Abstract: A controller associated with a machine may determine that a first subset of nozzles, of a plurality of nozzles of the machine, is to be cleaned. The controller may determine a first flow rate of the fluid through the first subset of nozzles and increase, based on determining that the first subset of nozzles is to be cleaned, the first flow rate of the fluid through the first subset of nozzles to a second flow rate of the fluid through the first subset of nozzles. The controller may decrease the second flow rate of the fluid through the first subset of nozzles to the first flow rate of the fluid through the first subset of nozzles when the first subset of nozzles is cleaned.

Abstract: Method and systems for managing clear-down are provided. The method can include generating a clear-down trigger associated with an ion mobility spectrometer and operating the ion mobility spectrometer in fast clear-down mode in response to the clear-down trigger. Methods and systems can further provide that where the ion mobility spectrometer operates in fast-switching mode, the ion mobility spectrometer alternating a plurality of times between operation according to a positive ion mode and operation according to a negative ion mode, and further operating according to the positive ion mode for less than about 1 second before switching to the operation according to the negative ion mode, and operating according to the negative ion mode for less than about 1 second before switching to the operation according to the positive ion mode.

Abstract: The present disclosure provides embodiments of a system and method for detecting processing chamber condition. The embodiments include performing a wafer-less processing step in a processing chamber to determine the condition of the chamber walls. Based on an analysis of the residual gas resulting from the wafer-less processing step, an operator or a process controller can determine whether the chamber walls have deteriorated to such an extent as to be cleaned.

Abstract: There is provided systems and methods for effective cleaning and drying of vehicles of different shapes and sizes. In an example, a conveyor system may move a vehicle along a path, and a bridge assembly supported above a vehicle is moveable along the length thereof. At least one trolley assembly is moveable in a direction transverse to the movement of the bridge assembly. At least one cleaning arm assembly delivers cleaning fluid to or for brushing the surface of a vehicle. The cleaning arm assembly is moveable in association with movement of the vehicle to position the cleaning arm assembly adjacent at least a portion of the front, sides and rear of the vehicle as it moves along the path. A variable impact or patterning spray arm or drying system is also provided.

Abstract: The disclosure relates to a pressure cleaning device comprising a pressure generating unit for pressurizing a fluid and for dispensing a pressurized fluid via a hose attachment, preferably via a hand gun or via a cleaning nozzle. The pressure cleaning device can be operated in at least two different operating modes. According to the disclosure, a preferably electric pressure sensor for determining an actual operating pressure and/or a flow rate sensor for determining an actual flow rate and a control device are associated with the pressure generating unit. The control device is designed to control the pressure generating unit in particular, based on a respectively set operating mode in accordance with an actual operating pressure and/or an actual determined flow rate.

Abstract: A pipe cleaning assembly has a connection fixture having a body defining a cavity. A first aperture, opposing first auxiliary aperture coaxially aligned with the first aperture, second aperture, and opposing second auxiliary aperture coaxially aligned with the second aperture are in fluid communication with the cavity. A first connection flange extends from and surrounds the first aperture, a second connection flange extends from and surrounds the second aperture, a third connection flange extends from and surrounds the first auxiliary aperture, and a fourth connection flange extends from and surrounds the second auxiliary aperture. A bonnet is inserted through the second auxiliary aperture and is positioned within the cavity of the body and includes a generally cylindrical wall and a plurality of openings formed through the cylindrical wall to direct fluid flowing through the connection fixture.

Abstract: A method for controlling damages in cleaning a semiconductor wafer comprising features of patterned structures, the method comprising: delivering a cleaning liquid over a surface of a semiconductor wafer during a cleaning process; and imparting sonic energy to the cleaning liquid from a sonic transducer during the cleaning process, wherein power is alternately supplied to the sonic transducer at a first frequency and a first power level for a first predetermined period of time and at a second frequency and a second power level for a second predetermined period of time, the first predetermined period of time and the second predetermined period of time consecutively following one another, wherein at least one of the cleaning parameters is determined such that a percentage of damaged features as a result of the imparting sonic energy is lower than a predetermined threshold.

Abstract: A method of cleaning a surface of a substrate uses alcohol and water treatments. The method may include applying an alcohol treatment on a surface of the substrate with the alcohol treatment configured to provide surface reduction and applying a water treatment to the surface of the substrate with the water treatment configured to enhance selectivity of at least a portion of the surface for a subsequent barrier layer process by removing alcohol from the at least a portion of the surface. The water treatment may be performed simultaneously with the alcohol treatment or performed after the alcohol treatment. The water treatment may include vaporized water or water injected into a plasma to produce hydrogen or oxygen radicals.

Abstract: A deburring device includes a cylindrical body with a receptacle for receiving a pipe. The cylindrical body includes an abrasive surface provided in the receptacle, which is configured to simultaneously deburr at least two surfaces of a pipe inserted into the receptacle.

Abstract: A substrate cleaning device may include a chamber body configured to hold a substrate and a brush assembly. The brush assembly may include a first roller, a second roller, and a belt extending between the first roller and the second roller. At least one of the first roller and the second roller may be movable between a first position where the belt contacts a first surface of a substrate disposed in the chamber body and a second position where the belt is spaced from the first surface. Other substrate cleaning devices and methods of cleaning substrates are disclosed.

Abstract: The present disclosure relates to a dishwasher and a method of controlling the same. The dishwasher may determine an amount of foam in a wash space using a turbidity sensor measuring a turbidity value of wash water. Additionally, the dishwasher may perform a foam removal operation based on the amount of the foam in the wash space. In this case, the turbidity value measured by the turbidity sensor may be used. The foam removal operation may include a drainage operation, a water supply operation, and a wash operation that are consecutively performed, and may be performed in one or more of a pre-wash course, a main wash course, and a heating and rinsing course.

Abstract: A system and method for treating a portion of a food flow path in a food processor having a freezer chamber includes imparting a continuous flow of solution through a portion of the food flow path with sufficient flow rate, temperature and flow duration to impart at least one of (i) impart at least a 6 log reduction in inoculum count and (ii) extend the necessary time for manual cleaning of the portion of a food flow path exposed to the continuous flow of solution to at least 7 days.

Abstract: A cleaning nozzle includes an outer housing having a central axis and an inner surface that defines an outer housing interior. An inner housing resides within the outer housing interior along the central axis and has an inner surface that defines an inner flow channel. The inner flow channel supports flow of the cleaning fluid and has a converging taper and a flow disrupter element. The nozzle assembly may include an adapter that receives a front end of the nozzle and that also holds a ferrule that supports an optical fiber having an end face. The nozzle assembly allows the nozzle to direct a jet stream of cleaning fluid to the ferrule end face and the fiber end face. The flow disrupter causes the jet stream to have a time-varying direction that enhances the cleaning of the ferrule end face and the optical fiber end face.

Abstract: A method of removing debris from an area of turf grass can include providing a grass treatment system including a comb having a leading edge comprising a plurality of comb teeth, wherein the comb is mounted transversely to a direction of travel, and a substantially cylindrical brush positioned above the comb and configured to engage at least a portion of a top surface of the comb, wherein the brush rotates relative to the comb. The method can include positioning the grass treatment system closely adjacent to the turf grass such that the comb engages debris on and around the turf grass surface, and moving the grass treatment so that (i) the comb engages the debris, (ii) the rotating brush removes at least a portion of the debris from the surface of the comb, and (iii) the rotating brush does not come into contact with the turf grass.

Abstract: The present application discloses a cleaning apparatus and system, including: a transmission assembly; a drive assembly, connected to the transmission assembly and located lower than the transmission assembly; a cleaning assembly, located higher than the transmission assembly; and a waterproof structure, located between the drive assembly and the cleaning assembly.

Abstract: The invention concerns a method of treating the pipes of the drinking water network of an aircraft for cleaning purposes, said network comprising at least one storage tank and a plurality of pipes providing a plurality of water inlet and outlet points, notable in that it involves the following operations: —injecting water at a high temperature of between fifty and one hundred degrees Celsius into the network, for treatment purposes, —draining, —injecting cold water at a temperature no higher than thirty degrees Celsius combined with chemical treatment products comprising a chlorinated product or hydrogen peroxide, —draining, —injecting water at a high temperature of between fifty and one hundred degrees Celsius for rinsing purposes, eliminating the chemical treatment products comprising a chlorinated product or hydrogen peroxide, —draining. Applications: cleaning the drinking water network of an aircraft.

Abstract: A machine tool chip removal device including a coupling interface to couple with a rotatable spindle of a machine tool to facilitate rotation of the machine tool chip removal device about an axis at a rotational speed. The chip removal device can also include a main fluid channel with an opening to receive pressurized fluid from the machine tool. The chip removal device can further include a first fluid delivery channel and a second fluid delivery channel to direct fluid in different directions. Each fluid delivery channel can be in fluid communication with the main fluid channel. In addition, the chip removal device can include one or more valves associated with the first and second fluid delivery channels to selectively allow fluid passage from the main fluid channel to the fluid delivery channels. The one or more valves can be actuated by varying fluid pressure and/or rotational speed.

Abstract: A tubular jetting device includes at least one inlet port that includes a first inlet opening in an inner surface of the tubular jetting device where the inner surface defines a center bore. The at least one inlet port also includes a second inlet opening in an end surface of the tubular jetting device and an inlet channel extending between the first inlet opening and the second inlet opening. The tubular jetting device further includes at least one exhaust port that includes a first exhaust opening in the end surface, a second exhaust opening in an outer surface of the tubular jetting device, and an exhaust channel extending between the first exhaust opening and the second exhaust opening.

Abstract: Implementations disclosed herein generally relate to systems and methods of protecting a substrate support in a process chamber from cleaning fluid during a cleaning process. The method of cleaning the process chamber includes positioning in the process chamber a cover substrate above a substrate support and a process kit that separates a purge volume from a process volume. The method of cleaning includes flowing a purge gas in the purge volume to protect the substrate support and flowing a cleaning fluid to a process volume above the cover substrate, flowing the cleaning fluid in the process volume to an outer flow path, and to an exhaust outlet in the chamber body. The purge volume is maintained at a positive pressure with respect to the process volume to block the cleaning fluid from the purge volume.

Abstract: A method is provided for vaporized hydrogen peroxide cleaning of a chamber. The method includes altering a temperature of air in the chamber from an initial temperature to a sterilization temperature over a first time period. The method also includes injecting vaporized hydrogen peroxide into air in the chamber to alter a relative humidity of hydrogen peroxide vapor in the chamber to a sterilization level over the first time period. The method also includes maintaining the temperature at the sterilization temperature and the relative humidity at the sterilization level over a second time period. The method also includes reducing the relative humidity from the sterilization level to a safe level over a third time period. In one embodiment, the method is provided for vaporized hydrogen peroxide cleaning of an interior chamber of an incubation container. In other embodiments, the incubation chamber featured in the method is provided.