Abstract: A structure includes a die substrate; a passivation layer on the die substrate; first and second interconnect structures on the passivation layer; and a barrier on the passivation layer, at least one of the first or second interconnect structures, or a combination thereof. The first and second interconnect structures comprise first and second via portions through the passivation layer to first and second conductive features of the die substrate, respectively. The first and second interconnect structures further comprise first and second pads, respectively, and first and second transition elements on a surface of the passivation layer between the first and second via portion and the first and second pad, respectively. The barrier is disposed between the first pad and the second pad. The barrier does not fully encircle at least one of the first pad or the second pad.

Abstract: A semiconductor device may include active pattern, a silicon liner, an insulation layer, an isolation pattern and a transistor. The active pattern may protrude from a substrate. The silicon liner having a crystalline structure may be formed conformally on surfaces of the active pattern and the substrate. The insulation layer may be formed on the silicon liner. The isolation pattern may be formed on the insulation layer to fill a trench adjacent to the active pattern. The transistor may include a gate structure and impurity regions. The gate structure may be disposed on the silicon liner, and the impurity regions may be formed at the silicon liner and the active pattern adjacent to both sides of the gate structure.

Abstract: A multi-layer substrate includes: a first insulating layer; a conductor layer that is provided on an upper surface of the first insulating layer and that has a penetrating portion; a second insulating layer that covers the conductor layer and that is stacked on the upper surface of the first insulating layer; a via hole that penetrates the second insulating layer from an upper surface of the second insulating layer to reach an inside of the first insulating layer and that includes the penetrating portion; and an insulating member with which the via hole is filled. The conductor layer has a portion exposed in the via hole, and the insulating member covers an upper surface and a lower surface of the conductor layer exposed in the via hole through the penetrating portion of the conductor layer.

Abstract: Semiconductor devices and methods of forming a first layer cap at ends of layers of first channel material in a stack of alternating layers of first channel material and second channel material. A second layer cap is formed at ends of the layers of second channel material. The first layer caps are etched away in a first device region. The second layer caps are etched away in a second device region.

Abstract: A light emitting diode includes: a substrate; a semiconductor stack disposed on the substrate and including a lower semiconductor layer, an upper semiconductor layer and an active layer interposed between the lower semiconductor layer and the upper semiconductor layer, the semiconductor stack having an isolation groove exposing the substrate through the upper semiconductor layer, the active layer and the lower semiconductor layer; a first electrode pad and an upper extension portion electrically connected to the upper semiconductor layer; a second electrode pad and a lower extension portion electrically connected to the lower semiconductor layer; a connecting portion connecting the upper extension portion and the lower extension portion to each other across the isolation groove; a first current blocking layer interposed between the lower extension portion and the lower semiconductor layer; and a second current blocking layer interposed between the second electrode pad and the lower semiconductor layer.

Abstract: A display may have an array of organic light-emitting diodes that form an active area on a flexible substrate. Metal traces may extend between the active area and an inactive area of the flexible substrate. Display driver circuitry such as a display driver integrated circuit may be coupled to the inactive area. The metal traces may extend across a bend region in the flexible substrate. The flexible substrate may be bent in the bend region. The flexible substrate may be made of a thin flexible material to reduce metal trace bending stress. A coating layer in the bend region may be provided with an enhanced elasticity to allow its thickness to be reduced. The flexible substrate may be bent on itself and secured within an electronic device without using a mandrel.

Abstract: A spin current magnetization rotational element includes: a spin-orbit torque wiring extending in a first direction; and a first ferromagnetic layer laminated in a second direction intersecting with the spin-orbit torque wiring, wherein the first ferromagnetic layer comprises a plurality of ferromagnetic constituent layers and at least one inserted layer sandwiched between adjacent ferromagnetic constituent layers, and polarities of spin Hall angles of two layers, which sandwich at least one of the ferromagnetic constituent layers among the plurality of the ferromagnetic constituent layers, differ.

Abstract: A double-sided coolable semiconductor package includes an upper electrically conductive element having an outwardly exposed metal surface, a lower carrier substrate having an upper electrically conductive layer, a lower electrically conductive layer with an outwardly exposed surface and an electrical insulating layer arranged between the upper and lower electrically conductive layers, a first electrically conductive spacer arranged between the upper electrically conductive element and the upper electrically conductive layer, a power semiconductor chip arranged between the upper electrically conductive element and the upper electrically conductive layer, a second electrically conductive spacer arranged between the upper electrically conductive element and the power semiconductor chip, and a passive electrical component electrically connected to the upper electrically conductive layer of the lower carrier substrate.

Abstract: A semiconductor package may include a first substrate and a second substrate, a redistribution layer (RDL), a first conductive via and a second conductive via. The first substrate has a first surface and a second surface opposite to the first surface. The second substrate has a first surface and a second surface opposite to the first surface. The RDL is disposed on the first surface of the first substrate and the first surface of the second substrate. The first conductive via passes through the RDL and is electrically connected to the first substrate. The second conductive via passes through the RDL and is electrically connected to the second substrate.

Abstract: A semiconductor device includes a structure including gate electrodes and interlayer insulating layers alternately stacked on an upper surface of a substrate, trenches passing through the structure; and a groove passing through a portion of the structure. The gate electrodes include word lines, and first and second select lines. The word lines are stacked in a vertical direction upwardly from the upper surface of the substrate. The first and second select lines are on the word lines, and are spaced apart from each other in a first horizontal direction parallel to the upper surface of the substrate. The trenches include a first trench and a second trench spaced apart from the first trench. The groove is on the word lines. The groove and a portion of the first trench are between the first select line and the second select line. The second trench is spaced apart from the select lines.

Abstract: A method of fabricating an integrated circuit (IC) structure, includes forming a gate trench that exposes a portion of each of a plurality of fins and forming a threshold voltage (Vt) tuning dielectric layer in the gate trench over the plurality of fins. Properties of the Vt tuning dielectric layer are adjusted during the forming to achieve a different Vt for each of the plurality of fins. The method also includes forming a glue metal layer over the Vt tuning dielectric layer; and forming a fill metal layer over the glue metal layer. The fill metal layer has a substantially uniform thickness over top surfaces of the plurality of fins.

Abstract: A display may have an array of organic light-emitting diodes that form an active area on a flexible substrate. Metal traces may extend between the active area and an inactive area of the flexible substrate. Display driver circuitry such as a display driver integrated circuit may be coupled to the inactive area. The metal traces may extend across a bend region in the flexible substrate. The flexible substrate may be bent in the bend region. The flexible substrate may be made of a thin flexible material to reduce metal trace bending stress. A coating layer in the bend region may be provided with an enhanced elasticity to allow its thickness to be reduced. The flexible substrate may be bent on itself and secured within an electronic device without using a mandrel.

Abstract: A light-emitting device has a longitudinal direction and a width direction perpendicular to the longitudinal direction, and includes a first light-emitting element, a second light-emitting element having a peak emission wavelength different from a peak emission wavelength of the first light-emitting element and being aligned with the first light-emitting element in the longitudinal direction, a light-transmissive member covering a first element light extracting surface and a second element light extracting surface such that a portion of a light-guide member is located between the light-transmissive member and each of the first element light extracting surface and the second element light extracting surface, a first reflective member surrounding the first light-emitting element, the second light-emitting element, and the light-guide member in a top view, and a first inclined member between the first light-emitting element and the first reflective member in the longitudinal direction and having an inclined surf

Abstract: A back end of line interconnect structure and methods for forming the interconnect structure including a fully aligned via design generally includes wide lines formed of copper and narrow lines formed of an alternative metal. The fully aligned vias are fabricated using a metal recess approach and the hybrid metal conductors can be fabricated using a selective deposition approach.

Abstract: Image sensors are provided. Image sensors may include unit pixels arranged in a first direction and a second direction crossing the first direction. Each of the unit pixels may include first and second floating diffusion regions and first and second photo gate electrodes between the first and second floating diffusion regions. The unit pixels may include a first unit pixel, a second unit pixel, and a third unit pixel sequentially arranged. The first floating diffusion region of the second unit pixel may be between the first photo gate electrode of the first unit pixel and the first photo gate electrode of the second unit pixel, and the second floating diffusion region of the second unit pixel may be between the second photo gate electrode of the second unit pixel and the second photo gate electrode of the third unit pixel.

Abstract: An IC device package includes a carrier, one or more IC devices and a lid. The lid includes a lid-ridge. The lid is connected to the carrier by connecting the lid-ridge to the carrier with first nano particle metallic paste, prior to connecting the IC device to the carrier. Subsequent to connecting the IC device to the carrier, the lid is connected to the lid-ridge with second nano particle metallic paste. The nano particle metallic paste may be sintered to form a metallic connection. In multi-IC device packages, the lid-ridge may be positioned between the lid and the carrier and between the IC devices.

Abstract: A semiconductor package may include: a chip stack including first to Nth semiconductor chips stacked with an offset to one side such that edges thereof on the other side are exposed, and having first to Nth chip pads disposed at the other-side edges, respectively; a bridge unit disposed adjacent to the other side of the chip stack and spaced apart from the chip stack; kth to Nth wires extended in a vertical direction while one ends thereof are connected to the kth to Nth chip pads among the first to Nth chip pads; first to (k?1)th wires having one ends connected to the first to (k?1)th chip pads among the first to Nth chip pads; and an additional wire electrically coupled to the first to (k?1)th wires, and extended in the vertical direction while one end thereof is connected to the bridge unit.

Abstract: A module assembly includes an adapter substrate with at least one cavity and a surface mounted die mounted on a top surface of the adapter substrate. The first cavity extends through the adapter substrate and has at least one first side wall. A first metallization layer is provided within the cavity. A first recessed die is attached to the first metallization layer and mounted within the cavity such that the first recessed die is at least partially recessed into the first cavity and surrounded by a gap filler that resides between side portions of the first recessed die and the at least one first side wall. The top surface of the gap filler is flush with the top surface of the adapter substrate and a top surface of the first recessed die.

Abstract: A semiconductor device of an embodiment includes: a first semiconductor layer of a first conductive type; a second semiconductor layer of the first conductive type, being provided on the first semiconductor layer and including a first trench, a plurality of holes, a plurality of second trenches, and a plurality of third trenches; a first semiconductor region of a second conductive type, being provided on the second semiconductor layer; a second semiconductor region of the first conductive type, being provided on the first semiconductor region; a first electrode electrically connected to the second semiconductor region; a second electrode disposed in the first trench via a first insulation film; a plurality of first field plate electrodes having a column shape, being electrically connected to the first electrode, interposing the second electrode, and being disposed in the holes via a second insulation film; a plurality of third electrodes extending from ends of the first insulation films in a first direction t

Abstract: According to one embodiment, a semiconductor memory device includes a semiconductor substrate, a memory cell array, first circuitry and a via. The semiconductor substrate includes a first main surface and a second main surface opposite the first main surface. The memory cell array is provided on the first main surface. The memory cell array includes stacked memory cells. The first circuitry is provided on the second main surface. The first circuitry is configured to operate the memory cells. The via penetrates through the semiconductor substrate. The via provides electrical connection between the memory cells and the first circuitry.