Patents Examined by Ngoc-Yen Nguyen
  • Patent number: 9840421
    Abstract: When a disproportionated chlorosilane is to be produced by causing a starting material chlorosilane liquid to flow through a catalyst-packed layer which is packed with a weakly basic anion exchange resin as a disproportionation reaction catalyst to carry out a disproportionation reaction, before the disproportionation reaction is carried out, the disproportionation reaction catalyst is brought into contact with a processing gas obtained by diluting a chlorosilane with an inert gas to prevent the deterioration of the disproportionation reaction catalyst at the start of the reaction so as to carry out the disproportionation of the chlorosilane efficiently.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: December 12, 2017
    Assignee: TOKUYAMA CORPORATION
    Inventors: Shouji Iiyama, Tomohiro Yamamoto, Yukihiro Takata, Shinichirou Koyanagi, Kanji Sakata
  • Patent number: 9796594
    Abstract: The invention relates to an improved process to manufacture TCS in a polysilicon plant based upon combining a high temperature FBR process reacting metallurgical grade silicon, hydrogen, and silicon tetrachloride (STC) to make trichlorosilane (TCS) and a high temperature thermal converter to hydrogenate STC to TCS and hydrogen chloride.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: October 24, 2017
    Assignee: Summit Process Design, Inc.
    Inventors: Sumeet Dharampal Gandhi, Bruce Hazeltine
  • Patent number: 9776878
    Abstract: The invention relates to a process for converting silicon tetrachloride (STC) to trichlorosilane (TCS), by introducing reactant gas containing STC and hydrogen into a reaction zone of a reactor in which the temperature is 1000-1600° C., wherein the reaction zone is heated by a heater located outside the reaction zone and the product gas containing TCS which forms is then cooled, with the proviso that it is cooled to a temperature of 700-900° C. within 0.1-35 ms, wherein the reactant gas is heated by the product gas by means of a heat exchanger working in countercurrent, wherein reactor and heat exchanger form a single, gas-tight component, wherein the component includes one or more ceramic materials selected from the group consisting of silicon carbide, silicon nitride, graphite, SiC-coated graphite and quartz glass.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: October 3, 2017
    Assignee: Wacker Chemie AG
    Inventors: Jens Felix Knoth, Hans-Juergen Eberle, Christoph Ruedinger
  • Patent number: 9776881
    Abstract: Processes for producing beryllium fluoride salt systems containing beryllium fluoride, such as lithium beryllium fluoride salts, are disclosed herein. The processes include mixing ammonium beryllium fluoride with a lithium compound, melting the mixture to form a molten phase, purging the molten phase, and cooling the molten phase. This reduces the number of manufacturing steps needed to obtain the beryllium fluoride containing salt.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: October 3, 2017
    Assignee: MATERION CORPORATION
    Inventors: Edgar E. Vidal, Christopher K. Dorn
  • Patent number: 9764963
    Abstract: The invention relates to a process for producing free-flowing calcium fluoride particles from a diluted aqueous solution of hydrogen fluoride comprising the step of reacting the diluted aqueous solution of hydrogen fluoride with calcium carbonate particles at a temperature of less than 50° C. The invention further relates to the use of the free-flowing calcium fluoride particles for the manufacturing of anhydrous hydrogen fluoride.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: September 19, 2017
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Tilman Zipplies, Klaus Hintzer, Thorsten Gerdes, Achim Schmidt-Rodenkirchen, Sebastian Seidl, Thomas Berger
  • Patent number: 9758383
    Abstract: The invention relates to a process for converting polychlorosilanes into hexachlorodisilane, by one or more trimeric polychlorosilanes or a trimeric polychlorosilane in a mixture with higher molecular weight polychlorosilanes being exposed to a gas discharge and hexachlorodisilane being formed and isolated.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: September 12, 2017
    Assignee: Evonik Degussa GmbH
    Inventors: Juergen Erwin Lang, Hartwig Rauleder, Ekkehard Mueh
  • Patent number: 9731979
    Abstract: Disclosed is a process/system for the removal of metal chloride impurities from a titanium tetrachloride stream. The metal chloride impurities are removed through contact of the titanium tetrachloride stream with an alumino-silicate material, which can be selected based on certain properties of the alumino-silicate and based on the geometries of the impurity(ies) and the alumino-silicate.
    Type: Grant
    Filed: April 15, 2013
    Date of Patent: August 15, 2017
    Assignee: Cristal USA Inc.
    Inventors: Bela Derecskei, Alexandre Jean Fines, Alastair Valentine
  • Patent number: 9731968
    Abstract: Disclosed is a process for producing a fluoride gas that can produces fluoride gases such as BF3, SiF4, GeF4, PF5 or AsF5 at a reduced production cost in a simple manner. The process is characterized in that a compound containing an atom, which, together with a fluorine atom, can form a polyatomic ion, is added to a hydrogen fluoride solution to produce the polyatomic ion in a hydrogen fluoride solution and to evolve a fluoride gas comprising the fluorine atom and the atom that, together with the fluorine atom, can form a polyatomic ion.
    Type: Grant
    Filed: June 8, 2009
    Date of Patent: August 15, 2017
    Assignee: STELLA CHEMIFA CORPORATION
    Inventors: Masahide Waki, Tatsuhiro Yabune, Kazuhiro Miyamoto, Kazutaka Hirano
  • Patent number: 9731978
    Abstract: The present invention relates to a method for preparing basic zinc chloride, comprising the following steps: A: preparing raw materials: preparing zinc chloride solution, ammonia water and an induction system; B: performing synthesis: adding the zinc chloride solution and the ammonia water into the induction system in a parallel flow manner, and controlling the temperature to be 60.0-90.0° C.; after the feeding is finished, continuing to react for 20.0-40.0 minutes; and C: performing filtration, washing and drying: after filtering and washing the synthesized basic zinc chloride, drying the basic zinc chloride for 4.0-8.0 hours at 80-105° C. to obtain the basic zinc chloride product. Compared with the prior art, the method for preparing basic zinc chloride has such advantages as simple process, low impurity content, easy-to-control product quality, and suitability for industrialization.
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: August 15, 2017
    Assignee: DONGJIANG ENVIRONMENTAL CO., LTD.
    Inventors: Junqiang Zhu, Wenbin Xu, Yanjie Wang, Long Chen, Cheng Yuan, Zhijia Zeng, Bing Fan
  • Patent number: 9724665
    Abstract: An apparatus for producing trichlorosilane in which metallurgical grade silicon powder supplied to a reactor is reacted with hydrogen chloride gas while being fluidized by the hydrogen chloride gas, thereby discharging trichlorosilane generated by the reaction from the reactor, includes: a plurality of gas flow controlling members which are installed along a vertical direction in an annular shape R from an inner peripheral wall of the reactor in an internal space of the reactor; and a heat transfer tube which is installed along the vertical direction in the annular space R and through which a heating medium passes.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: August 8, 2017
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventor: Mitsutoshi Narukawa
  • Patent number: 9695052
    Abstract: Methods of recovering hydrohalosilanes from reaction residues are disclosed. An inorganic halosilane slurry comprising (i) tetrahalosilane, trihalosilane, dihalosilane, or any combination thereof, (ii) silicon particles, and (iii) heavies is passed through a thin-film dryer to remove halosilanes and form a solid residue comprising silicon particles. Heavies also may be removed as the slurry passes through the thin-film dryer.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: July 4, 2017
    Assignee: REC Silicon Inc
    Inventors: Pei Yoong Koh, Anthony D. Thompson
  • Patent number: 9688543
    Abstract: Bromine containing compounds, such as calcium bromide, sodium bromide and the like, are prepared in high purity and more quickly with less waste by using a process with two bromination stages and often a third step wherein the crude product mixture can be adjusted to meet specific product requirements. In the first bromination stage, the majority, but not all, of a substrate is brominated using a reductive bromination reaction, the remaining unreacted substrate is converted to product in the second stage through another a reductive bromination reaction, although the specific reagents may be different, wherein the addition of bromine and a reducing agent are carefully monitored.
    Type: Grant
    Filed: November 12, 2014
    Date of Patent: June 27, 2017
    Assignee: LANXESS SOLUTIONS US, INC.
    Inventors: Thomas G. Ray, David W. Bartley, Hugh Broadhurst, Nate Goodwin
  • Patent number: 9676626
    Abstract: An IF7-derived iodine fluoride compound recovery method includes putting gas containing IF7 into contact with a material to be fluorinated, thereby converting the IF7 into IF5; and cooling gas containing the IF5, thereby trapping the IF5 as an IF7-derived iodine fluoride compound. The recovered IF5 may be reacted with fluorine to generate IF7, which may be reused for a semiconductor production process.
    Type: Grant
    Filed: July 28, 2014
    Date of Patent: June 13, 2017
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Akiou Kikuchi, Masanori Watari
  • Patent number: 9669400
    Abstract: The present invention provides a technique which allows stable use of an ion-exchange resin for removing boron impurities over a long period of time in the purification step of a silane compound or a chlorosilane compound. In the present invention, a weakly basic ion-exchange resin used for the purification of a silane compound and a chlorosilane compound is cleaned with a gas containing hydrogen chloride. When this cleaning treatment is used for the initial activation of the weakly basic ion-exchange resin, a higher impurity-adsorbing capacity can be obtained. Further, use of the cleaning treatment for the regeneration of the weakly basic ion-exchange resin allows stable use of the ion-exchange resin for a long time. This allows reduction in the amount of the resin used in a long-term operation and reduction in the cost of used resin disposal.
    Type: Grant
    Filed: January 15, 2014
    Date of Patent: June 6, 2017
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiko Ishida, Hiroshi Saito, Atsushi Yoshida
  • Patent number: 9669056
    Abstract: A micronutrient supplement which is made by reacting together copper metal and either hydrochloric acid and/or cupric chloride under oxidizing conditions.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: June 6, 2017
    Assignee: Micronutrients USA LLC
    Inventor: Nicholas J. Leisure
  • Patent number: 9656864
    Abstract: The present invention provides a novel method for producing hydrogen fluoride, which is capable of using various calcium fluoride sources and preventing a second pasty state from occurring, effectively. In a method for producing hydrogen fluoride by reacting calcium fluoride with sulfuric acid, following steps are conducted: (a) a step for mixing and reacting calcium fluoride particles having an average particle diameter of 1-40 ?m with sulfuric acid at a sulfuric acid/calcium fluoride molar ratio of 0.9-1.1 under a temperature of 0-70° C. to obtain a solid-state reaction mixture; and (b) a step for heating the solid-state reaction mixture to a temperature of 100-200° C. to react with itself, and thereby producing hydrogen fluoride in a gas phase.
    Type: Grant
    Filed: June 24, 2010
    Date of Patent: May 23, 2017
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Toshikazu Yoshimura, Masayoshi Imoto, Arata Sasatani, Akikazu Tabuchi
  • Patent number: 9650255
    Abstract: The invention provides a process for endothermic gas phase reaction in a reactor, in which reactant gases are introduced into the reactor via a gas inlet apparatus and distributed homogeneously into a heating zone by means of a gas distribution apparatus, wherein the reactant gases are heated in the heating zone to a mean temperature of 500-1500° C. by means of heating elements and then conducted into a reaction zone, the reactant gases reacting in the reaction zone to give a product gas which is conducted out of the reactor via a gas outlet apparatus. Further subject matter of the invention relates to a process for endothermic gas phase reaction in a reactor, wherein the heating of the heating elements is controlled by temperature measurements in the reaction zone, at least two temperature sensors being present in the reaction zone for this purpose, and reactor for performance of the process.
    Type: Grant
    Filed: September 19, 2013
    Date of Patent: May 16, 2017
    Assignee: Wacker Chemie AG
    Inventors: Andreas Hirschmann, Walter Haeckl, Uwe Paetzold
  • Patent number: 9629876
    Abstract: A micronutrient supplement which is made by reacting together copper metal and either hydrochloric acid and/or cupric chloride under oxidizing conditions.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: April 25, 2017
    Assignee: Micronutrients USA LLC
    Inventor: Nicholas J. Leisure
  • Patent number: 9610567
    Abstract: The invention relates to a process for regenerating a hydrogen chloride oxidation catalyst comprising ruthenium oxide on a support material, which comprises the steps a) reduction of the catalyst in a gas stream comprising hydrogen chloride and optionally an inert gas at a temperature of from 100 to 800° C., b) recalcination of the catalyst in an oxygen-comprising gas stream at a temperature of from 150 to 800° C.
    Type: Grant
    Filed: December 28, 2009
    Date of Patent: April 4, 2017
    Assignee: BASF SE
    Inventors: Guido Henze, Heiko Urtel, Martin Sesing, Martin Karches, Thorsten Von Fehren, Toni Kustura
  • Patent number: 9586832
    Abstract: A method of reacting amine compounds with halons and perhalogenated compounds, resulting in the conversion of these ozone-depleting species into non-volatile salts and a variety of other amine derivatives is disclosed.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: March 7, 2017
    Inventor: Dru L. DeLaet