Abstract: A mass spectrometer that includes a tray on the outer housing of the mass spectrometer for receiving a portable user interface. Each of the user interface and the tray has a transceiver port for transmitting and receiving electromagnetic wave radiation as infrared radiation. More specifically, the tray also includes a serial port connector and the portable user interface includes a receptor for receiving the serial port connected when the user interface is mounted on the tray.

Abstract: A mass spectrometer includes: an ion source; a mass separator for separating ions with respect to mass to charge ratios of the ions; an ion detector; an ion deflector including a pair of electrodes placed opposite each other across an ion optical axis, the ion deflector being placed between the ion source and the mass separator or between the mass separator and the ion detector; and a voltage generator for applying AC voltages of opposite polarities respectively to the pair of electrodes, where a frequency of the AC voltages is determined so that lighter ions are more deflected and prevented from entering the mass separator or the ion detector and heavier ions are less deflected and allowed to enter the mass separator or the ion detector. Only helium ions which are deleterious to the mass spectrometry can be efficiently eliminated while object sample ions are hardly affected.

Abstract: A kit for preparing TEM sample holders includes at least one TEM coupon made of a sheet of material and having one or more paths from its edge to a TEM sample holder form embodied in the TEM coupon. There is at least one hole in the coupon defining the outer boundary of the TEM sample holder form. This hole has a mouth that defines a land of material. This land connects the TEM sample holder form to the edge of the sheet. The kit preferably includes at least one probe tip, where the probe tip has a probe-tip point, and finally, a press. The press has inner and outer dies and a former rod opposing the inner and outer dies. A shear punch is situated coaxially with the former rod. Thus, when an actuator drives the shear punch toward the inner and outer dies, the shear punch severs the land and cuts an opening in the TEM sample holder form, and simultaneously the former rod presses the probe tip point or points into the sheet of material.

Abstract: The preferred embodiment further includes a press for cutting a TEM sample holder from a TEM coupon and joining a probe-tip point with an attached sample to the TEM sample holder. The press includes: an outer die; an inner die situated inside the outer die; a former rod opposing the inner and outer dies; and, a shear punch situated coaxially with the former rod. A hold-down spring biases the former rod toward the inner die. A trigger or other mechanism responsive to the contact of the former rod and the inner die, and an actuator responsive to the trigger, drive the shear punch toward the inner and outer dies. This press can be located either inside or outside the vacuum chamber of the FIB or other analytical instrument.

Abstract: According to the existing mass spectrometric system, whether or not the informations are sufficient for analyzing substances (particularly proteins, sugars, etc.) cannot be judged in the process of measurement. Further, it is difficult to find out isomers having just the same mass number or compounds very close in mass only from the MS data. According to this invention, whether or not the retention time in the LC (or GC) of peptide formed at the time of enzymatic decomposition of protein coincides with the predicted retention time assumed from the amino acid sequence predicted from MS2 mass spectrometry data is judged within the actual time period of measurement, and thereby the quality of MS2 mass spectrometry data (quantity of information) is judged.

Abstract: A particle beam irradiation apparatus includes a synchrotron, two scanning electromagnets, an beam delivery apparatus for outputting an ion beam extracted from the synchrotron, and an accelerator and transport system controller, and a scanning controller. These controllers stop the output of the ion beam from the beam delivery apparatus; in a state where the output of the ion beam is stopped, change the irradiation position of the ion beam by controlling the scanning electromagnets; and after this change, control the scanning electromagnets to start the output of the ion beam from the beam delivery apparatus and to perform irradiations of the ion beam to at least one irradiation position a plurality of times based on treatment planning information.

Abstract: A method and an apparatus for collecting ions in which ions are produced from a sample in an ion source. An electric field is provided that is more uniform in an area adjacent the sample than in an area adjacent an inlet to the ion transfer device or that is larger in field strength at the sample than at a point removed from the sample towards the inlet of the ion transfer device. Ions are received into the electric field and transferred through the ion transfer device to a sampling orifice of the mass spectrometer. The apparatus includes an ion transfer device coupled to a sampling orifice of a mass spectrometer. The ion transfer device has an inlet with a surface that extends in a direction from an axis of the ion transfer device. The ion transfer device can extend a distance of at least 10 times an inner diameter of a sampling orifice of the mass spectrometer.

Abstract: An ion resonance condition is corrected accurately in an ion trapping device. Measurements are repeated by alternately applying and not applying a resonance frequency voltage while spectral data is obtained continuously. Data obtained in the absence of the resonance frequency voltage is used as reference data to correct the set data of a resonance condition. As a result, calibration can be made while taking into consideration the variations in the amount of ions that are introduced into the ion trap.

Abstract: A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

Abstract: A TEM sample holder is formed by cutting the TEM sample holder form from a coupon in a press. The cutting at the same time joins the tip point of a nano-manipulator probe tip with the formed TEM sample holder. The tip point of the probe has a sample attached for inspection in a TEM. The cutting process also creates a gap in the sample holder to allow for FIB milling of the specimen.

Abstract: A method for preparing a transmission electron microscopy (TEM) sample is provided which includes removing a portion of a substrate using a focused ion beam tool and securing the removed portion to a support structure to form a grafted structure. The method further includes forming an opening within the support structure to expose an underside of the removed portion and thinning the exposed underside using an ion beam miller tool. In some cases, the step of securing the removed portion to the support structure may include placing the substrate specimen upon a film attached to a mesh grid, positioning the mesh grid upon a framework comprising the support structure such that the substrate specimen is above the support structure, and pushing the substrate specimen through the film onto the support structure. A TEM sample resulting from such methods is also provided.

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract: Ion mobility spectrometer. The spectrometer includes an enclosure for receiving a sample therewithin and an electron beam window admits an electron beam into the enclosure to ionize the sample in an ionization region. A shutter grid is spaced apart from the ionization region and means are provided for sample ion preconcentration upstream of the shutter grid. The ion preconcentration is effective to reduce space charge resulting in a lowered threshold detection level.

Abstract: An apparatus (10, 10?) for producing an alignment surface on an associated substrate (12, 12?) of a liquid crystal display. An electron source (40) produces a collimated electron beam (50). A substrate support (20, 20?) supports the associated substrate (12, 12?) with a surface normal (80) of the substrate arranged at a preselected angle (?) relative to the collimated electron beam (50). The collimated electron beam (50) is rastered across the associated substrate (12, 12?) at the preselected angle (?) while the substrate moves through the electron beam.

Abstract: An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The ion source has an arc chamber for ionizing a source material routed into the arc chamber that defines an exit aperture for routing ions to the transport system and including an arc chamber flange attached to the arc chamber and including a first surface that defines a gas inlet which accepts gas from a source and a gas outlet which opens into the arc chamber. An arc chamber support includes a support flange having a conforming surface that sealingly engages the first surface of arc chamber flange at a region of the gas inlet and further includes a throughpassage that aligns with the gas inlet. A gas supply line routes gas from a gas source through the throughpassage of the support flange and into the gas inlet of said arc chamber flange.

Abstract: To acquire defect images even when a defect exists below an optically transparent film, an electron optical system of an electron microscope is set to a first imaging condition. A defect position of a specimen is set so as to fall within the visual field of the electron microscope, using position data of a defect of the specimen. The position of the defect is imaged by the electron microscope set to the first imaging condition to obtain a first image corresponding to the defect position. The first image is processed to determine whether a defect exists. The electron optical system is then set to a second imaging condition on the basis of the result of determination. A point imaged under the first imaging condition is imaged by the electron microscope set to the second imaging condition to acquire a second image corresponding to a defect position.

Abstract: The invention relates to radiation source assembly including a novel arrangement for protecting at least a portion of an optical radiation sensor from damage due to thermal build-up from the radiation being sensed while allowing the optical radiation sensor to function in a substantially normal manner. Generally, in the present arrangement, damaging radiation from the radiation field in which the sensor is disposed is substantially prevented from contacting the sensor. This may be achieved in a number of different ways.

Abstract: A particle beam irradiation apparatus includes a synchrotron, two scanning electromagnets, an beam delivery apparatus for outputting an ion beam extracted from the synchrotron, and an accelerator and transport system controller, and a scanning controller. These controllers stop the output of the ion beam from the beam delivery apparatus; in a state where the output of the ion beam is stopped, change the irradiation position of the ion beam by controlling the scanning electromagnets; and after this change, control the scanning electromagnets to start the output of the ion beam from the beam delivery apparatus and to perform irradiations of the ion beam to at least one irradiation position a plurality of times based on treatment planning information.

Abstract: A measuring apparatus for irradiating measuring light and for measuring optical performance of a target optical system includes a barrel for housing the target optical system, the barrel being rotatable around an optical axis of the target optical system, and an illumination optical system for introducing the measuring light into the barrel, the illumination optical system being movable along a direction perpendicular to the optical axis of the target optical system, wherein the measuring apparatus controls an illumination area of the measuring light in the target optical system using a polar coordinate determined by a rotational angle of the barrel and a moving amount of the illumination optical system.

Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.