Abstract: A multi beam inspection method and system. The inspection system includes: (i) a beam array generator adapted to generate an array of beams characterized by a beam array axis; and (ii) at least one mechanism adapted to position the object under the array of beams such that at least two beams that are positioned along a beam array axis scan substantially simultaneously at least two regions of interest of the object, wherein the first axis is oriented in relation to the beam array axis.

Abstract: A micro-miniature ion trap device comprises a wafer (or substrate) having a major surface, a multiplicity of electrodes forming a micro-miniature ion trap in a region adjacent the major surface when voltage is applied to the electrodes, characterized in that the multiplicity includes a first, planar annular electrode located over and rigidly affixed to the major surface, and at least one second, planar annular electrode located over and rigidly affixed to the major surface, the at least one second electrode being concentric with the first electrode. The at least one second electrode may be completely annular, in that the annulus forms a closed geometric shape, or it may be partially annular, in that the annulus has a slot or opening allowing access to the first electrode. In accordance with a preferred embodiment of our invention, the at least one second electrode is C-shaped, and the angle subtended by the C-shape is greater than 180 degrees.

Abstract: A stand-alone calculator enables multi energy electron beam treatments with standard single beam electron beam radiotherapy equipment thereby providing improved dose profiles. By employing user defined depth-dose profiles, the calculator may work with a wide variety of existing standard electron beam radiotherapy systems.

Abstract: System and a method for electrically testing a semiconductor wafer, the method including: (a) scanning a charged particle beam along at least one scan line while maintaining an electrode located at a vicinity of the wafer at a first voltage that differs from a voltage level of a first scanned portion of the wafer, and collecting charged particles scattered from the first scanned portion; (b) scanning a charged particle beam along at least one other scan line while maintaining the electrode at a second voltage that differs from a voltage level of a second scanned portion such as to control a charging state of at least an area that comprises the first and second scanned portions; and (c) repeating the scanning stages until a predefined section of the wafer is scanned.

Abstract: An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.

Abstract: A method for preparing a specimen for application of microanalysis thereto includes forming an initial conductive layer over a defined area of interest on a semiconductor substrate, the initial conductive layer formed through an electron beam deposition process. A volume of substrate material surrounding the area of interest is removed, thereby forming the specimen, including said area of interest and said initial conductive layer over the area of interest. The specimen is then removed from the bulk substrate material.

Abstract: A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

Abstract: In an ion trap device including: a plurality of electrodes enclosing an ion trapping space for trapping ions; an RF driving circuit for generating an RF driving voltage; a resonant circuit for amplifying the RF driving voltage and applying an RF high voltage to at least one of the plurality of electrodes; and a tuning circuit for adjusting a resonant frequency of the resonant circuit while keeping the amplitude of the RF high voltage constant, the method of adjusting the ion trap device according to the present invention includes the steps of: adjusting a resonant frequency of the resonant circuit to a frequency of the RF driving voltage; and shifting the resonant frequency of the resonant circuit so that the RF driving voltage increases by a predetermined constant ratio.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator generates a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls each of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: A method for discharging a sample, the method includes: determining whether to discharge a negatively charged area of a sample or to discharge a positively charged area of the sample; and injecting gas, via an electrode and gas supply component, or setting a first electrode to a first voltage and set the electrode and gas supply component to a second voltage, in response to the determination. A system including: a first electrode adapted to be set to at least a first potential; an electrode and gas supply component, adapted to be set to at least a second potential and to selectively supply gas to a vicinity of the sample; wherein at least one out of the first electrode and the electrode and gas supply component are positioned close to the sample.

Abstract: An apparatus for mass analyzing molecules includes a mass spectrometer configured to select precursor ions having a mass to charge ratio range, a metastable species generator configured to generate a metastable species for introduction into the mass spectrometer, and a mass detector configured to detect a mass of the product ions. The apparatus also includes interaction region in the mass spectrometer where the precursor ions fragment into product ions via interaction of the precursor ions with the metastable species.

Abstract: An ion trap/time-of-flight mass spectrometer, which can perform accurate mass measurement of a product ion based on MS/MS and MSn has an ion source for ionizing a sample, an ion trap capable of temporarily trapping ions, and a time-of-flight mass spectrometer. The ion source produces ions of the sample as a measurement target and ions of a reference sample each having a known mass value. A precursor ion is selected from among the ions of the measurement target sample, and the selected precursor ion is excited and fragmented in the ion trap to produce a product ion. The reference sample ions are introduced to and trapped in the ion trap. The trapped product ion and reference sample ions are expelled out of the ion trap and introduced to the time-of-flight mass spectrometer, thereby obtaining a mass spectrum.

Abstract: A charged particle device is provided comprising a charged particle source configured to direct charged particles in the direction of a specimen under examination and an imaging device configured to convert charged particles to an image representing the specimen. The imaging device comprises a detector defining a pixel array. The detector is configured to generate electric charges for individual pixels of the pixel array such that the electric charges collectively define the image. The imaging device is configured such that a portion of the pixel array can be transitioned between a partially masked state and a substantially unmasked state.

Abstract: According to the invention, to achieve the above objective, there is provided a charged particle beam apparatus that creates a first image by irradiating a charged particle beam on a sample to scan a first pattern of the sample, controls on the basis of the first image the focus of the charged particle beam and the brightness and/or contrast of the image, and irradiates the charged particle beam to correctly scan a second pattern different from the first pattern by using the control conditions used to control the focus of the charged particle beam and the brightness and/or contrast of the image.

Abstract: According to one aspect of the invention, a method and apparatus for producing electromagnetic radiation is provided. The apparatus may include a chamber wall enclosing a plasma emission chamber to contain a plasma emission gas. A first electrode may be within the plasma emission chamber. At least one second electrode may within the plasma emission chamber. The at least one second electrode may be rotatable about an axis thereof and positioned within the plasma emission chamber such that when a voltage is applied across the first electrode and the at least one second electrode, a plasma is generated between the first electrode and the at least one second electrode.

Abstract: A method and apparatus for carrying out analyses of a gas comprising one or more species by using an ion mobility spectrometer which includes a plurality of electrodes arranged in a chamber divided by an electrifiable grid into a reaction zone provided with an inlet for the gas to be analyzed and a drift zone provided with at least one ion detector. The electrodes generate at least one electric field non-uniform in space along the longitudinal axis of the chamber.

Abstract: A method and system is disclosed for concentrating high energy particles on a predetermined area on a target semiconductor substrate. A high energy source for generating a predetermined amount of high energy particles, and an electro-magnetic radiation source for generating low energy beams are used together. The system also uses a mask set having at least one mask with at least one alignment area and at least one mask target area thereon, the mask target area passing more high energy particles then any other area of the mask. At least one protection shield is incorporated in the system for protecting the alignment area from being exposed to the high energy particles, wherein the mask is aligned with the predetermined target semiconductor substrate by passing the low energy beams through the alignment area, wherein the high energy particles generated by the high energy source pass through the mask target area to land on the predetermined area on the target semiconductor substrate.

Abstract: Method and apparatus for field ion mobility spectrometry for identification of chemical compounds in a sample by trajectory of sample ions in a transverse electric field.

Abstract: Disclosed are methods and apparatus for classifying defects based on X-ray spectrum obtained from the defects. In general terms, the present invention provides pattern recognition techniques for accurately and efficiently classifying a defect based on an X-ray spectrum obtained from such defect and its surrounding substrate and structures, no matter the complexity of such substrate and structures. A pattern recognition technique generally includes training a pattern recognition process to recognize particular types of X-ray spectrum obtained from specimens as belonging to a particular defect type or other specific characteristic of a specimen. Once a pattern recognition process is set up to recognize or classify particular X-ray spectrum, the pattern recognition process can then be utilized to automatically classify specimens as having a specific characteristic or defect type.

Abstract: A mass spectrometer having an ion source section capable of creating positive ions and negative ions at high efficiency. The ion source is comprised of an ion source section for creating ions of a sample gas, a mass spectrometric section for conducting mass separation of created ions, linear RF generating multipole electrodes, magnetic fields generation means, a sample gas introduction system, a reaction gas introduction system and an electron source in which the linear RF generating multipole electrodes generate linear RF multipole electric fields. A static magnetic fields is applied in parallel on the center axis where the linear RF multipole electric fields are zero. A sample gas and a reagent gas are introduced into the ion source section. Electrons are injected for creating reaction of the positive ions or negative ions.