Abstract: The present invention provides a chip integration module, including a die, a passive device, and a connecting piece, where the die is provided with a die bonding portion, the passive device is provided with a passive device bonding portion, the die bonding portion of the die and the passive device bonding portion of the passive device are disposed opposite to each other, and the connecting piece is disposed between the die bonding portion and the passive device bonding portion and is connected to the die bonding portion and the passive device bonding portion. The chip integration module of the present invention achieves easy integration and has low costs. Moreover, a path connecting the die to the passive device becomes shorter, which can improve performance of the passive device. The present invention further discloses a chip package structure and a chip integration method.

Abstract: A wafer processing method includes a wafer providing step of placing a polyolefin or polyester sheet on an upper surface of a substrate for supporting a wafer and placing the wafer on an upper surface of the sheet in a condition where a back side of the wafer is exposed upward, a thermocompression bonding step of setting the wafer placed through the sheet on the substrate in an enclosed environment, next evacuating the enclosed environment, and next heating the sheet as applying a pressure to the wafer, thereby uniting the wafer through the sheet to the substrate by thermocompression bonding, a back processing step of processing the back side of the wafer supported through the sheet to the substrate, and a separating step of separating the wafer from the sheet bonded to the substrate.

Abstract: The present invention provides a microwave-based high-throughput material processing device with a concentric rotary chassis. The device includes a microwave source generator, a microwave reaction chamber, and a temperature acquisition device. The microwave reaction chamber is provided with a rotary table, a thermal insulation barrel and a crucible die. The thermal insulation barrel is disposed on the rotary table, and the crucible die is disposed in the thermal insulation barrel. The crucible die is provided with a plurality of first grooves, and the first grooves are evenly distributed on a first circumference. A plurality of first fixing holes are disposed on a top of the thermal insulation barrel, and the first fixing holes are disposed corresponding to the first grooves. A first acquisition hole is disposed on the top of the microwave reaction chamber, and the first acquisition hole is located right above the first circumference.

Abstract: The semiconductor device includes an insulating circuit substrate mounted with a semiconductor element; an external terminal; a base including a support portion; an adhesive sheet; and a sealing portion covering the semiconductor element. The support portion has a first surface, a second surface on the side opposite to the first surface, and a first opening opened at the first surface and the second surface. The insulating circuit substrate is disposed in the first opening. The adhesive sheet is disposed on the second surface of the support portion and has a second opening in which the semiconductor element is disposed in plan view. The adhesive sheet is projected into the first opening in plan view and adhered to a circuit block. The external terminal is adhered on the adhesive sheet and has a connecting surface to which a bonding wire is connected.

Abstract: A semiconductor package includes: a first semiconductor package including: a first frame having a first through portion, a first semiconductor chip in the first through portion and having a first surface on which a first connection pad is disposed and a second surface on which a second connection pad is disposed, and a through via connected to the second connection pad, a first connection structure on the first surface and including a first redistribution layer, and a backside redistribution layer on the second surface; and a second semiconductor package on the first semiconductor package and including: a second connection structure including a second redistribution layer, a second frame on the second connection structure and having a second through portion, and a second semiconductor chip in a second through portion and having a third surface on which a third connection pad is disposed.

Abstract: Embodiments of the invention include a light emitting device including a substrate and a semiconductor structure including a light emitting layer. A first reflective layer surrounds the light emitting device. A wavelength converting element is disposed over the light emitting device. A second reflective layer is disposed adjacent a first sidewall of the wavelength converting element.

Abstract: Techniques are provided to fabricate metal interconnects using liner planarization-free process flows. A sacrificial layer is formed on a dielectric layer, and the sacrificial and dielectric layers are patterned to form an opening in the dielectric layer. A conformal liner layer is deposited, and a metal layer deposited to form a metal interconnect in the opening. An overburden portion of the metal layer is planarized to expose an overburden portion of the liner layer. A first wet etch is performed to selectively remove the overburden portion of the liner layer. A second wet etch process is performed to selectively remove the sacrificial layer, resulting in extended portions of the liner layer and the metal interconnect extending above a surface of the dielectric layer. A dielectric capping layer is formed to cover the sidewall and upper surfaces of the extended portions of the liner layer and the metal interconnect.

Abstract: A power inverter includes a bridge circuit including a first half-bridge and a second half-bridge, each half-bridge including a high-side device and a low-side device, and a gate driver circuit connected with each gate of the high-side device and low-side power device of the first and second half-bridges and operable to provide each gate with a respective voltage to control operation of the respective power device. The gate driver is operable to provide a first voltage which is higher than a first threshold voltage of the respective power device, and a second voltage which is higher than a surge threshold of the respective power device. The surge threshold is higher than the first threshold and defines the onset of a surge current operation area of the respective power device at which the power device becomes conducts a surge current that is larger than the rated current of the device.

Abstract: A method of forming a semiconductor device structure comprises forming at least one 2D material over a substrate. The at least one 2D material is treated with at least one laser beam having a frequency of electromagnetic radiation corresponding to a resonant frequency of crystalline defects within the at least one 2D material to selectively energize and remove the crystalline defects from the at least one 2D material. Additional methods of forming a semiconductor device structure, and related semiconductor device structures, semiconductor devices, and electronic systems are also described.

Abstract: In an embodiment, a device includes: an integrated circuit die; an encapsulant at least partially surrounding the integrated circuit die; and a redistribution structure including: a plurality of dielectric layers over the encapsulant and the integrated circuit die; a plurality of metallization patterns in the dielectric layers, the metallization patterns being electrically coupled to the integrated circuit die; and a sealing ring in the dielectric layers, the sealing ring extending around the metallization patterns, the sealing ring being electrically isolated from the metallization patterns and the integrated circuit die, the sealing ring including a plurality of sealing ring layers, each of the sealing ring layers including a via portion extending through a respective one of the dielectric layers, the via portion of each of the sealing ring layers being aligned along a same common axis.

Abstract: A lead frame includes a die pad, a first lead extending away from the die pad, a peripheral structure mechanically connected to the first lead and the die pad, and a first groove in an outer surface of the first lead. The first groove extends longitudinally along the first lead away from the die pad.

Abstract: Heterostructures that include a bilayer composed of epitaxial layers of vanadium dioxide having different rutile-to-monoclinic phase transition temperatures are provided. Also provided are electrical switches that incorporate the heterostructures. The bilayers are characterized in that they undergo a single-step, collective, metal-insulator transition at an electronic transition temperature. At temperatures below the electronic transition temperature, the layer of vanadium dioxide having the higher rutile-to-monoclinic phase transition temperature has an insulating monoclinic crystalline phase, which is converted to a metallic monoclinic crystalline phase at temperatures above the electronic transition temperature.

Abstract: A structure and a formation method of a package structure are provided. The method includes forming one or more solder elements over a substrate. The one or more solder elements surround a region of the substrate. The method also includes disposing a semiconductor die structure over the region of the substrate. The method further includes dispensing a polymer-containing liquid onto the region of the substrate. The one or more solder elements confine the polymer-containing liquid to being substantially inside the region. In addition, the method includes curing the polymer-containing liquid to form an underfill material.

Abstract: A method for fabricating a semiconductor device includes forming an interfacial layer and a dielectric layer on a base structure and around channels of a first gate-all-around field-effect transistor (GAA FET) device within a first region and a second GAA FET device within a second region, forming at least a scavenging metal layer in the first and second regions, and performing an anneal process after forming at least one cap layer.

Abstract: Flash memory technology is disclosed. In one example, a flash memory component can include a plurality of conductive layers vertically spaced apart from one another and separated by voids, each of the plurality of conductive layers forming a word line. The memory component can also include a vertically oriented conductive channel extending through the plurality of conductive layers. In addition, the flash memory component can include a plurality of memory cells coupling the plurality of conductive layers to the conductive channel. Each word line can be associated with one of the plurality of memory cells. Associated devices, systems, and methods are also disclosed.

Abstract: A wiring board of the present disclosure includes: a first insulating layer including a surface; a second insulating layer including un upper surface and a lower surface and locating above the surface of the first insulating layer; a wiring conductor layer formed on the surface of the first insulating layer, includes a via land; and a via hole conductor penetrating from the upper surface to the lower surface of the second insulating layer. The via hole conductor includes a via bottom being in contact with the via land. Crystal grains in the via bottom are smaller than crystal grains in the via land.

Abstract: Techniques are provided to fabricate metal interconnects using liner planarization-free process flows. A sacrificial layer is formed on a dielectric layer, and the sacrificial and dielectric layers are patterned to form an opening in the dielectric layer. A conformal liner layer is deposited, and a metal layer deposited to form a metal interconnect in the opening. An overburden portion of the metal layer is planarized to expose an overburden portion of the liner layer. A first wet etch is performed to selectively remove the overburden portion of the liner layer. A second wet etch process is performed to selectively remove the sacrificial layer, resulting in extended portions of the liner layer and the metal interconnect extending above a surface of the dielectric layer. A dielectric capping layer is formed to cover the sidewall and upper surfaces of the extended portions of the liner layer and the metal interconnect.

Abstract: A light emitting display apparatus is disclosed. The light emitting display apparatus includes: a substrate; and a plurality of pixels disposed on a pixel area on the substrate. Each of the plurality of pixels includes: a first circuit layer including a first pixel circuit including a driving transistor; a second circuit layer overlapping the first circuit layer, wherein the second circuit layer includes a second pixel circuit including a data supply transistor configured to supply a data signal to the first pixel circuit; a circuit insulating layer between the first circuit layer and the second circuit layer; and a light emitting diode layer including a light emitting diode electrically connected with the first pixel circuit.

Abstract: A manufacturing method of microelectromechanical system (MEMS) device includes providing a first, a second and a third substrates, wherein the first substrate includes a first and a second circuit, the second substrate includes second and third connection areas, and the third substrate includes first connection areas. Second grooves and a dividing groove are formed on the fourth surface of the third substrate. The second and third substrates are bonded to make the first and the second connection areas correspondingly connect with each other. The second substrate is divided to form electrically isolating first and second movable elements. The first movable element is spatial separated from the third substrate and corresponding to the second groove. The second movable element is connected to the third substrate. The first and the second substrates are bonded to make the fourth and the third connection areas connect correspondingly.

Abstract: A packaged semiconductor device has a thin profile, two face-to-face mounted power semiconductor device dice, and no internal bond wires. A first semiconductor device die is mounted so that a gate pad is bonded to the bottom of a first lead, and so that a source pad is bonded to the bottom of a second lead. A second semiconductor device die identical to the first is mounted so that a gate pad is bonded to the top of the first lead, and so that a source pad is bonded to the top of the second lead. The backside drain electrodes of both dice are electrically coupled to a third lead. The third lead in one example has a forked-shape, and the two dice are disposed entirely between the two tines of the fork. After encapsulation, the three leads extend parallel to each other from a body portion of the package.