Abstract: The invention relates to a modulatable infrared emitter comprising a MEMS heating element and an actuator, wherein the actuator triggers shape and/or structure changes of the MEMS heating element. Said change in shape and/or structure of the MEMS heating element may vary the ratio of the emitting area to the total area, thereby producing a change in intensity of the emitted infrared beam. The invention further relates to a manufacturing method for the infrared emitter, a method for modulated emission of infrared radiation using the infrared emitter, and preferred uses of the infrared emitter. In further preferred aspects the invention relates to a system comprising the infrared emitter and a control device for regulating the actuator.

Abstract: Embodiments herein describe an atomic sensor that includes a photonic die that outputs optical signals on a top surface. These optical signals can be directed and shaped as needed to satisfy a particular type of atomic sensor. In one embodiment, an atomic source (e.g., rubidium or cesium) is disposed on the photonic chip to emit atoms when heated. A collimator can then direct the emitted atoms along a path that intersects with the optical signals. This intersection can be used to detect motion (e.g., rotation and acceleration) of the atomic sensor.

Abstract: An analysis method includes: subjecting a sample to liquid chromatography; performing first mass spectrometry of the sample subjected to the liquid chromatography to detect a first ion corresponding to cholesteryl ester and a second ion corresponding to cholesteryl ester peroxide; and analyzing a degree of oxidation of the sample based on a ratio between an intensity of the detected first ion and an intensity of the detected second ion.

Abstract: The present invention relates to the field of microscopy, preferably electron microscopy. Especially, the present invention concerns an embedding medium for imaging a biological sample by microscopy comprising: from 60% to 99% wt. of a glycol dimethacrylate selected from alkylene glycol dimethacrylate and/or oligo(alkylene glycol) dimethacrylate; from 0% to 38% wt. of a polyalkylene glycol diacrylate or of a polyalkylene glycol methacrylate; said polyalkylene glycol diacrylate or polyalkylene glycol methacrylate being optionally substituted by at least one hydrophilic group such as hydroxyl, amino, or an oxo group; at least one additive, preferably comprising at least one heavy metal salt or lanthanide salt; and from 0.1% to 2% wt. of a radical polymerization initiator.

Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, an information provision unit for providing information indicating an expected machining completion time, and a storage unit for storing past machining information. The information provision unit performs processing for calculating the expected machining completion time based on the past machining information, processing for acquiring an image photographed by the camera, processing for calculating a machining speed based on the acquired image, and processing for updating the expected machining completion time based on the machining speed.

Abstract: An ion implantation system has a mass analyzing magnet having interior and exterior region and defining a first entrance, second entrance, and an exit. A first ion source defines a first ion beam directed toward the first entrance along a first beam path. A second ion source defines a second ion beam directed toward the second entrance along a second beam path. A magnet current source supplies a magnet current to the mass analyzing magnet. Magnet control circuitry controls a polarity of the magnet current based on a formation of the first or second ion beam. The mass analyzing magnet mass analyzes the respective first or second ion beam to define defining a mass analyzed ion beam along a mass analyzed beam path. At least one shield in the interior or exterior region prevents line-of-sight between the first and second ion sources. Beamline components modify the mass analyzed ion beam.

Abstract: A composite panel for a toxic material encapsulation system, comprising a reinforcing structure extending within and integrally formed with a non-biodegradable thermoplastic polymer.

Abstract: An ion gun according to one embodiment of the present invention has an anode, a cathode having a first portion and a second portion that face the anode, and a magnet that creates a spatial magnetic field between the first portion and the second portion. An annular gap including a curved portion is provided between the first portion and the second portion of the cathode. The magnet creates lines of magnetic field having the bottom inside with respect to the sectional center line of the gap between the first portion and the second portion of the curved portion.

Abstract: A metrology target includes a first set of pattern elements compatible with a first metrology mode along one or more directions, and a second set of pattern elements compatible with a second metrology mode along one or more directions, wherein the second set of pattern elements includes a first portion of the first set of pattern elements, and wherein the second set of pattern elements is surrounded by a second portion of the first set of pattern elements not included in the second set of pattern elements.

Abstract: An ion source has an arc chamber with a first end and a second end. A first cathode at the first end of the arc chamber has a first cathode body and a first filament disposed within the first cathode body. A second cathode at the second end of the arc chamber has a second cathode body and a second filament disposed within the second cathode body. A filament switch selectively electrically couples a filament power supply to each of the first filament and the second filament, respectively, based on a position of the filament switch. A controller controls the position of the filament switch to alternate the electrical coupling of the filament power supply between the first filament and the second filament for a plurality of switching cycles based on predetermined criteria. The predetermined criteria can be a duration of operation of the first filament and second filament.

Abstract: The invention generally relates to systems and methods for conducting reactions and screening for reaction products.

Abstract: The present disclosure provides a method of achieving an integral number of sweeps within an ion beam. A substrate having a fiducial is placed on a wafer stage within the ion beam system. An energetic particle beam is generated within the ion beam system. The substrate is exposed to the energetic particle beam while the wafer stage with the substrate is rotated clockwise so that the fiducial of the substrate travels a sweep distance in a clockwise direction at a first speed and the fiducial of the substrate travels the same sweep distance in a counterclockwise direction at a second speed. The exposure of the substrate to the energetic particle beam is discontinued when the number of complete/full sweeps in the clockwise direction equals the number of complete/full sweeps in the counterclockwise direction.

Abstract: The disclosure provides a method for evaluation of removal of nitrogen-containing organic matter from the wastewater.

Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.

Abstract: To improve startability in a UV irradiation apparatus equipped with excimer lamps. The UV irradiation apparatus includes a plurality of excimer lamps each having a light-emitting tube filled with a discharge gas containing a noble gas. The plurality of excimer lamps includes a first excimer lamp filled with the discharge gas at a first enclosed gas pressure and a second excimer lamp filled with the discharge gas at a second enclosed gas pressure lower than the first enclosed gas pressure. The first excimer lamp is placed in a position such that at least part of light emitted from the second excimer lamp is allowed to enter the first excimer lamp.

Abstract: A laser beam delivery apparatus of an extreme ultra violet light source may include a high power seed module configured to generate a laser beam, a power amplifier configured to amplify the laser beam generated by the high power seed module, a beam transfer module configured to collect and move the laser beam amplified by the power amplifier, a final focusing assembly optical platform configured to adjust focus of the laser beam collected and moved by the beam transfer module, and a focusing unit configured to focus the laser beam with the focus adjusted by the final focusing assembly optical platform to a target droplet. The power amplifier may include a position adjuster configured to adjust a position of the laser beam. The position adjuster may include a refraction plate having a flat surface. The power amplifier may include a pointing adjuster, which may include a mirror.

Abstract: An ion source for extracting a ribbon ion beam with improved height uniformity is disclosed. Gas nozzles are disposed in the chamber proximate the extraction aperture. The gas that is introduced near the extraction aperture serves to shape the ribbon ion beam as it is being extracted. For example, the height of the ribbon ion beam may be reduced by injecting gas above and below the ion beam so as to compress the extracted ion beam in the height direction. In some embodiments, the feedgas is introduced near the extraction aperture. In other embodiments, a shield gas, such as an inert gas, is introduced near the extraction aperture.

Abstract: An electron source has an insulating base, a pair of conductive terminals, an insulating support member, a drift isolation member, an emitter-cathode, and one or more heating elements. The conductive terminals are exposed from a first surface of the insulating base. The insulating support member extends from the first surface of the insulating base. The drift isolation member is disposed at an end of the insulating support member remote from the insulating base. The emitter-cathode is coupled to the drift isolation member. The one or more heating elements are coupled to the conductive terminals and the drift isolation member. The combination of the drift isolation member with the insulating support member can prevent stress-induced drift from impacting position of the emitter-cathode, thereby improving the mechanical stability of the electron source.

Abstract: An ion source has an arc chamber defining an arc chamber volume. A reservoir is coupled to the arc chamber, defining a reservoir volume. The reservoir receives a source species to define a liquid within the reservoir volume. A conduit fluidly couples the reservoir volume to the arc chamber volume. First and second openings of the conduit are open to the respective reservoir and arc chamber volume. A heat source selectively heats the reservoir to melt the source species at a predetermined temperature. A liquid control apparatus controls a first volume of the liquid within the reservoir volume to define a predetermined supply of the liquid to the arc chamber volume. The liquid control apparatus is a pressurized gas source fluidly coupled to the reservoir to supply a gas to the reservoir and provide a predetermined amount of liquid to the arc chamber.

Abstract: The present invention centers upon a novel “molecular amplification spike,” which is an admixture of two components, namely, an aliquot of a quantity of a molecule, composition, compound or element of interest (an “analyte”) in its natural isotopic state and an aliquot of an isotopically enriched form of the same molecule, composition, compound or element. The molecular amplification spike contains 20% natural-abundance isotope, balance enriched isotope. The molecular amplification spike may optionally contain more than 20% natural-abundance isotope, with concomitantly reduced balance of enriched isotope. Such an admixed spike, when added to a sample prior to mass spectrometric analysis of that sample, creates new and significantly improved percentage of errors and quantification or confirmation of the absence of the molecule, composition, compound or element of interest in the sample.