Abstract: A substrate processing method includes a liquid discharging step of discharging liquid through a nozzle toward a predetermined supply region on the main surface of a substrate held on a substrate holding unit within a chamber, a humidified gas supplying step of supplying humidified gas with a humidity higher than the humidity within the chamber onto the main surface of the substrate to remove electrical charges carried on the substrate, and a spin-drying step of rotating the substrate about a predetermined rotational axis after the liquid discharging step to spin off the liquid component from the main surface of the substrate. The humidified gas supplying step is started before the start of the liquid discharging step and ended at a predetermined termination timing after the start of the liquid discharging step and before the spin-drying step.

Abstract: A dishwasher includes a pump device operated by a pump current for supply of washing liquor to a first spray device via a first hydraulic arrangement for providing a first washing zone and to a second spray device via a second hydraulic arrangement for providing a second washing zone. A third spray device is connected to one of the first and second hydraulic arrangements for providing an intensive washing zone. In a first switching state, the third spray device is isolated from the one hydraulic arrangement, and in a second switching state the third spray device is connected to the one hydraulic arrangement. A control device determines a current switching state of the third spray device as a function of a difference between the pump current when washing liquor is supplied to the first hydraulic arrangement and when washing liquor is supplied to the second hydraulic arrangement.

Abstract: A cleaning system for a solar panel is provided. The cleaning system comprises: i) a frame moveable in a transverse direction over the solar panel, the frame having edges oriented in the transverse direction; a brush assembly positioned within the frame and moveable in a longitudinal direction including a plurality brush holders arranged within the frame, with each brush holder being adapted to interchangeably receive a brush for cleaning the solar panel; and a liquid spray arrangement including nozzles arranged one or more rows for spraying at least one of water and a water detergent mix onto the solar panel. The liquid spray arrangement includes nozzles positioned near at least one of the transverse edges of the frame for spraying the water detergent mix onto a longitudinal end of the brush assembly.

Abstract: A method of cleaning blind spots around a substrate supporting apparatus by controlling a position of the substrate supporting apparatus includes moving the substrate supporting apparatus relative to a ring and supplying a cleaning gas to an upper space of the substrate supporting apparatus.

Abstract: The present disclosure relates to a dishwasher and a method of controlling the same. The dishwasher may determine an amount of foam in a wash space using a turbidity sensor measuring a turbidity value of wash water. Additionally, the dishwasher may perform a foam removal operation based on the amount of the foam in the wash space. In this case, the turbidity value measured by the turbidity sensor may be used. The foam removal operation may include a drainage operation, a water supply operation, and a wash operation that are consecutively performed, and may be performed in one or more of a pre-wash course, a main wash course, and a heating and rinsing course.

Abstract: Disclosed are a dishwasher that sprays wash water to wash dishes or cookware and a method of controlling the same. The method of controlling the dishwasher includes supplying wash water from an external water source to a sump and intermittently driving a washing pump to change the level of water around a filter, thereby removing filth from the filter.

Abstract: A method of cleaning a surface of a substrate uses alcohol and water treatments. The method may include applying an alcohol treatment on a surface of the substrate with the alcohol treatment configured to provide surface reduction and applying a water treatment to the surface of the substrate with the water treatment configured to enhance selectivity of at least a portion of the surface for a subsequent barrier layer process by removing alcohol from the at least a portion of the surface. The water treatment may be performed simultaneously with the alcohol treatment or performed after the alcohol treatment. The water treatment may include vaporized water or water injected into a plasma to produce hydrogen or oxygen radicals.

Abstract: The present disclosure relates to a dish washer having a heat pump, and the dish washer may include a washing tank provided with a sump at a bottom surface thereof and provided with an accommodation space for storing dishes therein; a heat pump system provided with an evaporator, a compressor that compresses and circulates refrigerant, a condenser that heats washing water for washing the dishes, and an expansion apparatus; and a heat exchange system that exchanges heat between water for heat transfer to the refrigerant and the evaporator, thereby enhancing the heat exchange performance and efficiency of the evaporator.

Abstract: A cleaning device (10, 110, 210) may be a card-like member such as a flap (16, 116), integrally formed with a dispenser container (12), or a slotted member (36) mounted on a stand-alone cleaning device (110). A cleaning wipe fabric (22, 122) has a modulus of stiffness which is high enough to bridge a plurality of cleaning slots (26a-26d, 126a-126d) and hold the fabric out of contact with the slot floor surfaces (26a?), and low enough to be deflected by a fiber optic end being cleaned to sag within the cleaning slot to better enclose and clean the tip of the fiber optic end. Used cleaning fabric (22, 122) can easily be advanced or removed as needed to avoid using the same area of fabric for cleaning more than once.

Abstract: A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.

Abstract: The present disclosure provides a device and a system for cleaning glass substrates with different dimensions. The device includes a rack (1); conveying rollers (2) rotatably disposed on the rack (1); a limiting assembly (4) including a first roller (41) and a second roller (42), the first roller (41) being fixed on a first connecting rod (43), and the second roller (42) being fixed on a second connecting rod (44), and the first connecting rod (43) and the second connecting rod (44) being movable along an axial direction of the conveying roller (2); a driving device (5) for driving the conveying rollers (2), the first roller (41) and the second roller (42) to rotate; a cleaning assembly (6) including an upper cleaning box (61) and a lower cleaning box (62), and the upper cleaning box (61) and the lower cleaning box (62) being both provided with nozzles.

Abstract: A method of removing particles of a substrate processing apparatus includes a pressure increasing process, a circulating process, and a particle removing process. In the pressure increasing process, a pressure in a processing space is increased by supplying a cleaned fluid from a first supply line to the processing space in a state where a second on-off valve and a third on-off valve are closed. In the circulating process, a processing fluid is supplied from a second supply line to the processing space and discharged from a discharge line by opening the second on-off valve and the third on-off valve after the pressure increasing process. In the particle removing process, a flow of the cleaned fluid is generated against the pressure of the processing space in the second supply line by opening and closing the second on-off valve during the pressure increasing process.

Abstract: The invention provides an object (10) that during use is at least partly submerged in water, the object (10) further comprising an anti-bio fouling system (200) comprising an UV emitting element (210), wherein the UV emitting element (210) comprises one or more light sources (220) and is configured to irradiate with UV radiation (221) during an irradiation stage one or more of (i) a part (111) of an external surface (11) of said object (10) and (ii) water adjacent to said part (111) of said external surface (11), wherein the object (10) is selected from the group consisting of a vessel (1) and an infrastructural object (15), wherein the object (10) further comprises a water switch (400), wherein the anti-bio fouling system (200) is configured to provide said UV radiation (221) to said part (111) in dependence of the water switch (400) being in physical contact with the water.

Abstract: A washing apparatus includes a stage, a suction nozzle, and a control unit. On the stage, an analytical unit is mounted. In the analytical unit, a well having a hole shape including a bottom surface and an inner peripheral surface is formed. The suction nozzle sucks a solution in the well. The control unit, after controlling the suction nozzle to sucks the solution in the well, controls the stage to rotate the stage on which the analytical unit is mounted at a predetermined speed of rotation, and controls the suction nozzle to suck a residue of the solution existing in the well.

Abstract: The present disclosure includes arrangements, systems, and methods for removing mineral deposits. Disclosed is an aqueous solution within a container, with the container containing mineral deposits. The aqueous solution submerges the mineral deposits and may include at least one acid, or a combination of an organic acid and an inorganic acid in percentages that allow the replacement of toxic dangerous chemical ingredients. Disclosed also is a cathode and an anode within the container that are at least partially submerged within the aqueous solution. A direct current power source is configured to direct a voltage across the cathode and the anode to generate an electrical charge gradient within the aqueous solution.

Abstract: A cleaning apparatus for a glass sheet includes a housing in which a cleaning liquid is stored, a plurality of spindle cases fixed to the housing to face an internal space of the housing, a spindle rotatably held in each of the spindle cases to face an internal space of the each of the spindle cases, and a cleaning member mounted to a distal end portion of the spindle. The cleaning apparatus also includes a first supply path formed in the each of the spindle cases to supply the cleaning liquid in the internal space of the housing to the internal space of the each of the spindle cases, and a second supply path formed in the spindle to supply the cleaning liquid in the internal space of the each of the spindle cases to the cleaning member.

Abstract: Auger cleaned inaccessible floor systems to maximize operational capacity of inaccessible floors. The auger cleaned inaccessible floor system includes a floor having at least one channel beneath the lowest point of the floor extending horizontally at least half the length of the longest dimension of the floor and adapted for receiving an auger cleaner, at least one gate complex that provides fluid communication between the channel and at least one box and further provides access to the floor for the auger cleaner, and at least one box to deliver the auger cleaner to the channel and adapted for equalizing pressure when the inaccessible floor is under water to deliver an auger cleaner for cleaning. Thus, the auger cleaned inaccessible floor system allows cleaning of the inaccessible floor while the inaccessible floor system is in operation increasing the yield from the inaccessible floor system.

Abstract: Embodiments of the invention disclosed herein include steam appliances and methods which apply steam and a liquid containing a cleaning agent to the floor via separate outlets. In some embodiments, the liquid containing a cleaning agent is applied to an area of the floor that is physically separated from a steam application area. The steam may be applied to the floor through a steam-permeable fabric. The liquid containing a cleaning agent may be heated before being applied to the floor or being mixed with steam.

Abstract: A brush for cleaning a pool includes an at least partially hollow body for receiving a hose, wherein the hose includes a plurality of rings being rotatably disposed around the hose. The brush also includes a plurality of bristles that project from the at least partially hollow body and a means for coupling the brush to at least one of the plurality of rings which facilitates rotation around the hose along with the at least one of the plurality of rings to which it is coupled.

Abstract: A grass treatment system includes a first ground engaging rolling element, a second ground engaging rolling element, a comb having a leading edge including a plurality of comb teeth spaced apart at intervals, the comb is mounted between the first and second rolling elements and transversely to a direction of travel, a substantially cylindrical brush positioned above the comb and configured to engage at least a portion of a top surface of the comb, wherein the brush rotates relative to the comb to propel debris lifted from an area of turf grass by the comb.