Abstract: A UV emission interface cell including a sensor arranged to detect an object along an axis extending from the sensor, at least one UV light emitter arranged to emit UV light toward the object, and an activator circuit arranged to activate the at least one UV light emitter in response to the sensor detecting that the object is aligned along the axis extending from the sensor.

Abstract: A windshield wiper system (WWS) is provided and includes a wiper blade assembly drivable along a first sweep angle, an internal wiper trigger disposed to move with the wiper blade assembly, a measurement system configured to monitor a position of the internal wiper trigger from which a corresponding position of the wiper blade assembly relative to the first sweep angle is measurable and to output a sweep angle feedback signal corresponding to monitoring results and a controller. The controller is receptive of the sweep angle feedback signal.

Abstract: The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.

Abstract: A base station for connecting a cleaning device and a method for operating a cleaning system with a cleaning device and such a base station are proposed, wherein the room air is conditioned by means of the base station and/or the quality of the room air is measured by means of the base station.

Abstract: The invention relates to a method of automatic dishwashing, comprising: placing soiled wares inside a cleaning volume; providing a first cleaning composition comprising a bleach and a second cleaning composition different from the first composition; and delivering the first composition and the second composition separately to the cleaning volume to contact the soiled wares, wherein: the first composition is delivered to the cleaning volume as a mist and the second composition is delivered to the cleaning volume as a jet; and the first and second compositions are delivered to the cleaning volume at a temperature below 100° C. The invention also relates to a dishwasher and a kit for use in the inventive method.

Abstract: In an aseptic filling apparatus, a CIP of the content filling station is performed after rotation of a wheel in the content filling station is stopped, a COP or SOP of the content filling station is performed while the wheel in the content filling station is rotating immediately after the CIP is completed, an SIP of the content filling station is performed with rotation of the wheel in the content filling station being stopped immediately after the COP or SOP is completed, and one or both of the COP and SOP of the other stations is performed in a predetermined order while wheels in the other stations are rotating in a period from the start of the CIP to the end of the SIP.

Abstract: In an aseptic filling apparatus, a CIP of the content filling station is performed after rotation of a wheel in the content filling station is stopped, a COP or SOP of the content filling station is performed while the wheel in the content filling station is rotating immediately after the CIP is completed, an SIP of the content filling station is performed with rotation of the wheel in the content filling station being stopped immediately after the COP or SOP is completed, and one or both of the COP and SOP of the other stations is performed in a predetermined order while wheels in the other stations are rotating in a period from the start of the CIP to the end of the SIP.

Abstract: A sweeper/scrubber assembly may be used to clean a floor surface without dry sweeping or mopping solid debris from the floor surface before conveying the sweeper/scrubber assembly over the floor surface. In some examples, the sweeper/scrubber assembly includes at least two counter-rotating brushes, a cleaning fluid dispensing system, a vacuum squeegee, and a solid debris collection reservoir. The cleaning fluid dispensing system can dispense cleaning fluid on the floor being cleaning and or one or both brushes. The vacuum squeegee can be positioned against a face of one of the brushes and can apply a vacuum suction force to the face of the brush. The solid debris collection reservoir can be a space not exposed to a vacuum force that collects solid debris thrown by the rotating brushes.

Abstract: A cleaning module for cleaning a wafer comprises a wafer gripping device configured to support a wafer in a vertical orientation and comprises a catch cup and a gripper assembly. The catch cup comprises a wall that has an annular inner surface that defines a processing region and has an angled portion that is symmetric about a central axis of the wafer gripping device. The gripper assembly comprises a first plate assembly, a second plate assembly, a plurality of gripping pin, and a plurality of loading pin. The gripping pins are configured to grip a wafer during a cleaning process and the loading pins are configured to grip the wafer during a loading and unloading process. The cleaning module further comprises a sweep arm coupled to a nozzle mechanism configured to deliver liquids to the front and back side of the wafer.

Abstract: Provided are embodiments for a direct drive wiper system. The system includes a motor that is operably coupled to a wiper system to drive one or more wiper arms of the wiper system, and a gearbox, wherein an input to the gearbox is coupled to the motor and an output of the gearbox is coupled to the wiper assembly, wherein the gearbox is configured to convert an input from the motor to an output to drive the wiper system. The system also includes a brake and stopper mechanism that is coupled to the gearbox and the wiper system. Also provided are embodiments for a method for operating the direct drive wiper system.

Abstract: In a method for removing an organic adhesive from a glass carrier in a semiconductor manufacturing process, the glass carrier is placed into a process chamber. The glass carrier is rotated and heated sulfuric acid is applied or sprayed onto the glass carrier. Ozone is introduced into the process chamber. The ozone diffuses through the sulfuric acid to the organic adhesive on the surface of the glass carrier. The sulfuric acid and the ozone chemically react with the organic adhesive and remove it from the glass carrier.

Abstract: The present disclosure relates generally to water jet equipment. Specifically, water jet equipment that includes a support frame comprised of a plurality of stackable trolleys that support a plurality of lances as those lances are inserted into and withdrawn from heat exchanger tubes during a cleaning operation of the same. A method of cleaning elongated tubes by positioning and rotating the lances while moving in a first direction is further provided.

Abstract: A method of cleaning a component within a turbine that includes disassembling the turbine engine to provide a flow path to an interior passageway of the component from an access point. The component has coked hydrocarbons formed thereon. The method further includes discharging a flow of cleaning solution towards the interior passageway from the access point, wherein the cleaning solution is configured to remove the coked hydrocarbons from the component.

Abstract: Method of cleaning a plasma coating torch utilizing at least one nozzle mounted so as to be directed at the plasma coating torch in order to subject an external surface of the plasma coating torch to a cleaning agent that removes spray material particles which have adhered to the external surface of the plasma coating torch during coating with the plasma coating torch, and such that the cleaning agent exiting the at least one nozzle and being directed toward the external surface and directly changing to a gaseous state from either a solid state or a liquid state.

Abstract: A UV sanitizing device including a sanitizing interface having a top surface arranged to support a device positioned above the sanitizing interface where the sanitizing interface includes a translucent material arranged to allow UV light to pass through An adjustable UV emission interface, positioned adjacent to the sanitizing interface, arranged to adjustably conform to the shape of a device facing the sanitizing interface, and arranged to emit the UV light toward the sanitizing interface in the shape of the device. The adjustable UV emission interface includes UV emission interface cells such that, when a first portion of the UV emission interface cells is activated and a second portion of the UV emission interface cells is deactivated, the UV emission interface conforms to the shape of the device. Each cell of UV emission interface cells includes a sensor arranged to detect a portion of the device facing the sanitizing interface.

Abstract: A cleaning method removes a silicon oxide film by plasma from a member that is provided in a processing container of a plasma processing apparatus and having the silicon oxide film formed on its surface. The cleaning method includes: supplying a processing gas into the processing container; generating plasma of the processing gas that is supplied into the processing container; and applying bias power that draws ions in the plasma of the processing gas to the member. A ratio of a value of the bias power to a pressure in the processing container is 1.0 W/mTorr or less.

Abstract: An artificial intelligence (AI) cleaner according to an embodiment of the present invention may include a memory, a movement detect sensor, a driving unit configured to allow the AI cleaner to be moved, and a processor configured to control the movement sensor to sense a movement of the AI cleaner by a user and acquire a position to which the AI cleaner has moved while the AI cleaner operates at a first cleaning mode and control the driving unit to allow the AI cleaner to clean a priority cleaning area corresponding to the position at a second cleaning mode.

Abstract: Extended reach sluicer systems, devices, and methods for breaking up and retrieving chemical, radioactive, hazardous materials and/or other waste and/or other material from storage tanks with mechanical arms and nozzles to break up and transfer tank material. And this invention can work with tanks having high temperature or low temperature conditions.

Abstract: System for selectively contacting a cleaning composition with a surface of a turbine engine component is presented. The system includes a cleaning apparatus and a manifold assembly. The cleaning apparatus includes an upper portion and a lower portion defining a cleaning chamber configured to allow selective contact between the cleaning composition and a surface of the first portion of the turbine engine component. The upper portion includes a plurality of fill holes in fluid communication with the cleaning chamber, and the lower portion includes a plurality of drain holes in fluid communication with the cleaning chamber. The manifold assembly is configured to selectively circulate the cleaning composition from a reservoir to the cleaning chamber via the plurality of fill holes, and recirculate the cleaning composition from the cleaning chamber to the reservoir via the plurality of drain holes. Methods for selectively cleaning a turbine engine component is also presented.

Abstract: An automatic cleaning device of food flying machines is disclosed, wherein a food flying pot and a cleaning device are respectively installed on the machine body, the cleaning device includes a water inlet externally connected to a water source, the water inlet is connected with at least one connection tube, a water control valve is installed on the connection tube, a water outlet head is connected to the end of the connection tube, and the master controller is set up to control the water control valve, after having completed the food flying operation, the water control valve can be activated so that clean water can be sprayed into the inner flying pot through the water outlet head.