Abstract: A UV curing apparatus and method is provided for enhancing the distribution and application of UV light to UV photo initiators in a UV curable ink, coating or adhesive. The UV curing apparatus and method comprises UV LED assemblies in a first row with the UV LED assemblies spaced from adjacent UV LED assemblies. At least one second row of a plurality of UV LED assemblies are provided next to the first row but with the UV LED assemblies of the second row positioned adjacent the spaces between adjacent UV LED assemblies in the first row thereby to stagger the second row of UV LED assemblies from the UV LED assemblies in the first row. Desirably, the rows of staggered UV LED assemblies are mounted on a panel. UV curable products, articles or other objects containing UV photo initiators that are in or on a web can be conveyed or otherwise moved past the rows of UV LED assemblies for effective UV curing.

Abstract: The apparatus for processing an in-process substrate by generating a plasma have a processing chamber with an observation window, in which the in-process substrate is disposed; plasma generating means for generating a plasma in the inside of the processing chamber; irradiation means for projecting a light beam into the inside of the processing chamber through the observation window; detection means for detecting the light projected and reflected from the inside wall of the chamber by the irradiation means; and data processing means for obtaining information on the state of contamination of the inside wall of the processing chamber by processing signals obtained through detection of the reflected light by the detection means, and thereby permitting simultaneously monitoring of both the state of contamination of an inside wall of the processing chamber and foreign materials suspended in the processing chamber, with a single observation window and an optical system composed of one unit.

Abstract: A method for making three-dimensional structures of nanometric or micrometric dimensions comprises the following steps: obtaining of a photopolymeric or UV mixture including nanoparticles orientable in space; deposition of a layer of the mixture on a respective substrate; exposure of the layer to UV-radiation and control of the polymerization of the mixture by means of variation of its index of refraction; application of a magnetic and/or electrical field for producing a desired positioning of the nanoparticles, in order to induce the growth of surface projections from the layer of mixture; and polymerization of the mixture.

Abstract: Disclosed is an apparatus for producing DLC film-coated plastic containers, which comprises an outer electrode unit disposed outside a plastic container, an inner electrode disposed inside the plastic container, a duct through which a raw material gas of a carbon source is fed into the plastic container having been degassed, and a high-frequency oscillator for applying a voltage between the outer electrode unit and the inner electrode with a carbon source gas being fed into the container, thereby to generate plasma to form a DLC film on the inner surface of the plastic container. In the apparatus, the outer electrode unit comprises a bottom electrode disposed along the bottom of the plastic container, and a body electrode disposed along the body of the plastic container, and the upper edge of the bottom electrode is positioned below the center between the top and the bottom of the plastic container.

Abstract: A method for protecting an organic polymer underlayer during a plasma assisted process of depositing a subsequent film on the organic polymer underlayer is disclosed. The method provides the deposition of a protective continuous layer using organic polymer damage-free technique in order to not damage the organic polymer underlayer and to protect the organic polymer underlayer during the plasma assisted process of depositing a subsequent film. The organic polymer damage-free technique is a non-plasma process, using only thermal energy and chemical reactions to deposit the continuous layer. The organic polymer damage-free technique can also be a plasma assisted process using a reduced plasma power low enough in order to not damage the organic polymer underlayer.

Abstract: An apparatus for sequential processing of a workpiece comprises an assembly line processing system. The apparatus comprises multiple workpieces moving in an assembly line fashion under multiple process stations. The multiple process stations provide different processes onto the workpieces for a sequential processing of the workpieces. The sequential processing action is carried out by the movement of the workpieces under the various process stations.

Abstract: The present invention generally provides improved adhesion and oxidation resistance of carbon-containing layers without the need for an additional deposited layer. In one aspect, the invention treats an exposed surface of carbon-containing material, such as silicon carbide, with an inert gas plasma, such as a helium (He), argon (Ar), or other inert gas plasma, or an oxygen-containing plasma such as a nitrous oxide (N2O) plasma. Other carbon-containing materials can include organic polymeric materials, amorphous carbon, amorphous fluorocarbon, carbon containing oxides, and other carbon-containing materials. The plasma treatment is preferably performed in situ following the deposition of the layer to be treated. Preferably, the processing chamber in which in situ deposition and plasma treatment occurs is configured to deliver the same or similar precursors for the carbon-containing layer(s). However, the layer(s) can be deposited with different precursors.

Abstract: A method for preparing high-use temperature, light-weight polymer/inorganic nanocomposite materials with enhanced thermal stability and performance characteristics, which comprises treating a polymer/inorganic nanocomposite material with oxygen plasma under conditions which result in a thin, protective, ceramic-like layer at the surface of the thus-treated nanocomposite material.

Abstract: This invention provides novel methods for creation of patterned lipid bilayer membranes as well as methods for refunctionalization of such patterned membranes with selected components. Such components optionally comprise, e.g., lipid bilayer membranes (which optionally comprise specific proteins), proteins, non-biologic moieties, etc.

Abstract: This invention solves the technical problem of compensating for the angular dependence of the contrast in optical devices comprising liquid crystal displays (LC optical light shutters, which operate on the principle of electrically controlled optical birefringence), with the aid of a compensation layer exhibiting optically negative birefringence, which enables the angular compensation of the LC layer birefringence in the state in which the LC molecules are homeotropically aligned (typical optically positive birefringence). The process for the manufacture of the optically negatively birefringent compensation layer is devised on the controlled spontaneous deformation of the polymer molecules during the polymerization procedure. The manufacturing process is feasible by the employment of known and well-controllable technical procedures, and enables the mass production of compensation layers.

Abstract: A system and method to expose a material to an ion beam during a continuous material production process may include a vacuum fixture to form the ion beam and a slit in the fixture to allow at least a portion of the ion beam to exit the fixture through the slit. The material can be placed in contact with an exterior area of the fixture so as to cover the slit. With the material in place, the vacuum within the fixture may be maintained and the ion beam formed. The material over the slit can be exposed to the ion beam. As the continuous process moves material past the slit, the vacuum within the vacuum fixture may help to maintain the material in contact with the fixture.

Abstract: A process is described for producing molding compounds and coatings on substrates by curing radiation-curable compositions under inert gas by exposure to light wherein said inert gas comprises a gas heavier than air, and lateral escape of the inert gas in the course of radiation curing is prevented by means of appropriate apparatus or other measures.

Abstract: A liquid material is applied by spin coating it onto a first main surface of a flat plate to form a coating of the liquid material thereon. The flat plate includes a second main surface which is opposite to the first main surface and a hole which passes through the flat plate. The application of the liquid material is carried out using an inner guide member, which is placed in the hole, and the spin coating is carried out while the flat plate is placed on a stage such that the inner guide member is placed generally adjacent to an inner peripheral side surface of the flat plate and an upper surface of the inner guide member and the first main surface are located at generally the same level. Thereby, a coating is obtained which extends on the upper surface of the inner guide member and the first main surface of the flat plate.

Abstract: A method of manufacturing electric machines comprised of geometrically patterned arrays of permanent magnets, soft magnetic materials, and electrical conductors deposited by kinetic spraying methods directly atop a carrier. The magnets and planar coils of the present invention may be integrally formed atop carriers to form electrical machines such as motors, generators, alternators, solenoids, and actuators. The manufacturing techniques used in this invention may produce highly defined articles that do not require additional shaping or attaching steps. Very high-purity permanent and soft magnetic materials, and conductors with low oxidation are produced.

Abstract: A method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions, and reactive gas is introduced to the ion beam to saturate dangling bonds on the surface. Another method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions and quenched with a reactive component to saturate dangling bonds on the surface.

Abstract: A material containing, as a main component, an organic silicon compound represented by the following general formula: R1xSi(OR2)4-x (where R1 is a phenyl group or a vinyl group; R2 is an alkyl group; and x is an integer of 1 to 3) is caused to undergo plasma polymerization or react with an oxidizing agent to form an interlayer insulating film composed of a silicon oxide film containing an organic component. As the organic silicon compound where R1 is a phenyl group, there can be listed phenyltrimethoxysilane or diphenyldimethoxysilane. As the organic silicon compound where R1 is a vinyl group, there can be listed vinyltrimethoxysilane or divinyldimethoxysilane.

Abstract: A method for depositing a low dielectric constant film is provided by reacting a gas mixture including one or more linear, oxygen-free organosilicon compounds, one or more oxygen-free hydrocarbon compounds comprising one ring and one or two carbon-carbon double bonds in the ring, and one or more oxidizing gases. Optionally, the low dielectric constant film is post-treated after it is deposited. In one aspect, the post treatment is an electron beam treatment.

Abstract: The method for hardening electro-insulating materials is characterised by the utilization and/or co-utilization of near-infrared radiation (NIR) having a wavelength of 500 nm to 1400 nm. NIR also enables very fast hardening of the component surface even with pure thermally hardenable impregnating material and further provides good hardening of thick layers located deep inside said layers. Combined hardening, for example, NIR and UV light, is also possible.

Abstract: A film forming and film modifying method utilizing a film forming apparatus which has an alcohol supply unit to form a metal oxide film on a semiconductor wafer in a vacuum atmosphere in which a vaporized metal oxide film material and a vaporized alcohol exist. The film modifying method irradiates a UV ray on ozone to generate active oxygen atoms, thus modifying the metal oxide film by exposing the metal oxide film to the active oxygen atoms in a vacuum atmosphere.

Abstract: A method to selectively metallize polyimide with an all-electroless process.