsion containing the color-developing agent resin composition and a method for preparing the same. The color-developing agent resin composition and the color-developing agent resin emulsion of the present invention are used for no-carbon copying paper as special resin color-developing agents. They have advantages of not only fast developing at a low temperature and bright colors, but also heavy developing strength and good light-aging resistance of writing, and furthermore, their coatings are not easy to turn yellow when they are hold in the air, and the like.

Abstract: Novel photoresists containing at least about 0.2 molar ratio of a base with respect to the concentration of a photoacid generator present and their preparation are described. It has been discovered that inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, thus providing resists having submicron linewidth resolution.

Abstract: A negative-working CTP plate which is superior in resolution and printing resistance of the image area of a press plate is provided, which is obtained by forming a latent image on a heat-sensitive layer in a heat-sensitive lithographic printing plate comprising a substrate having a hydrophilic surface and a heat-sensitive layer made of an alkali-soluble polymer formed on the surface of the substrate, using heat generated upon irradiation with laser light, and developing the heat-sensitive layer using an alkaline developing solution. In the heat-sensitive lithographic printing plate comprising a substrate having a hydrophilic surface, and a heat-sensitive layer made of an alkali-soluble polymer formed on the surface of the substrate, an advancing contact angle (?f1) of the surface of the heat-sensitive layer with water at 25° C. is within a range from 70° to 110°, a receding contact angle (?b2) of the surface of the heat-sensitive layer with water at 25° C. after heating at 150° C.

Abstract: There are disclosed a releasing sheet comprising a substrate and a releasing agent layer which is installed by coating the substrate with a releasing agent liquid containing 1,4-polybutadiene and an antioxidant, and irradiating the coated layer with ultraviolet ray so that the layer is cured; and also a releasing sheet comprising in turn a substrate, an undercoat layer which is formed thereon and is composed of an elastic body, and a releasing agent layer which is installed on the undercoat layer by coating the same with a releasing agent liquid containing 1,4-polybutadiene and an antioxidant, and irradiating the layers with ultraviolet ray so that the layers are cured. Being of non-silicone base, the releasing sheets are excellent in releasability from a tacky adhesive agent layer and adhesiveness to the substrate.

Abstract: The present invention relates to an antistatic article comprising a substrate or support having thereon at least one antistatic layer, wherein the antistatic layer comprises a conductive material having areas of patterned coverage. The present invention also relates to a display comprising a substrate having an electrically modulated imaging layer thereon, at least one electrically conductive layer, and at least one transparent antistatic layer, wherein said antistatic layer comprises a conductive material having areas of patterned coverage.

Abstract: A light-sensitive sheet comprises a support, a first light-sensitive layer, a barrier layer and a second light-sensitive layer in this order. Each of the first and second light sensitive layers independently contains a binder, a polymerizable compound and a photo-polymerization initiator. The second light-sensitive layer is more sensitive to light than the first light-sensitive layer. A light-sensitive laminate comprises a substrate, the second light-sensitive layer, the barrier layer and the first light-sensitive layer in this order.

Abstract: A heat-sensitive lithographic printing plate precursor comprising on a support, a hydrophilic layer having a protrusion structure on at least one surface thereof.

Abstract: An article of manufacture has an environmental sensitive label with at least one cumulative time-temperature indicator and at least one thermal event indicator thereon. The cumulative time-temperature indicator and the thermal event indicator each provides an independent verification of product performance in a predetermined environment.

Abstract: A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order to prevent formation of sloping patterns due to photoresist resins absorbing wavelength of light used as light sources during lithography process using light sources such as KrF, ArF, VUV, EUV, E-beam and ion beam, even when photoresist resins having high absorbance to light source are used.

Abstract: Disclosed is a liquid coating composition for forming a top antireflective film that contains a polymer, the polymer containing, as a structural unit, a (meth)acrylate unit that has at least one polycyclic hydrocarbon group on its side chain and becomes more soluble to alkali by the action of an acid, the liquid coating composition comprising: (a) a water-soluble, film-forming component; (b) at least one fluorine-based compound selected from a perfluoroalkylcarboxylic acid having 4 or more carbon atoms and a perfluoroalkylsulfonic acid having 5 or more carbon atoms; and (c) a fluoroalkylsulfonic acid having 1–4 carbon atoms and/or an acidic compound consisting of a hydrocarbon having 1–4 carbon atoms in which one or more hydrogen atoms are substituted with a fluoloalkylsulfonyl group(s), with the proviso that one or more carbon atoms therein may be substituted with a nitrogen atom(s).

Abstract: A chemically amplified resist composition which comprises a base resin reacting in the presence of an acid, a photo acid generator generating an acid upon exposure, and a compound having the combination of an acetal moiety and a site which is eliminated by an acid in its molecule, or which comprises a base resin, which is a copolymer having the combination of an acetal moiety and a site eliminated by an acid in one repeating unit and reacts in the presence of an acid, and a photo acid generator generating an acid upon exposure.

Abstract: A composite photoresist structure includes an first organic layer located on a substrate, a sacrificial layer located on the first organic layer, and a second organic layer located on the sacrificial layer. The first organic layer is made of materials that can be easily removed by plasma. Therefore, the surface of the substrate will not be damaged while transferring a predetermined pattern onto the substrate.

Abstract: There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.

Abstract: This invention provides a support for a lithographic printing plate, and an original form of a heat-sensitive lithographic printing plate, which comprises a hydrophilic film formed on a metallic base whose surface has been roughened, said hydrophilic film having a heat conductivity of 0.05–0.5 W/(m·K) in the direction of its film thickness, which when used as the development on machine type, exhibits good on-press, or good non-treatment developability, a high sensitivity, a long press life and a preferable stain resistance and ink removal property upon printing and which, when used as a conventional thermal positive or negative type, makes efficient utilization of heat for the formation of image, has a high sensitivity and exhibits a long press life and a good stain resistance in a nonimage area, wherein the non-treatment in which the development is not performed.

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. Preferred polymers include polycarbonates, polysulfonyl esters, polycarbonate sulfones, and mixtures thereof. The compositions can be applied to a silicon wafer or other substrate to form a cured or hardened layer which is initially insoluble in typical photoresist developing solutions. Upon exposure to light, the cured or hardened layers become soluble in photoresist developing solutions so that the layer can be selectively removed along with the developed photoresist layer, thus eliminating the need for a separate removal step.

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.